JPS648809B2 - - Google Patents
Info
- Publication number
- JPS648809B2 JPS648809B2 JP17172781A JP17172781A JPS648809B2 JP S648809 B2 JPS648809 B2 JP S648809B2 JP 17172781 A JP17172781 A JP 17172781A JP 17172781 A JP17172781 A JP 17172781A JP S648809 B2 JPS648809 B2 JP S648809B2
- Authority
- JP
- Japan
- Prior art keywords
- heat
- developable photosensitive
- photosensitive material
- silver
- silver halide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 claims description 36
- -1 silver halide Chemical class 0.000 claims description 30
- 229910052709 silver Inorganic materials 0.000 claims description 22
- 239000004332 silver Substances 0.000 claims description 22
- 150000001875 compounds Chemical class 0.000 claims description 21
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 claims description 13
- 239000011230 binding agent Substances 0.000 claims description 6
- 239000003638 chemical reducing agent Substances 0.000 claims description 6
- 230000033116 oxidation-reduction process Effects 0.000 claims description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 4
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052700 potassium Inorganic materials 0.000 claims description 4
- 239000011591 potassium Substances 0.000 claims description 4
- 239000002356 single layer Substances 0.000 claims description 4
- 229910052708 sodium Inorganic materials 0.000 claims description 4
- 239000011734 sodium Substances 0.000 claims description 4
- 125000003342 alkenyl group Chemical group 0.000 claims description 2
- 125000004450 alkenylene group Chemical group 0.000 claims description 2
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 125000002947 alkylene group Chemical group 0.000 claims description 2
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 description 17
- 238000000576 coating method Methods 0.000 description 17
- 238000000034 method Methods 0.000 description 16
- 230000018109 developmental process Effects 0.000 description 14
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 8
- GVNVAWHJIKLAGL-UHFFFAOYSA-N 2-(cyclohexen-1-yl)cyclohexan-1-one Chemical compound O=C1CCCCC1C1=CCCCC1 GVNVAWHJIKLAGL-UHFFFAOYSA-N 0.000 description 7
- 239000010410 layer Substances 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 5
- 239000000975 dye Substances 0.000 description 5
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 101150065749 Churc1 gene Proteins 0.000 description 4
- PCLIMKBDDGJMGD-UHFFFAOYSA-N N-bromosuccinimide Chemical compound BrN1C(=O)CCC1=O PCLIMKBDDGJMGD-UHFFFAOYSA-N 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- 102100038239 Protein Churchill Human genes 0.000 description 4
- 235000014113 dietary fatty acids Nutrition 0.000 description 4
- 239000000194 fatty acid Substances 0.000 description 4
- 229930195729 fatty acid Natural products 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- AQRYNYUOKMNDDV-UHFFFAOYSA-M silver behenate Chemical compound [Ag+].CCCCCCCCCCCCCCCCCCCCCC([O-])=O AQRYNYUOKMNDDV-UHFFFAOYSA-M 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- 206010034972 Photosensitivity reaction Diseases 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229920002301 cellulose acetate Polymers 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 150000004665 fatty acids Chemical class 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 230000036211 photosensitivity Effects 0.000 description 3
- IJAPPYDYQCXOEF-UHFFFAOYSA-N phthalazin-1(2H)-one Chemical compound C1=CC=C2C(=O)NN=CC2=C1 IJAPPYDYQCXOEF-UHFFFAOYSA-N 0.000 description 3
- 150000003378 silver Chemical class 0.000 description 3
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- UKMSUNONTOPOIO-UHFFFAOYSA-N docosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCC(O)=O UKMSUNONTOPOIO-UHFFFAOYSA-N 0.000 description 2
- 125000000219 ethylidene group Chemical group [H]C(=[*])C([H])([H])[H] 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- KIWUVOGUEXMXSV-UHFFFAOYSA-N rhodanine Chemical compound O=C1CSC(=S)N1 KIWUVOGUEXMXSV-UHFFFAOYSA-N 0.000 description 2
- 230000001235 sensitizing effect Effects 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 1
- PSBDWGZCVUAZQS-UHFFFAOYSA-N (dimethylsulfonio)acetate Chemical group C[S+](C)CC([O-])=O PSBDWGZCVUAZQS-UHFFFAOYSA-N 0.000 description 1
- ZEMODTUZIWTRPF-UHFFFAOYSA-N 1-n,4-n-diethylbenzene-1,4-diamine Chemical compound CCNC1=CC=C(NCC)C=C1 ZEMODTUZIWTRPF-UHFFFAOYSA-N 0.000 description 1
