JPS6455815A - Sputtering apparatus for manufacturing thin magnetic film - Google Patents

Abstract

PURPOSE:To efficiently form a magnetic film having uniform magnetic properties by so disposing a first permanent magnet that the same poles face at the position for surrounding between a target and a substrate, and so disposing a second permanent magnet that a reverse pole to the pole faces the target around the center of the target on the rear face of the target. CONSTITUTION:After a substrate 10 is heated, discharging Ar gas is introduced from a gate introduction system into a vacuum vessel, and the vessel is held in vacuum of approx. 10<-5>Torr. Then, a negative high potential is applied to a target 7 of a ferromagnetic metal material to ionize the Ar gas to Ar<+>. In this case, lines 21 of magnetic force from first permanent magnets 19a, 19b, 19c, 19d substantially uniformly pass through the whole target 7 to a second permanent magnet 20. Thus, since second electrons for ionizing the Ar gas are substantially uniformly enclosed in the whole area on the target 7, the Ar<+> collides uniformly with the target 7 in high density to discharge atoms 22. The discharged atoms 22 collide substantially perpendicularly with the substrate 10 to form a magnetic film 23 having a columnar structure 26 perpendicular to the surface of the substrate 10..