JPS6399993A - Treating liquid for planography - Google Patents

Treating liquid for planography

Info

Publication number
JPS6399993A
JPS6399993A JP24557286A JP24557286A JPS6399993A JP S6399993 A JPS6399993 A JP S6399993A JP 24557286 A JP24557286 A JP 24557286A JP 24557286 A JP24557286 A JP 24557286A JP S6399993 A JPS6399993 A JP S6399993A
Authority
JP
Japan
Prior art keywords
general formula
compound
formulas
acid
copolymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24557286A
Other languages
Japanese (ja)
Other versions
JPH0635217B2 (en
Inventor
Akira Minami
南 章
Chiaki Kawamoto
河本 千秋
Chikashi Oishi
近司 大石
Sadao Osawa
大沢 定男
Sho Nakao
中尾 捷
Hidefumi Sera
世羅 英史
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP61245572A priority Critical patent/JPH0635217B2/en
Publication of JPS6399993A publication Critical patent/JPS6399993A/en
Publication of JPH0635217B2 publication Critical patent/JPH0635217B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00Preparing for use and conserving printing surfaces
    • B41N3/08Damping; Neutralising or similar differentiation treatments for lithographic printing formes; Gumming or finishing solutions, fountain solutions, correction or deletion fluids, or on-press development

Landscapes

  • Printing Plates And Materials Therefor (AREA)

Abstract

PURPOSE:To obtain a treating liquid free of the possibility of precipitation of crystals in an apparatus and capable of maintaining a capability of imparting hydrophilic nature for a long time, by incorporating at least one copolymer containing at least one each of two kinds of specific repeating units and at least one specific compound. CONSTITUTION:A treating liquid for planography contains at least one copolymer containing at least one each of repeating units of general formulas (I) and (II) and at least one compound of general formula (III). The copolymer can be obtained by, for example, a method in which a copolymer of a monomer corresponding to the component of general formula (I) with maleic anhydride is subjected to hydrolysis or alcoholysis. The weight ratio of the repeating unit of general formula (I) to the repeating unit of general formula (II) in the copolymer thus obtained is preferably in the range of 9:1-5:5. The compound of general formula (III) is preferably used in an amount of 0.001-5 Wt.%. The treating liquid has excellent performance of preventing generation of crystals, scum, precipitation or the like, and a printed matter obtained by use of the treating liquid has excellent performance as to ink build-up properties and ground contamination.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は電子写真オフセットマスター、PEi版の印刷
に用いる処理液、即ちエツチング液および湿し水に関す
る。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to processing liquids, ie, etching liquids and dampening solutions, used for printing electrophotographic offset masters and PEi plates.

(従来の技術) 電子写真オフセットマスターはまず酸化亜鉛の如き光導
電性微粉末を電気絶縁性樹脂と共に支持体上に塗布して
なる感光層上に、電子写真的手法により親油性画像を得
る。
(Prior Art) In an electrophotographic offset master, a lipophilic image is first obtained by an electrophotographic method on a photosensitive layer formed by coating a photoconductive fine powder such as zinc oxide on a support together with an electrically insulating resin.

また親油性筆記具またはタイプによって直接マスター上
に画像を形成して印刷版とする方式および電子写真転写
法等を用いる方式がある。
There are also methods of forming a printing plate by directly forming an image on the master using a lipophilic writing instrument or type, and methods of using an electrophotographic transfer method.

これらはエツチング処理によシ非画像部を親油性から親
水性に転換して印刷版とする。印刷中も親水性を維持す
るために通常処理液を数倍に希釈して湿し水として用い
る。
These are used as printing plates by converting the non-image areas from lipophilic to hydrophilic through an etching process. In order to maintain hydrophilicity during printing, the processing liquid is usually diluted several times and used as dampening water.

これまでにも多くの処理液の提案があった。それらを主
成分で分類すると黄血塩系と非黄血塩系に分けられる。
Many treatment solutions have been proposed so far. If they are classified according to their main components, they can be divided into yellow blood salt type and non-yellow blood salt type.

黄血塩系は古くから用いられてきている。これは熱およ
び光にたいして不安定で69自然経時によってもエツチ
ング力の低下、沈澱発生などの欠点がある。そのためこ
れらの欠点を改善すべく数多くの提案が試みられている
。また非黄血塩系については主としてエツチング力を改
良すべく努力が続けられている。しかしながらそれらは
今なお十分ではない。さらに近年電子写真オフセットマ
スターによる印刷の適用範囲が拡大し、従来よりもよシ
高度な性能が要求されるようになってきた。
Yellow blood salts have been used for a long time. It is unstable to heat and light, and has disadvantages such as a decrease in etching power and the formation of precipitates even with natural aging. Therefore, many proposals have been attempted to improve these drawbacks. Efforts are being made mainly to improve the etching power of non-yellow blood salts. However, they are still not enough. Furthermore, in recent years, the scope of application of printing using electrophotographic offset masters has expanded, and more advanced performance than before has been required.

