JPS6436031U - - Google Patents
Info
- Publication number
- JPS6436031U JPS6436031U JP13075987U JP13075987U JPS6436031U JP S6436031 U JPS6436031 U JP S6436031U JP 13075987 U JP13075987 U JP 13075987U JP 13075987 U JP13075987 U JP 13075987U JP S6436031 U JPS6436031 U JP S6436031U
- Authority
- JP
- Japan
- Prior art keywords
- tank
- upper edge
- discharge means
- tank wall
- processing liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 claims description 8
- 238000007599 discharging Methods 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 238000005192 partition Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
Landscapes
- Weting (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Description
第1図から第3図までが本考案に関し、第1図
は本考案によるオーバフロー形処理槽の一実施例
を示す正面図および側面図、第2図および第3図
はそれぞれ本考案の異なる実施例を要部について
示す処理槽の側面図である。第4図は従来技術に
よるオーバフロー形処理槽の正面図および上面図
である。図において、
10:オーバフロー形処理槽、11:底板、1
2:処理槽の槽壁、13:隔壁、14:導入室、
15:処理室、16:上周縁の導入管、20:槽
壁の上縁、21:排出手段としての凹凸、22:
排出手段としてのスリツト、23:排出手段とし
ての孔、EX:排出手段を介する処理用液体の排
出、L:処理用液体、OF,OF1,OF2:上
周縁のオーバフロー、UP:処理室内の上昇液流
、である。
Figures 1 to 3 relate to the present invention; Figure 1 is a front view and side view showing an embodiment of an overflow treatment tank according to the present invention; Figures 2 and 3 are respectively different embodiments of the present invention; FIG. 3 is a side view of a processing tank showing an example of main parts. FIG. 4 is a front view and a top view of an overflow type processing tank according to the prior art. In the figure, 10: overflow type processing tank, 11: bottom plate, 1
2: Tank wall of the treatment tank, 13: Partition wall, 14: Introduction chamber,
15: Processing chamber, 16: Inlet pipe on upper periphery, 20: Upper edge of tank wall, 21: Irregularities as discharge means, 22:
Slit as discharge means, 23: Hole as discharge means, EX: Discharge of processing liquid via discharge means, L: Processing liquid, OF, OF1, OF2: Overflow at upper periphery, UP: Rising liquid in processing chamber It's flowing.
Claims (1)
上部開口から装入される処理対象に所定の処理を
するための液体を槽の底部から導入し、槽壁の上
縁からオーバフローさせながら槽内の処理用液体
を連続的に入れ換えるようにした処理槽であつて
、処理用液体を槽内から排出する手段を槽壁の上
縁よりは下側に位置しかつ槽壁の上周縁部にほぼ
均一に分布するように多数個設け、槽内の処理用
液体を排出手段が持つ排出能力の少なくとも大部
分を用いて槽外に排出しながら処理用液体を入れ
換えるようにしたことを特徴とするオーバフロー
形処理槽。 (2) 実用新案登録請求の範囲第1項に記載の処
理槽において、排出手段が槽壁の上縁にそれと連
続して設けられた凹凸であることを特徴とするオ
ーバフロー形処理槽。 (3) 実用新案登録請求の範囲第1項に記載の処
理槽において、排出手段が槽壁の上縁から切られ
たスリツトであることを特徴とするオーバフロー
形処理槽。 (4) 実用新案登録請求の範囲第1項に記載の処
理槽において、排出手段の槽壁の上縁より下側に
明けられた孔であることを特徴とするオーバフロ
ー形処理槽。[Claims for Utility Model Registration] (1) Formed as a box-like body with an open top;
A process in which a liquid is introduced from the bottom of the tank to perform a specified treatment on the object being charged through the top opening, and the processing liquid in the tank is continuously replaced while overflowing from the upper edge of the tank wall. A tank, in which a large number of means for discharging the processing liquid from inside the tank are installed below the upper edge of the tank wall and distributed almost uniformly around the upper edge of the tank wall. An overflow type processing tank characterized in that the processing liquid is replaced while the processing liquid is discharged outside the tank using at least a large part of the discharge capacity of the discharge means. (2) Utility Model Registration The overflow type processing tank according to claim 1, characterized in that the discharge means is a concave and convex portion continuous with the upper edge of the tank wall. (3) An overflow type treatment tank according to claim 1, wherein the discharge means is a slit cut from the upper edge of the tank wall. (4) Utility Model Registration The overflow type treatment tank according to claim 1, characterized in that the hole is formed below the upper edge of the tank wall of the discharge means.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13075987U JPS6436031U (en) | 1987-08-27 | 1987-08-27 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13075987U JPS6436031U (en) | 1987-08-27 | 1987-08-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6436031U true JPS6436031U (en) | 1989-03-06 |
Family
ID=31386212
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13075987U Pending JPS6436031U (en) | 1987-08-27 | 1987-08-27 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6436031U (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100232998B1 (en) * | 1996-06-05 | 1999-12-01 | 윤종용 | Chemical bath unit with controlling means for etch rate |
KR20230133299A (en) | 2021-01-26 | 2023-09-19 | 신에쯔 한도타이 가부시키가이샤 | Single crystal pulling device and single crystal pulling method |
-
1987
- 1987-08-27 JP JP13075987U patent/JPS6436031U/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100232998B1 (en) * | 1996-06-05 | 1999-12-01 | 윤종용 | Chemical bath unit with controlling means for etch rate |
KR20230133299A (en) | 2021-01-26 | 2023-09-19 | 신에쯔 한도타이 가부시키가이샤 | Single crystal pulling device and single crystal pulling method |
DE112021006162T5 (en) | 2021-01-26 | 2023-09-28 | Shin-Etsu Handotai Co., Ltd. | Device for growing a single crystal and method for growing a single crystal |
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