- KGRVJHAUYBGFFP-UHFFFAOYSA-N 2,2'-Methylenebis(4-methyl-6-tert-butylphenol) Chemical compound CC(C)(C)C1=CC(C)=CC(CC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O KGRVJHAUYBGFFP-UHFFFAOYSA-N 0.000 description 1
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 1
- MOXDGMSQFFMNHA-UHFFFAOYSA-N 2-hydroxybenzenesulfonamide Chemical class NS(=O)(=O)C1=CC=CC=C1O MOXDGMSQFFMNHA-UHFFFAOYSA-N 0.000 description 1
- DFZVZKUDBIJAHK-UHFFFAOYSA-N 2-hydroxyoctadecanoic acid silver Chemical compound [Ag].OC(C(=O)O)CCCCCCCCCCCCCCCC DFZVZKUDBIJAHK-UHFFFAOYSA-N 0.000 description 1
- SRJCJJKWVSSELL-UHFFFAOYSA-N 2-methylnaphthalen-1-ol Chemical compound C1=CC=CC2=C(O)C(C)=CC=C21 SRJCJJKWVSSELL-UHFFFAOYSA-N 0.000 description 1
- HXIQYSLFEXIOAV-UHFFFAOYSA-N 2-tert-butyl-4-(5-tert-butyl-4-hydroxy-2-methylphenyl)sulfanyl-5-methylphenol Chemical compound CC1=CC(O)=C(C(C)(C)C)C=C1SC1=CC(C(C)(C)C)=C(O)C=C1C HXIQYSLFEXIOAV-UHFFFAOYSA-N 0.000 description 1
- IKEHOXWJQXIQAG-UHFFFAOYSA-N 2-tert-butyl-4-methylphenol Chemical compound CC1=CC=C(O)C(C(C)(C)C)=C1 IKEHOXWJQXIQAG-UHFFFAOYSA-N 0.000 description 1
- YKUUUTAPMKKPTK-UHFFFAOYSA-N 2-tert-butyl-6-[2-(3-tert-butyl-2-hydroxy-5-methylphenyl)ethyl]-4-methylphenol Chemical compound CC(C)(C)C1=CC(C)=CC(CCC=2C(=C(C=C(C)C=2)C(C)(C)C)O)=C1O YKUUUTAPMKKPTK-UHFFFAOYSA-N 0.000 description 1
- CNGYZEMWVAWWOB-VAWYXSNFSA-N 5-[[4-anilino-6-[bis(2-hydroxyethyl)amino]-1,3,5-triazin-2-yl]amino]-2-[(e)-2-[4-[[4-anilino-6-[bis(2-hydroxyethyl)amino]-1,3,5-triazin-2-yl]amino]-2-sulfophenyl]ethenyl]benzenesulfonic acid Chemical compound N=1C(NC=2C=C(C(\C=C\C=3C(=CC(NC=4N=C(N=C(NC=5C=CC=CC=5)N=4)N(CCO)CCO)=CC=3)S(O)(=O)=O)=CC=2)S(O)(=O)=O)=NC(N(CCO)CCO)=NC=1NC1=CC=CC=C1 CNGYZEMWVAWWOB-VAWYXSNFSA-N 0.000 description 1
- KILSKMIMHDYVMB-UHFFFAOYSA-N 6-tert-butyl-4-[1-(3-tert-butyl-4-hydroxy-1-methylcyclohexa-2,4-dien-1-yl)butyl]-4-methylcyclohexa-1,5-dien-1-ol Chemical compound C1C=C(O)C(C(C)(C)C)=CC1(C)C(CCC)C1(C)CC=C(O)C(C(C)(C)C)=C1 KILSKMIMHDYVMB-UHFFFAOYSA-N 0.000 description 1
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 1
- 235000021357 Behenic acid Nutrition 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- 229910021612 Silver iodide Inorganic materials 0.000 description 1
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 1
- HOLVRJRSWZOAJU-UHFFFAOYSA-N [Ag].ICl Chemical compound [Ag].ICl HOLVRJRSWZOAJU-UHFFFAOYSA-N 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- SWLVFNYSXGMGBS-UHFFFAOYSA-N ammonium bromide Chemical compound [NH4+].[Br-] SWLVFNYSXGMGBS-UHFFFAOYSA-N 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 1
- 229910001864 baryta Inorganic materials 0.000 description 1
- 229940116226 behenic acid Drugs 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- FQUNFJULCYSSOP-UHFFFAOYSA-N bisoctrizole Chemical compound N1=C2C=CC=CC2=NN1C1=CC(C(C)(C)CC(C)(C)C)=CC(CC=2C(=C(C=C(C=2)C(C)(C)CC(C)(C)C)N2N=C3C=CC=CC3=N2)O)=C1O FQUNFJULCYSSOP-UHFFFAOYSA-N 0.000 description 1
- 238000004061 bleaching Methods 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- AJPXTSMULZANCB-UHFFFAOYSA-N chlorohydroquinone Chemical compound OC1=CC=C(O)C(Cl)=C1 AJPXTSMULZANCB-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000586 desensitisation Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000010946 fine silver Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
- 150000004668 long chain fatty acids Chemical class 0.000 description 1
- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- YSZIOXAEADAJLX-UHFFFAOYSA-N phthalazine-1,4-dione Chemical class C1=CC=C2C(=O)N=NC(=O)C2=C1 YSZIOXAEADAJLX-UHFFFAOYSA-N 0.000 description 1
- 150000003022 phthalic acids Chemical class 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 1
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 1
- 229940045105 silver iodide Drugs 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- YRSQDSCQMOUOKO-KVVVOXFISA-M silver;(z)-octadec-9-enoate Chemical compound [Ag+].CCCCCCCC\C=C/CCCCCCCC([O-])=O YRSQDSCQMOUOKO-KVVVOXFISA-M 0.000 description 1
- MNMYRUHURLPFQW-UHFFFAOYSA-M silver;dodecanoate Chemical compound [Ag+].CCCCCCCCCCCC([O-])=O MNMYRUHURLPFQW-UHFFFAOYSA-M 0.000 description 1
- LTYHQUJGIQUHMS-UHFFFAOYSA-M silver;hexadecanoate Chemical compound [Ag+].CCCCCCCCCCCCCCCC([O-])=O LTYHQUJGIQUHMS-UHFFFAOYSA-M 0.000 description 1
- ORYURPRSXLUCSS-UHFFFAOYSA-M silver;octadecanoate Chemical compound [Ag+].CCCCCCCCCCCCCCCCCC([O-])=O ORYURPRSXLUCSS-UHFFFAOYSA-M 0.000 description 1
