JPS6425413A - Optical aligner - Google Patents

Optical aligner

Info

Publication number
JPS6425413A
JPS6425413A JP62181047A JP18104787A JPS6425413A JP S6425413 A JPS6425413 A JP S6425413A JP 62181047 A JP62181047 A JP 62181047A JP 18104787 A JP18104787 A JP 18104787A JP S6425413 A JPS6425413 A JP S6425413A
Authority
JP
Japan
Prior art keywords
circuit pattern
wafer
exposed
circuit
light source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62181047A
Other languages
Japanese (ja)
Inventor
Yoshimitsu Sase
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62181047A priority Critical patent/JPS6425413A/en
Publication of JPS6425413A publication Critical patent/JPS6425413A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To reduce the manpower for layout of circuit patterns by performing alignment, thereby using an optical, linear pattern in the first circuit as a target mark when the different second circuit pattern is exposed on the first circuit pattern which is formed in advance on a wafer through an optical aligner. CONSTITUTION:The image of the second circuit pattern formed at a reticle 5 is lap-exposed with a condensing lens 9 and a projection lens 10 by receiving lights from a light source 7 on a photoresist of a wafer 1 which is placed on a support stand 2 located on a movable carriage 3a and has the first circuit pattern formed through a previous process. On the other hand, a light emitted from a light source 14 mounted at a pair of alignment optical system 12 illuminates downward a linear pattern 19 which is selected in advance on the wafer 1 through the projection lens 10 and the like. Reflected lights coming from illuminated lights downward form themselves into images on a linear sensor 17 moving back towards the projection lens 10 and so forth and positioning works are carried out. Further, as a monochromatic light having a wavelength which is not exposed to a photoresist such as a g ray of a mercury-arc lamp is used as the light source 7, its light may avoid a loss to resist caused by alignment.
JP62181047A 1987-07-22 1987-07-22 Optical aligner Pending JPS6425413A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62181047A JPS6425413A (en) 1987-07-22 1987-07-22 Optical aligner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62181047A JPS6425413A (en) 1987-07-22 1987-07-22 Optical aligner

Publications (1)

Publication Number Publication Date
JPS6425413A true JPS6425413A (en) 1989-01-27

Family

ID=16093842

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62181047A Pending JPS6425413A (en) 1987-07-22 1987-07-22 Optical aligner

Country Status (1)

Country Link
JP (1) JPS6425413A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6271919B1 (en) 1998-04-02 2001-08-07 Nec Corporation Semiconductor device and alignment apparatus and alignment method for same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6271919B1 (en) 1998-04-02 2001-08-07 Nec Corporation Semiconductor device and alignment apparatus and alignment method for same

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