JPS6461914A - Photoelectronic image transfer device - Google Patents
Photoelectronic image transfer deviceInfo
- Publication number
- JPS6461914A JPS6461914A JP62219372A JP21937287A JPS6461914A JP S6461914 A JPS6461914 A JP S6461914A JP 62219372 A JP62219372 A JP 62219372A JP 21937287 A JP21937287 A JP 21937287A JP S6461914 A JPS6461914 A JP S6461914A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- camera
- picture signal
- intensity distribution
- photoelectrons
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To avoid wasteful transfer, and to inhibit the generation of loss by receiving the irradiation of photoelectrons E from a mask so as to contain the whole region of a specified transfer region in a mask and detecting the distribution of photoelectron intensity in the transfer region by a two-dimensional electron-ray detecting means. CONSTITUTION:A two-dimensional electron ray detecting means 10 is composed of a fluorescent screen 11, a TV camera 12 and a lens system 13 optically coupling both the screen 11 and the camera 12. The fluorescent screen 11 is arranged at the position of a wafer 2 at the time of transfer, is irradiated with photoelectrons E from a mask 4 so as to include the whole region of a specified transfer region in the mask 4, and emits fluorescence in intensity distribution corresponding to the intensity distribution of photoelectrons E, and the TV camera 12 converts the intensity distribution into a picture signal. The picture signal of a reference corresponding to the intensity distribution of the reference, which will be changed, is acquired previously only by the shape and arrangement of the pattern of the mask 4, and the picture signal from the TV camera 12 and the picture signal of the reference are compared. Accordingly, the nonuniformity of the distribution of a photoconductive film 4c can be detected by the difference of both picture signals.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62219372A JPS6461914A (en) | 1987-09-02 | 1987-09-02 | Photoelectronic image transfer device |
US07/238,047 US5029222A (en) | 1987-09-02 | 1988-08-30 | Photoelectron image projection apparatus |
EP19880308029 EP0306275A3 (en) | 1987-09-02 | 1988-08-31 | Photoelectron image projection apparatus |
KR8811318A KR910009322B1 (en) | 1987-09-02 | 1988-09-02 | Photoelectron image projection apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62219372A JPS6461914A (en) | 1987-09-02 | 1987-09-02 | Photoelectronic image transfer device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6461914A true JPS6461914A (en) | 1989-03-08 |
Family
ID=16734384
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62219372A Pending JPS6461914A (en) | 1987-09-02 | 1987-09-02 | Photoelectronic image transfer device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6461914A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5068544A (en) * | 1989-07-18 | 1991-11-26 | Sanyo Electric Co., Ltd. | Fsk data waveform shaping circuit |
US5783367A (en) * | 1989-09-20 | 1998-07-21 | Fujitsu Limited | Process for production of semiconductor device and resist developing apparatus used therein |
KR19990080932A (en) * | 1998-04-23 | 1999-11-15 | 신영주 | Oil separator |
US7829863B2 (en) | 2005-05-17 | 2010-11-09 | Kyoto University | Electron beam irradiation device |
-
1987
- 1987-09-02 JP JP62219372A patent/JPS6461914A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5068544A (en) * | 1989-07-18 | 1991-11-26 | Sanyo Electric Co., Ltd. | Fsk data waveform shaping circuit |
US5783367A (en) * | 1989-09-20 | 1998-07-21 | Fujitsu Limited | Process for production of semiconductor device and resist developing apparatus used therein |
KR19990080932A (en) * | 1998-04-23 | 1999-11-15 | 신영주 | Oil separator |
US7829863B2 (en) | 2005-05-17 | 2010-11-09 | Kyoto University | Electron beam irradiation device |
JP4945763B2 (en) * | 2005-05-17 | 2012-06-06 | 国立大学法人京都大学 | Electron beam exposure system |
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