- OHGHHPYRRURLHR-UHFFFAOYSA-M silver;tetradecanoate Chemical compound [Ag+].CCCCCCCCCCCCCC([O-])=O OHGHHPYRRURLHR-UHFFFAOYSA-M 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 150000003455 sulfinic acids Chemical class 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- GWIKYPMLNBTJHR-UHFFFAOYSA-M thiosulfonate group Chemical group S(=S)(=O)[O-] GWIKYPMLNBTJHR-UHFFFAOYSA-M 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 239000001018 xanthene dye Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/494—Silver salt compositions other than silver halide emulsions; Photothermographic systems ; Thermographic systems using noble metal compounds
- G03C1/498—Photothermographic systems, e.g. dry silver
- G03C1/49836—Additives
- G03C1/49845—Active additives, e.g. toners, stabilisers, sensitisers
Description
本発明は熱現像性感光材料に関するものであ
り、特に脂肪酸ナトリウム塩或はカリウム塩を含
有することにより最大濃度を増し、熱現像寛容度
（加熱現像時の加熱条件の広さ）を増し、また高
温高湿下の保存による経時安定性を向上させた熱
現像性感光材料に関するものである。
従来より用いられるハロゲン化銀写真法は感光
性、階調性等に於いて他の写真法に比して勝るも
のであるが、定着、漂白等の処理工程が湿式であ
るが為に、その取扱いが煩雑であり、又処理工程
を機械化する為にも不都合な面が多い。かかるハ
ロゲン化銀写真法に代り乾式処理による画像形成
が数多く試みられている。従来の画像形成法に比
較して特に勝れているものとして、現像工程を熱
処理で行う熱現像性感光材料を用いた画像形成法
が提案されている。
例えば特公昭４−4924号公報には、有機銀塩及
び有機銀イオンに対して触媒的に接触しているハ
ロゲン化銀から成る熱現像性感光材料が記載され
ている。又これに類するものとして特公昭44−
26582号及び特開昭46−6074号に記載がある。又
上記の他の像露光前に加熱処理を施して活性化さ
せて感光性となしてから、像露光後、現像画像を
形成する為に全体的に加熱する熱現像性感光材料
及びそれらの調製方法が提案されている。この熱
現像性感光材料は、ハロゲン化銀を含有していな
いか、或いはハロゲン化銀を含有しても感光性を
全く有していない熱現像性感光要素から成り、具
体的には特公昭51−29819号、特公昭53−41967
号、特公昭54−5687号各公報に記述されている。
熱現像性感光材料は、画像形成を湿式の工程に
よらないという利点を有するが、一方感度及びか
ぶり濃度等の画像特性は、従来より用いられてい
るハロゲン化銀写真法に比べ未だ充分とはいえな
い。そして最大の欠点は、高温高湿下で保存する
と画像特性が変化し、感度の低下、最大濃度の低
下及びカブリの発生等が生ずることである。
かかる欠点を改善する為に種々の方法が提案さ
れている。特公昭54−44212号公報のチオスルホ
ン酸塩を用いる方法は、高温高湿下での経時によ
る減感に対し或る程度効果があるが、最大濃度の
低下には効果が少ない。特開昭51−54428号公報
のスルフイン酸類とフタル酸類の併用は、高温高
湿下の保存によるカブリの発生を防止することに
は有効であるが、しかし高温高湿下の保存による
感度の低下の防止及び画像形成後の光に対する安
定性は不充分である。
従つて本発明の目的は、熱現像寛容度が広く高
温高湿下で保存されても最大濃度の低下が少ない
熱現像性感光材料を提供することである。
本発明のかかる目的は、支持体上に少なくとも
(a)被還元性有機銀塩及び還元剤からなる酸化―還
元画像形成成分及び(b)感光性ハロゲン化銀又は
（及び）感光性ハロゲン化銀形成成分及び(c)バイ
ンダーからなる熱現像性感光要素を単層若しくは
多層に形成した熱現像性感光要素に於て、(b)下記
一般式（）、（）及び（）で表わされる化合
物の少なくも一種を含有することにより達成され
た。
一般式（）
R1―COOM1
式中R1は直鎖又は分岐したアルキル基、アル
ケニル基又はアラルキル基を表わし、M1はナト
リウム又はカリウムを表わす。
一般式（）
M2OOC―R2―COOM3
一般式（）
M2OOC―COOM3
式中R2は直鎖又は分岐したアルキレン基又は
アルケニレン基を表わし、M2及びM3は水素、ナ
トリウム又はカリウムを表わす（但しM2とM3が
同時に水素であることはない）。
本発明に用いられる一般式（）、（）及び
（）の化合物を列挙するが、これ等の化合物に
限定されるものではない。
(1) CH3COONa
(2) CH2＝CHCOONa
(3) CH3CH2COONa
(4) CH3（CH2）2COONa
(5) （CH3）2CHCH2COONa
(6) CH3CH＝CHCH＝CHCOONa
(7) CH3（CH2）4COONa
(8) CH3（CH2）3CH（CH3）COONa
(9) CH3（CH2）6COONa
(10) CH3（CH2）8COONa
(11) CH3（CH2）10COONa
(12) CH3（CH2）12COONa
(13) CH3（CH2）14COONa
(14)
(15) CH3（CH2）4CH＝CHCH2CH＝CH
（CH2）7COONa
(16) CH3（CH2）16COONa
(17) CH3（CH2）18COONa
(18) CH3（CH2）20COONa
(19) NaOOC―COONa
(20) NaOOCCH2COONa
(21) HOOCCH2CH2COONa
(22) HOOC（CH2）8COONa
(23) CH3COOK
(24) CH2＝Ｃ（CH3）COOK
(25) CH3（CH2）3COOK
(26) （CH3）CCOOH
(27) CH3CH＝CHCH＝CHCOOK
(28) CH3（CH2）4COOK
(29) CH3（CH2）8COOK
(30) CH3（CH2）9COOK
(31) CH3（CH2CH＝CH）3（CH2）7COOK
(32) CH3（CH2）7CH＝（CH2）7COOK
(32) CH3（CH2）18COOK
(34) CH3（CH2）20COOK
(35) KOOCCH＝CHCOOK
(36) KOOCCH2COOK
(37) HOOCCH2CH2COOK
(38) HOOCCH2C（＝CH2）COOK
(39) KOOC（CH2）4COOK
(40) KOOC（CH2）7COOK
(41) HOOC（CH2）8COOK
本発明の化合物の添加方法及び添加時期は特に
限定されるものではなく、例えば適当な溶媒に溶
解した状態で熱現像性感光材料塗布液中に直持添
加する方法、又は熱現像性感光材料塗布液をフイ
ルム上に塗布乾燥した後に該表面を本発明の化合
物を含有する溶液で浸漬処理する方法などを採用
することが出来る。本発明の化合物の好適なる添
加量範囲は、被還元性有機銀塩１モル当り0.001
モル〜0.2モルの範囲であり、特に好ましくは
0.01モル〜0.1モルの範囲である。
本発明に用いる熱現像性感光要素は、被還元性
有機銀塩および還元剤から成る酸化―還元画像形
成成分、およびバインダーを少なくとも含有して
おり、このものを単層に含有させることができる
が被還元性有機銀塩および還元剤を別個の層にし
て多層とする若しくは上記の単一層の上又は下に
更に被還元性有機銀塩又は還元剤を含有する層を
設けた多層とすることもできる。この被還元性有
機銀塩は、特公昭43−4924号および特開昭46−
6074号各公報に記載の有機酸の銀塩、或いはイミ
ノ基又はメルカプト基を有する有機化合物の銀塩
であり、特に炭素数12個〜24個の長鎖脂肪酸銀塩
は室温、室内光下で暗着色化等の不都合な変化を
受け難いため好ましいものである。具体的にはベ
ヘン酸銀、ステアリン酸銀、パルミチン酸銀、ミ
リスチン酸銀、ラウリン酸銀、オレイン酸銀、又
はヒドロキシステアリン酸銀等を挙げることがで
き、そのうち特にベヘン酸銀が最も有効である。
更に本発明による熱現像性感光材料は、画像の
色調性、画像形成後の安定性を改善する為に有機
酸を用いることが好ましく、特に脂肪酸銀を被還
元性有機銀塩として用いる場合、それらと同一か
又は近傍の脂肪酸を単独或いは組合せて含有せし
めることが望ましい。それらの脂肪酸の使用量は
被還元性有機銀塩に対し25モル％〜200モル％で
あり好適には30モル％〜120モル％が好ましい。
前述の酸化―還元画像形成成分に用いる還元剤
は種々のものを挙げることができる。一般的には
通常のハロゲン化銀感光材料に用いられる現像
薬、具体的にはハイドロキノン、メチルハイドロ
キノン、クロロハイドロキノン、メチルヒドロキ
シナフタレン、Ｎ，N′―ジエチル―Ｐ―フエニ
レンジアミン、アミンフエノール、アスコルビン
酸、１―フエニル―３―ピラゾリンド等を挙げる
ことができ、又これらの他に２，2′―メチレンビ
ス（６―ターシヤリーブチル―４―メチルフエノ
ール）、４，4′―ブチリデンビス（６―ターシヤ
リーブチル―３―メチルフエノール）、４，4′―
チオビス（６―ターシヤリーブチル―３―メチル
