JPS6422024U - - Google Patents
Info
- Publication number
- JPS6422024U JPS6422024U JP11590387U JP11590387U JPS6422024U JP S6422024 U JPS6422024 U JP S6422024U JP 11590387 U JP11590387 U JP 11590387U JP 11590387 U JP11590387 U JP 11590387U JP S6422024 U JPS6422024 U JP S6422024U
- Authority
- JP
- Japan
- Prior art keywords
- tray
- metal plate
- pressure cvd
- atmospheric pressure
- cvd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002184 metal Substances 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 3
- 238000001505 atmospheric-pressure chemical vapour deposition Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 1
Description
第１図は、従来から一般的に使用されている常
圧ＣＶＤ装置の概略図であり、第２図は第１図の
常圧ＣＶＤ装置のデイスパーシヨンヘツド部を示
す図面であり、第３図はヒーター加熱方式の一例
を示す図面であり、第４図は従来の装置における
加熱状態を示す説明図である。第５図は本考案に
従つた常圧ＣＶＤ装置のトレー３とメタル板９と
の組合わせ構造の一例を示す図面であり、第６図
は第５図のＡ部の拡大平面図であり、第７図は第
６図のＸ−Ｘ′断面を示す図面である。
１……常圧ＣＶＤ装置、２……ヒーターユニツ
ト、３……トレー、４……ロード機構、５……デ
イスパージヨンヘツド、６……アンロード機構、
７……ヒーター、８……電磁波、９……メタル板
、１０……孔、１１……止め具、１２……Ａ１配
線、１３……半導体基板。
FIG. 1 is a schematic diagram of an ordinary pressure CVD apparatus commonly used in the past, FIG. 2 is a drawing showing the dispersion head of the atmospheric pressure CVD apparatus of FIG. The figure is a diagram showing an example of a heater heating method, and FIG. 4 is an explanatory diagram showing a heating state in a conventional device. FIG. 5 is a drawing showing an example of the combination structure of the tray 3 and metal plate 9 of the atmospheric pressure CVD apparatus according to the present invention, and FIG. 6 is an enlarged plan view of section A in FIG. FIG. 7 is a cross-sectional view taken along line XX' in FIG. 6. DESCRIPTION OF SYMBOLS 1...Normal pressure CVD device, 2...Heater unit, 3...Tray, 4...Loading mechanism, 5...Dispersion head, 6...Unloading mechanism,
7... Heater, 8... Electromagnetic wave, 9... Metal plate, 10... Hole, 11... Stopper, 12... A1 wiring, 13... Semiconductor substrate.
Claims (1)
Ｄ装置のトレー上にメタル板をトレーに対し可動
自在に固定して成る常圧ＣＶＤ装置。 Atmospheric pressure CV for growing CVD films on semiconductor substrates
A normal pressure CVD device consisting of a metal plate movably fixed on the tray of device D.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11590387U JPS6422024U (en) | 1987-07-30 | 1987-07-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11590387U JPS6422024U (en) | 1987-07-30 | 1987-07-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6422024U true JPS6422024U (en) | 1989-02-03 |
Family
ID=31357969
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11590387U Pending JPS6422024U (en) | 1987-07-30 | 1987-07-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6422024U (en) |
-
1987
- 1987-07-30 JP JP11590387U patent/JPS6422024U/ja active Pending
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