即ち非画像部に印刷汚れを発生せずかつ画像部には十分
インキが乗る(=着肉性が良い)こと、指紋等の汚れ防
止のために製版直後に平版印刷用処理液にて親水化処理
を行ないその後数時間たって印刷した場合でも細線や網
点のハイライト部がかすれたすせずインキが十分乗る(
=乾燥放置後着肉性が曳い)こと、刷り始めてからすぐ
に正常な印刷物が得られる(=インキ乗シが迅速である
)こと、多数枚印刷しても地汚れが発生しないこと、非
画像部にインキが誤って付着し汚れとなった場合でも印
刷機を空回転することにより容易に汚れがとれる(イン
キ付着汚れ除去性にすぐれる)こと、長期間使用しても
親水化力が変わらず結晶fカスが発生しないこと、とい
つえよすな特性を具備していなければならない。
In other words, the non-image area should not have printing stains and the image area should have sufficient ink coverage (=good ink adhesion), and should be made hydrophilic with a lithographic printing treatment liquid immediately after plate making to prevent stains such as fingerprints. Even if you print several hours after processing, the fine lines and highlights of halftone dots will not fade or smear, and the ink will get on well (
= ink receptivity remains after being left to dry), normal prints can be obtained immediately after printing begins (= ink build-up is quick), background smear does not occur even when printing a large number of sheets, and non-image Even if ink accidentally adheres to a surface and causes stains, the stain can be easily removed by running the printing machine idly (excellent ability to remove ink adhesion stains), and the hydrophilicity does not change even after long-term use. It must also have good characteristics, such as not generating crystal scum.

(発明が解決しようとする問題点) しかし、従来の処理液を、機械的にエツチングをおこな
うエツチング・マシーンに投入して使用した場合、スク
イズ・ローラ一部や、喫水線近傍部に結晶が析出し、そ
れが印刷版上に付着し汚れとなり、またボール・ベアリ
ング部等に結晶が析出すると、機械的な故障を引き起こ
すという問題を有していた。
(Problem to be solved by the invention) However, when a conventional processing solution is used in an etching machine that performs mechanical etching, crystals are deposited on a part of the squeeze roller and near the waterline. This has caused the problem that it adheres to the printing plate and becomes a stain, and that if crystals are deposited on ball bearings or the like, it can cause mechanical failure.

これを防ぐ方法として主剤含有量を低減するという方法
があるが、この場合結晶析出は防げるが印刷時に非画像
部の汚れ管まねき、印刷物に地汚れを生じてしまう。
One way to prevent this is to reduce the content of the base agent, but in this case, crystal precipitation can be prevented, but stains may be formed in non-image areas during printing, and background stains may occur on printed matter.

他方、従来の処理液を用いてエツチング処理をし乾燥を
おこなった場合、画像部へのインキ着肉性が劣化すると
込う欠点がある。この欠点はエツチング処理、乾燥をお
こなった後、長時間放置(置版)された場合さらに顕著
になる。
On the other hand, when etching is performed using a conventional processing liquid and then dried, there is a drawback that ink adhesion to the image area deteriorates. This drawback becomes more noticeable when the plate is left for a long time (plate placement) after etching and drying.

これを防ぐ方法としてエツチング力を弱める方法(希釈
、主剤含有量の低減等)があるが、この場合も上記の場
合と同様に着肉劣化は防げるが印刷時に非画像部の汚れ
をまねき、印刷物に地汚れを生じてしまう。
To prevent this, there is a method of weakening the etching power (dilution, reducing the content of the main agent, etc.), but in this case as well, deterioration due to inking can be prevented as in the case above, but it may cause stains in non-image areas during printing, and This will cause stains on the surface.

もう一つの方法として界面活性剤を添加する方法がある
。この場合、印刷物に地汚れを生じることなしに着肉劣
化を防ぐ仁とはできるが、非常に泡がたちやすくなシ、
エツチング・プロセッサ等での使用時に起泡による液モ
レを生じたり、製造適性が悪くなる等の問題がある。泡
を消すために消泡剤を添加する方法があるが、消泡効果
が出現するまで添加すると相分離を起す等の液安定性の
悪化が生じた9、印刷汚れを起す等の副作用を示し、実
用的でない。
Another method is to add a surfactant. In this case, it is possible to prevent the deterioration of the inking without causing background stains on the printed matter, but it is very easy to create bubbles.
When used in etching processors, etc., there are problems such as liquid leakage due to foaming and poor manufacturing suitability. There is a method of adding an antifoaming agent to eliminate foam, but if it is added until the antifoaming effect appears, the liquid stability deteriorates such as phase separation9, and side effects such as printing stains occur. , impractical.

本発明は上述の欠点を解消し、印刷物の地汚れが生じな
い平版印刷用処理液を提供するものである。
The present invention solves the above-mentioned drawbacks and provides a processing liquid for lithographic printing that does not cause background stains on printed matter.

本発明の第一の目的はエツチング・マシーン等の装置内
において結晶が析出せずメンテナンス・フリーで6〕か
つ長期間親水化力が変わらな−処層液を提供することに
ある。
The first object of the present invention is to provide a treatment solution that does not cause crystal precipitation in equipment such as etching machines, is maintenance-free, and has a long-term hydrophilicity.