フエノール）等、更には特開昭46−6074号公報に
記載のビスナフトール系還元性化合物、或いはベ
ルギー特許第802519号明細書に記載の４―ベンゼ
ンスルホンアミドフエノール等のスルホンアミド
フエノール系化合物特を挙げることができる。
本発明による熱現像性感光要素は、バインダー
を単独若しくは組合せて層中に含有することがで
きる。バインダーの適当な材料は疎水性あるいは
親水性であることができ、又透明若しくは半透明
であることができる。具体的には、ポリビニルブ
チラール、セルロースアセテートブチレート、ポ
リメチルメタアクリレート、ポリビニルピロリド
ン、エチルセルローズ、酢酸セルローズ、ポリ酢
酸ビニル、ポリビニルアルコール、ゼラチン、カ
ナダ特許第774054号明細書に記載のスルホベタイ
ン繰り返し単位を有するもの等を挙げることがで
きる。バインダーの使用量は被還元性有機銀塩に
対し、重量比で10：１乃至１：10が好ましく、更
に好ましくは４：１乃至１：２の範囲である。
この熱現像性感光要素には、特に感光性を付与
するためにハロゲン化銀、例えば塩化銀、臭化
銀、沃化銀、沃臭化銀、沃塩化銀、沃塩臭化銀を
含有せしめる必要がある。このハロゲン化銀は、
特に微細な粒子状のものが有効であり、これを調
製する方法として被還元性有機銀塩の一部をハロ
ゲン化銀形成成分例えば臭化アンモニウム、臭化
リチウム、塩化ナトリウム、Ｎ―ブロムコハク酸
イミド、等によりハロゲン化して微細なハロゲン
化銀を調製する方法が挙げられる。又、いわゆる
系外ハロゲン化銀を含有させる方法も用いること
ができる。
この系外ハロゲン化銀を含有する熱現像性感光
要素は、例えばベルギー特許第774436号明細書に
記載されている。即ち熱現像性感光要素とは別の
ところで換言すると、酸化―還元画像形成成分の
外に感光性ハロゲン化銀を調製し、次いで調製後
そのハロゲン化銀を上記画像形成成分に添加して
混合することによつて調製される。ハロゲン化銀
（又はハロゲン化銀形成成分）の好適な含有量は
被還元性有機銀塩１モル当り好ましくは0.001モ
ル〜0.30モル更に好ましくは0.01モル〜0.15モル
である。
また、適当な色調剤を含有することができる。
この目的のための色調剤は、米国特許第3080254
号明細書に記載のフタラジノン又はその誘導体、
特開昭46−6074号公報に記載の環式イミド類、特
開昭50−32927号公報に記載のフタラジンジオン
化合物等を包含する。
本発明の熱現像性感光要素は、熱カブリ防止剤
と併用することができる（熱カブリとは、加熱現
像により生ずる未露光部の白地のカブリを意味す
る）。熱カリブ防止剤としては、特公昭47−11113
号公報記載の水銀化合物、特公昭55−42375号記
載の１，２，４―トリアゾール化合物、特願昭55
−105270号記載のテトラゾール化合物、特願昭56
−23512号記載の安息香酸及び特願昭56−33483号
記載のスルホニルチオ基を有する化合物等を挙げ
ることができる。
本発明の熱現像性感光要素は、更に現像促進
剤、硬化剤、帯電防止剤（層）、紫外線吸収剤、
螢光増白剤、フイルター染料（層）等を含有する
ことができる。
本発明による要素には、適当な分光増感剤を含
有することができる。有用な増感色素は、シアニ
ン色素、メロシアニン色素、キサンテン色素、特
に「プロダクト ライセンシング インデツク
ス」Vol92、第107〜110頁（1971年12月発行）あ
るいはベルギー特許第772371号明細書に記載され
たものが有用である。
本発明による熱現像性感光要素は適当な支持体
上に被覆を形成して熱現像性感光材料を得ること
ができる。代表的な支持体としてポリエチレン、
ポリプロピレン、ポリエチレンテレフタレート、
ポリカーボネート、酢酸セルロースなどの合成樹
脂フイルム、合成紙、ポリエチレンなどの樹脂フ
イルムで被覆された紙、アート紙、写真用バライ
タ紙などの紙類、又はアルミニウムなどの金属板
（箱）類、通常の方法により金属蒸着膜を有する
合成樹脂フイルム又はガラス板などを挙げること
ができる。
以下、本発明を実施例に従つて説明するが、勿
論本発明はこれに限定されるものではない。
実施例 １
ベヘン酸銀25ｇ、キシレン200ml及びｎ―ブタ
ノール200mlをホモミキサーを用いて分散し分散
液を調整した。この分散液にポリビニルブチラー
ル10ｇを加え撹拌溶解した後65℃に加熱調温し、
次いで25mlのアセトンに溶解したＮ―ブロムコハ
ク酸イミド1.0ｇを添加し２時間撹拌した。次い
でこの分散液を30℃に調温し、２，2′―エチレン
ビス（６―ｔ―ブチル―４―メチルフエノール）
８％及びポリビニルブチラール20％のキシレン／
ブタノール（容積比で１／１）の溶液250ml、例
示化合物(7)の10％メタノール溶液3.9ml及び３−
エチル−５−〔（３−メチル−２―チアゾリリデ
ン）エチリデン〕ローダニンの0.1％DMF溶液10
mlを順次添加し第１塗布液も調整した。この第１
塗布液をロールコーターを用い写真用原紙上に塗
布した。この際、乾燥時の塗布量は10.0ｇ／m2で
あつた。次いで上記第１塗布液を塗布して形成さ
れた被覆上に、下記構成成分からなる第２塗布液
を乾燥時の塗布量が2.5ｇ／m2となる様に重ねて
塗布し、熱現像性感光材料（）を調整した。
第２塗布液
フタラジノン 25ｇ
セルロースアセテート 50ｇ
アセトン 1000ml
又、例示化合物(7)を除いた以外は熱現像性感光
材料（）と同様な方法で熱現像性感光材料
（）を作成した。又、経時による画像特性の変
化を見る為に、熱現像性感光材料（）及び
（）を温度35℃、相対湿度80％の条件下に120時
間保存し試料を作成した。
以上の試料について150W引き伸し用タングス
テンランプを光源として400ルクスで10秒間光楔
（コダツクステツプタブレツトNo.２）を用い露光
を与え、130℃、７秒間又は130℃、12秒間で加熱
ローラーを用いて熱現像を施し画像を作成した。
得られた画像より最大濃度を測定し、表―１に示
す結果を得た。
The present invention relates to a heat-developable photosensitive material, and in particular contains a fatty acid sodium salt or potassium salt to increase the maximum density, increase the heat development latitude (wide range of heating conditions during heat development), and This invention relates to a heat-developable photosensitive material that has improved stability over time when stored under high temperature and high humidity conditions. The conventionally used silver halide photography method is superior to other photographic methods in terms of photosensitivity, gradation, etc., but because the processing steps such as fixing and bleaching are wet, It is complicated to handle, and there are many disadvantages to mechanizing the treatment process. Many attempts have been made to form images by dry processing instead of such silver halide photography. An image forming method using a heat-developable photosensitive material in which the developing step is performed by heat treatment has been proposed as a method that is particularly superior to conventional image forming methods. For example, Japanese Patent Publication No. 4-4924 describes a heat-developable photosensitive material comprising silver halide in catalytic contact with an organic silver salt and an organic silver ion. Also, as something similar to this, the
It is described in No. 26582 and JP-A-46-6074. In addition, other heat-developable photosensitive materials as described above, which are activated and made photosensitive by heat treatment before imagewise exposure, and then heated as a whole to form a developed image after imagewise exposure, and their preparation. A method is proposed. This heat-developable photosensitive material consists of a heat-developable photosensitive element that does not contain silver halide or has no photosensitivity even if it contains silver halide. −29819, Special Publication No. 53-41967
