JPS646748A - Analysis of sulfur in semiconductor material - Google Patents
Analysis of sulfur in semiconductor materialInfo
- Publication number
- JPS646748A JPS646748A JP16091287A JP16091287A JPS646748A JP S646748 A JPS646748 A JP S646748A JP 16091287 A JP16091287 A JP 16091287A JP 16091287 A JP16091287 A JP 16091287A JP S646748 A JPS646748 A JP S646748A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- added
- hydrogen sulfide
- heating
- emission
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title abstract 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 229910052717 sulfur Inorganic materials 0.000 title 1
- 239000011593 sulfur Substances 0.000 title 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 abstract 3
- 238000010438 heat treatment Methods 0.000 abstract 3
- 229910000037 hydrogen sulfide Inorganic materials 0.000 abstract 3
- 229910052751 metal Inorganic materials 0.000 abstract 3
- 239000002184 metal Substances 0.000 abstract 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 abstract 2
- 239000003638 chemical reducing agent Substances 0.000 abstract 2
- 239000011261 inert gas Substances 0.000 abstract 2
- 238000002844 melting Methods 0.000 abstract 2
- 239000007800 oxidant agent Substances 0.000 abstract 2
- 239000007864 aqueous solution Substances 0.000 abstract 1
- 229910052786 argon Inorganic materials 0.000 abstract 1
- 238000007796 conventional method Methods 0.000 abstract 1
- 230000005284 excitation Effects 0.000 abstract 1
- 230000008018 melting Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 230000001590 oxidative effect Effects 0.000 abstract 1
- 235000011007 phosphoric acid Nutrition 0.000 abstract 1
- KMUONIBRACKNSN-UHFFFAOYSA-N potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 abstract 1
- 238000004445 quantitative analysis Methods 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
- 238000005507 spraying Methods 0.000 abstract 1
Landscapes
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
Abstract
PURPOSE:To achieve a quantitative analysis of a trace of S in a short time, by a method wherein a sample to be analyzed is taken onto a high-melting point metal boat and an oxidizing or reducing agent is added thereto to separate S as hydrogen sulfide by heating and S is introduced into an argon plasma to determine it from intensity of excitation emission. CONSTITUTION:A sample to be analyzed is taken onto a boat made of a high melting point metal such as W and Mo, an oxidizing agent such as orthophosphoric acid and potassium bichromate is added thereto and the sample is melted by heating upto 200-400 deg.C. Then, a reducing agent such as metal Sn is added to the sample to separate S in the sample as hydrogen sulfide by heating upto 200-400 deg.C. The hydrogen sulfide is introduced into an ICP emission analyzer with an inert gas such as Ar as carrier and emission in observed at any wavelength of 180.7, 182.0 or 182.6nm with a spectroscope purged with the inert gas such as Ar to analyze S in material. This eliminates spraying of an aqueous solution required as in the conventional method, thereby enabling expectation of a rise in sensitivity with a high plasma temperature.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16091287A JPS646748A (en) | 1987-06-30 | 1987-06-30 | Analysis of sulfur in semiconductor material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16091287A JPS646748A (en) | 1987-06-30 | 1987-06-30 | Analysis of sulfur in semiconductor material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS646748A true JPS646748A (en) | 1989-01-11 |
Family
ID=15725006
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16091287A Pending JPS646748A (en) | 1987-06-30 | 1987-06-30 | Analysis of sulfur in semiconductor material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS646748A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1181547A4 (en) * | 1999-03-22 | 2007-10-03 | Risatec Pty Ltd | Apparatus for analysing reduced inorganic sulfur |
| WO2013105947A1 (en) * | 2012-01-11 | 2013-07-18 | E. I. Du Pont De Nemours And Company | Method for determining sulfur content in fibers |
-
1987
- 1987-06-30 JP JP16091287A patent/JPS646748A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1181547A4 (en) * | 1999-03-22 | 2007-10-03 | Risatec Pty Ltd | Apparatus for analysing reduced inorganic sulfur |
| WO2013105947A1 (en) * | 2012-01-11 | 2013-07-18 | E. I. Du Pont De Nemours And Company | Method for determining sulfur content in fibers |
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