JPS647109B2 - - Google Patents
Info
- Publication number
- JPS647109B2 JPS647109B2 JP665688A JP665688A JPS647109B2 JP S647109 B2 JPS647109 B2 JP S647109B2 JP 665688 A JP665688 A JP 665688A JP 665688 A JP665688 A JP 665688A JP S647109 B2 JPS647109 B2 JP S647109B2
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- diamine
- conductor
- butanetricarboxylic acid
- insulated wire
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920000642 polymer Polymers 0.000 claims description 12
- 150000004985 diamines Chemical class 0.000 claims description 10
- 239000003960 organic solvent Substances 0.000 claims description 9
- 239000004020 conductor Substances 0.000 claims description 7
- ZNFNDZCXTPWRLQ-UHFFFAOYSA-N butane-1,1,1-tricarboxylic acid Chemical compound CCCC(C(O)=O)(C(O)=O)C(O)=O ZNFNDZCXTPWRLQ-UHFFFAOYSA-N 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 5
- 239000011810 insulating material Substances 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 3
- 239000012212 insulator Substances 0.000 claims description 3
- 239000000178 monomer Substances 0.000 claims description 3
- 239000003973 paint Substances 0.000 description 11
- 239000004962 Polyamide-imide Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 229920002312 polyamide-imide Polymers 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000004135 Bone phosphate Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- -1 acid anhydride chlorides Chemical class 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- LOGBRYZYTBQBTB-UHFFFAOYSA-N butane-1,2,4-tricarboxylic acid Chemical compound OC(=O)CCC(C(O)=O)CC(O)=O LOGBRYZYTBQBTB-UHFFFAOYSA-N 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 230000035939 shock Effects 0.000 description 3
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 2
- 102100038576 F-box/WD repeat-containing protein 1A Human genes 0.000 description 2
- 101001030691 Homo sapiens F-box/WD repeat-containing protein 1A Proteins 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000008064 anhydrides Chemical group 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- 229920003055 poly(ester-imide) Polymers 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- PWGJDPKCLMLPJW-UHFFFAOYSA-N 1,8-diaminooctane Chemical compound NCCCCCCCCN PWGJDPKCLMLPJW-UHFFFAOYSA-N 0.000 description 1
- ZFPGARUNNKGOBB-UHFFFAOYSA-N 1-Ethyl-2-pyrrolidinone Chemical compound CCN1CCCC1=O ZFPGARUNNKGOBB-UHFFFAOYSA-N 0.000 description 1
- GGYVTHJIUNGKFZ-UHFFFAOYSA-N 1-methylpiperidin-2-one Chemical compound CN1CCCCC1=O GGYVTHJIUNGKFZ-UHFFFAOYSA-N 0.000 description 1
- DCZHLSUPIRYYMN-UHFFFAOYSA-N 1-methylpropane-1,1,3-tricarboxylic acid Chemical compound OC(=O)C(C(O)=O)(C)CCC(O)=O DCZHLSUPIRYYMN-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical group CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- FGSUUFDRDVJCLT-UHFFFAOYSA-N 3-methylazepan-2-one Chemical compound CC1CCCCNC1=O FGSUUFDRDVJCLT-UHFFFAOYSA-N 0.000 description 1
- ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- TYNNEOUATWMCIY-UHFFFAOYSA-N 4-(4-aminophenyl)phosphonoylaniline Chemical compound C1=CC(N)=CC=C1P(=O)C1=CC=C(N)C=C1 TYNNEOUATWMCIY-UHFFFAOYSA-N 0.000 description 1