本発明の第二の目的はいかなる条件においてもインキ着
肉性が良好でかつ印刷汚れが発生しくくい処理液を提供
することにある。
A second object of the present invention is to provide a processing liquid that has good ink receptivity under any conditions and is less likely to cause printing stains.

本発明の第三の目的はインキ乗9が迅速でかつインキ付
着汚れ除去性にすぐれた処理液を提供することにある。
A third object of the present invention is to provide a processing liquid that has rapid ink multiplication and excellent ability to remove ink-attached stains.

(問題点を解決するための手段) 本発明の目的は、下記の一般式(I)および(II)で
示される繰9返し単位を各々少なくとも1つずつ含む少
なくとも1種の共重合体と少なくとも1・種の下記一般
式(III)で示される化合物とを含有してなる平版印
刷用処理液により達成されることが見出され九。
(Means for Solving the Problems) An object of the present invention is to combine at least one copolymer containing at least one 9 repeating unit represented by the following general formulas (I) and (II), and at least It has been found that this can be achieved by a lithographic printing processing liquid containing 1. a compound represented by the following general formula (III);

一般式(I) 一般式(n) 式(りおよび(I1)中 R1%R1υコ8々水素原子又はメチル基を示し、R,
は水素原子、アルキル基、アリール基、アラルキル基又
は無機塩基を示し、 4 s Mv を暑苦々水素原子又は無機塩基を示す。
General formula (I) General formula (n) In the formula (I1), R1%R1υco8 represents a hydrogen atom or a methyl group, R,
represents a hydrogen atom, an alkyl group, an aryl group, an aralkyl group, or an inorganic base, and 4 s Mv represents a hydrogen atom or an inorganic base.

一般式(2) 式(2)中、R4−R1は互いに独立に各々水素原子又
は炭素数1〜7の置換若しくは無置換の、アルキル、ア
ルケニル、アリール若しくはアラルキル基を示すかある
いはR4−R1のうちの2つが一緒に任意にヘテ四原子
を含有していてもよい環を形成する。但し、R4〜R,
Oうちの全てが同時に水素原子を示すことはない。
General formula (2) In formula (2), R4-R1 each independently represent a hydrogen atom or a substituted or unsubstituted alkyl, alkenyl, aryl, or aralkyl group having 1 to 7 carbon atoms, or R4-R1 Two of them together form a ring which may optionally contain a heterotetraatom. However, R4~R,
All of them do not exhibit hydrogen atoms at the same time.

ム0は水酸基又は1価の酸残基を示す。Mu0 represents a hydroxyl group or a monovalent acid residue.

一般式(I)1jLび(n)で示される繰り返し単位を
各々少なくとも1つずつ含む共重合体について詳述する
Copolymers each containing at least one repeating unit represented by the general formula (I) 1jL and (n) will be described in detail.

R3がアルキル基を表わす場合にはメチル、エチル、プ
ロピル等の如き炭素数6以下のものが好ましく、アリー
ル基を表わす場合にはフェニル、トリル等の如き炭素数
8以下のものが好ましく、アラルキル基を表わす場合に
はベンジル等の如き炭素数8以下のものが好ましい。
When R3 represents an alkyl group, it preferably has 6 or less carbon atoms, such as methyl, ethyl, propyl, etc.; when it represents an aryl group, it preferably has 8 or less carbon atoms, such as phenyl, tolyl, etc.; When this is represented, those having 8 or less carbon atoms such as benzyl are preferred.

R3、Ml及び/又はM、が無機塩基を表わす場合には
、無機塩基として例えばアルカリ金属、アンそニウム等
を挙げることができる。
When R3, Ml and/or M represent an inorganic base, examples of the inorganic base include alkali metals, anthonium and the like.

本発明に使用される共重合体は、例えば一般式(I)の
成分に対応する単量体(例えばアクリル酸、メタクリル
酸、イタ;ン酸等)と無水マレイン酸との共重合物を加
水分解あるいは加アルコール分解する等の公知の方法で
得られる。
The copolymer used in the present invention is, for example, a copolymer of a monomer corresponding to the component of general formula (I) (for example, acrylic acid, methacrylic acid, itanoic acid, etc.) and maleic anhydride. It can be obtained by known methods such as decomposition or alcoholysis.

この共重合体における一般式(I)で示される繰り返し
単位対一般式(I)で示される繰り返し単位の比率は重
量比で?:1〜5:5の範囲が好ましい。
What is the ratio by weight of the repeating units represented by general formula (I) to the repeating units represented by general formula (I) in this copolymer? :1 to 5:5 is preferred.

又一般式(I)及び(I)で示される成分以外のものが
繰〕返し単位として共重合されていても良いが、それら
酸ヒドロキシエチルメタアクリレート、アクリルアミド
、N−アクリロイルモルホリン、ヒドロキシエチルアク
リルアミド、スチレンスルホン酸等の如き水溶性のモノ
マーを更に用いて共重合体を製造することによ〕導入す
るかあるいは酢酸ビニルとして共重合させた後加水分解
し、親水性基として導入することが好ましい。
In addition, components other than those represented by general formulas (I) and (I) may be copolymerized as repeating units, such as hydroxyethyl methacrylate, acrylamide, N-acryloylmorpholine, hydroxyethyl acrylamide, It is preferable to introduce the hydrophilic group by further producing a copolymer using a water-soluble monomer such as styrene sulfonic acid, or by copolymerizing it as vinyl acetate, followed by hydrolysis, and introducing it as a hydrophilic group.

又、共重合体における一般式(I)及び(II)で示さ
れる成分の和社好ましくは60重量係以下になる事はな
い。
Further, the weight ratio of the components represented by general formulas (I) and (II) in the copolymer preferably does not exceed 60% by weight.

これらの共重合体の分子量は約to00〜1へ000の
範囲が適しておシ約2.Goo〜a000の範囲が4I
K好ましい。
The molecular weight of these copolymers is suitably in the range of about 00 to 1000 and about 2.00 to 1.000. The range from Goo to a000 is 4I
K is preferred.

以下に本発明に使用される共重合体の例を示すが、本発
明はこれらに限定されるものではない。
Examples of copolymers used in the present invention are shown below, but the present invention is not limited thereto.

化合物例−1 化合物例−2 (H3 化合物例−3 化合物例−4 H3 Coo)In2  COONH4COONH4化合物列
−5 0H冨 cooHooon  ooou 化合物化合物 化合物例−7 これらO使用量はα01〜10重量憾、より好ましくは
11〜5重量係である。
Compound Example-1 Compound Example-2 (H3 Compound Example-3 Compound Example-4 H3 Coo)In2 COONH4COONH4 Compound Series-5 0H Tomi cooHoooon ooou Compound Compound Compound Example-7 The amount of these O used is α01 to 10 by weight, more preferably is 11-5 weight ratio.

また上記共重合体は単独で用いることも2種以上組み合
わせて用いることもでき、その使用量は101〜10重
量憾、より好ましくはα1〜5重量係である。
Further, the above copolymers can be used alone or in combination of two or more, and the amount used is 101 to 10% by weight, more preferably α1 to 5% by weight.

以下一般式(III)で示される化合物について詳述す
る。
The compound represented by the general formula (III) will be explained in detail below.

一般式(2)中、R4へR1は互いに独立に各々水素原
子又は炭素数1〜7の置換若しくは無置換の、アルキル
、アルケニル、アリール若しくはアラルキル基を示す。
In the general formula (2), R4 and R1 each independently represent a hydrogen atom or a substituted or unsubstituted alkyl, alkenyl, aryl or aralkyl group having 1 to 7 carbon atoms.

好ましくは炭素数1〜4である。Preferably it has 1 to 4 carbon atoms.

これらの好ましい置換基としてはアミノ基、アンモニオ
基、ヒドロキシ基、アシルオキシ基、アシルアミノ基な
どの親水性の基が挙げられる。
Preferred examples of these substituents include hydrophilic groups such as an amino group, an ammonio group, a hydroxy group, an acyloxy group, and an acylamino group.

またR4へR1の炭素数の合計は16以下、特に4〜1
2、が好ましい。更KR4〜R1のうちの全てが同時に
水素原子を示すことはない。ま九s R4へR1のうち
の2づが結合することKよ〕環を形成していても良い。
Also, the total number of carbon atoms in R1 to R4 is 16 or less, especially 4 to 1.
2 is preferred. Further, all of KR4 to R1 do not simultaneously represent hydrogen atoms. Two of R1 may be bonded to R4 to form a ring.

該環は任意にヘテロ原子、例えば窒素原子、酸素原子及
び/又は硫黄原子、を含有していてもよい。
The ring may optionally contain heteroatoms, such as nitrogen, oxygen and/or sulfur atoms.

ムeは水酸基または1価の酸残基、好ましくはOL”、
  Br”、  Xe、  HBOp %HPO4e等
(D無機以下に一般式(III)で示される化合物の代
表例を示すが、本発明はこれらによって制約、限定され
るものではない。
mue is a hydroxyl group or a monovalent acid residue, preferably OL",
Br", Xe, HBOp %HPO4e, etc. (D Inorganic) Representative examples of compounds represented by the general formula (III) are shown below, but the present invention is not restricted or limited by these.

