JPS645439U - - Google Patents
Info
- Publication number
- JPS645439U JPS645439U JP9977387U JP9977387U JPS645439U JP S645439 U JPS645439 U JP S645439U JP 9977387 U JP9977387 U JP 9977387U JP 9977387 U JP9977387 U JP 9977387U JP S645439 U JPS645439 U JP S645439U
- Authority
- JP
- Japan
- Prior art keywords
- stage
- semiconductor wafer
- cleaning
- nozzle
- cutout
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004140 cleaning Methods 0.000 claims description 8
- 239000004065 semiconductor Substances 0.000 claims 4
- 239000007921 spray Substances 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 1
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Description
第１図は本考案装置における洗浄部を示す正面
図、第２図はウエハーを該洗浄部へ搬入ならびに
搬出するための移送器の斜視図、第３図イ〜ハは
本装置によるウエハー洗浄の作用説明図、第４〜
５図は従来のウエハー洗浄法の説明図である。
符号説明、１……洗浄用筐体、２……シリンダ
、３……下部ステージ、４……吸引管、５……下
側ノズル、６……上部ステージ、７……吸引管、
８……上側ノズル、９……搬入器、１０……搬出
器、１１……ガイドレール、１２……ベース部、
１３……アーム、１４……吸着パツド、１５……
シリンダ、１６……ベース部、１７……アーム、
１８……吸着パツド、１９，２０……シリンダ、
２１……ウエハー、２２……取出容器、２３……
シリンダ、２４，２５……コンベア、２６……収
納容器、２７……シリンダ、２８……ブラシ、２
９……ノズル。
Fig. 1 is a front view showing the cleaning section of the apparatus of the present invention, Fig. 2 is a perspective view of a transfer device for carrying wafers into and out of the cleaning section, and Figs. Action explanatory diagram, 4th ~
FIG. 5 is an explanatory diagram of a conventional wafer cleaning method. Description of symbols, 1...Cleaning casing, 2...Cylinder, 3...Lower stage, 4...Suction tube, 5...Lower nozzle, 6...Upper stage, 7...Suction tube,
8... Upper nozzle, 9... Carrying device, 10... Carrying device, 11... Guide rail, 12... Base part,
13... Arm, 14... Adsorption pad, 15...
Cylinder, 16...Base part, 17...Arm,
18...Adsorption pad, 19,20...Cylinder,
21... Wafer, 22... Removal container, 23...
Cylinder, 24, 25... Conveyor, 26... Storage container, 27... Cylinder, 28... Brush, 2
9...Nozzle.
Claims (1)
部ステージと、該下部ステージの上方に配置され
下面が中央部の欠除された負圧吸着面である上部
ステージとを備え、下部ステージの上記欠除部内
側には上方に向けて洗浄水を噴射する下側ノズル
が、また上部ステージの上記欠除部内側には下方
に向けて洗浄水を噴射する上側ノズルがそれぞれ
設けられ、上部ステージと下部ステージとはいず
れか一方のステージが上下動可能に支持されて互
いに接近可能に構成され、更に洗浄前の半導体ウ
エハーを外部から上記下部ステージ上面へ搬入す
る搬入器と洗浄後の半導体ウエハーを上部ステー
ジの下面から外部へ搬出する搬出器とを備えてな
ることを特徴とする半導体ウエハーの洗浄装置。 a lower stage whose upper surface is a negative pressure suction surface with a central portion removed; and an upper stage disposed above the lower stage and whose lower surface is a negative pressure suction surface with a central portion removed; A lower nozzle that sprays cleaning water upward is provided inside the cutout of the upper stage, and an upper nozzle that sprays washwater downward is provided inside the cutout of the upper stage. The stage and the lower stage are configured such that one of the stages is supported so as to be movable up and down so that they can approach each other, and furthermore, there is a loading device for loading the semiconductor wafer before cleaning from the outside onto the upper surface of the lower stage, and the semiconductor wafer after cleaning. 1. A semiconductor wafer cleaning apparatus, comprising: a carrier for carrying out the semiconductor wafer from the lower surface of the upper stage to the outside.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987099773U JPH069493Y2 (en) | 1987-06-29 | 1987-06-29 | Semiconductor wafer cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987099773U JPH069493Y2 (en) | 1987-06-29 | 1987-06-29 | Semiconductor wafer cleaning device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS645439U true JPS645439U (en) | 1989-01-12 |
| JPH069493Y2 JPH069493Y2 (en) | 1994-03-09 |
Family
ID=31327241
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987099773U Expired - Lifetime JPH069493Y2 (en) | 1987-06-29 | 1987-06-29 | Semiconductor wafer cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH069493Y2 (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6126226A (en) * | 1984-07-16 | 1986-02-05 | Shioya Seisakusho:Kk | Scribing device |
-
1987
- 1987-06-29 JP JP1987099773U patent/JPH069493Y2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6126226A (en) * | 1984-07-16 | 1986-02-05 | Shioya Seisakusho:Kk | Scribing device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH069493Y2 (en) | 1994-03-09 |
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