JPS6441825A - Temperature measuring system - Google Patents

Temperature measuring system

Info

Publication number
JPS6441825A
JPS6441825A JP19808087A JP19808087A JPS6441825A JP S6441825 A JPS6441825 A JP S6441825A JP 19808087 A JP19808087 A JP 19808087A JP 19808087 A JP19808087 A JP 19808087A JP S6441825 A JPS6441825 A JP S6441825A
Authority
JP
Japan
Prior art keywords
thermocouple
coil
measurement
zero
temperature measuring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19808087A
Other languages
Japanese (ja)
Inventor
Keijiro Shindo
Kenjiro Tamura
Kazunori Tsujimoto
Shinichi Taji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP19808087A priority Critical patent/JPS6441825A/en
Priority to US07/192,178 priority patent/US4956043A/en
Publication of JPS6441825A publication Critical patent/JPS6441825A/en
Pending legal-status Critical Current

Links

Landscapes

  • Measuring Temperature Or Quantity Of Heat (AREA)

Abstract

PURPOSE:To achieve an accurate temperature measurement with the removal of a high frequency component, by using a signal conductor itself for a coil composing a low pass filter in the measurement of temperature comprising a thermocouple, the low pass filter and a zero-point compensator. CONSTITUTION:A chromel wire of a thermocouple 5 for measurement composes a coil 1 and a coil 2 of a low pass filter and leads to a thermocouple 4 within a zero-point compensator 8 via a temperature measuring device 7. An alumel wire of the thermocouple 5 for measurement composes the coil 1 and a coil 3 and leads to a thermocouple within the zero-point compensator 8. This eliminates abnormal metal joint in a temperature measuring path thus obtained to generate no thermoelectromotive force, thereby enabling accurate temperature measurement with the removal of a high frequency component.
JP19808087A 1987-05-25 1987-08-10 Temperature measuring system Pending JPS6441825A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP19808087A JPS6441825A (en) 1987-08-10 1987-08-10 Temperature measuring system
US07/192,178 US4956043A (en) 1987-05-25 1988-05-10 Dry etching apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19808087A JPS6441825A (en) 1987-08-10 1987-08-10 Temperature measuring system

Publications (1)

Publication Number Publication Date
JPS6441825A true JPS6441825A (en) 1989-02-14

Family

ID=16385182

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19808087A Pending JPS6441825A (en) 1987-05-25 1987-08-10 Temperature measuring system

Country Status (1)

Country Link
JP (1) JPS6441825A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0467391A2 (en) * 1990-07-20 1992-01-22 Tokyo Electron Limited Plasma apparatus, and method and system for extracting electrical signal of member to which high-frequency-wave is applied
JP2000068253A (en) * 1998-08-21 2000-03-03 Toyo Commun Equip Co Ltd Dry etching container
CN109843821A (en) * 2016-11-16 2019-06-04 日本电气硝子株式会社 The manufacturing method of glass substrate

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0467391A2 (en) * 1990-07-20 1992-01-22 Tokyo Electron Limited Plasma apparatus, and method and system for extracting electrical signal of member to which high-frequency-wave is applied
EP0467391A3 (en) * 1990-07-20 1992-03-18 Tokyo Electron Limited Plasma apparatus, and method and system for extracting electrical signal of member to which high-frequency-wave is applied
JP2000068253A (en) * 1998-08-21 2000-03-03 Toyo Commun Equip Co Ltd Dry etching container
CN109843821A (en) * 2016-11-16 2019-06-04 日本电气硝子株式会社 The manufacturing method of glass substrate

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