JPS6470744A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
JPS6470744A
JPS6470744A JP22749287A JP22749287A JPS6470744A JP S6470744 A JPS6470744 A JP S6470744A JP 22749287 A JP22749287 A JP 22749287A JP 22749287 A JP22749287 A JP 22749287A JP S6470744 A JPS6470744 A JP S6470744A
Authority
JP
Japan
Prior art keywords
composition
photosensitive
acid
polymer
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22749287A
Other languages
Japanese (ja)
Other versions
JP2561841B2 (en
Inventor
Shigeo Koizumi
Nobuyuki Kita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP62227492A priority Critical patent/JP2561841B2/en
Priority to US07/241,374 priority patent/US4942109A/en
Publication of JPS6470744A publication Critical patent/JPS6470744A/en
Application granted granted Critical
Publication of JP2561841B2 publication Critical patent/JP2561841B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To enable the development of the title composition with an aqueous alkaline solution and to improve the sensitivity of composition by incorporating a specified photosensitive resin in the titled composition. CONSTITUTION:The titled composition contains the photosensitive resin B which is formed by adding an active mercapto carboxylic acid (such as 3-mercapto propionic acid) to a polymer A having >=2 an unsatd. double bonds which are adjacent to an aromatic ring and are capable of effecting dimerization with a light, as a main chain. Said polymer A is composed of a photosensitive polyester of p-phenyle diacrylic acid or 4-carboxy cinnamic acid and a diol compd., and said resin B has preferably an acid value of 15-200. And, a planographic printing plate is prepared by forming a photosensitive plate from the composition which if necessary, adds a sensitizer, etc., and then, exposing it, followed by developing the obtd. photosensitive plate with the aqueous alkaline solution.
JP62227492A 1987-09-10 1987-09-10 Photosensitive composition Expired - Lifetime JP2561841B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP62227492A JP2561841B2 (en) 1987-09-10 1987-09-10 Photosensitive composition
US07/241,374 US4942109A (en) 1987-09-10 1988-09-07 Light-sensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62227492A JP2561841B2 (en) 1987-09-10 1987-09-10 Photosensitive composition

Publications (2)

Publication Number Publication Date
JPS6470744A true JPS6470744A (en) 1989-03-16
JP2561841B2 JP2561841B2 (en) 1996-12-11

Family

ID=16861736

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62227492A Expired - Lifetime JP2561841B2 (en) 1987-09-10 1987-09-10 Photosensitive composition

Country Status (1)

Country Link
JP (1) JP2561841B2 (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4954491A (en) * 1972-05-05 1974-05-27
JPS50138096A (en) * 1974-04-22 1975-11-04
JPS5283531A (en) * 1976-01-01 1977-07-12 Ciba Geigy Ag Polymerizing esters
JPS5862640A (en) * 1981-09-21 1983-04-14 イ−・アイ・デユポン・ド・ネモア−ス・アンド・コンパニ− Photosensitive elastic composition
JPS60165646A (en) * 1984-02-09 1985-08-28 Dainippon Ink & Chem Inc Photosensitive image forming material developable with aqueous alkaline developing solution
JPS6155643A (en) * 1984-08-27 1986-03-20 Dainippon Ink & Chem Inc Photosensitive image forming material developable from aqueous alkaline developer
JPS6234151A (en) * 1985-08-08 1987-02-14 Dainippon Ink & Chem Inc Photosensitive image forming material capable of developing with aqueous alkaline developer

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4954491A (en) * 1972-05-05 1974-05-27
JPS50138096A (en) * 1974-04-22 1975-11-04
JPS5283531A (en) * 1976-01-01 1977-07-12 Ciba Geigy Ag Polymerizing esters
JPS5862640A (en) * 1981-09-21 1983-04-14 イ−・アイ・デユポン・ド・ネモア−ス・アンド・コンパニ− Photosensitive elastic composition
JPS60165646A (en) * 1984-02-09 1985-08-28 Dainippon Ink & Chem Inc Photosensitive image forming material developable with aqueous alkaline developing solution
JPS6155643A (en) * 1984-08-27 1986-03-20 Dainippon Ink & Chem Inc Photosensitive image forming material developable from aqueous alkaline developer
JPS6234151A (en) * 1985-08-08 1987-02-14 Dainippon Ink & Chem Inc Photosensitive image forming material capable of developing with aqueous alkaline developer

Also Published As

Publication number Publication date
JP2561841B2 (en) 1996-12-11

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