JPS645016A - Scanning type projection aligner - Google Patents

Scanning type projection aligner

Info

Publication number
JPS645016A
JPS645016A JP62160013A JP16001387A JPS645016A JP S645016 A JPS645016 A JP S645016A JP 62160013 A JP62160013 A JP 62160013A JP 16001387 A JP16001387 A JP 16001387A JP S645016 A JPS645016 A JP S645016A
Authority
JP
Japan
Prior art keywords
mask
optical system
projection optical
substrate
spot
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62160013A
Other languages
Japanese (ja)
Inventor
Masaki Suzuki
Toshiyuki Watanabe
Hiroyuki Nagano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP62160013A priority Critical patent/JPS645016A/en
Priority to KR1019880006108A priority patent/KR920002820B1/en
Priority to US07/199,078 priority patent/US4844568A/en
Priority to EP88108440A priority patent/EP0292976A3/en
Publication of JPS645016A publication Critical patent/JPS645016A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G03F7/70366—Rotary scanning

Abstract

PURPOSE:To make it possible to constitute a projection optical system of small optical parts, by making a 1:1 erect projection optical system perform a scanning movement by a first scanning means, and making a mask and a substrate perform a scanning movement without changing the relative position by a second scanning means. CONSTITUTION:Light radiated from a mercury lamp 7 is reflected by an ellipsoidal reflecting mirror 8, converged to enter the incidence end 10 of an optical fiber 9, branched to output from four emission ends 12, and forms an illumination spot on the lower surface of a mask 25, after passing through a spot illumination optical system 15. The light containing information of mask pattern enters a 1:1 erect projection optical system 21, and focuses, on the upper surface of a substrate 26, an partial pattern image of the mask 25 subjected to the spot illumination. An optical fiber 9, a spot illumination optical system 14 and a 1:1 erect projection optical system 21 are rotated en bloc in the direction of arrow B by a motor 32. As the mask 25 is linearlly scanned in the direction of C, the whole pattern of the mask 25 is densely exposed on the substrate 26.
JP62160013A 1987-05-27 1987-06-26 Scanning type projection aligner Pending JPS645016A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP62160013A JPS645016A (en) 1987-06-26 1987-06-26 Scanning type projection aligner
KR1019880006108A KR920002820B1 (en) 1987-05-27 1988-05-25 Scanning type projection exposure system
US07/199,078 US4844568A (en) 1987-05-27 1988-05-26 Scanning type projection exposure system
EP88108440A EP0292976A3 (en) 1987-05-27 1988-05-26 Scanning type projection exposure system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62160013A JPS645016A (en) 1987-06-26 1987-06-26 Scanning type projection aligner

Publications (1)

Publication Number Publication Date
JPS645016A true JPS645016A (en) 1989-01-10

Family

ID=15706089

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62160013A Pending JPS645016A (en) 1987-05-27 1987-06-26 Scanning type projection aligner

Country Status (1)

Country Link
JP (1) JPS645016A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006183938A (en) * 2004-12-27 2006-07-13 Nippon Steel Corp Blowing air-conditioner using thermoelement
JP2013520787A (en) * 2010-02-23 2013-06-06 エーエスエムエル ネザーランズ ビー．ブイ． Lithographic apparatus and device manufacturing method
KR20140144225A (en) * 2012-04-11 2014-12-18 에이에스엠엘 네델란즈 비.브이. Rotatable frame for a lithographic apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5940532A (en) * 1982-08-30 1984-03-06 Hitachi Ltd Projecting exposure and device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5940532A (en) * 1982-08-30 1984-03-06 Hitachi Ltd Projecting exposure and device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006183938A (en) * 2004-12-27 2006-07-13 Nippon Steel Corp Blowing air-conditioner using thermoelement
JP2013520787A (en) * 2010-02-23 2013-06-06 エーエスエムエル ネザーランズ ビー．ブイ． Lithographic apparatus and device manufacturing method
US9235140B2 (en) 2010-02-23 2016-01-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR20140144225A (en) * 2012-04-11 2014-12-18 에이에스엠엘 네델란즈 비.브이. Rotatable frame for a lithographic apparatus
JP2015516681A (en) * 2012-04-11 2015-06-11 エーエスエムエル ネザーランズ ビー．ブイ． Rotating frame for lithographic apparatus

Similar Documents

Publication Publication Date Title
JP2655465B2 (en) Reflection type homogenizer and reflection type illumination optical device
JP3428055B2 (en) Illumination optical device, exposure apparatus, semiconductor manufacturing method and exposure method
JP3409855B2 (en) Arbitrary width lens array with contrast field of view spanning substrate width
JPS6142644A (en) Image forming apparatus
JPS645016A (en) Scanning type projection aligner
DE3880238D1 (en) TRANSPARENT WRITING PROJECTOR.
JPS6226059B2 (en)
JPH06138403A (en) Picture device
JPS63114186A (en) Lighting apparatus
KR19980064410A (en) Exposure apparatus and manufacturing method of semiconductor device using the exposure apparatus
JP3415571B2 (en) Scanning exposure apparatus, exposure method, and semiconductor manufacturing method
JPH0769576B2 (en) Lighting optics
GB2170925A (en) Optical scanning system using electro-mechanical light modulator
JPS6413113A (en) Scanning optical device
JPS6046430B2 (en) copying device
JPS61186064A (en) Original reader
JPH0349213A (en) Exposure device
JP2584393Y2 (en) Optical system reading unit structure
JP2606797B2 (en) Illumination device and illumination method using the same
JPS587665A (en) Optical device for copying machine
JPH0567557A (en) Arc-shaped dark-field illumination apparatus
JPH09102456A (en) Illuminating optical device
JPH0513312B2 (en)
JPS552253A (en) Exposure method of photoreceptor and apparatus thereof
JPS61188517A (en) Illuminating optical system