JPS6481905A - Spectral element - Google Patents

Spectral element

Info

Publication number
JPS6481905A
JPS6481905A JP24008287A JP24008287A JPS6481905A JP S6481905 A JPS6481905 A JP S6481905A JP 24008287 A JP24008287 A JP 24008287A JP 24008287 A JP24008287 A JP 24008287A JP S6481905 A JPS6481905 A JP S6481905A
Authority
JP
Japan
Prior art keywords
spectral element
sic
magnesium
silicon carbide
film thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24008287A
Other languages
Japanese (ja)
Inventor
Junichi Fujita
Atsushi Kamijo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP24008287A priority Critical patent/JPS6481905A/en
Publication of JPS6481905A publication Critical patent/JPS6481905A/en
Pending legal-status Critical Current

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  • Spectrometry And Color Measurement (AREA)
  • Optical Filters (AREA)

Abstract

PURPOSE:To obtain a spectral element which has high strength and adequate resolving power and does not require intricate optical systems by alternately laminating silicon carbide and magnesium at respective film thicknesses in such a manner that the film thickness ratio of the silicon carbide and the magnesium attains 0.1-10. CONSTITUTION:This spectral element is the artificial multi-layered film which is provided with periodic structures by alternately laminating the silicon carbide (SiC) 2 and the magnesium (Mg) 3 respectively to >=1atom. and <=400Angstrom film thickness on a substrate 1 in such a manner that the film thickness ratio of the SiC 2 and the Mg 3 attains 0.1-10. Glass, silicon, sapphire, etc., having optically flat surfaces are used for the substrate 1. A vacuum deposition method or neutralized ion beam sputtering method, high-frequency sputtering method, etc., are used for the alternate lamination of the SiC 2 and the Mg 3. The spectral element which has the high strength and the adequate resolving power and does not require the intricate optical systems is thereby obtd.
JP24008287A 1987-09-24 1987-09-24 Spectral element Pending JPS6481905A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24008287A JPS6481905A (en) 1987-09-24 1987-09-24 Spectral element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24008287A JPS6481905A (en) 1987-09-24 1987-09-24 Spectral element

Publications (1)

Publication Number Publication Date
JPS6481905A true JPS6481905A (en) 1989-03-28

Family

ID=17054216

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24008287A Pending JPS6481905A (en) 1987-09-24 1987-09-24 Spectral element

Country Status (1)

Country Link
JP (1) JPS6481905A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015140924A1 (en) * 2014-03-18 2015-09-24 エヌ・ティ・ティ・アドバンステクノロジ株式会社 Multilayer mirror, spectroscopic device, and spectroscopy method for higher harmonics

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015140924A1 (en) * 2014-03-18 2015-09-24 エヌ・ティ・ティ・アドバンステクノロジ株式会社 Multilayer mirror, spectroscopic device, and spectroscopy method for higher harmonics
JPWO2015140924A1 (en) * 2014-03-18 2017-04-06 エヌ・ティ・ティ・アドバンステクノロジ株式会社 Multilayer reflector, spectroscopic device, and high-order harmonic spectroscopy method

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