JPS6456643A - Addition reaction type compound, production and related substance thereof - Google Patents

Addition reaction type compound, production and related substance thereof

Info

Publication number
JPS6456643A
JPS6456643A JP21269187A JP21269187A JPS6456643A JP S6456643 A JPS6456643 A JP S6456643A JP 21269187 A JP21269187 A JP 21269187A JP 21269187 A JP21269187 A JP 21269187A JP S6456643 A JPS6456643 A JP S6456643A
Authority
JP
Japan
Prior art keywords
formula
compound
cidenticaln
compound shown
give
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21269187A
Other languages
Japanese (ja)
Other versions
JPH0796519B2 (en
Inventor
Akio Nishikawa
Toru Koyama
Hideki Asano
Toshikazu Narahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62212691A priority Critical patent/JPH0796519B2/en
Publication of JPS6456643A publication Critical patent/JPS6456643A/en
Publication of JPH0796519B2 publication Critical patent/JPH0796519B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides

Abstract

NEW MATERIAL:A bis-(benzoylethenyl)-benzene compound shown by formula I [X1 and X2 are -NH2, -NH-CidenticalN, OH, -C-CidenticalN, -CidenticalN, -CidenticalCH or group shown by formula II (D is group containing ethylenic unsaturated double bond); with the proviso that X1=X2not equal to -NH2]. EXAMPLE:A compound shown by formula III. USE:A compound for a resin composition. An intermediate useful for a photosensitive material and/or heat-resistant material, suitable as laminating material, molding material, coating compound and adhesive, readily crosslinked and cured by heat energy and/or light energy to give a cured polymer having excellent heat resistance and adhesiveness. PREPARATION:An acetophenone compound shown by formula V and/or formula VI is reacted with a phthalaldehyde compound such as terephthalaldehyde shown by formula IV in acetic acid solvent in the presence of a dehydrating catalyst of orthophosphoric acid to give a compound shown by formula I.
JP62212691A 1987-08-28 1987-08-28 Addition reaction type compound, its manufacturing method and related substances Expired - Lifetime JPH0796519B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62212691A JPH0796519B2 (en) 1987-08-28 1987-08-28 Addition reaction type compound, its manufacturing method and related substances

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62212691A JPH0796519B2 (en) 1987-08-28 1987-08-28 Addition reaction type compound, its manufacturing method and related substances

Publications (2)

Publication Number Publication Date
JPS6456643A true JPS6456643A (en) 1989-03-03
JPH0796519B2 JPH0796519B2 (en) 1995-10-18

Family

ID=16626829

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62212691A Expired - Lifetime JPH0796519B2 (en) 1987-08-28 1987-08-28 Addition reaction type compound, its manufacturing method and related substances

Country Status (1)

Country Link
JP (1) JPH0796519B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009191218A (en) * 2008-02-18 2009-08-27 Sumitomo Bakelite Co Ltd Circuit board resin composition, prepreg and laminate
CN106316970A (en) * 2016-08-11 2017-01-11 重庆大学 Bis-benzotriazole containing organic dyestuff with super thermal stability

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5928897A (en) * 1982-08-09 1984-02-15 Hitachi Ltd Drive device for pulse motor

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5928897A (en) * 1982-08-09 1984-02-15 Hitachi Ltd Drive device for pulse motor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009191218A (en) * 2008-02-18 2009-08-27 Sumitomo Bakelite Co Ltd Circuit board resin composition, prepreg and laminate
CN106316970A (en) * 2016-08-11 2017-01-11 重庆大学 Bis-benzotriazole containing organic dyestuff with super thermal stability

Also Published As

Publication number Publication date
JPH0796519B2 (en) 1995-10-18

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