化合物IPII−8(aHs)3− OR”化合物IF
IJ−9(OHs)4トOAe化合物fMJ−1o  
(011,)4N−B2O,e化合物例−12(0,m
ig)4”1i−On”化合物fl+J−1s  (c
l!Is)、’Bm−ate化合物例−14 Φ (an、−)、トanlam、−on−cnsso3e
化合物例−15 C馬CHI−1+O馬OB、0il)s−Br’化合物
1Fl−16(OE110]1iIO馬)4トO2e化
合物列−17 1s 化合物列−20 化合物例−21 Es 化合物fP4−22 0E  OIi 化合物例−23 (Can5 )s N H−OL” (トリメチルアミン水溶液) 化合物fMJ−2s   an、Tm、−on”(メチ
ルアミン水溶液) これらの化合物は単独で又は混合して用いることができ
るが、その使用量(混合した場合はその総量)は好まし
くはα001〜5重量係、よシ好ましくは1101〜1
重R係である。
Compound IPII-8(aHs)3-OR” Compound IF
IJ-9(OHs)4toOAe compound fMJ-1o
(011,)4N-B2O,e Compound Example-12 (0,m
ig) 4"1i-On" compound fl+J-1s (c
l! Is), 'Bm-ate compound example-14 Φ (an, -), anlam, -on-cnsso3e
Compound example-15 C horse CHI-1+O horse OB, 0il)s-Br' compound 1Fl-16 (OE110]1iIO horse)4toO2e Compound row-17 1s Compound row-20 Compound example-21 Es Compound fP4-22 0E OIi Compound Example-23 (Can5)s N H-OL" (trimethylamine aqueous solution) Compound fMJ-2s an, Tm, -on" (methylamine aqueous solution) These compounds can be used alone or in combination, but The amount used (total amount when mixed) is preferably α001 to 5 weight ratio, preferably 1101 to 1
I am in charge of heavy R.

また、一般式(I)及び(!l)で示される繰り返し単
位を含有する共重合体と一般式(III)で示される化
合物は任意に組合わせることができるが、特に前記化合
物例−10共重合体と前記化合物99−9.12又は1
3の化合物との組合わせを好ましく用いることができる
Further, the copolymer containing the repeating units represented by general formulas (I) and (!l) and the compound represented by general formula (III) can be arbitrarily combined, but in particular, the above-mentioned compound example 10 Polymer and the above compound 99-9.12 or 1
A combination with compound No. 3 can be preferably used.

親水化主剤は黄血塩およびリン酸塩、フィチン酸塩、ヘ
キサアミンコバルト塩等、従来よシ公知の化合物がすべ
て使用できる。黄血塩には黄血塩が酸化されることによ
り生成する赤血塩が一部含有され得る。
As the main hydrophilizing agent, all conventionally known compounds such as yellow blood salt, phosphate, phytate, and hexamine cobalt salt can be used. Yellow blood salt may partially contain red blood salt produced by oxidizing yellow blood salt.

更にこの他にpH調節剤、1)H緩衝剤を併用すること
ができる。それらは既によく知られている無機酸、有機
酸およびそれらの塩を単独もしくは混合して用いる。例
えばギ酸、酢酸、酪酸、吉草酸、乳酸、酒石酸、プロピ
オン酸、シュウ酸、マロン酸、コハク酸、グルタル酸、
マレイン酸、フタル酸、シトラコン酸、イタコン酸、フ
マル酸、トリカルバリル酸、グリコール酸、プロピオン
酸、チオグリコール酸、リンゴ酸、クエン酸、グルコン
酸、ヒルビン酸、ゲルコール酸、サルチル酸、アジピン
酸、ヒドロアクリル酸、グリセリン酸、?−)ルエンス
ルホン酸およびこれらの金属塩、有機アミン塩などであ
る。
Furthermore, in addition to this, a pH adjuster and 1) H buffering agent can be used in combination. They use well-known inorganic acids, organic acids and their salts alone or in combination. For example, formic acid, acetic acid, butyric acid, valeric acid, lactic acid, tartaric acid, propionic acid, oxalic acid, malonic acid, succinic acid, glutaric acid,
Maleic acid, phthalic acid, citraconic acid, itaconic acid, fumaric acid, tricarballylic acid, glycolic acid, propionic acid, thioglycolic acid, malic acid, citric acid, gluconic acid, hiruvic acid, gelcholic acid, salicylic acid, adipic acid, Hydroacrylic acid, glyceric acid,? -) Luenesulfonic acid, metal salts thereof, organic amine salts, etc.

またWTA−2Na のごときキレート剤、亜硫酸塩の
ごとき還元剤の添加も特に親水化主剤が黄血塩の場合は
親水化力を維持し沈澱を防止する上で好ましい。
In addition, addition of a chelating agent such as WTA-2Na and a reducing agent such as sulfite is also preferred, particularly when the main hydrophilizing agent is yellow blood salt, in order to maintain the hydrophilic power and prevent precipitation.

また主剤がフィチン酸塩の場合は更に特開昭60−25
099に示される水溶性カチオンポリマーと低分子電解
質化合物を加える事も、汚れを発生しにくくする上で望
ましい。
In addition, when the main agent is phytate, JP-A-60-25
It is also desirable to add a water-soluble cationic polymer shown in No. 099 and a low molecular weight electrolyte compound to prevent staining.

また湿潤剤および濡れ剤としてエチレングリコール、ジ
エチレングリコール、トリエチレングリコール、ホリエ
チレングリコール、グリセリン、アラビアゴム、カルボ
キシメチルセルロース、アクリルポリマー、メタノール
、エタノール、イソオヨヒノルマルプロピルアルコール
、トリエタノールアミンなどを加える事ができる。
In addition, ethylene glycol, diethylene glycol, triethylene glycol, polyethylene glycol, glycerin, gum arabic, carboxymethyl cellulose, acrylic polymer, methanol, ethanol, isopropylene normal propyl alcohol, triethanolamine, etc. can be added as wetting agents and wetting agents. .