- OSGFBINRYVUILV-UHFFFAOYSA-N 4-[(4-aminophenyl)-diethylsilyl]aniline Chemical compound C=1C=C(N)C=CC=1[Si](CC)(CC)C1=CC=C(N)C=C1 OSGFBINRYVUILV-UHFFFAOYSA-N 0.000 description 1
- HSBOCPVKJMBWTF-UHFFFAOYSA-N 4-[1-(4-aminophenyl)ethyl]aniline Chemical compound C=1C=C(N)C=CC=1C(C)C1=CC=C(N)C=C1 HSBOCPVKJMBWTF-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-O N-dimethylethanolamine Chemical compound C[NH+](C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-O 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- NBICYCZLCAMSBG-UHFFFAOYSA-L [Co+2].CCCCCC=CC([O-])=O.CCCCCC=CC([O-])=O Chemical compound [Co+2].CCCCCC=CC([O-])=O.CCCCCC=CC([O-])=O NBICYCZLCAMSBG-UHFFFAOYSA-L 0.000 description 1
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- MJNOWPQJWBTQEH-UHFFFAOYSA-N butane-1,1,2-tricarboxylic acid Chemical compound CCC(C(O)=O)C(C(O)=O)C(O)=O MJNOWPQJWBTQEH-UHFFFAOYSA-N 0.000 description 1
- ICFZVGUJHMPRKR-UHFFFAOYSA-N butane-1,1,4-tricarboxylic acid Chemical compound OC(=O)CCCC(C(O)=O)C(O)=O ICFZVGUJHMPRKR-UHFFFAOYSA-N 0.000 description 1
- JODNECOOAJMIKX-UHFFFAOYSA-N butane-1,2,3-tricarboxylic acid Chemical compound OC(=O)C(C)C(C(O)=O)CC(O)=O JODNECOOAJMIKX-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- VKIRRGRTJUUZHS-UHFFFAOYSA-N cyclohexane-1,4-diamine Chemical compound NC1CCC(N)CC1 VKIRRGRTJUUZHS-UHFFFAOYSA-N 0.000 description 1
- 239000012975 dibutyltin dilaurate Substances 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- GIWKOZXJDKMGQC-UHFFFAOYSA-L lead(2+);naphthalene-2-carboxylate Chemical compound [Pb+2].C1=CC=CC2=CC(C(=O)[O-])=CC=C21.C1=CC=CC2=CC(C(=O)[O-])=CC=C21 GIWKOZXJDKMGQC-UHFFFAOYSA-L 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- SXJVFQLYZSNZBT-UHFFFAOYSA-N nonane-1,9-diamine Chemical compound NCCCCCCCCCN SXJVFQLYZSNZBT-UHFFFAOYSA-N 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- WSFQLUVWDKCYSW-UHFFFAOYSA-M sodium;2-hydroxy-3-morpholin-4-ylpropane-1-sulfonate Chemical compound [Na+].[O-]S(=O)(=O)CC(O)CN1CCOCC1 WSFQLUVWDKCYSW-UHFFFAOYSA-M 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- AGGKEGLBGGJEBZ-UHFFFAOYSA-N tetramethylenedisulfotetramine Chemical compound C1N(S2(=O)=O)CN3S(=O)(=O)N1CN2C3 AGGKEGLBGGJEBZ-UHFFFAOYSA-N 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- 150000003628 tricarboxylic acids Chemical class 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
- RVXKJRWBHPHVOV-UHFFFAOYSA-L zinc;oct-2-enoate Chemical compound [Zn+2].CCCCCC=CC([O-])=O.CCCCCC=CC([O-])=O RVXKJRWBHPHVOV-UHFFFAOYSA-L 0.000 description 1
Landscapes
- Paints Or Removers (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Organic Insulating Materials (AREA)
- Insulated Conductors (AREA)
- Polyamides (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Description
【発明の詳細な説明】
本発明は有機溶媒に対する溶解性のすぐれた耐
熱性重合体を用いて得られ、優れた性熱性を示す
絶縁電線の製造法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing an insulated wire that is obtained using a heat-resistant polymer with excellent solubility in organic solvents and exhibits excellent heat resistance.
