JPS647684A - Manufacture of solid-state laser - Google Patents

Manufacture of solid-state laser

Info

Publication number
JPS647684A
JPS647684A JP16347487A JP16347487A JPS647684A JP S647684 A JPS647684 A JP S647684A JP 16347487 A JP16347487 A JP 16347487A JP 16347487 A JP16347487 A JP 16347487A JP S647684 A JPS647684 A JP S647684A
Authority
JP
Japan
Prior art keywords
layer
crystal
luminous layer
electrode
state laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16347487A
Other languages
Japanese (ja)
Other versions
JP2524595B2 (en
Inventor
Akira Matsuno
Takashi Nire
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Komatsu Ltd
Original Assignee
Komatsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Komatsu Ltd filed Critical Komatsu Ltd
Priority to JP62163474A priority Critical patent/JP2524595B2/en
Publication of JPS647684A publication Critical patent/JPS647684A/en
Application granted granted Critical
Publication of JP2524595B2 publication Critical patent/JP2524595B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Semiconductor Lasers (AREA)

Abstract

PURPOSE:To manufacture a solid state laser with high luminous efficiency and reliability by employing the steps of forming a thin single-crystal layer as a light-emitting layer on a single-crystal substrate, depositing an insulating layer and then a first electrode on the light-emitting layer, etching and depositing an insulating film and then a second electrode on the etched and exposed portions of the light-emitting layer. CONSTITUTION:Electrodes 14 and 17 are formed through insulating films 13 and 16 onto opposite faces of a luminous layer 12 which a luminescence center impurity is doped in the luminescent base metal. At the same time, a solid-state laser is manufactured with other two faces treated as reflecting surfaces 18a and 18b. In such cases, a thin single-crystal film is formed as the luminous layer 12 onto a single-crystal substrate 11 through the epitaxial growth method. Next, the single-crystal substrate 11 is etched from its reverse side to expose the luminous layer 12. The second electrode 17 is formed through the insulating film on the reverse side of the exposed luminous layer 12. For example, the luminous layer 12 is composed by the thin single-crystal film which terbium as the luminescence center impurity is doped in zinc sulphide as the luminescent base metal.
JP62163474A 1987-06-30 1987-06-30 Method for manufacturing solid laser Expired - Lifetime JP2524595B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62163474A JP2524595B2 (en) 1987-06-30 1987-06-30 Method for manufacturing solid laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62163474A JP2524595B2 (en) 1987-06-30 1987-06-30 Method for manufacturing solid laser

Publications (2)

Publication Number Publication Date
JPS647684A true JPS647684A (en) 1989-01-11
JP2524595B2 JP2524595B2 (en) 1996-08-14

Family

ID=15774560

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62163474A Expired - Lifetime JP2524595B2 (en) 1987-06-30 1987-06-30 Method for manufacturing solid laser

Country Status (1)

Country Link
JP (1) JP2524595B2 (en)

Also Published As

Publication number Publication date
JP2524595B2 (en) 1996-08-14

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