更にサリチル酸、フェノール、フェノールパラ安息香酸
ブチル、デヒドロ酢酸ナトリウム、4−イソチアゾロン
−3−オン化合物等の防腐剤を加える事ができる。
Furthermore, preservatives such as salicylic acid, phenol, butyl phenol-parabenzoate, sodium dehydroacetate, and 4-isothiazolone-3-one compounds can be added.

加えて亜硝酸ナトリウム、亜硝酸ジシクロヘキシルアン
モニウム等の防錆剤を添加することもできる。
In addition, rust preventives such as sodium nitrite and dicyclohexylammonium nitrite can also be added.

本発明になる平版印刷用処理液を印刷版に適用するに当
九っては、従来よシこの分野で使われているエツチング
プロセッサーのいずれの処理機に用いても良い。
When applying the lithographic printing processing liquid of the present invention to printing plates, it may be used in any etching processor conventionally used in this field.

更にハンドエツチング用としても、指紋等の汚れ防止を
目的としたプリエツチング用としても十分にその特性を
活用することができる。
Furthermore, its characteristics can be fully utilized for hand etching and pre-etching for the purpose of preventing stains such as fingerprints.

また本平版印刷用処理液は水で希釈することによシオフ
セットマスターやps版の湿し水として使う事もできる
Furthermore, this lithographic printing processing liquid can also be used as a dampening water for offset masters and PS plates by diluting it with water.

以下に本発明の実施例を示す。ただしこれによって本発
明が制約を受けるものではない。
Examples of the present invention are shown below. However, the present invention is not limited by this.

実施例1 7エロシアン化カリウム        20Pリン酸
1アンモニウム        60Pクエン酸2アン
モニウム       10P亜硫酸ナトリウム   
        topIDTム−2ナトリウム   
    α4Pアクリル酸/無水マレイン酸共重合体 
   10Pナトリウム塩 (重量比80720 ) (分子量 翫ooo〜1へ000) 塩化テトラエチルアンモニウム     2P水 (合
計)       1000p本処方をエツチング液と
し更に水で7倍に希釈して湿し水とし、富士フィルムE
LF−1Marklシステムにて製版したマスターをE
LFインキ(墨、速乾)を用いハマダスタ−800で印
刷した。刷シ出しから1万枚までまったく汚れることな
く鮮明に印刷できた。更にこのエツチング液を補給しな
がら3000版の処理を1ケ月かけてテストした。その
結果初めの1版めと最後の3000版目の印刷物の品質
にはほとんど差が見られず、親水化力、インキの着肉性
等の低下は認められなかった。エツチング装置内には結
晶、カス、沈澱などはほとんどみられなかった。また、
処理中泡の発生は認められなかった。またエツチング乾
燥後室内に2日間放置したマスターを同様に印刷(乾燥
放置テスト)シたとζろ、細線や網点のハイライト部の
着肉は極めて良好であった。
Example 1 7 Potassium erocyanide 20P monoammonium phosphate 60P diammonium citrate 10P sodium sulfite
topIDT Mu-2 Sodium
α4P acrylic acid/maleic anhydride copolymer
10P sodium salt (weight ratio 80720) (molecular weight 翫ooo~1000) Tetraethylammonium chloride 2P water (total) 1000p Use this formulation as an etching solution, dilute it 7 times with water to make a dampening solution, and use Fuji Film E
The master made with the LF-1 Markl system is
It was printed with Hamada Star 800 using LF ink (black, quick drying). I was able to print 10,000 sheets clearly without any smudges from the beginning of the printing process. Further, the processing of 3000 plates was tested for one month while replenishing this etching solution. As a result, there was almost no difference in the quality of the printed matter between the first edition and the final 3000th edition, and no deterioration in hydrophilicity, ink receptivity, etc. was observed. Almost no crystals, scum, or precipitates were observed in the etching apparatus. Also,
No foam was observed during the treatment. Furthermore, when the master, which had been left indoors for two days after etching and drying, was similarly printed (drying test), the inking of the highlighted areas of fine lines and halftone dots was extremely good.

比較例1 実施例1の処方から、アクリル酸/無水マレイン酸共重
合体ナトリウム塩および塩化テトラエチルアンモニウム
を除外した以外はすべて同様にしてテストをおこなった
。エツチング液を補給しながらの3000版処理の1ケ
月テストでは、スタート後3臼目からエツチング装置内
に結晶、カス、沈澱が発生し始め、その後も更に増して
、印刷版上に付着して、印刷汚れとなった。又1ケ月後
には軸受部に結晶が析出堆積し、装置の駆動に支障をき
たした。更に乾燥放置テストでは画偉の一部にインキが
乗シにくい傾向があられれた。
Comparative Example 1 A test was conducted in the same manner as in Example 1 except that the sodium salt of acrylic acid/maleic anhydride copolymer and tetraethylammonium chloride were excluded. In a one-month test of processing 3,000 plates while replenishing the etching solution, crystals, scum, and precipitates began to form inside the etching device from the third mound after starting, and after that, they continued to increase and adhere to the printing plates. The printing became smudged. Moreover, after one month, crystals were deposited on the bearing, which caused trouble in driving the device. Furthermore, in the drying test, it was found that the ink tended to be difficult to get on some parts of the image.

