JPS6411542U - - Google Patents

Info

Publication number
JPS6411542U
JPS6411542U JP10498387U JP10498387U JPS6411542U JP S6411542 U JPS6411542 U JP S6411542U JP 10498387 U JP10498387 U JP 10498387U JP 10498387 U JP10498387 U JP 10498387U JP S6411542 U JPS6411542 U JP S6411542U
Authority
JP
Japan
Prior art keywords
attracted
conductor
insulating film
electrostatic chuck
coated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10498387U
Other languages
Japanese (ja)
Other versions
JPH0636583Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1987104983U priority Critical patent/JPH0636583Y2/en
Publication of JPS6411542U publication Critical patent/JPS6411542U/ja
Application granted granted Critical
Publication of JPH0636583Y2 publication Critical patent/JPH0636583Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Jigs For Machine Tools (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案に係る静電チヤツクの構造を示
す概略縦断面図、第2図は本考案に係る静電チヤ
ツクを用いて、静電吸着処理時の電界強度と誘起
される静電力との関係を示すグラフ、第3図は従
来の埋設型静電チヤツクの構造を示す概略縦断面
図、第4図は同じく従来の被覆型静電チヤツクの
構造を示す概略縦断面図である。 1…電極、2…セラミツク溶射膜、3…端子。
Fig. 1 is a schematic vertical cross-sectional view showing the structure of the electrostatic chuck according to the present invention, and Fig. 2 shows the relationship between electric field strength and induced electrostatic force during electrostatic adsorption processing using the electrostatic chuck according to the present invention. FIG. 3 is a schematic vertical cross-sectional view showing the structure of a conventional buried type electrostatic chuck, and FIG. 4 is a schematic vertical cross-sectional view showing the structure of a conventional covered electrostatic chuck. 1... Electrode, 2... Ceramic sprayed film, 3... Terminal.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 導電体上に絶縁膜を被覆し、被吸着物と前記導
電体との間に直流電圧を印加し、前記絶縁膜上に
被吸着物を吸着すべくなした静電チヤツクにおい
て、セラミツク溶射にて前記導電体を被覆する絶
縁膜を具備することを特徴とする静電チヤツク。
In an electrostatic chuck in which an insulating film is coated on a conductor, a DC voltage is applied between an object to be attracted and the conductor, and the object to be attracted is attracted to the insulating film, ceramic spraying is used. An electrostatic chuck comprising an insulating film covering the conductor.
JP1987104983U 1987-07-07 1987-07-07 Electrostatic chuck Expired - Lifetime JPH0636583Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1987104983U JPH0636583Y2 (en) 1987-07-07 1987-07-07 Electrostatic chuck

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1987104983U JPH0636583Y2 (en) 1987-07-07 1987-07-07 Electrostatic chuck

Publications (2)

Publication Number Publication Date
JPS6411542U true JPS6411542U (en) 1989-01-20
JPH0636583Y2 JPH0636583Y2 (en) 1994-09-21

Family

ID=31337190

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1987104983U Expired - Lifetime JPH0636583Y2 (en) 1987-07-07 1987-07-07 Electrostatic chuck

Country Status (1)

Country Link
JP (1) JPH0636583Y2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04304942A (en) * 1991-03-29 1992-10-28 Shin Etsu Chem Co Ltd Electrostatic chuck substrate and electrostatic chuck
JP2010272730A (en) * 2009-05-22 2010-12-02 Shinko Electric Ind Co Ltd Electrostatic chuck

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115210860A (en) * 2021-02-04 2022-10-18 日本碍子株式会社 Member for semiconductor manufacturing apparatus and method for manufacturing the same
WO2022168368A1 (en) * 2021-02-04 2022-08-11 日本碍子株式会社 Semiconductor manufacturing device member and method for manufacturing same

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62286247A (en) * 1986-06-05 1987-12-12 Toto Ltd Electrostatic chuck plate and manufacture thereof

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62286247A (en) * 1986-06-05 1987-12-12 Toto Ltd Electrostatic chuck plate and manufacture thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04304942A (en) * 1991-03-29 1992-10-28 Shin Etsu Chem Co Ltd Electrostatic chuck substrate and electrostatic chuck
JP2010272730A (en) * 2009-05-22 2010-12-02 Shinko Electric Ind Co Ltd Electrostatic chuck

Also Published As

Publication number Publication date
JPH0636583Y2 (en) 1994-09-21

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