JPS6420540A - Positive type photoresist composition - Google Patents

Positive type photoresist composition

Info

Publication number
JPS6420540A
JPS6420540A JP17778387A JP17778387A JPS6420540A JP S6420540 A JPS6420540 A JP S6420540A JP 17778387 A JP17778387 A JP 17778387A JP 17778387 A JP17778387 A JP 17778387A JP S6420540 A JPS6420540 A JP S6420540A
Authority
JP
Japan
Prior art keywords
soluble resin
alkaline soluble
quinone diazide
specified
essential component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17778387A
Other languages
Japanese (ja)
Other versions
JP2654947B2 (en
Inventor
Mikio Yajima
Masaji Kawada
Shigemitsu Kamiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zeon Corp
Original Assignee
Nippon Zeon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Zeon Co Ltd filed Critical Nippon Zeon Co Ltd
Priority to JP62177783A priority Critical patent/JP2654947B2/en
Publication of JPS6420540A publication Critical patent/JPS6420540A/en
Application granted granted Critical
Publication of JP2654947B2 publication Critical patent/JP2654947B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Abstract

PURPOSE:To improve the ability of forming a fine pattern on a substrate by incorporating an alkaline soluble resin having a specified photoabsorption characteristics and a mol.wt. and a quinone diazide compd. as an essential component, in the titled composition. CONSTITUTION:In the titled composition which contains the alkaline soluble resin and the quinone diazide compd. as the essential component, and is used for an UV ray having 350-450nm for an exposure light source, the alkaline soluble resin has absorbance of 0.5X10<-2>-10.0X10<-2>/cm against an exposure wavelength in a 2-ethoxyethyl acetate solution of 10ppm concn. and absorption which does not fade by a light having said wavelength range, and >=500 number average molecular weight. The alkaline soluble resin is exemplified by phenol, cresol, xylenol, resorcinol or bisphenol, etc. The quinone diazide compd. is not specified.
JP62177783A 1987-07-16 1987-07-16 Positive photoresist composition Expired - Lifetime JP2654947B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62177783A JP2654947B2 (en) 1987-07-16 1987-07-16 Positive photoresist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62177783A JP2654947B2 (en) 1987-07-16 1987-07-16 Positive photoresist composition

Publications (2)

Publication Number Publication Date
JPS6420540A true JPS6420540A (en) 1989-01-24
JP2654947B2 JP2654947B2 (en) 1997-09-17

Family

ID=16037027

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62177783A Expired - Lifetime JP2654947B2 (en) 1987-07-16 1987-07-16 Positive photoresist composition

Country Status (1)

Country Link
JP (1) JP2654947B2 (en)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5573045A (en) * 1978-11-04 1980-06-02 Hoechst Ag Photosensitive mixture * and copying material containing same
JPS58174941A (en) * 1982-04-08 1983-10-14 Tokyo Ohka Kogyo Co Ltd Novel light absorber and photoresist composition containing it
JPS59142538A (en) * 1983-02-04 1984-08-15 Tokyo Ohka Kogyo Co Ltd Photosensitive composition
JPS60158440A (en) * 1984-01-26 1985-08-19 Mitsubishi Chem Ind Ltd Positive type photoresist composition
JPS6193445A (en) * 1984-10-12 1986-05-12 Fuji Photo Film Co Ltd Novel photoresist composition
JPS6198344A (en) * 1984-10-19 1986-05-16 Fuji Photo Film Co Ltd New photoresist composition
JPS61278846A (en) * 1985-06-04 1986-12-09 Sumitomo Chem Co Ltd Positive type photoresist composition
JPS63198046A (en) * 1987-02-13 1988-08-16 Konica Corp Photosensitive composition having excellent treating chemical resistant and ink forming properties

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5573045A (en) * 1978-11-04 1980-06-02 Hoechst Ag Photosensitive mixture * and copying material containing same
JPS58174941A (en) * 1982-04-08 1983-10-14 Tokyo Ohka Kogyo Co Ltd Novel light absorber and photoresist composition containing it
JPS59142538A (en) * 1983-02-04 1984-08-15 Tokyo Ohka Kogyo Co Ltd Photosensitive composition
JPS60158440A (en) * 1984-01-26 1985-08-19 Mitsubishi Chem Ind Ltd Positive type photoresist composition
JPS6193445A (en) * 1984-10-12 1986-05-12 Fuji Photo Film Co Ltd Novel photoresist composition
JPS6198344A (en) * 1984-10-19 1986-05-16 Fuji Photo Film Co Ltd New photoresist composition
JPS61278846A (en) * 1985-06-04 1986-12-09 Sumitomo Chem Co Ltd Positive type photoresist composition
JPS63198046A (en) * 1987-02-13 1988-08-16 Konica Corp Photosensitive composition having excellent treating chemical resistant and ink forming properties

Also Published As

Publication number Publication date
JP2654947B2 (en) 1997-09-17

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