実施例2 実施例1における、アクリル酸/無水マレイン酸共重合
体ナトリウム塩の代わシに等量のアクリル[/メタアク
リル酸/無水マレイン酸共重合体(重量比70/10/
20、分子量500ト10000)を、また塩化テトラ
エチルアンモニウムの代わシに等モルの水酸化テトラn
−プロピルを用いた他は実施例1と同様にしてテストを
おこなった。結果は実施例1に劣らず満足すべきもので
あった。
Example 2 In place of the acrylic acid/maleic anhydride copolymer sodium salt in Example 1, an equivalent amount of acrylic acid/methacrylic acid/maleic anhydride copolymer (weight ratio 70/10/
20, molecular weight 500 to 10,000), and in place of tetraethylammonium chloride, equimolar amount of tetran hydroxide was added.
The test was conducted in the same manner as in Example 1 except that -propyl was used. The results were as satisfactory as in Example 1.

実施例3 実施例1におけるアクリル酸/無水マレイン酸共重合体
す)+7ウム塩の代りに前記化合物例−4で示される共
重合体8P及び塩化テトラエチルアンモニウムの代りに
前記化合物例−25で示される化合物の水溶液(I0w
t%)30jlを用いた他は、実施例1と同様に製版し
、印刷した。
Example 3 In place of the acrylic acid/maleic anhydride copolymer (S) + 7um salt in Example 1, the copolymer 8P shown in Compound Example-4 was used, and in place of tetraethylammonium chloride, the copolymer 8P shown in Compound Example-25 was used. Aqueous solution of compound (I0w
Plate making and printing were carried out in the same manner as in Example 1, except that 30 jl (t%) was used.

更にこのエツチング液を補給しながら、2週間で500
0版の処理を行なった結果、実施例1と同様の結果が得
られた。
Furthermore, while replenishing this etching solution, 500
As a result of performing the zero plate processing, the same results as in Example 1 were obtained.

またエツチング乾燥後、室内に2日間放置したマスター
を印刷した結果、着肉性に変化は認められなかった。
Further, when the master was left indoors for 2 days after etching and drying, no change was observed in the ink receptivity.

実施例4 実施例1におけるアクリル酸/無水マレイン酸共重合体
ナトリウム塩の代シに前記化合物例−6で示される共重
合体15P及び塩化テトラエチルアンモニウムの代シに
前記化合物例−17で示される化合物3Pを用いた他は
、実施例1と同様に製版し、印刷した。。
Example 4 In place of the acrylic acid/maleic anhydride copolymer sodium salt in Example 1, the copolymer 15P shown in Compound Example-6 was used, and in place of tetraethylammonium chloride, the compound shown in Compound Example-17 was used. Plate making and printing were carried out in the same manner as in Example 1, except that Compound 3P was used. .

更にこのエツチング液を補給しながら、2週間で300
0版の処理を行なった結果、実施例1と同様の結果が得
られた。
Furthermore, while replenishing this etching solution, it became 300 ml in 2 weeks.
As a result of performing the zero plate processing, the same results as in Example 1 were obtained.

ま次、エツチング乾燥後、室内に2日間放置したマスタ
ーを印刷した結果、着肉性に変化は認められなかった。
Next, after etching and drying, the master was left indoors for two days and no change was observed in the ink receptivity.

実施例5 実施例1におけるアクリル酸/無水マレイン酸共重合体
ナトリウム塩の代シに前記化合物例−7で示される共重
合体155g及び塩化テトラエチルアンモニウムの代シ
に化合物例18で示される化合物2Fを用いた他は、実
施例1と同様に製版し印刷した。
Example 5 In place of the acrylic acid/maleic anhydride copolymer sodium salt in Example 1, 155 g of the copolymer shown in Compound Example-7 and in place of tetraethylammonium chloride, compound 2F shown in Compound Example 18 was used. Plate making and printing were carried out in the same manner as in Example 1, except that .

更にこのエツチング液を補給しながら、2週間で300
0版の処理を行なった結果、実施例1と同様の結果が得
られた。
Furthermore, while replenishing this etching solution, it became 300 ml in 2 weeks.
As a result of performing the zero plate processing, the same results as in Example 1 were obtained.

また、エツチング乾燥後、室内に2日間放置したマスタ
ーを印刷した結果、着肉性に変化は認められなかった。
Further, when the master was left indoors for 2 days after etching and drying, no change was observed in the ink receptivity.

(発明の効果) 本発明の処理液は製造適性に優れるとともにエツチング
装置内での、結晶、カス、沈澱等の発生を防止するのに
優れた性能を有し、更にそれを用いて得られる印刷物も
インキ着肉性、地汚れ等の点において優れた性能を有す
る。
(Effects of the Invention) The processing liquid of the present invention has excellent manufacturing suitability and excellent performance in preventing the generation of crystals, scum, precipitation, etc. in an etching device, and furthermore, the processing liquid obtained by using the processing liquid It also has excellent performance in terms of ink receptivity, background smearing, etc.

