JPS6415740A - Resist removing solution - Google Patents

Resist removing solution

Info

Publication number
JPS6415740A
JPS6415740A JP16965887A JP16965887A JPS6415740A JP S6415740 A JPS6415740 A JP S6415740A JP 16965887 A JP16965887 A JP 16965887A JP 16965887 A JP16965887 A JP 16965887A JP S6415740 A JPS6415740 A JP S6415740A
Authority
JP
Japan
Prior art keywords
resist
soln
residual
resist removing
salt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16965887A
Other languages
Japanese (ja)
Other versions
JP2576516B2 (en
Inventor
Shigeki Shimokawa
Tetsuo Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Gas Chemical Co Inc
Original Assignee
Mitsubishi Gas Chemical Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Gas Chemical Co Inc filed Critical Mitsubishi Gas Chemical Co Inc
Priority to JP16965887A priority Critical patent/JP2576516B2/en
Publication of JPS6415740A publication Critical patent/JPS6415740A/en
Application granted granted Critical
Publication of JP2576516B2 publication Critical patent/JP2576516B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Abstract

PURPOSE:To enhance the removing performance of a resist removing soln. by using a specified result removing soln. CONSTITUTION:An aq. hydrogen peroxide soln. contg. an alkali metallic salt (A) of orthophosphoric acid or condensed phosphoric acid added by 0.003-1wt.% (expressed in terms of anhydride) is used as a resist removing soln. Disodium orthophosphate or sodium pyrophosphate may be used as the salt A. When the removing soln. is used, the amts. of a residual resist and residual foreign matter can be reduced because of the high removing and cleaning performance and not only a photoresist but also an electron beam resist can be removed whether the resist is positive or negative.
JP16965887A 1987-07-09 1987-07-09 Resist removal liquid Expired - Lifetime JP2576516B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16965887A JP2576516B2 (en) 1987-07-09 1987-07-09 Resist removal liquid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16965887A JP2576516B2 (en) 1987-07-09 1987-07-09 Resist removal liquid

Publications (2)

Publication Number Publication Date
JPS6415740A true JPS6415740A (en) 1989-01-19
JP2576516B2 JP2576516B2 (en) 1997-01-29

Family

ID=15890536

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16965887A Expired - Lifetime JP2576516B2 (en) 1987-07-09 1987-07-09 Resist removal liquid

Country Status (1)

Country Link
JP (1) JP2576516B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000030162A1 (en) * 1998-11-12 2000-05-25 Sharp Kabushiki Kaisha Novel detergent and cleaning method using it
WO2000034996A1 (en) * 1998-12-09 2000-06-15 Kishimoto Sangyo Co., Ltd. Stripping agent against resist residues
JP2005183937A (en) * 2003-11-25 2005-07-07 Nec Electronics Corp Manufacturing method of semiconductor device and cleaning device for removing resist
CN110908254A (en) * 2019-12-26 2020-03-24 苏州珮凯科技有限公司 Curing photoresist removing liquid for 8-inch wafer manufacturing photoetching machine core part CUP and method for removing curing photoresist

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50150650A (en) * 1974-05-25 1975-12-03
JPS5325102A (en) * 1976-08-20 1978-03-08 Japan Synthetic Rubber Co Ltd Composition of peeling liquid
JPS629630A (en) * 1985-07-08 1987-01-17 Mitsubishi Gas Chem Co Inc Resist removing method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50150650A (en) * 1974-05-25 1975-12-03
JPS5325102A (en) * 1976-08-20 1978-03-08 Japan Synthetic Rubber Co Ltd Composition of peeling liquid
JPS629630A (en) * 1985-07-08 1987-01-17 Mitsubishi Gas Chem Co Inc Resist removing method

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000030162A1 (en) * 1998-11-12 2000-05-25 Sharp Kabushiki Kaisha Novel detergent and cleaning method using it
WO2000034996A1 (en) * 1998-12-09 2000-06-15 Kishimoto Sangyo Co., Ltd. Stripping agent against resist residues
US6534459B1 (en) 1998-12-09 2003-03-18 Kishimoto Sangyo Co., Ltd. Resist residue remover
JP2005183937A (en) * 2003-11-25 2005-07-07 Nec Electronics Corp Manufacturing method of semiconductor device and cleaning device for removing resist
CN110908254A (en) * 2019-12-26 2020-03-24 苏州珮凯科技有限公司 Curing photoresist removing liquid for 8-inch wafer manufacturing photoetching machine core part CUP and method for removing curing photoresist

Also Published As

Publication number Publication date
JP2576516B2 (en) 1997-01-29

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