No. 1, and Special Publication No. 54-5687. Heat-developable photosensitive materials have the advantage of not requiring a wet process for image formation, but on the other hand, image characteristics such as sensitivity and fog density are still not as satisfactory as compared to conventionally used silver halide photography. I can't say that. The biggest drawback is that when stored under high temperature and high humidity, image characteristics change, resulting in decreased sensitivity, decreased maximum density, and fogging. Various methods have been proposed to improve these drawbacks. The method using a thiosulfonate as disclosed in Japanese Patent Publication No. 54-44212 has some effect on desensitization due to aging under high temperature and high humidity conditions, but is less effective in reducing the maximum concentration. The combined use of sulfinic acids and phthalic acids as disclosed in JP-A No. 51-54428 is effective in preventing fogging caused by storage at high temperature and high humidity; however, the sensitivity decreases due to storage at high temperature and high humidity. Prevention and stability against light after image formation are insufficient. SUMMARY OF THE INVENTION Accordingly, an object of the present invention is to provide a heat-developable photosensitive material which has a wide thermal development latitude and exhibits little loss in maximum density even when stored under high temperature and high humidity conditions. Such an object of the present invention is to provide at least
(a) an oxidation-reduction image forming component consisting of a reducible organic silver salt and a reducing agent; (b) a photosensitive silver halide or (and) a photosensitive silver halide forming component; and (c) a heat developable image forming component consisting of a binder. This was achieved by containing (b) at least one of the compounds represented by the following general formulas (), (), and () in a heat-developable photosensitive element in which an optical element is formed in a single layer or in multiple layers. General formula () R 1 -COOM 1 In the formula, R 1 represents a linear or branched alkyl group, alkenyl group or aralkyl group, and M 1 represents sodium or potassium. General formula () M 2 OOC-R 2 - COOM 3 General formula () M 2 OOC-COOM 3 In the formula, R 2 represents a linear or branched alkylene group or alkenylene group, and M 2 and M 3 are hydrogen and sodium. or potassium (however, M 2 and M 3 are never hydrogen at the same time). Compounds of general formulas (), () and () used in the present invention are listed below, but are not limited to these compounds. (1) CH 3 COONa (2) CH 2 ＝CHCOONa (3) CH 3 CH 2 COONa (4) CH 3 (CH 2 ) 2 COONa (5) (CH 3 ) 2 CHCH 2 COONa (6) CH 3 CH＝ CHCH＝CHCOONa (7) CH 3 (CH 2 ) 4 COONa (8) CH 3 (CH 2 ) 3 CH (CH 3 ) COONa (9) CH 3 (CH 2 ) 6 COONa (10) CH 3 (CH 2 ) 8 COONa (11) CH 3 (CH 2 ) 10 COONa (12) CH 3 (CH 2 ) 12 COONa (13) CH 3 (CH 2 ) 14 COONa (14) (15) CH 3 (CH 2 ) 4 CH＝CHCH 2 CH＝CH
(CH 2 ) 7 COONa (16) CH 3 (CH 2 ) 16 COONa (17) CH 3 (CH 2 ) 18 COONa (18) CH 3 (CH 2 ) 20 COONa (19) NaOOC―COONa (20) NaOOCCH 2 COONa (21) HOOCCH 2 CH 2 COONa (22) HOOC (CH 2 ) 8 COONa (23) CH 3 COOK (24) CH 2 = C (CH 3 ) COOK (25) CH 3 (CH 2 ) 3 COOK (26 ) (CH 3 ) CCOOH (27) CH 3 CH＝CHCH＝CHCOOK (28) CH 3 (CH 2 ) 4 COOK (29) CH 3 (CH 2 ) 8 COOK (30) CH 3 (CH 2 ) 9 COOK ( 31) CH 3 (CH 2 CH＝CH) 3 (CH 2 ) 7 COOK (32) CH 3 (CH 2 ) 7 CH＝(CH 2 ) 7 COOK (32) CH 3 (CH 2 ) 18 COOK (34) CH 3 (CH 2 ) 20 COOK (35) KOOCCH＝CHCOOK (36) KOOCCH 2 COOK (37) HOOCCH 2 CH 2 COOK (38) HOOCCH 2 C (＝CH 2 ) COOK (39) KOOC (CH 2 ) 4 COOK (40) KOOC(CH 2 ) 7 COOK (41) HOOC(CH 2 ) 8 COOK The method and timing of addition of the compound of the present invention are not particularly limited. A method of directly adding the compound to a photosensitive material coating solution, or a method of coating a film with a heat-developable photosensitive material coating solution and drying it, and then immersing the surface of the film in a solution containing the compound of the present invention, etc. I can do it. The preferred addition amount range of the compound of the present invention is 0.001 per mole of reducible organic silver salt.
