JPS6456796A - Azeotropic solvent composition - Google Patents

Azeotropic solvent composition

Info

Publication number
JPS6456796A
JPS6456796A JP21369287A JP21369287A JPS6456796A JP S6456796 A JPS6456796 A JP S6456796A JP 21369287 A JP21369287 A JP 21369287A JP 21369287 A JP21369287 A JP 21369287A JP S6456796 A JPS6456796 A JP S6456796A
Authority
JP
Japan
Prior art keywords
solvent composition
difluoroethane
cyclopentane
dichloro
azeotropic solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21369287A
Other languages
Japanese (ja)
Inventor
Koji Tamura
Yukio Omure
Satoru Ide
Naomi Hanatani
Hisamasa Fukuzawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daikin Industries Ltd
Original Assignee
Daikin Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daikin Industries Ltd filed Critical Daikin Industries Ltd
Priority to JP21369287A priority Critical patent/JPS6456796A/en
Publication of JPS6456796A publication Critical patent/JPS6456796A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/028—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons
    • C23G5/02809—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons containing chlorine and fluorine
    • C23G5/02825—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons containing chlorine and fluorine containing hydrogen
    • C23G5/02829—Ethanes
    • C23G5/02835—C2H2Cl2F2
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/26—Cleaning or polishing of the conductive pattern

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Detergent Compositions (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PURPOSE:To obtain the titled composition, capable of moderately regulating solvency and facilitating liquid control in use and handling in reuse without breaking the ozonoshere, by blending 1,2-dichloro-1,1-difluoroethane with cyclopentane at a specific ratio. CONSTITUTION:The aimed composition consisting of (A) 72.5wt.% 1,2- dichloro-1,1-difluoroethane and (B) 27.5wt.% cyclopentane. Furthermore, (C) 0.1-10wt.% nitrated compounds of fatty acids, acetylene alcohol compounds, epoxides, etc., are also preferably blended as a stabilizer.
JP21369287A 1987-08-27 1987-08-27 Azeotropic solvent composition Pending JPS6456796A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21369287A JPS6456796A (en) 1987-08-27 1987-08-27 Azeotropic solvent composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21369287A JPS6456796A (en) 1987-08-27 1987-08-27 Azeotropic solvent composition

Publications (1)

Publication Number Publication Date
JPS6456796A true JPS6456796A (en) 1989-03-03

Family

ID=16643406

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21369287A Pending JPS6456796A (en) 1987-08-27 1987-08-27 Azeotropic solvent composition

Country Status (1)

Country Link
JP (1) JPS6456796A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6473348A (en) * 1987-09-16 1989-03-17 Tokyo Ohka Kogyo Co Ltd Stripping solution for resist
WO1991009157A1 (en) * 1989-12-14 1991-06-27 Allied-Signal Inc. Azeotrope-like compositions of dichlorotrifluoroethane, cyclopentane and optionally nitromethane
JPH06132396A (en) * 1992-10-19 1994-05-13 Rohm Co Ltd Dicing method
JPH06132397A (en) * 1992-10-19 1994-05-13 Rohm Co Ltd Dicing method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6473348A (en) * 1987-09-16 1989-03-17 Tokyo Ohka Kogyo Co Ltd Stripping solution for resist
WO1991009157A1 (en) * 1989-12-14 1991-06-27 Allied-Signal Inc. Azeotrope-like compositions of dichlorotrifluoroethane, cyclopentane and optionally nitromethane
JPH06132396A (en) * 1992-10-19 1994-05-13 Rohm Co Ltd Dicing method
JPH06132397A (en) * 1992-10-19 1994-05-13 Rohm Co Ltd Dicing method

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