JPS6421512A - Gas mass flow rate control device - Google Patents

Gas mass flow rate control device

Info

Publication number
JPS6421512A
JPS6421512A JP17826287A JP17826287A JPS6421512A JP S6421512 A JPS6421512 A JP S6421512A JP 17826287 A JP17826287 A JP 17826287A JP 17826287 A JP17826287 A JP 17826287A JP S6421512 A JPS6421512 A JP S6421512A
Authority
JP
Japan
Prior art keywords
signal
gas
reference gas
control
master control
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17826287A
Other languages
Japanese (ja)
Inventor
Hidekazu Miyoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP17826287A priority Critical patent/JPS6421512A/en
Publication of JPS6421512A publication Critical patent/JPS6421512A/en
Pending legal-status Critical Current

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  • Flow Control (AREA)

Abstract

PURPOSE:To allow a master control part to control the flow rates of many kinds of process gases by correcting a previously stored conversion factor for a reference gas control master signal outputted from the master control part and converting the signal into the one for the reference gas. CONSTITUTION:A gas conversion factor storing part 6a in a gas factor correcting part 6 previously stores conversion factors based upon the specific heat ratios of various inherent gases against the reference gas. When a selection signal SN corresponding to gas to be used, the storing part 6a outputs a conversion factor signal SK, a multiplier part 6b outputs a master control signal SuN for inherent gas which is obtained by multiplying an upper signal Su for the reference gas by the conversion factor SK and a flow rate control signal SC from a comparing control part 7 adjusts a gas flow passing a control valve 8. Since an output signal from the master control part 5 is outputted through the gas factor correcting part 6, the signal for all the process gases goes to the same as a reference gas flow control signal and the master control part 5 can be standardized for the reference gas.
JP17826287A 1987-07-16 1987-07-16 Gas mass flow rate control device Pending JPS6421512A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17826287A JPS6421512A (en) 1987-07-16 1987-07-16 Gas mass flow rate control device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17826287A JPS6421512A (en) 1987-07-16 1987-07-16 Gas mass flow rate control device

Publications (1)

Publication Number Publication Date
JPS6421512A true JPS6421512A (en) 1989-01-24

Family

ID=16045415

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17826287A Pending JPS6421512A (en) 1987-07-16 1987-07-16 Gas mass flow rate control device

Country Status (1)

Country Link
JP (1) JPS6421512A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001264138A (en) * 2000-03-16 2001-09-26 Hitachi Metals Ltd Mass flow rate controller
JP2006120149A (en) * 2004-10-21 2006-05-11 Minebea Co Ltd Dosing system and method for fluid media
JP2006330851A (en) * 2005-05-23 2006-12-07 Fujikin Inc Improved pressure type flow rate controller
CN102759932A (en) * 2012-07-05 2012-10-31 中国科学技术大学 Control device and control method for plurality of paths of gas mass flow meters
JP2013058066A (en) * 2011-09-08 2013-03-28 Amada Co Ltd Shield gas flow rate controller
CN103049008A (en) * 2011-10-14 2013-04-17 东京毅力科创株式会社 Flow rate controller and processing apparatus
WO2019080512A1 (en) * 2017-10-27 2019-05-02 君泰创新（北京）科技有限公司 Method and system for adjusting process gas flow of vacuum coating device

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5081361A (en) * 1973-11-19 1975-07-02
JPS62100817A (en) * 1985-10-28 1987-05-11 Hitachi Electronics Eng Co Ltd Monitor system for flow rate of gas

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5081361A (en) * 1973-11-19 1975-07-02
JPS62100817A (en) * 1985-10-28 1987-05-11 Hitachi Electronics Eng Co Ltd Monitor system for flow rate of gas

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001264138A (en) * 2000-03-16 2001-09-26 Hitachi Metals Ltd Mass flow rate controller
JP2006120149A (en) * 2004-10-21 2006-05-11 Minebea Co Ltd Dosing system and method for fluid media
JP2006330851A (en) * 2005-05-23 2006-12-07 Fujikin Inc Improved pressure type flow rate controller
JP2013058066A (en) * 2011-09-08 2013-03-28 Amada Co Ltd Shield gas flow rate controller
CN103049008A (en) * 2011-10-14 2013-04-17 东京毅力科创株式会社 Flow rate controller and processing apparatus
JP2013088926A (en) * 2011-10-14 2013-05-13 Tokyo Electron Ltd Flow controller and processor
TWI503641B (en) * 2011-10-14 2015-10-11 Tokyo Electron Ltd Flow rate controller and processing apparatus
CN102759932A (en) * 2012-07-05 2012-10-31 中国科学技术大学 Control device and control method for plurality of paths of gas mass flow meters
WO2019080512A1 (en) * 2017-10-27 2019-05-02 君泰创新（北京）科技有限公司 Method and system for adjusting process gas flow of vacuum coating device
CN109983156A (en) * 2017-10-27 2019-07-05 君泰创新（北京）科技有限公司 A kind of method of adjustment and system of the process gas flow of vacuum coating equipment

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