mol to 0.2 mol, particularly preferably
It ranges from 0.01 mol to 0.1 mol. The heat-developable photosensitive element used in the present invention contains at least an oxidation-reduction image forming component consisting of a reducible organic silver salt and a reducing agent, and a binder, which may be contained in a single layer. The reducible organic silver salt and the reducing agent may be made into separate layers to form a multilayer structure, or a multilayer structure may be formed in which a layer containing the reducible organic silver salt or the reducing agent is further provided above or below the single layer. can. This reducible organic silver salt is disclosed in Japanese Patent Publication No. 4924-1983 and Japanese Patent Application Publication No. 46-1989.
Silver salts of organic acids described in each publication No. 6074, or silver salts of organic compounds having an imino group or mercapto group, especially silver salts of long-chain fatty acids having 12 to 24 carbon atoms, are oxidized at room temperature and under indoor light. This is preferable because it is less susceptible to undesirable changes such as darkening. Specific examples include silver behenate, silver stearate, silver palmitate, silver myristate, silver laurate, silver oleate, and silver hydroxystearate, among which silver behenate is particularly effective. . Furthermore, in the heat-developable photosensitive material of the present invention, it is preferable to use an organic acid in order to improve the tonal properties of the image and the stability after image formation. In particular, when fatty acid silver is used as the reducible organic silver salt, It is desirable to contain fatty acids that are the same as or close to , either singly or in combination. The amount of these fatty acids used is 25 mol % to 200 mol %, preferably 30 mol % to 120 mol %, based on the reducible organic silver salt. Various reducing agents can be used in the above-mentioned oxidation-reduction image forming component. Generally, developers used for ordinary silver halide photosensitive materials, specifically hydroquinone, methylhydroquinone, chlorohydroquinone, methylhydroxynaphthalene, N,N'-diethyl-P-phenylenediamine, aminephenol, ascorbin. In addition to these, 2,2'-methylenebis(6-tertiarybutyl-4-methylphenol), 4,4'-butylidenebis(6-tertiarybutyl-4-methylphenol), 1-phenyl-3-pyrazolinde, etc. Libutyl-3-methylphenol), 4,4'-
Thiobis (6-tertiarybutyl-3-methylphenol), etc., as well as bisnaphthol reducing compounds described in JP-A-46-6074, or 4-benzenesulfone described in Belgian Patent No. 802519. Specific examples include sulfonamidophenol compounds such as amidophenol. The heat-developable photosensitive element according to the present invention may contain a binder alone or in combination in the layer. Suitable materials for the binder can be hydrophobic or hydrophilic, and transparent or translucent. Specifically, polyvinyl butyral, cellulose acetate butyrate, polymethyl methacrylate, polyvinylpyrrolidone, ethyl cellulose, cellulose acetate, polyvinyl acetate, polyvinyl alcohol, gelatin, and the sulfobetaine repeating unit described in Canadian Patent No. 774054. Examples include those having the following. The amount of the binder to be used is preferably in a weight ratio of 10:1 to 1:10, more preferably 4:1 to 1:2, based on the weight of the reducible organic silver salt. This heat-developable photosensitive element contains silver halides such as silver chloride, silver bromide, silver iodide, silver iodobromide, silver iodochloride, and silver iodochlorobromide to impart photosensitivity. There is a need. This silver halide is
Particularly fine particles are effective, and as a method for preparing them, part of the reducible organic silver salt is mixed with silver halide forming components such as ammonium bromide, lithium bromide, sodium chloride, N-bromosuccinimide. , etc. to prepare fine silver halide. Furthermore, a method of incorporating so-called extra-system silver halide can also be used. A heat-developable photosensitive element containing this extra-system silver halide is described, for example, in Belgian Patent No. 774,436. That is, in other words apart from the heat-developable photosensitive element, photosensitive silver halide is prepared in addition to the oxidation-reduction image-forming components, and then, after preparation, the silver halide is added to and mixed with the image-forming components. It is prepared by A suitable content of silver halide (or silver halide forming component) is preferably 0.001 mol to 0.30 mol, more preferably 0.01 mol to 0.15 mol, per mol of reducible organic silver salt. Moreover, a suitable color toning agent can be contained.
