JPS6453502A - Resistor - Google Patents
ResistorInfo
- Publication number
- JPS6453502A JPS6453502A JP62211811A JP21181187A JPS6453502A JP S6453502 A JPS6453502 A JP S6453502A JP 62211811 A JP62211811 A JP 62211811A JP 21181187 A JP21181187 A JP 21181187A JP S6453502 A JPS6453502 A JP S6453502A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- resin
- resistive film
- low
- external
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Non-Adjustable Resistors (AREA)
- Details Of Resistors (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Abstract
PURPOSE:To manufacture a resistor by using a low-cost material and by a low- temperature operation by a method wherein a columnar or cylindrical substrate composed of a resin is provided, a resistive film is formed on an external circumference of this substrate by a non-electrolytic plating operation and terminals are installed on both ends of the substrate in its axial direction. CONSTITUTION:A substrate 1 composed of a resin is provided; the resin such as a phenol resin, an ABS resin, a polycarbonate resin, a polyvinyl chloride resin, a polyethylene resin or the like is used. An external cross section of this substrate 1 is shaped to be circular such as columnar, cylindrical or the like. A resistive film 2 is formed on the whole surface of the substrate 1; it is composed mainly of, e.g., Ni-P; it is formed by a non-electrolytic plating operation. Metal caps 3, 3 acting as external terminals are put on both ends of the substrate 1; after the caps have been pressure- bonded to the resistive film on the surface at the ends of the substrate 1, they are connected to the resistive film 2. An insulating film 4 is formed on an external circumference of the resistive film 2 exposed between both metal caps 3, 3. Because a bath plating to form the resistive film 2 can be executed in a low-temperature range of about 30-95 deg.C, it does not produce any adverse effect on the substrate 1 composed of the resin.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62211811A JPS6453502A (en) | 1987-08-25 | 1987-08-25 | Resistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62211811A JPS6453502A (en) | 1987-08-25 | 1987-08-25 | Resistor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6453502A true JPS6453502A (en) | 1989-03-01 |
Family
ID=16611985
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62211811A Pending JPS6453502A (en) | 1987-08-25 | 1987-08-25 | Resistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6453502A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6401869B1 (en) | 1998-10-08 | 2002-06-11 | Kanzaki Kokyukoki Mfg. Co., Ltd. | Axle driving apparatus |
-
1987
- 1987-08-25 JP JP62211811A patent/JPS6453502A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6401869B1 (en) | 1998-10-08 | 2002-06-11 | Kanzaki Kokyukoki Mfg. Co., Ltd. | Axle driving apparatus |
US6622825B2 (en) * | 1998-10-08 | 2003-09-23 | Kanzaki Kokyukoki Mfg. Co., Ltd. | Axle driving apparatus |
US7011182B2 (en) | 1998-10-08 | 2006-03-14 | Masaru Iida | Axle driving apparatus |
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