JPS6468933A - Apparatus for treating semiconductor-substrate - Google Patents
Apparatus for treating semiconductor-substrateInfo
- Publication number
- JPS6468933A JPS6468933A JP62225736A JP22573687A JPS6468933A JP S6468933 A JPS6468933 A JP S6468933A JP 62225736 A JP62225736 A JP 62225736A JP 22573687 A JP22573687 A JP 22573687A JP S6468933 A JPS6468933 A JP S6468933A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- semiconductor substrate
- arms
- treatment
- treating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning In General (AREA)
- Weting (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
PURPOSE:To expand the exposed part of a semiconductor substrate, to eliminate stagnation of treating liquid and to make dispersion in treatment small, by providing a structure, which does not need a semiconductor substrate container, preventing re-attachment of contaminated material and dust from the semiconductor substrate container, and minimizing a semiconductor substrate supporting part as required. CONSTITUTION:A semiconductor substrate 5 is held with the operations of holding arms 2 and 2, which are suspended from a conveyer 6, in the direction of a b. The substrate is conveyed into a treating bath 3 by the movement of the conveyer 6 in the directions (e) and (f) and in the directions (c) and (d). When, the substrate 5 is coupled with grooves 4b of supporting poles 4a in the treating bath 3, the arms 2 and 2 are opened in the direction of b a. Said substrate 5 is held with a holding part 4, and immersion treatment is performed. After the treatment, the substrate 5 is lifted up with the arms 2 and 2 out of the treating bath 3 and conveyed to the next step.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62225736A JPS6468933A (en) | 1987-09-09 | 1987-09-09 | Apparatus for treating semiconductor-substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62225736A JPS6468933A (en) | 1987-09-09 | 1987-09-09 | Apparatus for treating semiconductor-substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6468933A true JPS6468933A (en) | 1989-03-15 |
Family
ID=16834025
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62225736A Pending JPS6468933A (en) | 1987-09-09 | 1987-09-09 | Apparatus for treating semiconductor-substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6468933A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4332857A1 (en) * | 1992-09-25 | 1994-04-21 | Mitsubishi Electric Corp | Semiconductor wafer cleaning appts. associated with prod. cassette - handles wafers set upright in portable rack for mechanised transport between isopropyl alcohol cleaning and drying stations |
| JPH07106408A (en) * | 1993-10-05 | 1995-04-21 | Kaijo Corp | Substrate holding cassette |
-
1987
- 1987-09-09 JP JP62225736A patent/JPS6468933A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4332857A1 (en) * | 1992-09-25 | 1994-04-21 | Mitsubishi Electric Corp | Semiconductor wafer cleaning appts. associated with prod. cassette - handles wafers set upright in portable rack for mechanised transport between isopropyl alcohol cleaning and drying stations |
| DE4332857C2 (en) * | 1992-09-25 | 1999-05-06 | Mitsubishi Electric Corp | Semiconductor cleaning device |
| JPH07106408A (en) * | 1993-10-05 | 1995-04-21 | Kaijo Corp | Substrate holding cassette |
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