JPS6427154A - Ion irradiation device - Google Patents

Ion irradiation device

Info

Publication number
JPS6427154A
JPS6427154A JP62182794A JP18279487A JPS6427154A JP S6427154 A JPS6427154 A JP S6427154A JP 62182794 A JP62182794 A JP 62182794A JP 18279487 A JP18279487 A JP 18279487A JP S6427154 A JPS6427154 A JP S6427154A
Authority
JP
Japan
Prior art keywords
ion
plasma
acceleration
source
anode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62182794A
Other languages
Japanese (ja)
Other versions
JP2655146B2 (en
Inventor
Tamio Hara
Manabu Hamagaki
Katsunobu Aoyanagi
Susumu Nanba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN Institute of Physical and Chemical Research
Original Assignee
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN Institute of Physical and Chemical Research filed Critical RIKEN Institute of Physical and Chemical Research
Priority to JP62182794A priority Critical patent/JP2655146B2/en
Publication of JPS6427154A publication Critical patent/JPS6427154A/en
Application granted granted Critical
Publication of JP2655146B2 publication Critical patent/JP2655146B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Electrodes Of Semiconductors (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To have acceleration of low-energy, large-current ion beam by short interplasma distance in a great area by producing plasma behind an ion accelerating electrode, and by utilizing electrons therein for neutralization of ion space charge in the acceleration region. CONSTITUTION:By initial discharge source Vd1 a voltage is impressed between cylindrical anode A and cathode K1 functioning as part of a vessel of an ion source plasma generating part 1, to cause electric discharging, and the gas having flowed in from outside is made into plasma to generate ion source plasma. Ions in this ion source plasma are accelerated by the electric field formed by the ion acceleration power source Vacc between the anode A and ion acceleration electrode 2. On the other hand, the electrode 2 is used as anode and between this and another cathode K2, a voltage is impressed by a neutralizing discharge source Vd2 to generate electric discharging, and thereby space charge neutralizing plasma is produced to serve neutralization of the ion beam.
JP62182794A 1987-07-22 1987-07-22 Ion irradiation equipment Expired - Fee Related JP2655146B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62182794A JP2655146B2 (en) 1987-07-22 1987-07-22 Ion irradiation equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62182794A JP2655146B2 (en) 1987-07-22 1987-07-22 Ion irradiation equipment

Publications (2)

Publication Number Publication Date
JPS6427154A true JPS6427154A (en) 1989-01-30
JP2655146B2 JP2655146B2 (en) 1997-09-17

Family

ID=16124535

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62182794A Expired - Fee Related JP2655146B2 (en) 1987-07-22 1987-07-22 Ion irradiation equipment

Country Status (1)

Country Link
JP (1) JP2655146B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0469314A2 (en) * 1990-07-31 1992-02-05 ICT Integrated Circuit Testing Gesellschaft für HalbleiterprÀ¼ftechnik mbH Method and apparatus for neutralizing electric charges built up on a specimen in a vacuum chamber

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59107473U (en) * 1983-01-10 1984-07-19 日本電子株式会社 Ion beam irradiation device
JPS61273840A (en) * 1985-05-28 1986-12-04 Rikagaku Kenkyusho Electron beam exciting ion irradiating apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59107473U (en) * 1983-01-10 1984-07-19 日本電子株式会社 Ion beam irradiation device
JPS61273840A (en) * 1985-05-28 1986-12-04 Rikagaku Kenkyusho Electron beam exciting ion irradiating apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0469314A2 (en) * 1990-07-31 1992-02-05 ICT Integrated Circuit Testing Gesellschaft für HalbleiterprÀ¼ftechnik mbH Method and apparatus for neutralizing electric charges built up on a specimen in a vacuum chamber

Also Published As

Publication number Publication date
JP2655146B2 (en) 1997-09-17

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