JPS6467897A - High-frequency amplifier for semiconductor manufacturing device - Google Patents
High-frequency amplifier for semiconductor manufacturing deviceInfo
- Publication number
- JPS6467897A JPS6467897A JP62223252A JP22325287A JPS6467897A JP S6467897 A JPS6467897 A JP S6467897A JP 62223252 A JP62223252 A JP 62223252A JP 22325287 A JP22325287 A JP 22325287A JP S6467897 A JPS6467897 A JP S6467897A
- Authority
- JP
- Japan
- Prior art keywords
- permeability
- transformers
- ferrite cores
- amplified
- fed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE:To amplify high-frequency signals over a wide band by combining ferrite cores with permeability capable of efficiently transmitting separately for different frequency bands with low loss to constitute a transmission line transformer. CONSTITUTION:A high-frequency signal incoming to an input terminal 21 is divided into four through a transformer T1 and fed to gates of electric field effect transistors Q1-Q4 and amplified and fed to transformers T2, T3 and taken out at an output terminal 22 via transformers T4, T5 in sequence. The transformers T2-T5 are combined with the first ferrite cores 241-244 with the first permeability and the second ferrite cores 251-254 with the second permeability in turn, and wide-band signals can be transmitted. High-frequency signals in a wide band can be thereby power-amplified and outputted to the output terminal 22.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62223252A JPS6467897A (en) | 1987-09-07 | 1987-09-07 | High-frequency amplifier for semiconductor manufacturing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62223252A JPS6467897A (en) | 1987-09-07 | 1987-09-07 | High-frequency amplifier for semiconductor manufacturing device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6467897A true JPS6467897A (en) | 1989-03-14 |
Family
ID=16795183
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62223252A Pending JPS6467897A (en) | 1987-09-07 | 1987-09-07 | High-frequency amplifier for semiconductor manufacturing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6467897A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000058465A (en) * | 1998-05-29 | 2000-02-25 | Mitsubishi Heavy Ind Ltd | Plasma chemical vapor deposition equipment |
US8031896B2 (en) | 2003-07-21 | 2011-10-04 | Bose Corporation | Passive acoustic radiating |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS599173A (en) * | 1982-07-06 | 1984-01-18 | ザ・パ−キン−エルマ−・コ−ポレイシヨン | Method and apparatus for controllable etching of material |
JPS59153303A (en) * | 1983-02-22 | 1984-09-01 | Tokyo Denshi Kagaku Kabushiki | High frequency oscillator |
JPS6151808A (en) * | 1984-08-20 | 1986-03-14 | Fujitsu Ltd | Structure of ringed compound magnetic core |
JPS6263183A (en) * | 1985-09-13 | 1987-03-19 | Toshiba Corp | Rf type ion source |
-
1987
- 1987-09-07 JP JP62223252A patent/JPS6467897A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS599173A (en) * | 1982-07-06 | 1984-01-18 | ザ・パ−キン−エルマ−・コ−ポレイシヨン | Method and apparatus for controllable etching of material |
JPS59153303A (en) * | 1983-02-22 | 1984-09-01 | Tokyo Denshi Kagaku Kabushiki | High frequency oscillator |
JPS6151808A (en) * | 1984-08-20 | 1986-03-14 | Fujitsu Ltd | Structure of ringed compound magnetic core |
JPS6263183A (en) * | 1985-09-13 | 1987-03-19 | Toshiba Corp | Rf type ion source |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000058465A (en) * | 1998-05-29 | 2000-02-25 | Mitsubishi Heavy Ind Ltd | Plasma chemical vapor deposition equipment |
US8031896B2 (en) | 2003-07-21 | 2011-10-04 | Bose Corporation | Passive acoustic radiating |
US8594358B2 (en) | 2003-07-21 | 2013-11-26 | Bose Corporation | Passive acoustical radiating |
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