JPS6484108A - Position detecting method for alignment mark - Google Patents
Position detecting method for alignment markInfo
- Publication number
- JPS6484108A JPS6484108A JP62243194A JP24319487A JPS6484108A JP S6484108 A JPS6484108 A JP S6484108A JP 62243194 A JP62243194 A JP 62243194A JP 24319487 A JP24319487 A JP 24319487A JP S6484108 A JPS6484108 A JP S6484108A
- Authority
- JP
- Japan
- Prior art keywords
- alignment mark
- signal
- mark
- mark part
- overlaps
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Optical Transform (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE:To recognize the center position of the alignment mark even if the symmetry of the alignment mark is lost by shaping the alignment mark so that when one mark part is moved in parallel, it overlaps with the other mark part, and performing similarity pattern matching as to a signal generated by differentiating an image input signal. CONSTITUTION:The alignment mark consists of the two parts so that one mark part when moved in parallel overlaps with the other mark part. Those are picked up by a two-dimensional camera to obtain an analog image signal, which is converted into a digital signal. This signal is integrated synchronously to remove noises for S/N ratio improvement, and data compression is carried out. Then the signal after this processing is differentiated to extract the edge of the alignment mark. Then the similarity pattern matching processing based upon a specific equation is carried out for the differentiated data. The position where the result becomes maximum is recognized as the center position of the alignment mark.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62243194A JPH0663740B2 (en) | 1987-09-28 | 1987-09-28 | Alignment mark position detection method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62243194A JPH0663740B2 (en) | 1987-09-28 | 1987-09-28 | Alignment mark position detection method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6484108A true JPS6484108A (en) | 1989-03-29 |
JPH0663740B2 JPH0663740B2 (en) | 1994-08-22 |
Family
ID=17100232
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62243194A Expired - Fee Related JPH0663740B2 (en) | 1987-09-28 | 1987-09-28 | Alignment mark position detection method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0663740B2 (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02304303A (en) * | 1989-05-18 | 1990-12-18 | Sumitomo Heavy Ind Ltd | Position detecting device using sector fresnel zone plate |
JPH0712520A (en) * | 1990-12-27 | 1995-01-17 | Internatl Business Mach Corp <Ibm> | Method for discovering standard |
EP0786702A3 (en) * | 1996-01-11 | 1998-01-07 | Ushiodenki Kabushiki Kaisha | Process for pattern searching and a device for positioning of a mask to a workpiece |
WO2005008753A1 (en) * | 2003-05-23 | 2005-01-27 | Nikon Corporation | Template creation method and device, pattern detection method, position detection method and device, exposure method and device, device manufacturing method, and template creation program |
JP2006226987A (en) * | 2005-01-18 | 2006-08-31 | Mitsutoyo Corp | Photoelectric encoder and scale therefor |
JP2013253803A (en) * | 2012-06-05 | 2013-12-19 | Takaoka Electric Mfg Co Ltd | Film thickness measuring apparatus and film thickness measuring method |
CN117276104A (en) * | 2023-02-27 | 2023-12-22 | 魅杰光电科技(上海)有限公司 | Overlay measurement method applied to integrated circuit |
CN117276105A (en) * | 2023-02-27 | 2023-12-22 | 魅杰光电科技(上海)有限公司 | Method for measuring semiconductor registration error |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101310029B1 (en) * | 2012-03-14 | 2013-09-24 | 삼성모바일디스플레이주식회사 | Detecting method of alignment mark |
-
1987
- 1987-09-28 JP JP62243194A patent/JPH0663740B2/en not_active Expired - Fee Related
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02304303A (en) * | 1989-05-18 | 1990-12-18 | Sumitomo Heavy Ind Ltd | Position detecting device using sector fresnel zone plate |
JPH0712520A (en) * | 1990-12-27 | 1995-01-17 | Internatl Business Mach Corp <Ibm> | Method for discovering standard |
EP0786702A3 (en) * | 1996-01-11 | 1998-01-07 | Ushiodenki Kabushiki Kaisha | Process for pattern searching and a device for positioning of a mask to a workpiece |
WO2005008753A1 (en) * | 2003-05-23 | 2005-01-27 | Nikon Corporation | Template creation method and device, pattern detection method, position detection method and device, exposure method and device, device manufacturing method, and template creation program |
JP2006226987A (en) * | 2005-01-18 | 2006-08-31 | Mitsutoyo Corp | Photoelectric encoder and scale therefor |
JP2013253803A (en) * | 2012-06-05 | 2013-12-19 | Takaoka Electric Mfg Co Ltd | Film thickness measuring apparatus and film thickness measuring method |
CN117276104A (en) * | 2023-02-27 | 2023-12-22 | 魅杰光电科技(上海)有限公司 | Overlay measurement method applied to integrated circuit |
CN117276105A (en) * | 2023-02-27 | 2023-12-22 | 魅杰光电科技(上海)有限公司 | Method for measuring semiconductor registration error |
CN117276105B (en) * | 2023-02-27 | 2024-06-11 | 魅杰光电科技(上海)有限公司 | Method for measuring semiconductor registration error |
CN117276104B (en) * | 2023-02-27 | 2024-06-18 | 魅杰光电科技(上海)有限公司 | Overlay measurement method applied to integrated circuit |
Also Published As
Publication number | Publication date |
---|---|
JPH0663740B2 (en) | 1994-08-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CA2033359A1 (en) | Method of matching patterns and apparatus therefor | |
DE69626208D1 (en) | Method and system for recognizing hand gestures | |
EP0233628A3 (en) | Hand dimension verification | |
JPS6426285A (en) | Image recognizing device | |
EP0338677A3 (en) | Image processing method for shape recognition | |
JPS6484108A (en) | Position detecting method for alignment mark | |
EP0917929A3 (en) | Lens grinding apparatus | |
EP0287125A3 (en) | Method of processing radiation images | |
JPS59132079A (en) | Manual operation input device | |
EP0397429A3 (en) | Image processing apparatus and method | |
JPS6453282A (en) | Character recognition method and apparatus | |
EP0783226A3 (en) | Image processing apparatus and method | |
JPS5424546A (en) | Pattern recognition method | |
JPS6444586A (en) | Handwritten character recognizing device with personal dictionary forming function | |
JPS6446169A (en) | Pattern extracting device | |
JPS5379327A (en) | Character recognition unit | |
JPS5494236A (en) | Picture processor | |
JPS57198641A (en) | Pattern detection | |
JPS54118859A (en) | Pattern position recognition apparatus | |
JPS57113185A (en) | Character recognition system | |
JPS58121483A (en) | Picture processing method | |
JPS6444584A (en) | Composite template matching image processor | |
JPS5222444A (en) | Method of transferring data | |
JPS6482279A (en) | Subpixel precision template matching method | |
JPS6472285A (en) | Pattern recognizing method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |