JPS6387608A - Thin film magnetic head - Google Patents

Thin film magnetic head

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Publication number
JPS6387608A
JPS6387608A JP23114986A JP23114986A JPS6387608A JP S6387608 A JPS6387608 A JP S6387608A JP 23114986 A JP23114986 A JP 23114986A JP 23114986 A JP23114986 A JP 23114986A JP S6387608 A JPS6387608 A JP S6387608A
Authority
JP
Japan
Prior art keywords
coil
layer
core
insulating layer
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23114986A
Other languages
Japanese (ja)
Other versions
JP2564284B2 (en
Inventor
Yuko Kumisawa
組沢 優子
Masakatsu Saito
斉藤 正勝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP61231149A priority Critical patent/JP2564284B2/en
Publication of JPS6387608A publication Critical patent/JPS6387608A/en
Application granted granted Critical
Publication of JP2564284B2 publication Critical patent/JP2564284B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To eliminate an abuse due to step coverage degradation of an insulating layer formed on a coil upper layer and an abuse due to cavities of the insulating layer by forming a coil so that both angular shoulder parts of its section are cut away and increasing the coil resistance. CONSTITUTION:A lower core 2, an inter-layer insulating layer 3, a conductor coil 4, and an upper core 5 are formed on a substrate 1, and the upper core 5 and the lower core 2 are connected in a core connection part 7, and a gap 8 is provided to form a magnetic circuit. Since both angular shoulder of the section of the conductor coil 4 are cut away, the problem of the layer material and peeling of the insulating layer in both coil shoulder parts are prevented. Thus, short-circuit between the upper layer coil 4b and the upper core 5 or the like is eliminated, and a head is obtained with a good yield.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、磁気記録用または再生用の薄膜磁気ヘッドに
係り、特にマルチターンコイル構造の該薄膜磁気ヘッド
に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a thin film magnetic head for magnetic recording or reproduction, and more particularly to a thin film magnetic head having a multi-turn coil structure.

〔従来の技術〕[Conventional technology]

従来の薄膜ヘッドは、アイビーエム ディスクストレー
ジ テクノロジー(1980)第6頁から第・9頁(I
BM Disk Storage Tachrolol
y、 Fsb、(1980)・pp6−9)および特開
昭57−66522号に記載され5ているように、コイ
ル形状は、鳥屋断面と台形断。
Conventional thin-film heads are described in IBM Disk Storage Technology (1980), pages 6 to 9 (I
BM Disk Storage Tachrolol
y, Fsb, (1980), pp6-9) and JP-A No. 57-66522, the coil shapes are a Toriya cross section and a trapezoidal cross section.

面の2種類が提案され、コイル絶縁材料には、凹−凸の
平坦化が容易なフォトレジストやポリイミド。
Two types of surfaces have been proposed, and the coil insulating material is photoresist and polyimide, which can easily flatten the concave and convex surfaces.

系樹脂等の有機材料を用いたものが実用になって。Products using organic materials such as resins have come into practical use.

いる。角型コイルの従来ヘッドの1例を第7図に。There is. Figure 7 shows an example of a conventional square coil head.

示す、、2種類のコイルは、断面積の点から角型。The two types of coils shown are rectangular in terms of cross-sectional area.

(口型)コイルの方が台盤(Q型)のコイルに比、。(Mouth type) coil is better than base plate (Q type) coil.

べ、1ターンあたりの許容電流が大きく、記録能。The allowable current per turn is large, and the recording ability is high.

力を高めている。また、コイル抵抗の点からは当。increasing power. Also, from the point of view of coil resistance.

然角型コイルの方が抵抗値は小さくでき、インピーダン
スノイズの低減を図り、s/N向上を達成できる。
A square coil can have a smaller resistance value, reduce impedance noise, and improve S/N.

しかし、形成に高温を必要とするF g −Aj −S
 iやCo −Nh −Zr等の高Bs 、高摩耗性の
磁性薄膜をコア材に用いる場合には、コイルの絶縁材料
に、有機材料の代わりに耐熱性の高いf3i0xのよう
な無機材料が必要となり、角型コイルの場合には以下6
の様な問題を生じる。
However, F g −Aj −S requires high temperature to form.
When a high Bs, highly abrasive magnetic thin film such as i or Co-Nh-Zr is used as the core material, an inorganic material such as f3i0x with high heat resistance is required as the insulating material for the coil instead of an organic material. In the case of a square coil, the following 6
This causes problems such as:

第8図((Z)に示す様に、上層に形成した無機絶縁。FIG. 8 (As shown in (Z), inorganic insulation formed on the upper layer.

層3はステップカバレッジ不良部10を生じ、抜工。Layer 3 had defective step coverage 10 and was removed.

程での熱履歴でクラック、剥離を生じる。また同。Cracks and peeling occur due to thermal history during the process. Same again.

図(b)に示す様に、コイル巻数の増加あるいは磁路;
長短縮によるヘッド効率向上を目的としてコイル。
As shown in Figure (b), increase in the number of coil turns or magnetic path;
Coil designed to improve head efficiency by shortening the length.

間隔を狭くした場合、絶縁層に空洞11を生じたり、同
図(α)と同様の問題が発生し1歩留りよくヘッド。
If the spacing is made narrower, cavities 11 will be created in the insulating layer, and problems similar to those shown in FIG.

を提供することができなかった。could not be provided.

〔発明が解決しようとする問題点〕1.。[Problems to be solved by the invention] 1. .

上記従来技術では、コイル上に形成する絶縁層。In the above conventional technology, an insulating layer is formed on the coil.

の膜質への配慮がされておらず、コイル間のシ1゜−ト
や絶縁膜の剥離という問題があった。
No consideration was given to the quality of the film, and there was a problem of peeling of the sheet between the coils and the insulating film.

本発明の目的は、コイルの抵抗値を上げずに刑イル上層
に形成する無機絶縁層のステップカバン、3ツジ悪化に
よる弊害、絶縁層の空洞による弊害等を無クシ、歩留り
よおヘッドを提供することにある。
The purpose of the present invention is to provide a step bag of an inorganic insulating layer formed on the upper layer of the coil without increasing the resistance value of the coil, and to provide a head that eliminates the adverse effects caused by deterioration of the coil and the disadvantages caused by cavities in the insulating layer, and improves the yield. It's about doing.

〔問題点を解決するための手段〕[Means for solving problems]

上記目的は、コイル断面形状をコイル抵抗に影罵 響を与えない範囲内でコイル上部の両肩をおとし・た形
状とすることによって達成される。
The above object is achieved by making the cross-sectional shape of the coil such that both shoulders of the upper part of the coil are lowered within a range that does not affect the coil resistance.

〔作用〕[Effect]

コイルバターニング用のマスク材条件等を最適化するこ
とにより、イオンエツチング善後ノコイール断面形状を
角型コイルの上部両肩をおとした形・状とする。これに
より、上層に形成する絶縁層の。
By optimizing the mask material conditions for coil buttering, etc., the cross-sectional shape of the coil after ion etching is made into a shape with the upper shoulders of the rectangular coil being lowered. This allows the insulation layer to be formed as an upper layer.

ステップカバレッジ悪化、空洞形成を防止すると。Step coverage deteriorates and prevents cavity formation.

とができ、これらによる弊害が無くなり1歩留りよくヘ
ッドを提供することができる。
This eliminates the disadvantages caused by these and enables heads to be provided with a high yield.

〔実施例〕〔Example〕

以下に本発明の薄膜磁気ヘッドについて1図面。 Below is a drawing of the thin film magnetic head of the present invention.

を参照しながら具体的に説明する。This will be explained in detail with reference to.

第1図は9本発明の実施例である薄膜磁気ヘラ。FIG. 1 shows a thin film magnetic spatula that is an embodiment of the present invention.

ドの平面図5第2図は第1図のA −A’断面図、第、
−3図(α)ハ従来ヘッド断面(第7図)の拡大図、(
6)。
Figure 2 is a cross-sectional view taken along line A-A' in Figure 1.
-Figure 3 (α) C Enlarged view of the conventional head cross section (Figure 7), (
6).

は本発明のヘッド断面(第2図)の拡大図である。2 is an enlarged view of the head cross section (FIG. 2) of the present invention.

たたし、保護膜、保護板は省略しである。However, the tassel, protective film, and protective plate are omitted.

薄膜磁気ヘッド6は、基板1上に下部コア2、。The thin film magnetic head 6 includes a lower core 2 on a substrate 1.

眉間絶縁層3、導体コイル4、上部コア5から形。、成
されている。上部コア5と下部コア2はコア接・続部7
で接続され、ギャップ8を有して磁気回路・を形成して
いる。なお、上・下部コアは高透磁率・磁性材、例えば
Co −Nh −Zr系アモルファスから・なり、眉間
絶縁層は8iCh 、ギャップはCr、導体コーイルは
Ctb等からなる。
Shaped from the glabellar insulating layer 3, the conductor coil 4, and the upper core 5. , has been completed. Upper core 5 and lower core 2 are core connection/connection part 7
are connected with a gap 8 to form a magnetic circuit. The upper and lower cores are made of a high permeability/magnetic material, such as a Co-Nh-Zr amorphous material, the glabella insulating layer is made of 8iCh, the gap is made of Cr, and the conductor coil is made of Ctb.

第2図、第3図(41に示す様に、導体コイル4が。The conductor coil 4 is shown in FIGS. 2 and 3 (as shown at 41).

角型の両肩をおとした断面形状(0型)を持つと。It has a square cross-sectional shape with both shoulders down (0 type).

とにより、コイル両肩部の絶縁層の膜質の問題や。This may cause problems with the quality of the insulating layer on both shoulders of the coil.

ハガレを防止することができるため、上層コイル1.。Upper layer coil 1. .

4ξ上部コア5とのショート等がなくなり1歩留。4ξ There is no short circuit with the upper core 5, and the yield is 1.

りよくヘッドを提供することができる。It is possible to provide a better head.

また1本発明の■型コイル構造とすることによ。In addition, by adopting the ■-shaped coil structure of the present invention.

つて、上部コアのコイル端近傍の磁気特性の劣化。As a result, the magnetic properties near the coil ends of the upper core deteriorate.

防止にも効果があり、ヘッドの記録再生効率も改1、善
する利点がある。以下にその理由を説明する。
It is also effective in preventing this, and has the advantage of improving the recording and reproducing efficiency of the head. The reason is explained below.

薄膜ヘッドを作製する上で、コイル形成後何らかの方法
によりコイル凹凸を平坦化した絶縁層を形成し、凹凸に
よる磁気特性の劣化を防ぐ必要がある。その平坦化手段
としてエッチバック法がより。
In manufacturing a thin film head, it is necessary to form an insulating layer with flattened irregularities of the coil by some method after forming the coil to prevent deterioration of magnetic properties due to the irregularities. The etch-back method is the best planarization method.

4 ・ く用いられる。その場合、エツチング終点の判定・が難
しく、若干の段差がある状態(エッチング不・足)で工
程を終えることがしばしば起る。第3図はその時の従来
コイル構造(α)と本発明のコイル構・造優)による違
いを示したものである。すなわち、−両図において、記
号Xで示したコイル端近傍の上・部コアは、従来構造で
は磁気特性が劣化するのに・対して1本発明によれば、
同部分にはゆるい傾斜・かついているため磁気特性の劣
化は生じない。以。
4. Often used. In this case, it is difficult to determine the end point of etching, and the process often ends with a slight difference in level (insufficient or insufficient etching). FIG. 3 shows the difference between the conventional coil structure (α) and the coil structure of the present invention. That is, in both figures, the magnetic properties of the upper core near the end of the coil indicated by symbol X deteriorate in the conventional structure, whereas according to the present invention,
Since this part has a gentle slope and slope, no deterioration of magnetic properties occurs. More.

上のことから1本発明によれば、絶縁層形成工程。From the above, according to the present invention, there is an insulating layer forming step.

のプロセスマージンを大幅に改善でき、この点に。In this regard, the process margin can be significantly improved.

おいてもヘッド歩留り向上の効果が犬である。 。However, the effect of improving head yield is that of dogs. .

次にコイルを角型の両肩をおとした断面形状に。Next, make the coil into a square cross-section with both shoulders down.

パターニングする第一の方法としては、第4図1)に示
す様にエツチングする導体膜4′、膜厚aとマ、。
The first method of patterning is to etch the conductor film 4', which has a film thickness a and ma, as shown in FIG. 4 (1).

スフ材9のエツチング速度からマスク材の膜厚す。The film thickness of the mask material is determined from the etching speed of the surface material 9.

を決定する。例えば導体膜がCw sμmの場合、イ。Determine. For example, if the conductor film is Cw s μm, a.

オンエツチング条件をIarc : 1.6 A 、 
Vacc : 700 V *。
The on-etching conditions were Iarc: 1.6 A,
Vacc: 700 V*.

ビーム入射角0°とした時、フォトレジスト(マイ。When the beam incidence angle is 0°, photoresist (my.

クロポジット)膜厚1,8μmが適当である。同図2人
でイオンエツチングにより、導体膜をエツチング・する
。一般に肩の部分Aのエツチング速度は他の・部分に比
べ速いため、エツチング終了後は同図3)・の様になり
、レジスト除去後、同図4)に示す様な・O型コイルを
得ることができる。
Croposit) film thickness of 1.8 μm is appropriate. In the figure, two people etched the conductor film by ion etching. In general, the etching speed of the shoulder part A is faster than other parts, so after etching is completed, the result will be as shown in Figure 3), and after the resist is removed, an O-shaped coil as shown in Figure 4) will be obtained. be able to.

パターニングの第二の方法としては、第5図1)に・示
す様に、導体膜のエツチング終了時に、コイル・端部の
上、B部にレジストが残る様なレジスト膜・厚を塗布し
、導体膜4をエツチングする。導体膜・のエツチングが
終了したら、同図2)に示す様にし1゜シスト12を還
布する。レジストの平坦化作用によ。
As shown in Fig. 5 (1), the second method of patterning is to apply a resist film thick enough to leave resist on the coil end portion B at the end of etching the conductor film. The conductor film 4 is etched. When the etching of the conductor film is completed, the cyst 12 is returned by 1° as shown in FIG. 2). Due to the flattening effect of the resist.

す、コイル上の膜厚dは薄く、コイル間の膜厚e。The film thickness d on the coil is thin, and the film thickness between the coils e.

は厚くなる。例えばIl[6μm1間隔4μm、段差3
μmの場合には、dは0.8μm、 gは6.5μmと
なる。膜。
becomes thicker. For example, Il [6 μm, 1 interval 4 μm, step 3
In the case of μm, d is 0.8 μm and g is 6.5 μm. film.

厚eが、コイル端部上の膜厚Cより厚くなる様ζ5条件
でレジスト12を塗布する。イオンエツチング。
The resist 12 is applied under the conditions of ζ5 so that the thickness e becomes thicker than the film thickness C on the end of the coil. Ion etching.

により、コイル端部の両肩Cがエツチングされる。As a result, both shoulders C at the end of the coil are etched.

までエツチングする。、(同図3))レジストを除去。Etch until. , (Figure 3)) Remove the resist.

して、同図りに示す様な0型コイルを得ることが。Then, a type 0 coil as shown in the same figure can be obtained.

できる。この方法によれば、第1の方法に比べ% 2゜
・ 7 ・ コイルパターニング用のレジスト膜厚の条件範囲・が広
くなる。
can. According to this method, the condition range of the resist film thickness for coil patterning becomes wider by %2°.7. compared to the first method.

第6図に本発明の第2の実施例を示す。   ・第6図
1)に示す様に、導体膜4′上に第2の金属・層13を
蒸着、スパッタリング等により形成する。−・できれば
、導体膜と同一チャンバー内で形成する・ことがグロマ
ス的には望ましい。第2の金属層は・、導体膜4′より
エツチング速度の遅いものを選ぶ。。
FIG. 6 shows a second embodiment of the invention. - As shown in FIG. 6 (1), a second metal layer 13 is formed on the conductor film 4' by vapor deposition, sputtering, etc. - If possible, it is globally desirable to form it in the same chamber as the conductor film. The second metal layer is selected to have a slower etching rate than the conductor film 4'. .

例えば、導体膜がCtb 、 At等の場合、第2の金
属層としては、Cr 、 Ti 、 NiCr等を用い
ればよ<ml。
For example, when the conductive film is made of Ctb, At, etc., Cr, Ti, NiCr, etc. may be used as the second metal layer.

また導体膜がCμの場合には、接合層として、導体膜の
上・下層に例えばCr500X程度を必要とする。
Further, when the conductor film is Cμ, for example, approximately Cr500X is required as a bonding layer on the upper and lower layers of the conductor film.

ため、該上層の接合層膜厚を厚くすることで、プ。Therefore, by increasing the thickness of the upper bonding layer, the

ロセスな増すことなく、同様の効果を得ることができる
。                   15この方
法によれば、コイルパターニングのだ瞭のレジスト膜厚
を薄くすることができるため、ノミターニング精度が向
上するとともに、オーバエラ。
Similar effects can be obtained without the added process. 15 According to this method, it is possible to reduce the thickness of the resist film in the coil patterning, thereby improving chisel turning accuracy and reducing over-edge.

チングによるコイル形状の変化が小さくプロセへマージ
ンが大きくなる。           2゜、 8 
Changes in the coil shape due to chipping are small and the processing margin is large. 2°, 8
.

[発明の効果] 以上、本発明によれば、コイルを角型の両肩を・おとし
た断面形状のコイルとすることで、コイル・抵抗を増加
させることなく、コイル上層に形成す・る絶縁層のステ
ップカバレッジ悪化による弊害、5絶縁層の空洞による
弊害が無くなるので、歩留り。
[Effects of the Invention] As described above, according to the present invention, by forming the coil with a rectangular cross-sectional shape with both shoulders lowered, it is possible to form the coil in the upper layer without increasing the coil resistance. Yield is improved because the negative effects caused by poor step coverage of the insulating layer and the negative effects caused by cavities in the five insulating layers are eliminated.

よくヘッドを提供することができる。Well head can be provided.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の実施例による薄膜磁気ヘッド。 の平面図、第2図は第1図のA−A断面図、第3、。 図(α)は従来ヘッド(第7図)の拡大断面図、第3゜
図(町は本発明のヘッド断面(第2図)の拡大図、。 第4図はコイルパターニング方法を示す工程図、。 第5図は他のコイルパターニング方法を示す工私図、第
6図は本発明の第2の実施例を示す断面鴫5、第7図は
従来例の薄膜磁気ヘッドの断面図、第8゜図は角型コイ
ル上に形成した絶縁層の断面図であ。 る。 1・・・基板、2・・・下部コア、6・・・絶縁層、 
4a 、 48・・・導体コイル、4′・・・導体膜、
5・・・上部コア、61.。 薄膜磁気ヘッド、7・・・コア接続部、8・・・ギャッ
プ・、9・・・フォトレジスト、9′・・・ポストベー
ク後のフオ・トレジスト、10・・・ステップカバレッ
ジ、11・・・空洞・。 12・・・フォトレジスト、13・・・第2の金属層。    ・4・′へ
FIG. 1 shows a thin film magnetic head according to an embodiment of the present invention. FIG. 2 is a plan view of FIG. 1, and FIG. Figure (α) is an enlarged cross-sectional view of the conventional head (Figure 7), Figure 3 is an enlarged cross-sectional view of the head cross-section of the present invention (Figure 2), and Figure 4 is a process diagram showing the coil patterning method. ,. Fig. 5 is an engineering drawing showing another coil patterning method, Fig. 6 is a cross-sectional diagram showing a second embodiment of the present invention, and Fig. 7 is a cross-sectional view of a conventional thin-film magnetic head. The 8° figure is a cross-sectional view of the insulating layer formed on the square coil. 1... Substrate, 2... Lower core, 6... Insulating layer,
4a, 48...conductor coil, 4'...conductor film,
5... Upper core, 61. . Thin film magnetic head, 7... Core connection portion, 8... Gap, 9... Photo resist, 9'... Photo resist after post baking, 10... Step coverage, 11... cavity·. 12... Photoresist, 13... Second metal layer.・Go to 4・′

Claims (1)

【特許請求の範囲】 1、下部コア、単層または複数層の導体コイルと該導体
コイル間および上・下部コアとの絶縁をとる絶縁層、上
部コアの順に積層形成されてなる薄膜磁気ヘッドにおい
て、前記導体コイルが角型の上側両肩をおとした断面形
状を持つことを特徴とした薄膜磁気ヘッド。 2、第1項記載の角型の上側両端をおとした断面形状を
持つ導体コイルの上層部分に第2の金属層を持つことを
特徴とした薄膜磁気ヘッド。
[Claims] 1. In a thin film magnetic head formed by laminating a lower core, a single-layer or multiple-layer conductor coil, an insulating layer for insulating between the conductor coils and the upper and lower cores, and an upper core in this order. . A thin film magnetic head, wherein the conductor coil has a rectangular cross-sectional shape with both upper shoulders down. 2. A thin film magnetic head characterized in that a second metal layer is provided on the upper layer of the conductor coil having a cross-sectional shape with both upper ends of the rectangular shape as described in item 1 cut.
JP61231149A 1986-10-01 1986-10-01 Method of manufacturing thin film coil Expired - Fee Related JP2564284B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61231149A JP2564284B2 (en) 1986-10-01 1986-10-01 Method of manufacturing thin film coil

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Application Number Priority Date Filing Date Title
JP61231149A JP2564284B2 (en) 1986-10-01 1986-10-01 Method of manufacturing thin film coil

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JPS6387608A true JPS6387608A (en) 1988-04-18
JP2564284B2 JP2564284B2 (en) 1996-12-18

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6478436A (en) * 1987-09-19 1989-03-23 Victor Company Of Japan Magnetic transfer device
US6333830B2 (en) * 1998-11-09 2001-12-25 Read-Rite Corporation Low resistance coil structure for high speed writer

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61195505A (en) * 1985-02-25 1986-08-29 コニカ株式会社 Conductive layer material

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61195505A (en) * 1985-02-25 1986-08-29 コニカ株式会社 Conductive layer material

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6478436A (en) * 1987-09-19 1989-03-23 Victor Company Of Japan Magnetic transfer device
US6333830B2 (en) * 1998-11-09 2001-12-25 Read-Rite Corporation Low resistance coil structure for high speed writer

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JP2564284B2 (en) 1996-12-18

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