JPS6421883U - - Google Patents
Info
- Publication number
- JPS6421883U JPS6421883U JP11751787U JP11751787U JPS6421883U JP S6421883 U JPS6421883 U JP S6421883U JP 11751787 U JP11751787 U JP 11751787U JP 11751787 U JP11751787 U JP 11751787U JP S6421883 U JPS6421883 U JP S6421883U
- Authority
- JP
- Japan
- Prior art keywords
- flow path
- gas flow
- carrier gas
- valve
- gas introduction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012159 carrier gas Substances 0.000 claims description 4
- 239000007789 gas Substances 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims 1
Landscapes
- Details Of Valves (AREA)
Description
第１図は本考案の多重弁の一実施例を示す断面
図、第２図は従来の多重弁の一例を示す斜視図で
ある。
１……キヤリアガス流路、２……弁箱、３１，
３２……ガス導入弁、１０……シーズヒータ。
FIG. 1 is a sectional view showing an embodiment of the multiplex valve of the present invention, and FIG. 2 is a perspective view showing an example of a conventional multiplex valve. 1...Carrier gas flow path, 2...Valve box, 31,
32...Gas introduction valve, 10...Sheathed heater.
Claims (1)
流路を形成してなる弁箱の外面に、複数のガス導
入弁を設けて各ガス導入弁の吐出部を前記キヤリ
アガス流路に連通すると共に、該弁箱の内部に前
記キヤリアガス流路と平行に加熱棒を近接配置し
たことを特徴とする多重弁。 A plurality of gas introduction valves are provided on the outer surface of a valve box having a carrier gas flow path formed inside a polygonal prism body along the central axis, and the discharge portion of each gas introduction valve is communicated with the carrier gas flow path, A multiplex valve characterized in that a heating rod is disposed close to and parallel to the carrier gas flow path inside the valve box.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987117517U JPH0538307Y2 (en) | 1987-07-31 | 1987-07-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1987117517U JPH0538307Y2 (en) | 1987-07-31 | 1987-07-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6421883U true JPS6421883U (en) | 1989-02-03 |
| JPH0538307Y2 JPH0538307Y2 (en) | 1993-09-28 |
Family
ID=31361042
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1987117517U Expired - Lifetime JPH0538307Y2 (en) | 1987-07-31 | 1987-07-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0538307Y2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4459297B1 (en) * | 2009-12-25 | 2010-04-28 | 株式会社日立国際電気 | Semiconductor manufacturing apparatus, valve apparatus, CVD processing method using semiconductor manufacturing apparatus, and semiconductor manufacturing method |
| JP2010116627A (en) * | 2009-12-25 | 2010-05-27 | Hitachi Kokusai Electric Inc | Semiconductor manufacturing equipment, valve device, cvd treatment method using the semiconductor manufacturing equipment, and method of manufacturing semiconductor |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5022344U (en) * | 1973-06-19 | 1975-03-13 |
-
1987
- 1987-07-31 JP JP1987117517U patent/JPH0538307Y2/ja not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5022344U (en) * | 1973-06-19 | 1975-03-13 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4459297B1 (en) * | 2009-12-25 | 2010-04-28 | 株式会社日立国際電気 | Semiconductor manufacturing apparatus, valve apparatus, CVD processing method using semiconductor manufacturing apparatus, and semiconductor manufacturing method |
| JP2010116627A (en) * | 2009-12-25 | 2010-05-27 | Hitachi Kokusai Electric Inc | Semiconductor manufacturing equipment, valve device, cvd treatment method using the semiconductor manufacturing equipment, and method of manufacturing semiconductor |
| JP2010159492A (en) * | 2009-12-25 | 2010-07-22 | Hitachi Kokusai Electric Inc | Semiconductor production apparatus and valve apparatus, and cvd processing method and method for producing semiconductor using the semiconductor production apparatus |
| JP4523071B2 (en) * | 2009-12-25 | 2010-08-11 | 株式会社日立国際電気 | Semiconductor manufacturing apparatus, valve apparatus, CVD processing method using semiconductor manufacturing apparatus, and semiconductor manufacturing method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0538307Y2 (en) | 1993-09-28 |