JPS647036A - Photopolymerizable negative type resist - Google Patents
Photopolymerizable negative type resistInfo
- Publication number
- JPS647036A JPS647036A JP16316487A JP16316487A JPS647036A JP S647036 A JPS647036 A JP S647036A JP 16316487 A JP16316487 A JP 16316487A JP 16316487 A JP16316487 A JP 16316487A JP S647036 A JPS647036 A JP S647036A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- negative type
- photopolymn
- compd
- initiator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE:To improve the shelf stability of a resist by using a copolymer having structural units formed from methacrylic acid and methyl methacrylate, a lipophilic plasticizer, a compd. having polymerizable terminal ethylene groups and a photopolymn. initiator which is activated by active rays as constituents of the resist. CONSTITUTION:This photopolymerizable negative type resist contains a copolymer having two kinds of structural units formed from methacrylic acid and methyl methacrylate and having 10,000-500,000 weight average mol.wt., a lipophilic plasticizer such as phthalic diester or glycol ester, a compd. having two or more polymerizable terminal ethylene groups and >=100 deg.C b.p. under ordinary pressure, e.g., unsatd. carboxylic acid and a photopolymn. initiator which is activated by active rays, e.g., benzoin. The resist has superior sensitivity, etching resistance, strippability and shelf stability.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16316487A JPS647036A (en) | 1987-06-30 | 1987-06-30 | Photopolymerizable negative type resist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16316487A JPS647036A (en) | 1987-06-30 | 1987-06-30 | Photopolymerizable negative type resist |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS647036A true JPS647036A (en) | 1989-01-11 |
Family
ID=15768450
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16316487A Pending JPS647036A (en) | 1987-06-30 | 1987-06-30 | Photopolymerizable negative type resist |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS647036A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007131033A (en) * | 2005-11-08 | 2007-05-31 | Delta Kogyo Co Ltd | Slide adjuster for vehicle |
-
1987
- 1987-06-30 JP JP16316487A patent/JPS647036A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007131033A (en) * | 2005-11-08 | 2007-05-31 | Delta Kogyo Co Ltd | Slide adjuster for vehicle |
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