JPS6459928A - Inspection of surface condition - Google Patents
Inspection of surface conditionInfo
- Publication number
- JPS6459928A JPS6459928A JP21878887A JP21878887A JPS6459928A JP S6459928 A JPS6459928 A JP S6459928A JP 21878887 A JP21878887 A JP 21878887A JP 21878887 A JP21878887 A JP 21878887A JP S6459928 A JPS6459928 A JP S6459928A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- angle
- beta1
- light
- beta2
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
PURPOSE:To increase greatly the accuracy of separation of a foreign substance and a circuit pattern, which exist on a substrate, to reduce troubles due to the sensitivity difference, a change in the sensitivity and so on of a light-receiving part and to contrive the cutdown of cost by a method wherein the substrate and an optical system are tilted relatively by a constant angle and are inspected twice. CONSTITUTION:A substrate 5 is returned by an angle of beta1 in a counterclockwise rotation to the incident direction 01 and 02 of a laser beam and moreover, is rotated by an angle of beta2 in a counterclockwise rotation similarly. In short, the substrate is rotated by an angle of (beta1+beta2) in a counterclockwise rotation and is inspected two times. Whereupon, diffracted light from a patterns 10, which makes an angle of beta1 to the longitudinal and lateral directions of the substrate 5, is not received because the light goes emitting to a direction that makes an angle of (beta1+beta2) to the light-receiving direction 01 and 02. Moreover, if a scanning direction is changed (The longitudinal and literal directions of the substrate are not included.) and an inspection is conducted twice, the diffracted light is not received if a thing detected in the first inspection is the pattern and if the thing is a foreign substance, the diffracted light is received by reason of its isotropic scattering property. Thereby, a definite decision of whether the thing is the pattern or the foreign substance can be performed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21878887A JPH0682729B2 (en) | 1987-08-31 | 1987-08-31 | Surface condition inspection method and surface condition inspection device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21878887A JPH0682729B2 (en) | 1987-08-31 | 1987-08-31 | Surface condition inspection method and surface condition inspection device |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7300680A Division JPH08226900A (en) | 1995-10-25 | 1995-10-25 | Inspecting method of state of surface |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6459928A true JPS6459928A (en) | 1989-03-07 |
JPH0682729B2 JPH0682729B2 (en) | 1994-10-19 |
Family
ID=16725384
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21878887A Expired - Lifetime JPH0682729B2 (en) | 1987-08-31 | 1987-08-31 | Surface condition inspection method and surface condition inspection device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0682729B2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08180766A (en) * | 1994-12-24 | 1996-07-12 | Zexel Corp | Switch apparatus |
US10156664B2 (en) | 2016-02-12 | 2018-12-18 | Lasertec Corporation | Mask inspection apparatus and mask inspection method |
JP6053084B1 (en) * | 2016-02-12 | 2016-12-27 | レーザーテック株式会社 | Mask inspection apparatus and mask inspection method |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61104243A (en) * | 1984-10-29 | 1986-05-22 | Hitachi Ltd | Method and apparatus for detecting foreign matter |
-
1987
- 1987-08-31 JP JP21878887A patent/JPH0682729B2/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61104243A (en) * | 1984-10-29 | 1986-05-22 | Hitachi Ltd | Method and apparatus for detecting foreign matter |
Also Published As
Publication number | Publication date |
---|---|
JPH0682729B2 (en) | 1994-10-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |