JPS6413729A - Flush tank - Google Patents
Flush tankInfo
- Publication number
- JPS6413729A JPS6413729A JP17012487A JP17012487A JPS6413729A JP S6413729 A JPS6413729 A JP S6413729A JP 17012487 A JP17012487 A JP 17012487A JP 17012487 A JP17012487 A JP 17012487A JP S6413729 A JPS6413729 A JP S6413729A
- Authority
- JP
- Japan
- Prior art keywords
- flush
- cage
- water
- tank
- discharged
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
PURPOSE:To securely flush a wafer surface by directing poured water to the wafer surface immersed in a flush cage after substantially aligning the bottom of the flush cage with a flow ordering region flush cage with a flow ordering plate. CONSTITUTION:A region of holes 2a in a mesh plate 2 is substantially aligned with the bottom of a flush cage 3, and water is poured into a flush tank 1 through a water inlet 19. And, the surface of a wafer 4 placed in the flush cage 3 is flushed without fail because of close contact of a rib 1b with an edge 3a by water uniformly discharged from many hales formed in the mesh plate 2 disposed in the flush tank 1. The water flow thereafter is discharged from the upper of the flush cage 3 and discharged from the lower discharge hole 1c of the flush tank 1, whereby the outside of the flush cage 3 is flushed. Additionally, another fraction of the water is overflowed from the upper of the flush tank 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17012487A JPS6413729A (en) | 1987-07-07 | 1987-07-07 | Flush tank |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17012487A JPS6413729A (en) | 1987-07-07 | 1987-07-07 | Flush tank |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6413729A true JPS6413729A (en) | 1989-01-18 |
Family
ID=15899088
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17012487A Pending JPS6413729A (en) | 1987-07-07 | 1987-07-07 | Flush tank |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6413729A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5087114A (en) * | 1988-12-12 | 1992-02-11 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal device wherein the most optimum ratio of spacing between substrates in which the liquid crystal is disposed and before disposing of the liquid crystal is 0.77-0.87 |
JP2011018780A (en) * | 2009-07-09 | 2011-01-27 | Toppan Printing Co Ltd | Surface roughening device of build-up substrate insulating layer |
-
1987
- 1987-07-07 JP JP17012487A patent/JPS6413729A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5087114A (en) * | 1988-12-12 | 1992-02-11 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal device wherein the most optimum ratio of spacing between substrates in which the liquid crystal is disposed and before disposing of the liquid crystal is 0.77-0.87 |
JP2011018780A (en) * | 2009-07-09 | 2011-01-27 | Toppan Printing Co Ltd | Surface roughening device of build-up substrate insulating layer |
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