JPS6425530A - Optical projection apparatus - Google Patents

Optical projection apparatus

Info

Publication number
JPS6425530A
JPS6425530A JP62182838A JP18283887A JPS6425530A JP S6425530 A JPS6425530 A JP S6425530A JP 62182838 A JP62182838 A JP 62182838A JP 18283887 A JP18283887 A JP 18283887A JP S6425530 A JPS6425530 A JP S6425530A
Authority
JP
Japan
Prior art keywords
mounting stage
stage member
reticle
specified
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62182838A
Other languages
Japanese (ja)
Inventor
Yutaka Endo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP62182838A priority Critical patent/JPS6425530A/en
Publication of JPS6425530A publication Critical patent/JPS6425530A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To prevent the occurrence of geometric distortion in structure due to a temperature change, especially changes in interval between a mask and an optical projection system and in interval between the optical projection system and a light sensitive substrate, by using two kinds of materials having different thermal expansion coefficients for coupling means of structures. CONSTITUTION:A reticle mounting stage member 1, a lens mounting stage member 2 and a wafer mounting stage member 3 are coupled along an optical axis AX at specified intervals. The positions of a reticle R, a projecting lens PL and a wafer W are specified. A hole is provided at the central part of a mounting stage member 4 so that the light from a lighting system 1L is not shielded. The mounting stage member 4 is arranged at the opposite side with respect to the projecting lens PL with the reticle mounting stage member 1 inbetween. The mounting stage member 4 and the reticle mounting stage member 1 are tightened with a plurality of coupling members 7a and 7b at a specified interval. The reticle mounting stage member 1 and the lens mounting stage member 2 are tighened with a plurality of coupling members 8a and 8b at a specified interval. The mounting stage member 4 and the lens mounting stage member 2 are tightened with a plurality of coupling members 9a and 9b. Thus the position relation between the reticle R and the projecting lens PL is specified.
JP62182838A 1987-07-22 1987-07-22 Optical projection apparatus Pending JPS6425530A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62182838A JPS6425530A (en) 1987-07-22 1987-07-22 Optical projection apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62182838A JPS6425530A (en) 1987-07-22 1987-07-22 Optical projection apparatus

Publications (1)

Publication Number Publication Date
JPS6425530A true JPS6425530A (en) 1989-01-27

Family

ID=16125344

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62182838A Pending JPS6425530A (en) 1987-07-22 1987-07-22 Optical projection apparatus

Country Status (1)

Country Link
JP (1) JPS6425530A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010056383A (en) * 2008-08-29 2010-03-11 Nikon Corp Optical system and exposure apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010056383A (en) * 2008-08-29 2010-03-11 Nikon Corp Optical system and exposure apparatus

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