ポリアミドイミド樹脂が高度の耐熱性、機械的
特性、化学的特性等を有することはよく知られて
おり、フイルム、電線用をはじめとする各種塗
料、接着剤として広く実用に供されている。 It is well known that polyamide-imide resins have high heat resistance, mechanical properties, chemical properties, etc., and are widely used in practical applications as various coatings and adhesives, including those for films and electric wires.
従来、ポリアミドイミド樹脂は三塩基酸無水物
とジイソシアネートあるいは三塩基酸無水物クロ
ライドとジアミンとから合成されていた。しかる
に、このような方法で合成する場合には、反応媒
体としての有機溶媒は実質的に無水の状態にしな
ければ、無水物基、イソシアネート基、酸クロラ
イド基が分解あるいは変質して十分な分子量の重
合体が得られず、したがつてポリアミドイミド樹
脂本来の特性を発揮できない等、合成条件に種々
注意が必要である。 Conventionally, polyamide-imide resins have been synthesized from tribasic acid anhydrides and diisocyanates or tribasic acid anhydride chlorides and diamines. However, when synthesizing using such a method, the organic solvent used as the reaction medium must be kept in a substantially anhydrous state, otherwise the anhydride groups, isocyanate groups, and acid chloride groups will decompose or change in quality, resulting in a sufficient molecular weight. Various precautions must be taken with the synthesis conditions, such as not being able to obtain a polymer and therefore not being able to exhibit the inherent properties of polyamide-imide resin.
また三塩基酸無水物とジアミンとからポリアミ
ドイミド樹脂を合成する試みもなされているが、
十分な分子量を有するものは得られず、実用化に
は至つていない。 There have also been attempts to synthesize polyamideimide resin from tribasic acid anhydride and diamine, but
It has not been possible to obtain one with a sufficient molecular weight and it has not been put into practical use.
一方、周知の如く、ポリアミドイミド樹脂はそ
の構造上、一般の有機溶媒には極めて難溶で、そ
のためN―メチル―2―ピロリドン、N,N―ジ
メチルアセトアミド、N,N―ジメチルホルムア
ミド等の特殊な溶媒に溶解して実用に供してい
る。ところが、これらの溶媒類はいずれも高価な
ため、できるだけ溶液中の樹脂分濃度を高くし
て、塗膜、フイルム等の最終生成物を得る過程で
空気中に揮散させるにすぎないこれら溶媒類の使
用量を少なくすることが望まれている。このよう
な方向は昨今世界的に注目されている省資源化の
動きにも対応するものである。 On the other hand, as is well known, due to its structure, polyamide-imide resin is extremely poorly soluble in general organic solvents, and therefore, it is difficult to dissolve polyamide-imide resin in general organic solvents. It is put into practical use after being dissolved in a suitable solvent. However, all of these solvents are expensive, so the concentration of resin in the solution is increased as much as possible, and these solvents are simply volatilized into the air during the process of obtaining final products such as coatings and films. It is desired to reduce the amount used. This direction also corresponds to the trend toward resource conservation, which has recently been attracting attention worldwide.
このような状況に対拠すべく鋭意検討した結
果、特定のトリカルボン酸あるいはその機能誘導
体とジアミンを反応させて十分な分子量を有する
耐熱性重合体が得られること及びこの耐熱性重合
体の有機溶媒に対する溶解性がすぐれていること
を見出し、本発明を完成するに至つた。 As a result of intensive studies to counter this situation, we found that a heat-resistant polymer with sufficient molecular weight can be obtained by reacting a specific tricarboxylic acid or its functional derivative with a diamine, and that an organic solvent for this heat-resistant polymer can be obtained. They found that the solubility of the compound is excellent, leading to the completion of the present invention.
すなわち、本発明はブタントリカルボン酸また
はその機能誘導体とジアミンとを有機溶媒中でモ
ノマ濃度を10〜90重量%として50℃〜300℃で反
応させて得られる重合体を直接または他の絶縁物
を介して導体に塗布、焼付ける絶縁電線の製造法
に関する。 That is, the present invention uses a polymer obtained by reacting butanetricarboxylic acid or a functional derivative thereof with a diamine in an organic solvent at a monomer concentration of 10 to 90% by weight at 50°C to 300°C, or directly or with other insulators. This invention relates to a method for manufacturing insulated wires by coating and baking them onto conductors.
本発明において用いられる重合体は、ポリアミ
ドイミドの一種である。本発明においてブタント
リカルボン酸としては1,2,3―ブタントリカ
ルボン酸、1,2,4―ブタントリカルボン酸、
1,1,2―ブタントリカルボン酸、1,3,3
―ブタントリカルボン酸、1,4,4―ブタント
リカルボン酸などが用いられ、これらは無水物、
エステル、アミド等の機能性誘導体の形で使用す
ることも可能である。また、必要に応じて無水ト
リメリツト酸、無水ピロメリツト酸、無水ベンゾ
フエノンテトラカルボン酸のごとき三塩基酸また
は四塩基酸およびこれらの酸の機能性誘導体を併
用してもよい。 The polymer used in the present invention is a type of polyamideimide. In the present invention, butanetricarboxylic acid includes 1,2,3-butanetricarboxylic acid, 1,2,4-butanetricarboxylic acid,
1,1,2-butanetricarboxylic acid, 1,3,3
-Butanetricarboxylic acid, 1,4,4-butanetricarboxylic acid, etc. are used, and these are anhydrides,
It is also possible to use them in the form of functional derivatives such as esters and amides. Further, if necessary, tribasic acids or tetrabasic acids such as trimellitic anhydride, pyromellitic anhydride, benzophenonetetracarboxylic anhydride, and functional derivatives of these acids may be used in combination.
本発明で使用されるジアミン成分とは一般式
H2N―R1―NH2
で表わされる化合物であるが、R1は少なくとも
2個の炭素原子を含む炭化水素基であり、更に具
体的に言えば、芳香族、脂肪族、ヘテロ環基ある
いはこれらを組み合わせた基またはこれらが酸
素、窒素、硫黄、ケイ素、リンなどで結合された
2価の基であることが好ましい。また、これらの
基は、水酸基、アルキル基、シクロアルキル基、
アリル基、アルコキシル基、シクロアルコキシル
基、アリルオキシル基、ハロゲン等で置換されて
いてもよい。具体的な化合物としてはメタフエニ
レンジアミン、パラフエニレンジアミン、ベンジ
ジン、4,4′―ジアミノジフエニルメタン、4,
4′―ジアミノジフエニルエタン、4,4′―ジアミ
ノジフエニルプロパン、4,4′―ジアミノジフエ
ニルスルフイド、4,4′―ジアミノジフエニルス
ルホン、4,4′―ジアミノジフエニルエーテル、
パラービス―(4―アミノフエノキシ)ベンゼ
ン、メタ―ビス―(4―アミノフエノキシ)ベン
ゼン、パラキシリレンジアミン、メタキシリレン
ジアミン、ヘキサメチレンジアミン、ヘブタメチ
レンジアミン、オクタメチレンジアミン、ノナメ
チレンジアミン、1,4―ジアミノシクロヘキサ
ン、ビス―(4―アミノ―フエニル)ホスフイン
オキシド、ビス―(4―アミノフエニル)ジエチ
ルシランなどがあり、これらは単独あるいは混合
物として使用される。また場合により、少量のト
リアミン、テトラミンを併用しても差しつかえな
い。 The diamine component used in the present invention is a compound represented by the general formula H 2 N—R 1 —NH 2 , where R 1 is a hydrocarbon group containing at least 2 carbon atoms, and more specifically In other words, aromatic, aliphatic, heterocyclic groups, groups combining these, or divalent groups in which these are bonded with oxygen, nitrogen, sulfur, silicon, phosphorus, etc. are preferable. In addition, these groups include hydroxyl group, alkyl group, cycloalkyl group,
It may be substituted with an allyl group, an alkoxyl group, a cycloalkoxyl group, an allyloxyl group, a halogen, or the like. Specific compounds include metaphenylenediamine, paraphenylenediamine, benzidine, 4,4'-diaminodiphenylmethane, 4,
4'-diaminodiphenyl ethane, 4,4'-diaminodiphenylpropane, 4,4'-diaminodiphenyl sulfide, 4,4'-diaminodiphenyl sulfone, 4,4'-diaminodiphenyl ether,
Para-bis-(4-aminophenoxy)benzene, meta-bis-(4-aminophenoxy)benzene, para-xylylene diamine, metaxylylene diamine, hexamethylene diamine, hebutamethylene diamine, octamethylene diamine, nonamethylene diamine, 1,4 -diaminocyclohexane, bis-(4-amino-phenyl)phosphine oxide, bis-(4-aminophenyl)diethylsilane, etc., and these may be used alone or as a mixture. Depending on the case, a small amount of triamine or tetramine may also be used in combination.
有機溶媒としてはN―メチルピロリドン、N―
エチルピロリドン、N―メチルピペリドン、N―
メチルカプロラクタム、N―エチルカプロラクタ
ム等のN―アルキルラクタム類、フエノール、ク
レゾール、キシレノール等のフエノール類、N,
N―ジメチルアセトアミド、N,N―ジメチルホ
ルムアミド等のN,N―ジアルキルカルボン酸ア
ミド類、ニトロベンゼン、ピリジン、キノリン、
シアノベンゼン、N―アルキルアニリン等を使用
できるが、N―アルキルラクタム類、フエノール
類を主成分として用いることが好ましい。 As an organic solvent, N-methylpyrrolidone, N-
Ethylpyrrolidone, N-methylpiperidone, N-
N-alkyl lactams such as methyl caprolactam and N-ethyl caprolactam, phenols such as phenol, cresol, and xylenol, N,
N,N-dialkylcarboxylic acid amides such as N-dimethylacetamide and N,N-dimethylformamide, nitrobenzene, pyridine, quinoline,
Although cyanobenzene, N-alkylaniline, etc. can be used, it is preferable to use N-alkyllactams and phenols as the main components.
また希釈剤として有機溶媒のほか、ベンゼン、
トルエン、キシレン、高沸点炭化水素等の任意の
ものを使用することができる。 In addition to organic solvents as diluents, benzene,
Any of toluene, xylene, high boiling hydrocarbons, etc. can be used.
反応はブタントリカルボン酸またはその機能誘
導体とジアミンをほぼ等モルで反応させることと
が好ましいが必要に応じていずれかを過剰に用い
てもよい。 In the reaction, it is preferable to react butanetricarboxylic acid or a functional derivative thereof with a diamine in approximately equimolar amounts, but if necessary, an excess of either of them may be used.
反応時のブタントリカルボン酸またはその機能
誘導体およびジアミンのモノマ濃度は10〜90重量
%、好ましくは30〜80重量%とされ、場合によつ
ては反応の途中で希釈して更に反応を続行させて
もよい。また反応温度は50℃から300℃、好まし
くは100℃から沸点までとされる。 The monomer concentration of butanetricarboxylic acid or its functional derivative and diamine during the reaction is 10 to 90% by weight, preferably 30 to 80% by weight, and in some cases, it may be diluted during the reaction to continue the reaction. Good too. The reaction temperature is from 50°C to 300°C, preferably from 100°C to the boiling point.
更に、反応を促進させるために触媒を使用する
ことができ、特にフエノール系溶媒中で反応させ
る場合には触媒を用いることが望ましい。触媒と
しては例えばトリエチルアミン、トリブチルアミ
ン、ジメチルアニリン、トリエチレンジアミン、
N―メチルモルフオリン、1,8―ジアザビシク
ロ(5,4,0)ウンデカン―7,N,,N―ジ
メチルエタノールアミン等の第三級アミン、ジプ
ロピルアミン、ジブチルアミン、ジエタノールア
ミン、ピペリジン、モルフオリン等の第二級アミ
ンなどのアミン類、ジブチルチンジラウレート、
ジブチルチンジアセテート等の有機金属化合物、
ナフテン酸亜鉛、オクテン酸亜鉛、ナフテン酸
鉄、オクテン酸コバルト、ナフテン酸鉛等の金属
塩があげられ、これらは、原料仕込み量の0.01〜
10重量%程度添加される。 Furthermore, a catalyst can be used to accelerate the reaction, and it is particularly desirable to use a catalyst when the reaction is carried out in a phenolic solvent. Examples of catalysts include triethylamine, tributylamine, dimethylaniline, triethylenediamine,
Tertiary amines such as N-methylmorpholine, 1,8-diazabicyclo(5,4,0)undecane-7,N,,N-dimethylethanolamine, dipropylamine, dibutylamine, diethanolamine, piperidine, morpholine, etc. amines such as secondary amines, dibutyltin dilaurate,
Organometallic compounds such as dibutyltin diacetate,
Examples include metal salts such as zinc naphthenate, zinc octenoate, iron naphthenate, cobalt octenoate, and lead naphthenate.
It is added in an amount of about 10% by weight.
本発明におけるブタントリカルボン酸とジアミ
ンとの反応式は例えば1,2,4―ブタントリカ
ルボン酸を用いた場合には次のとおりであり、ポ
リアミドイミド樹脂が生成する。 The reaction formula of butanetricarboxylic acid and diamine in the present invention is as follows, for example when 1,2,4-butanetricarboxylic acid is used, and a polyamide-imide resin is produced.
得られた重合体を通常の条件で電気導体上に直
接又は他の絶縁物を介して塗布、焼付けて絶縁電
線とされる。また、更にその上に他の絶縁物を被
覆して絶縁電線としてもよい。他の絶縁物として
は、汎用ポリエステル塗料、トリス(2―ヒドロ
キシエチル)イソシアネート変性ポリエステル塗
料、ポリエステルイミド塗料、トリス(2―ヒド
ロキシエチル)イソシアネート変性ポリエステル
イミド塗料、ポリウレタン塗料、油性塗料、ポリ
ビニルホルマール塗料、ナイロン塗料等の他に、
主として絶縁電線に自己融着性を付与するために
用いられるエポキシ系塗料、熱可塑性ポリエステ
ル系塗料、ポリビニルブチラール系塗料等が用い
られる。 The obtained polymer is coated on an electrical conductor directly or via another insulator under normal conditions and baked to form an insulated wire. Further, another insulating material may be further coated thereon to form an insulated wire. Other insulating materials include general-purpose polyester paint, tris(2-hydroxyethyl) isocyanate-modified polyester paint, polyesterimide paint, tris(2-hydroxyethyl)isocyanate-modified polyesterimide paint, polyurethane paint, oil-based paint, polyvinyl formal paint, In addition to nylon paint, etc.
Epoxy paints, thermoplastic polyester paints, polyvinyl butyral paints, etc., which are mainly used to impart self-bonding properties to insulated wires, are used.
以下、実施例によつて本発明を説明する。 The present invention will be explained below with reference to Examples.
実施例 1
ジアミノジフエニルメタン(DAM)356g、
N―メチル―ピロリドン(NMP)174gを撹拌
機、温度計、窒素導入管を備えたフラスコに入れ
加温した。60℃で1,2,4―ブタントリカルボ
ン酸(BTRC)341gを加え、200℃に昇温した。
この温度で14時間保温すると84gの水が留出しフ
ラスコ内容物の粘度が非常に高くなつたため加熱
をやめて冷却し、NMP726gを加えて希釈した。
得られた溶液の粘度は32ポアズであつた。Example 1 356 g of diaminodiphenylmethane (DAM),
174 g of N-methyl-pyrrolidone (NMP) was placed in a flask equipped with a stirrer, a thermometer, and a nitrogen inlet tube and heated. 341 g of 1,2,4-butanetricarboxylic acid (BTRC) was added at 60°C, and the temperature was raised to 200°C.
When kept at this temperature for 14 hours, 84 g of water was distilled out and the viscosity of the contents of the flask became extremely high, so heating was stopped, the flask was cooled, and 726 g of NMP was added to dilute it.
The viscosity of the resulting solution was 32 poise.
この溶液の一部を多量の水中に投じ、得られた
沈殿の還元粘度(ηsp/c)を測定(0.5g/100mlジ
メチルアセトアミド、30℃)したところ0.36であ
つた。 A portion of this solution was poured into a large amount of water, and the reduced viscosity (η sp/c ) of the resulting precipitate was measured (0.5 g/100 ml dimethylacetamide, 30° C.) and found to be 0.36.
また、この溶液を常法によつて直径1mmの銅線
に塗布し、炉温300/350/400℃(入口/中央/
出口)の焼付炉中で焼付けることを6回繰り返し
て得られたエナメル銅線の特性は次の通りであつ
た。 In addition, this solution was applied to a copper wire with a diameter of 1 mm by the usual method, and the furnace temperature was 300/350/400°C (inlet/center/
The properties of the enamelled copper wire obtained by repeating the baking process six times in the baking furnace (exit) were as follows.
仕上り外径(mm) 1.076
導体径(mm) 1.000
皮膜厚(mm) 0.038
可とう性(自己径巻付) 良
耐熱衝撃性(240℃−1h) 1倍径良
熱軟化温度(℃) 380
耐劣化性(200℃−6h) 1倍径良
絶縁破壊電圧(kv) 12.4
実施例 2
ジアミノジフエニルエーテル357g、
BTRC339gをNMP174g中で実施例1と同様に
して200℃で15時間反応せしめた後、NMP887g
及びキシレン157gを加えて希釈した。得られた
溶液の粘度は28ポアズで、重合体の還元粘度は
0.37であつた。Finished outer diameter (mm) 1.076 Conductor diameter (mm) 1.000 Film thickness (mm) 0.038 Flexibility (self-diameter winding) Good thermal shock resistance (240°C-1h) 1x diameter Good thermal softening temperature (°C) 380 Resistance Degradability (200℃-6h) 1x diameter good dielectric breakdown voltage (kv) 12.4 Example 2 Diaminodiphenyl ether 357g,
After reacting 339 g of BTRC in 174 g of NMP at 200°C for 15 hours in the same manner as in Example 1, 887 g of NMP was reacted.
and 157 g of xylene were added for dilution. The viscosity of the resulting solution was 28 poise, and the reduced viscosity of the polymer was
It was 0.37.
この溶液を実施例1と同様にして直径1mmの銅
線に塗布焼付けて得られたエナメル銅線の特性は
次の通りであつた。 This solution was applied and baked on a copper wire having a diameter of 1 mm in the same manner as in Example 1, and the properties of the enameled copper wire obtained were as follows.
仕上り外径(mm) 1.075
導体径(mm) 1.000
皮膜厚(mm) 0.038
可とう性(自己径巻付) 良
性熱衝撃性(240℃−1h) 1倍径良
熱軟化温度(℃) 370℃
耐劣化性(200℃−6h) 1倍径良
絶縁破壊電圧(kv) 12.6
本発明によつて得られる絶縁電線は良好な可と
う性、絶縁破壊電圧を示し、また、耐熱衝撃性、
熱軟化温度、耐劣化性等の耐熱性絶縁電線として
の諸特性に優れ、広く実用に供することができ
る。Finished outer diameter (mm) 1.075 Conductor diameter (mm) 1.000 Film thickness (mm) 0.038 Flexibility (self-diameter winding) Benign thermal shock resistance (240℃-1h) 1x diameter good thermal softening temperature (℃) 370℃ Deterioration resistance (200℃-6h) 1x diameter Good dielectric breakdown voltage (kv) 12.6 The insulated wire obtained by the present invention exhibits good flexibility and dielectric breakdown voltage, and also has good thermal shock resistance,
It has excellent properties as a heat-resistant insulated wire, such as thermal softening temperature and deterioration resistance, and can be used in a wide range of practical applications.
Claims (1)
とジアミンとを有機溶媒中でモノマ濃度を10〜90
重量%として50℃〜300℃で反応させて得られる
重合体を直接または他の絶縁物を介して導体に塗
布、焼付けることを特徴とする絶縁電線の製造
法。 2 重合体を導体に直接または他の絶縁物を介し
て塗布、焼付けたのち、更に他の絶縁物を被覆す
る特許請求の範囲第1項記載の絶縁電線の製造
法。[Claims] 1. Butanetricarboxylic acid or a functional derivative thereof and a diamine are mixed in an organic solvent at a monomer concentration of 10 to 90%.
A method for producing an insulated wire, which comprises applying and baking a polymer obtained by reacting the polymer at 50°C to 300°C in weight percent onto a conductor directly or through another insulator. 2. The method of manufacturing an insulated wire according to claim 1, which comprises coating the conductor with the polymer directly or via another insulating material, baking the polymer, and then coating the conductor with another insulating material.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP665688A JPS63211512A (en) | 1988-01-14 | 1988-01-14 | Manufacture of insulated wire |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP665688A JPS63211512A (en) | 1988-01-14 | 1988-01-14 | Manufacture of insulated wire |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63211512A JPS63211512A (en) | 1988-09-02 |
JPS647109B2 true JPS647109B2 (en) | 1989-02-07 |
Family
ID=11644419
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP665688A Granted JPS63211512A (en) | 1988-01-14 | 1988-01-14 | Manufacture of insulated wire |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63211512A (en) |
-
1988
- 1988-01-14 JP JP665688A patent/JPS63211512A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS63211512A (en) | 1988-09-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0223958A2 (en) | Crosslinked copolyamideimides and method for their preparation | |
DE1937388A1 (en) | Process for the production of poly acid amides and polyimides | |
US4294952A (en) | Polyamide-imide resin and its production | |
US3440197A (en) | Coating solutions and methods for preparing and using the same | |
US3609113A (en) | Poly-(arylene-triketoimidazolidines and process for preparing the same | |
US3726712A (en) | Double coated electrical conductor | |
JPS61162525A (en) | New copolyamideimide, its production and prepolymer thereof and its production | |
JPH05205538A (en) | Solderable insulated wire | |
US4428977A (en) | Ammonium salt of partially emidized polyamide acid for aqueous coating composition | |
JPS647109B2 (en) | ||
JPS5953304B2 (en) | Covered conductor and its manufacturing method | |
JPS6366853B2 (en) | ||
US4356297A (en) | In-situ formation of a diprimary amine curing agent | |
KR100644338B1 (en) | The manufacture method of the polyamideimide resin solution for enamel copper wire clothing that the antiwear characteristic was strengthened | |
KR20010018933A (en) | Process for producing polyamideimide varnish for coating enamel wire by using Blocked -Isocyanate method and catalyst | |
US3652498A (en) | Process for preparing polyamide-imides | |
JPS5855168B2 (en) | Polyamideimide resin composition and method for producing the same | |
JPS5851409A (en) | Insulated wire | |
KR100644337B1 (en) | The manufacture method of the polyamideimide resin solution for high concentration type enamel copper wire clothing | |
JPH05339523A (en) | Insulating varnish and insulated wire | |
JPH0327577B2 (en) | ||
JPS61275327A (en) | Polyamide resin composition and its production | |
JPS6235431B2 (en) | ||
KR810001796B1 (en) | Polyesteramides and process for producing the same | |
JPS5927921A (en) | Production of heat-resistant resin |