本発明の平版印刷用処理液に含有される化合物は、市販
品等も含まれ、比較的容易に入毛でき、優れた性能を有
する本処理液が容易に且つ経済的に調整できる。
The compounds contained in the processing liquid for lithographic printing of the present invention include commercially available products, and can be applied relatively easily, and the processing liquid having excellent performance can be prepared easily and economically.

Claims (1)

【特許請求の範囲】 1)下記一般式( I )および(II)で示される繰り返
し単位を少なくとも各々1つずつ含む少なくとも1種の
共重合体と少なくとも1種の下記一般式(III)で示さ
れる化合物とを含有することを特徴とする平版印刷用処
理液。 一般式( I ) ▲数式、化学式、表等があります▼ 一般式(II) ▲数式、化学式、表等があります▼ 式( I )および(II)中 R_1、R_2は各々水素原子又はメチル基を示し、R
_3は水素原子、アルキル基、アリール基、アラルキル
基又は無機塩基を示し、 M_1、M_2は各々水素原子又は無機塩基を示す。 一般式(III) ▲数式、化学式、表等があります▼ 式(III)中、R_4〜R_7は互いに独立に各々水素
原子又は炭素数1〜7の置換若しくは無置換の、アルキ
ル、アルケニル、アリール若しくはアラルキル基を示す
かあるいはR_4〜R_7のうちの2つが一緒に任意に
ヘテロ原子を含有していてもよい環を形成する。但し、
R_4〜R_7のうちの全てが同時に水素原子を示すこ
とはない。 ▲数式、化学式、表等があります▼は水酸基又は、1価
の酸残基を示す。 2)黄血塩を主剤として含むことを特徴とする、特許請
求の範囲第1項記載の平版印刷用処理液。
[Scope of Claims] 1) At least one type of copolymer containing at least one repeating unit each represented by the following general formulas (I) and (II) and at least one type represented by the following general formula (III). 1. A lithographic printing processing liquid characterized by containing a compound comprising: General formula (I) ▲ Contains mathematical formulas, chemical formulas, tables, etc. ▼ General formula (II) ▲ Contains mathematical formulas, chemical formulas, tables, etc. ▼ In formulas (I) and (II), R_1 and R_2 each represent a hydrogen atom or a methyl group. Show, R
_3 represents a hydrogen atom, an alkyl group, an aryl group, an aralkyl group, or an inorganic base, and M_1 and M_2 each represent a hydrogen atom or an inorganic base. General formula (III) ▲There are numerical formulas, chemical formulas, tables, etc.▼ In formula (III), R_4 to R_7 each independently represent a hydrogen atom, or a substituted or unsubstituted alkyl, alkenyl, aryl or alkyl having 1 to 7 carbon atoms. represents an aralkyl group or two of R_4 to R_7 together form a ring which may optionally contain heteroatoms. however,
All of R_4 to R_7 do not represent hydrogen atoms at the same time. ▲There are mathematical formulas, chemical formulas, tables, etc. ▼ indicates a hydroxyl group or a monovalent acid residue. 2) The processing liquid for lithographic printing according to claim 1, characterized in that it contains yellow blood salt as a main ingredient.
JP61245572A 1986-10-17 1986-10-17 Processing liquid for lithographic printing Expired - Lifetime JPH0635217B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61245572A JPH0635217B2 (en) 1986-10-17 1986-10-17 Processing liquid for lithographic printing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61245572A JPH0635217B2 (en) 1986-10-17 1986-10-17 Processing liquid for lithographic printing

Publications (2)

Publication Number Publication Date
JPS6399993A true JPS6399993A (en) 1988-05-02
JPH0635217B2 JPH0635217B2 (en) 1994-05-11

Family

ID=17135713

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61245572A Expired - Lifetime JPH0635217B2 (en) 1986-10-17 1986-10-17 Processing liquid for lithographic printing

Country Status (1)

Country Link
JP (1) JPH0635217B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008213269A (en) * 2007-03-02 2008-09-18 Fuji Yakuhin Kogyo Kk Concentrated dampening water composition for lithographic printing
JP2010284963A (en) * 2009-01-06 2010-12-24 Fujifilm Corp Plate surface treatment agent for lithographic printing plate and method for treating lithographic printing plate

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58215399A (en) * 1982-06-09 1983-12-14 Fuji Photo Film Co Ltd Treatment of offset master for making it hydrophilic

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58215399A (en) * 1982-06-09 1983-12-14 Fuji Photo Film Co Ltd Treatment of offset master for making it hydrophilic

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008213269A (en) * 2007-03-02 2008-09-18 Fuji Yakuhin Kogyo Kk Concentrated dampening water composition for lithographic printing
JP2010284963A (en) * 2009-01-06 2010-12-24 Fujifilm Corp Plate surface treatment agent for lithographic printing plate and method for treating lithographic printing plate

Also Published As

Publication number Publication date
JPH0635217B2 (en) 1994-05-11

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