JPS6487146A - Dispersant for polishing agent - Google Patents

Dispersant for polishing agent

Info

Publication number
JPS6487146A
JPS6487146A JP62238543A JP23854387A JPS6487146A JP S6487146 A JPS6487146 A JP S6487146A JP 62238543 A JP62238543 A JP 62238543A JP 23854387 A JP23854387 A JP 23854387A JP S6487146 A JPS6487146 A JP S6487146A
Authority
JP
Japan
Prior art keywords
salt
polishing
polishing agent
improvement
sulfonic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62238543A
Other languages
Japanese (ja)
Inventor
Toshiyuki Ozawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lion Corp
Original Assignee
Lion Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lion Corp filed Critical Lion Corp
Priority to JP62238543A priority Critical patent/JPS6487146A/en
Publication of JPS6487146A publication Critical patent/JPS6487146A/en
Pending legal-status Critical Current

Links

Landscapes

  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

PURPOSE:To provide stationary stability and excellent redispersibility for a long time, by a method wherein, in a polishing agent for industrial use used especially for a high speed and precision polishing, a dispersant consisting of polystyrene sulfonic acid or salt thereof is blended. CONSTITUTION:Approximate 0.01-5wt.% preferably approximate 0.05-3wt.% polystyrene sulfonic acid or salt thereof, serving as a dispersant, is added in a suspension of a polishing agent, e.g., cerium oxide, zirconium oxide, diamond powder, alumina, and water. A molecular amount of 3,000-1,000,000, preferably 5,000-500,000, is used as polystyrene sulfonic acid or salt thereof, and sodium, calium, etc., are used as a counter ion in salt. This constitution enables provision of stationary stability in high concentration of a polishing agent suspension for a long time, and provision of excellent redispersability, improvement of polishing characteristics, e.g., improvement of a polishing speed, reduction of surface damage, and improvement of working efficiency.
JP62238543A 1987-09-22 1987-09-22 Dispersant for polishing agent Pending JPS6487146A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62238543A JPS6487146A (en) 1987-09-22 1987-09-22 Dispersant for polishing agent

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62238543A JPS6487146A (en) 1987-09-22 1987-09-22 Dispersant for polishing agent

Publications (1)

Publication Number Publication Date
JPS6487146A true JPS6487146A (en) 1989-03-31

Family

ID=17031815

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62238543A Pending JPS6487146A (en) 1987-09-22 1987-09-22 Dispersant for polishing agent

Country Status (1)

Country Link
JP (1) JPS6487146A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2350369A (en) * 1998-11-17 2000-11-29 Fujimi Inc Polishing and rinsing compositions
US6776810B1 (en) 2002-02-11 2004-08-17 Cabot Microelectronics Corporation Anionic abrasive particles treated with positively charged polyelectrolytes for CMP
US6821897B2 (en) 2001-12-05 2004-11-23 Cabot Microelectronics Corporation Method for copper CMP using polymeric complexing agents
US6936543B2 (en) * 2002-06-07 2005-08-30 Cabot Microelectronics Corporation CMP method utilizing amphiphilic nonionic surfactants
US7427361B2 (en) 2003-10-10 2008-09-23 Dupont Air Products Nanomaterials Llc Particulate or particle-bound chelating agents
US7677956B2 (en) 2002-05-10 2010-03-16 Cabot Microelectronics Corporation Compositions and methods for dielectric CMP

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2350369A (en) * 1998-11-17 2000-11-29 Fujimi Inc Polishing and rinsing compositions
GB2350369B (en) * 1998-11-17 2003-08-20 Fujimi Inc Polishing composition and rinsing composition
US6821897B2 (en) 2001-12-05 2004-11-23 Cabot Microelectronics Corporation Method for copper CMP using polymeric complexing agents
US6776810B1 (en) 2002-02-11 2004-08-17 Cabot Microelectronics Corporation Anionic abrasive particles treated with positively charged polyelectrolytes for CMP
US7306637B2 (en) 2002-02-11 2007-12-11 Cabot Microelectronics Corporation Anionic abrasive particles treated with positively charged polyelectrolytes for CMP
US7677956B2 (en) 2002-05-10 2010-03-16 Cabot Microelectronics Corporation Compositions and methods for dielectric CMP
US6936543B2 (en) * 2002-06-07 2005-08-30 Cabot Microelectronics Corporation CMP method utilizing amphiphilic nonionic surfactants
US7427361B2 (en) 2003-10-10 2008-09-23 Dupont Air Products Nanomaterials Llc Particulate or particle-bound chelating agents

Similar Documents

Publication Publication Date Title
ATE117196T1 (en) METHOD FOR PRIMERING HARD TISSUE.
FI831314A0 (en) COMPOSER SOM BEFRAEMJAR MUNHYGIEN
ATE36548T1 (en) SYNERGISTIC THICKENING MIXTURES.
BR9915174A (en) Ionic silver complex
KR930000099A (en) Cationic electrolyte terpolymers provide excellent conditioning properties for shampoos and other hair protection products
SE7511949L (en) POLY (CARBOXYLATE) CEMENT AND WAY TO PRODUCE THE SAME
MY121192A (en) New compounds.
HUP0103851A2 (en) Factor viia inhibitors, process for their preparation, their use and pharmaceutical compositions comprising thereof
NO944292L (en) Mineral additives for the adjustment and / or regulation of rheology and gel structure in aqueous, liquid phases, and their use
NO883753L (en) NEW GEL COMPOSITION.
IL66256A0 (en) Water containing compositions comprising salts of n-substituted-2-pyrrolidone-4-carboxylic acids as humectants
ATE166056T1 (en) GALLIUM III COMPLEXES, METHOD FOR THE PRODUCTION THEREOF AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM
JPS6487146A (en) Dispersant for polishing agent
GB1159226A (en) Shampoos
GB1460320A (en) Sodium specific glass compositions and electrodes
GB1537566A (en) Restoration of soft contact lenses
EP0214740A3 (en) Dopamine-beta-hydroxylase inhibitors
BR8605594A (en) PROCESS TO PRODUCE A DENTAL PASTE
AU3455093A (en) New adenosine derivatives, preparation methods and pharmaceutical compositions containing them
AU4834485A (en) Aqueous detergent compositions containing fatty alcohol polyalkylene oxide carboxylates
SE8405588D0 (en) NEW COMPOUNDS
JPS5461380A (en) Improved machining liquid
BR0002667A (en) Method of preparing lithium complex salts for use in electrochemical cells
HUP0105235A2 (en) Bis-amino acid sulfonamides containing n-terminally a substituted benzyl group as hiv protease inhibitors, pharmaceutical compositions comprising thereof and their use
BR8500669A (en) LIQUID DETERGENT COMPOSITION AND SUSPENSION COMPOSITION