A toning agent for this purpose is US Pat. No. 3,080,254
phthalazinone or its derivatives as described in the specification,
These include cyclic imides described in JP-A No. 46-6074, phthalazinedione compounds described in JP-A-50-32927, and the like. The heat-developable photosensitive element of the present invention can be used in combination with a thermal fog inhibitor (thermal fog refers to fog on the white background of unexposed areas caused by heat development). As a thermocaribe inhibitor, Tokuko Sho 47-11113
1,2,4-triazole compound described in Japanese Patent Publication No. 1983-42375, Japanese Patent Application No. 1983
-Tetrazole compound described in No. 105270, patent application 1982
Examples include benzoic acid described in Japanese Patent Application No. 56-33483 and compounds having a sulfonylthio group described in Japanese Patent Application No. 56-33483. The heat-developable photosensitive element of the present invention further includes a development accelerator, a curing agent, an antistatic agent (layer), an ultraviolet absorber,
It may contain a fluorescent brightener, a filter dye (layer), etc. Elements according to the invention may contain suitable spectral sensitizers. Useful sensitizing dyes include cyanine dyes, merocyanine dyes, and xanthene dyes, especially those described in "Product Licensing Index" Vol. 92, pp. 107-110 (published December 1971) or Belgian Patent No. 772371. Useful. The heat-developable photosensitive element according to the present invention can be coated on a suitable support to obtain a heat-developable photosensitive material. Typical supports include polyethylene,
polypropylene, polyethylene terephthalate,
Synthetic resin films such as polycarbonate and cellulose acetate, synthetic paper, paper covered with resin films such as polyethylene, art paper, baryta paper for photographs, etc., or metal plates (boxes) such as aluminum, conventional methods Examples include a synthetic resin film or a glass plate having a metal vapor-deposited film. The present invention will be described below with reference to Examples, but the present invention is of course not limited thereto. Example 1 25 g of silver behenate, 200 ml of xylene and 200 ml of n-butanol were dispersed using a homomixer to prepare a dispersion liquid. 10 g of polyvinyl butyral was added to this dispersion, stirred and dissolved, and heated to 65°C.
Next, 1.0 g of N-bromosuccinimide dissolved in 25 ml of acetone was added and stirred for 2 hours. Next, the temperature of this dispersion was adjusted to 30°C, and 2,2'-ethylenebis(6-t-butyl-4-methylphenol) was added.
xylene with 8% and 20% polyvinyl butyral/
250 ml of a solution of butanol (1/1 by volume), 3.9 ml of a 10% methanol solution of exemplified compound (7) and 3-
Ethyl-5-[(3-methyl-2-thiazolilidene)ethylidene]rhodanine 0.1% DMF solution 10
A first coating solution was also prepared by sequentially adding ml. This first
The coating solution was applied onto photographic base paper using a roll coater. At this time, the coating amount when dry was 10.0 g/m 2 . Next, on the coating formed by applying the first coating solution, a second coating solution consisting of the following components was applied in layers so that the dry coating amount was 2.5 g/ m2 , and heat-developable sensitivity was obtained. Adjusted the light material (). Second Coating Solution Phthalazinone 25g Cellulose acetate 50g Acetone 1000ml A heat-developable photosensitive material () was prepared in the same manner as the heat-developable photosensitive material () except that exemplified compound (7) was omitted. In addition, in order to observe changes in image characteristics over time, samples were prepared by storing the heat-developable photosensitive materials () and () at a temperature of 35° C. and a relative humidity of 80% for 120 hours. The above samples were exposed to light at 400 lux for 10 seconds using a light wedge (Kodak Step Tablet No. 2) using a 150W tungsten lamp for enlargement as the light source, and then heated at 130℃ for 7 seconds or at 130℃ for 12 seconds. An image was created by thermal development using a roller.
The maximum density was measured from the obtained image, and the results shown in Table 1 were obtained.
【表】
表―１より明らかな様に、本発明の化合物(7)を
用いた熱現像性感光材料（）は、比較的緩和な
現像条件である130℃、７秒に於て、熱現像性感
光材料（）に比べ高い最大濃度を有している。
又、更に現像を押し進めた130℃、12秒に於いて、
本発明の熱現像性感光材料（）は、現像条件
130℃、７秒の最大濃度のと比べ変化が少ない。
これは本発明の熱現像性感光材料（）が、大き
い熱現像寛容度を有していることを示している。
又本発明の熱現像性感光材料は、高温高湿下での
経時保存による最大濃度の低下も極めて少ないこ
とも知ることができる。
実施例 ２
実施例１の熱現像性感光材料（）の例示化合
物(7)の代りに、例示化合物（14）790mgを用い熱
現像性感光材料（）を、例示化合物（16）850
mgを用い熱現像性感光材料（）を、例示化合物
（29）590mgを用い熱現像性感光材料（）を、例
示化合物（39）620mgを用い熱現像性感光材料
（）を調整し、実施例１の記載に従つて経時保
存及び露光、熱現像を施し下記表―２に示す結果
を得た。
尚比較試料として実施例１の熱現像性感光材料
（）を用いた。[Table] As is clear from Table 1, the heat-developable photosensitive material () using the compound (7) of the present invention was heat-developable under relatively mild development conditions of 130°C for 7 seconds. It has a higher maximum density compared to photosensitive materials ().
In addition, at 130℃, 12 seconds, which pushed the development further,
The heat-developable photosensitive material () of the present invention has development conditions
There is little change compared to the maximum concentration at 130℃ for 7 seconds.
This shows that the heat-developable photosensitive material of the present invention has a large latitude in heat development.
It can also be seen that the heat-developable photosensitive material of the present invention exhibits extremely little decrease in maximum density due to storage over time under high temperature and high humidity conditions. Example 2 In place of Exemplified Compound (7) in the heat-developable photosensitive material () of Example 1, 790 mg of Exemplified Compound (14) was used.
Example 1 A heat-developable photosensitive material () was prepared using 590 mg of Exemplified Compound (29), and a heat-developable photo-sensitive material () was prepared using 620 mg of Exemplified Compound (39). The material was stored over time, exposed to light, and thermally developed as described in Section 1, and the results shown in Table 2 below were obtained. The heat-developable photosensitive material (2) of Example 1 was used as a comparison sample.
