JPS6427154A - Ion irradiation device - Google Patents
Ion irradiation deviceInfo
- Publication number
- JPS6427154A JPS6427154A JP62182794A JP18279487A JPS6427154A JP S6427154 A JPS6427154 A JP S6427154A JP 62182794 A JP62182794 A JP 62182794A JP 18279487 A JP18279487 A JP 18279487A JP S6427154 A JPS6427154 A JP S6427154A
- Authority
- JP
- Japan
- Prior art keywords
- ion
- plasma
- acceleration
- source
- anode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000002500 ions Chemical class 0.000 abstract 8
- 230000001133 acceleration Effects 0.000 abstract 4
- 238000007599 discharging Methods 0.000 abstract 2
- 238000010884 ion-beam technique Methods 0.000 abstract 2
- 238000006386 neutralization reaction Methods 0.000 abstract 2
- 230000003472 neutralizing effect Effects 0.000 abstract 2
- 230000005684 electric field Effects 0.000 abstract 1
Landscapes
- Electrodes Of Semiconductors (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE:To have acceleration of low-energy, large-current ion beam by short interplasma distance in a great area by producing plasma behind an ion accelerating electrode, and by utilizing electrons therein for neutralization of ion space charge in the acceleration region. CONSTITUTION:By initial discharge source Vd1 a voltage is impressed between cylindrical anode A and cathode K1 functioning as part of a vessel of an ion source plasma generating part 1, to cause electric discharging, and the gas having flowed in from outside is made into plasma to generate ion source plasma. Ions in this ion source plasma are accelerated by the electric field formed by the ion acceleration power source Vacc between the anode A and ion acceleration electrode 2. On the other hand, the electrode 2 is used as anode and between this and another cathode K2, a voltage is impressed by a neutralizing discharge source Vd2 to generate electric discharging, and thereby space charge neutralizing plasma is produced to serve neutralization of the ion beam.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62182794A JP2655146B2 (en) | 1987-07-22 | 1987-07-22 | Ion irradiation equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62182794A JP2655146B2 (en) | 1987-07-22 | 1987-07-22 | Ion irradiation equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6427154A true JPS6427154A (en) | 1989-01-30 |
JP2655146B2 JP2655146B2 (en) | 1997-09-17 |
Family
ID=16124535
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62182794A Expired - Fee Related JP2655146B2 (en) | 1987-07-22 | 1987-07-22 | Ion irradiation equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2655146B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0469314A2 (en) * | 1990-07-31 | 1992-02-05 | ICT Integrated Circuit Testing Gesellschaft für HalbleiterprÀ¼ftechnik mbH | Method and apparatus for neutralizing electric charges built up on a specimen in a vacuum chamber |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59107473U (en) * | 1983-01-10 | 1984-07-19 | 日本電子株式会社 | Ion beam irradiation device |
JPS61273840A (en) * | 1985-05-28 | 1986-12-04 | Rikagaku Kenkyusho | Electron beam exciting ion irradiating apparatus |
-
1987
- 1987-07-22 JP JP62182794A patent/JP2655146B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59107473U (en) * | 1983-01-10 | 1984-07-19 | 日本電子株式会社 | Ion beam irradiation device |
JPS61273840A (en) * | 1985-05-28 | 1986-12-04 | Rikagaku Kenkyusho | Electron beam exciting ion irradiating apparatus |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0469314A2 (en) * | 1990-07-31 | 1992-02-05 | ICT Integrated Circuit Testing Gesellschaft für HalbleiterprÀ¼ftechnik mbH | Method and apparatus for neutralizing electric charges built up on a specimen in a vacuum chamber |
Also Published As
Publication number | Publication date |
---|---|
JP2655146B2 (en) | 1997-09-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |