JPS64270A - Microwave plasma cvd device - Google Patents
Microwave plasma cvd deviceInfo
- Publication number
- JPS64270A JPS64270A JP62153502A JP15350287A JPS64270A JP S64270 A JPS64270 A JP S64270A JP 62153502 A JP62153502 A JP 62153502A JP 15350287 A JP15350287 A JP 15350287A JP S64270 A JPS64270 A JP S64270A
- Authority
- JP
- Japan
- Prior art keywords
- carrier
- vessel
- magnetic field
- deposited film
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
- Chemical Vapour Deposition (AREA)
- Light Receiving Elements (AREA)
Abstract
PURPOSE:To steadily mass-produce a high quality deposited film over a large area by arranging a magnet on the outer periphery of a microwave inlet part and the opposed position to form a closed magnetic field. CONSTITUTION:A deposited film forming carrier 9 in a vacuum vessel 7 is rotated by a motor 16, a raw gas is introduced into the vessel 7 to keep the vessel 7 at a specified pressure, a microwave is introduced from both ends of the vessel 7 through an inlet window 3, and glow discharge plasma is produced in the discharge space A surrounded by the plural carriers 9. Since a closed magnetic field is formed between the windows 3 by both magnets 6 arranged on the outer peripheries of the respective windows 3, the plasma density is increased at the central part 20 of the space A, namely in the space impressed with the magnetic field. As a result, the plasma density is lowered on the surface of the carrier 9 or the plasma is separated from the surface of the carrier 9, hence the overheating of the surface of the carrier 9 is prevented, and a film is always formed under stabilized temp. conditions. Accordingly, a uniform and high quality deposited film can be stably formed with good reproducibility.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62153502A JP2609866B2 (en) | 1987-06-22 | 1987-06-22 | Microwave plasma CVD equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62153502A JP2609866B2 (en) | 1987-06-22 | 1987-06-22 | Microwave plasma CVD equipment |
Publications (3)
Publication Number | Publication Date |
---|---|
JPS64270A true JPS64270A (en) | 1989-01-05 |
JPH01270A JPH01270A (en) | 1989-01-05 |
JP2609866B2 JP2609866B2 (en) | 1997-05-14 |
Family
ID=15563961
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62153502A Expired - Fee Related JP2609866B2 (en) | 1987-06-22 | 1987-06-22 | Microwave plasma CVD equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2609866B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5514217A (en) * | 1990-11-16 | 1996-05-07 | Canon Kabushiki Kaisha | Microwave plasma CVD apparatus with a deposition chamber having a circumferential wall comprising a curved moving substrate web and a microwave applicator means having a specific dielectric member on the exterior thereof |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6230880A (en) * | 1985-08-01 | 1987-02-09 | Canon Inc | Deposited film forming device by plasma cvd method |
JPS6260876A (en) * | 1985-09-09 | 1987-03-17 | Ricoh Co Ltd | Device for vapor-depositing thin film |
-
1987
- 1987-06-22 JP JP62153502A patent/JP2609866B2/en not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6230880A (en) * | 1985-08-01 | 1987-02-09 | Canon Inc | Deposited film forming device by plasma cvd method |
JPS6260876A (en) * | 1985-09-09 | 1987-03-17 | Ricoh Co Ltd | Device for vapor-depositing thin film |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5514217A (en) * | 1990-11-16 | 1996-05-07 | Canon Kabushiki Kaisha | Microwave plasma CVD apparatus with a deposition chamber having a circumferential wall comprising a curved moving substrate web and a microwave applicator means having a specific dielectric member on the exterior thereof |
Also Published As
Publication number | Publication date |
---|---|
JP2609866B2 (en) | 1997-05-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |