JPS6490246A - Antistatic resin composition - Google Patents

Antistatic resin composition

Info

Publication number
JPS6490246A
JPS6490246A JP24362587A JP24362587A JPS6490246A JP S6490246 A JPS6490246 A JP S6490246A JP 24362587 A JP24362587 A JP 24362587A JP 24362587 A JP24362587 A JP 24362587A JP S6490246 A JPS6490246 A JP S6490246A
Authority
JP
Japan
Prior art keywords
polyamide
antistatic
acrylic resin
segment
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24362587A
Other languages
Japanese (ja)
Inventor
Shoichi Yoshitani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NOF Corp
Original Assignee
Nippon Oil and Fats Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Oil and Fats Co Ltd filed Critical Nippon Oil and Fats Co Ltd
Priority to JP24362587A priority Critical patent/JPS6490246A/en
Publication of JPS6490246A publication Critical patent/JPS6490246A/en
Pending legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To obtain the title composition excellent in an antistatic effect as well as the transparency and mechanical strengths inherent in an acrylic resin itself, and useful for housings of electrical and electronic devices and insutruments, etc., by mixing a specified polyether block amide with an acrylic resin. CONSTITUTION:The title composition is prepared by mixing 5-70wt.% polyether block amide comprising polyamide segments and polyether segments, e.g., a polymer of formula I (wherein R is an alkyl, m, n, x and y are each a natural number; the polyamide segment of formula II as a hard segment is, for example, polyamide 6, polyamide 66 or polyamide 11, the polyether ester segment of formula III as a soft segment is, for example, polyethylene glycol or polypropylene glycol), with 95-30wt.% acrylic resin, e.g., polyethyl (meth) acrylate. This antistatic resin composition possesses a semipermanent antistatic property as well as the features of an acrylic resin, such as transparency and mechanical strengths, and does not lose its antistatic property due to friction or washing off of an antistatic agent by running water or the like, because no antistatic agent is used.
JP24362587A 1987-09-30 1987-09-30 Antistatic resin composition Pending JPS6490246A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24362587A JPS6490246A (en) 1987-09-30 1987-09-30 Antistatic resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24362587A JPS6490246A (en) 1987-09-30 1987-09-30 Antistatic resin composition

Publications (1)

Publication Number Publication Date
JPS6490246A true JPS6490246A (en) 1989-04-06

Family

ID=17106609

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24362587A Pending JPS6490246A (en) 1987-09-30 1987-09-30 Antistatic resin composition

Country Status (1)

Country Link
JP (1) JPS6490246A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02283748A (en) * 1989-04-25 1990-11-21 Asahi Chem Ind Co Ltd Thermoplastic resin composition
JPH0339349A (en) * 1989-07-06 1991-02-20 Asahi Chem Ind Co Ltd Thermoplastic resin composition
JPH04146947A (en) * 1990-10-11 1992-05-20 Asahi Chem Ind Co Ltd Antistatic and transparent acrylic resin composition
WO1993021273A1 (en) * 1992-04-09 1993-10-28 Asahi Kasei Kogyo Kabushiki Kaisha Acrylic resin composition
US5369179A (en) * 1990-09-07 1994-11-29 W. R. Grace & Co.-Conn. Inherently antistatic thermoplastic polyamide-polyether films
US5574101A (en) * 1993-12-07 1996-11-12 Asahi Kasei Kogyo Kabushiki Kaisha Acrylic resin composition
WO2001014471A3 (en) * 1999-08-25 2001-07-26 Cyro Ind Electrostatic-dissipative multipolymer compositions
JP2005264071A (en) * 2004-03-19 2005-09-29 Dainippon Ink & Chem Inc Acrylic resin composition and molded product of the same
JP2006133567A (en) * 2004-11-08 2006-05-25 Denki Kagaku Kogyo Kk Light diffusion plate

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02283748A (en) * 1989-04-25 1990-11-21 Asahi Chem Ind Co Ltd Thermoplastic resin composition
JPH0339349A (en) * 1989-07-06 1991-02-20 Asahi Chem Ind Co Ltd Thermoplastic resin composition
US5369179A (en) * 1990-09-07 1994-11-29 W. R. Grace & Co.-Conn. Inherently antistatic thermoplastic polyamide-polyether films
JPH04146947A (en) * 1990-10-11 1992-05-20 Asahi Chem Ind Co Ltd Antistatic and transparent acrylic resin composition
WO1993021273A1 (en) * 1992-04-09 1993-10-28 Asahi Kasei Kogyo Kabushiki Kaisha Acrylic resin composition
US5574101A (en) * 1993-12-07 1996-11-12 Asahi Kasei Kogyo Kabushiki Kaisha Acrylic resin composition
WO2001014471A3 (en) * 1999-08-25 2001-07-26 Cyro Ind Electrostatic-dissipative multipolymer compositions
US6624250B2 (en) * 1999-08-25 2003-09-23 Cyro Industries Electrostatic-dissipative multipolymer compositions
US6673873B1 (en) 1999-08-25 2004-01-06 Cyro Industries Electrostatic-dissipative multipolymer compositions
JP2012062479A (en) * 1999-08-25 2012-03-29 Evonik Cyro Llc Electrostatic-dissipative multipolymer composition
JP2005264071A (en) * 2004-03-19 2005-09-29 Dainippon Ink & Chem Inc Acrylic resin composition and molded product of the same
JP2006133567A (en) * 2004-11-08 2006-05-25 Denki Kagaku Kogyo Kk Light diffusion plate

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