JPS6468927A - Apparatus for printing and exposure of semiconductor - Google Patents

Apparatus for printing and exposure of semiconductor

Info

Publication number
JPS6468927A
JPS6468927A JP62227126A JP22712687A JPS6468927A JP S6468927 A JPS6468927 A JP S6468927A JP 62227126 A JP62227126 A JP 62227126A JP 22712687 A JP22712687 A JP 22712687A JP S6468927 A JPS6468927 A JP S6468927A
Authority
JP
Japan
Prior art keywords
wafer
stepper
exposure
fixed
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62227126A
Other languages
Japanese (ja)
Inventor
Yuji Tsuruoka
Makoto Torigoe
Hitoshi Fukuda
Kazuo Iizuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP62227126A priority Critical patent/JPS6468927A/en
Publication of JPS6468927A publication Critical patent/JPS6468927A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Abstract

PURPOSE:To facilitate the correction of exposure irregularities and the control of the amount of exposure, by controlling both the incident position and the incident angle of a laser beam. CONSTITUTION:A laser beam 20, which is emitted from an excimer laser head 1, passes through a position sensor 4 and a position sensor 5. Then the beam is reflected with mirrors 6, 7 and 8 and reaches a wafer 12 through a reticle 9 and a projecting lens 10. A stepper optical system comprising the parts 4-10 is fixed as a unitary body with a lens supporting stage 11, which is fixed to a stepper surface plate 15. Therefore the relative positions in the stepper optical system are substantially unchanged. The wafer 12 is sucked on a wafer chuck 13 with vacuum. The wafer chuck 13 is fixed to an X-Y stage 14, which is provided on the stepper surface plate 15. In the ordinary case, reduced patterns of several tens of shots are transferred on the wafer. Therefore, the X-Y stage 14 is moved in the direction X or Y, and the laser light is emitted. In this way the transfer is repeated.
JP62227126A 1987-09-09 1987-09-09 Apparatus for printing and exposure of semiconductor Pending JPS6468927A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62227126A JPS6468927A (en) 1987-09-09 1987-09-09 Apparatus for printing and exposure of semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62227126A JPS6468927A (en) 1987-09-09 1987-09-09 Apparatus for printing and exposure of semiconductor

Publications (1)

Publication Number Publication Date
JPS6468927A true JPS6468927A (en) 1989-03-15

Family

ID=16855886

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62227126A Pending JPS6468927A (en) 1987-09-09 1987-09-09 Apparatus for printing and exposure of semiconductor

Country Status (1)

Country Link
JP (1) JPS6468927A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04144114A (en) * 1990-10-05 1992-05-18 Canon Inc Aligner
JPH04143764A (en) * 1990-10-05 1992-05-18 Canon Inc Exposing device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04144114A (en) * 1990-10-05 1992-05-18 Canon Inc Aligner
JPH04143764A (en) * 1990-10-05 1992-05-18 Canon Inc Exposing device

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