【表】
表―２により明らかな様に、本発明の化合物を
使用することにより、熱現像寛容度が拡く、高温
高湿下での保存性に優れた熱現像性感光材料が得
られることが分る。
実施例 ３
ベヘン酸銀25ｇ、ベヘン酸20ｇ、キシレン325
ml及びｎ―ブタノール325mlをホモミキサーを用
いて分散し、分散液を調整した。この分散液にポ
リビニルブチラール40ｇを加えて撹拌溶解した。
その後50℃に加熱調温し、メタノール50mlに溶解
した臭化リチウム0.25ｇを加え２時間撹拌を続け
た。後30℃に調温し例示化合物(11)の10重量パーセ
ントメタノール溶液5.4mlを加え、第１塗布液と
した。次いでロールコーターによりこの第１塗布
液を乾燥時の塗布量が7.0ｇ／m2になる様に塗布
した。更に下記の第２塗布液を乾燥時の塗布量
5.25ｇ／m2になるように塗布し熱現像性感光材料
（）を調製した。
２，2′―メチレンビス（６―ｔ―ブチル―４―
メチルフエノール 50ｇ
フタラジノン 15ｇ
〓 増感色素 0.01ｇ
ポリビニルブチラール 40ｇ
キシレン 500ml
ｎ―ブタノール 500ml
〓 ３―エチル―５―〔（３―メチル―２―チア
ゾリリデン）エチリデン〕ローダニン
又例示化合物(11)を除いた以外は、熱現像性感光
材料（）と同様な方法を用い熱現像性感光材料
（）を作製した。実施例１の記載に従つて経時
保存及び露光、熱現像を施した。但し加熱現像は
125℃、７秒間又は125℃、12秒間で行なつた。得
られた結果を表―３に示す。[Table] As is clear from Table 2, by using the compound of the present invention, it is possible to obtain a heat-developable photosensitive material that has a wider thermal development latitude and has excellent storage stability under high temperature and high humidity conditions. I understand. Example 3 Silver behenate 25g, behenic acid 20g, xylene 325
ml and 325 ml of n-butanol were dispersed using a homomixer to prepare a dispersion liquid. 40 g of polyvinyl butyral was added to this dispersion and dissolved with stirring.
Thereafter, the temperature was adjusted to 50°C, 0.25 g of lithium bromide dissolved in 50 ml of methanol was added, and stirring was continued for 2 hours. After that, the temperature was adjusted to 30°C, and 5.4 ml of a 10 weight percent methanol solution of Exemplary Compound (11) was added to prepare a first coating solution. Next, this first coating liquid was applied using a roll coater so that the dry coating amount was 7.0 g/m 2 . Furthermore, the amount of the second coating liquid shown below when dry.
A heat-developable photosensitive material (2) was prepared by coating at a coating weight of 5.25 g/m 2 . 2,2'-methylenebis(6-t-butyl-4-
Methylphenol 50g Phthalazinone 15g 〓 Sensitizing dye 0.01g Polyvinyl butyral 40g Xylene 500ml n-butanol 500ml 〓 3-ethyl-5-[(3-methyl-2-thiazolylidene)ethylidene] rhodanine Other than exemplified compound (11) produced a heat-developable photosensitive material () using the same method as the heat-developable photosensitive material (). According to the description in Example 1, storage over time, exposure to light, and heat development were performed. However, heat development
It was carried out at 125°C for 7 seconds or at 125°C for 12 seconds. The results obtained are shown in Table 3.
【表】
表―３より明らかなように、本発明の例示化合
物(10)を用いた熱現像性感光材料（）は、比較の
熱現像性感光材料（）に比べ、熱現像寛容度が
大きく、更に経時保存後の最大濃度の低下が極め
て少ないことがわかる。[Table] As is clear from Table 3, the heat-developable photosensitive material () using the exemplary compound (10) of the present invention has a greater thermal development latitude than the comparative heat-developable photosensitive material (). Furthermore, it can be seen that the decrease in maximum concentration after storage over time is extremely small.
Claims (1)
び還元剤からなる酸化―還元画像形成成分、(b)感
光性ハロゲン化銀又は（及び）感光性ハロゲン化
銀形成成分及び(c)バインダーからなる熱現像性感
光要素を単層若しくは多層に形成した熱現像性感
光材料に於て、前記熱現像性感光要素が(d)下記一
般式（）、（）又は（）で表わされる化合物
の少なくとも一種を含有することを特徴とする熱
現像性感光材料。 一般式（） R1―COOM1 式中R1は直鎖又は分岐したアルキル基、アル
ケニル基又はアラルキル基を表わし、M1はナト
リウム又はカリウムを表わす。 一般式（） M2OOC―R2―COOM3 一般式（） M2OOC―COOM3 式中R2は直鎖又は分岐したアルキレン基又は
アルケニレン基を表わし、M2及びM3は水素、ナ
トリウム又はカリウムを表わす（但しM2とM3が
同時に水素であることはない）。[Scope of Claims] 1. On a support, at least (a) an oxidation-reduction image forming component comprising a reducible organic silver salt and a reducing agent, (b) a photosensitive silver halide or (and) a photosensitive silver halide. In a heat-developable photosensitive material in which a heat-developable photosensitive element consisting of a forming component and (c) a binder is formed in a single layer or in multiple layers, the heat-developable photosensitive element has (d) the following general formula (), (), or A heat-developable photosensitive material containing at least one of the compounds represented by (). General formula () R 1 —COOM 1 In the formula, R 1 represents a linear or branched alkyl group, alkenyl group or aralkyl group, and M 1 represents sodium or potassium. General formula () M 2 OOC-R 2 - COOM 3 General formula () M 2 OOC-COOM 3 In the formula, R 2 represents a linear or branched alkylene group or alkenylene group, and M 2 and M 3 are hydrogen and sodium. or potassium (however, M 2 and M 3 are never hydrogen at the same time).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17172781A JPS5872936A (en) | 1981-10-27 | 1981-10-27 | Heat developable photosensitive material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17172781A JPS5872936A (en) | 1981-10-27 | 1981-10-27 | Heat developable photosensitive material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5872936A JPS5872936A (en) | 1983-05-02 |
| JPS648809B2 true JPS648809B2 (en) | 1989-02-15 |
Family
ID=15928550
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17172781A Granted JPS5872936A (en) | 1981-10-27 | 1981-10-27 | Heat developable photosensitive material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5872936A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6428006U (en) * | 1987-08-07 | 1989-02-17 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04358144A (en) * | 1991-06-04 | 1992-12-11 | Oriental Photo Ind Co Ltd | Heat developable photosensitive material |
| JP5561694B2 (en) * | 2008-09-08 | 2014-07-30 | 学校法人東京理科大学 | Base generator and photosensitive resin composition containing the base generator |
| JP5561693B2 (en) * | 2009-09-08 | 2014-07-30 | 学校法人東京理科大学 | Novel compound, base generator and photosensitive resin composition containing the base generator |
-
1981
- 1981-10-27 JP JP17172781A patent/JPS5872936A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6428006U (en) * | 1987-08-07 | 1989-02-17 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5872936A (en) | 1983-05-02 |
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