JPS6386579A - Light emitting diode - Google Patents

Light emitting diode

Info

Publication number
JPS6386579A
JPS6386579A JP61232454A JP23245486A JPS6386579A JP S6386579 A JPS6386579 A JP S6386579A JP 61232454 A JP61232454 A JP 61232454A JP 23245486 A JP23245486 A JP 23245486A JP S6386579 A JPS6386579 A JP S6386579A
Authority
JP
Japan
Prior art keywords
layer
light
active layer
inp
stripe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61232454A
Other languages
Japanese (ja)
Inventor
Masaru Shimada
勝 島田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP61232454A priority Critical patent/JPS6386579A/en
Publication of JPS6386579A publication Critical patent/JPS6386579A/en
Pending legal-status Critical Current

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  • Led Devices (AREA)

Abstract

PURPOSE:To make optical output itself large, and increase the incident power into an optical fiber, by constituting the active layer and the inverter conductivity type semiconductor layer of a p-type or an n-type semiconductor substrate in a burying structure, making the length of the active layer in the direction of stripe long, and taking out, from end surfaces, the light whose wavelength produces optical gain. CONSTITUTION:After an n-InP buffer layer 2, an InGaAsP active layer 3, a p-InP current confined layer 4 and a p-InGaAsP cap layer 5 are grown on the surface of an n-InP substrate 1, a p-InP layer 6, an n-InP layer 7 and a p-InP layer 8 are grown in order on both sides of a stripe type mesa part. An electrode 10 is arranged on an SiO2 insulative layer 9, and a contact is formed only in the mesa stripe part. When a current is made to flow between the electrodes 10 and 11, the current is injected from the mesa stripe, and light is emitted from the active layer 3, which is effectively taken out from end surfaces 21 and 22 whose reflectivity are made small. When the active layer is excited, a bandwidth having gain in the long wavelength side of spontaneous emission light is produced. By making the length of the active layer 3 long, the light in this band is amplified, so that large output light whose half-width of emission spectrum is narrow is emitted from the end surfaces 21 and 22.

Description

【発明の詳細な説明】[Detailed description of the invention] 【産業上の利用分野】[Industrial application field]

この発明は、光フアイバ通信に好適な発光ダイオードに
関する。
The present invention relates to a light emitting diode suitable for optical fiber communication.

【従来の技術】[Conventional technology]

光フアイバ通信において発光ダイオードを光源として使
用するためには、出力光を効率よく光ファイバに入射で
きる構造である必要がある。 従来、光フアイバ通信用光ファイバとして、大別して、
面発光型発光ダイオードと端面発光型発光ダイオードと
が知られている。
In order to use a light emitting diode as a light source in optical fiber communication, it is necessary to have a structure that allows output light to enter the optical fiber efficiently. Conventionally, optical fibers for optical fiber communications can be broadly classified into:
Surface emitting type light emitting diodes and edge emitting type light emitting diodes are known.

【発明が解決しようとする問題点】[Problems to be solved by the invention]

ところが、面発光型発光ダイオードは発光出力が約1〜
2mWと大きいものの放射角及び発光領域とも比較的大
きいので光ファイバへ入射する出力が小さいという問題
がある。たとえば、外径125μm、コア径50μmの
グレイデッドインデックス型光ファイバへの入射出力は
80μWとなってしまうや これに対し、端面発光型発光ダイオードは、面発光型発
光ダイオードに比べて発光出力自体が約0.3mWと小
さい。これは、端面発光型発光ダイオードでは、端面に
ほぼ垂直に向かう活性層を通過する光の短波長側の成分
が大きな吸収を受けるので、光を取り出す端面より奥の
方の発光は光出力にあ珪り寄与せず、端面近くの部分の
発光のみが主に寄与するからである。にもかかわらず、
放射角は小さく、発光領域も小さいので、たとえば上記
と同じグレイデッドインデックス型光ファイバへの入射
パワーが約80μWとなり、光ファイバへの入射パワー
は同程度となる。 この発明は、端面発光型発光ダイオードの放射角が小さ
く発光領域も小さいという利点を生かし、その発光出力
自体を大きくするよう改善して光ファイバへの入射パワ
ーを高めるようにした端面発光型発光ダイオードを提供
することを目的とする。
However, surface-emitting light emitting diodes have a light output of about 1~
Although it is as large as 2 mW, both the radiation angle and the light emitting area are relatively large, so there is a problem that the output that enters the optical fiber is small. For example, the input power to a graded index optical fiber with an outer diameter of 125 μm and a core diameter of 50 μm is 80 μW.On the other hand, an edge-emitting type light emitting diode has a higher light emitting output than a surface-emitting type light emitting diode. It is small at about 0.3mW. This is because in an edge-emitting type light emitting diode, the short wavelength component of light that passes through the active layer that goes almost perpendicular to the edge is absorbed, so the light emitted deeper than the edge from which the light is taken out has a negative effect on the optical output. This is because the curvature does not contribute, and only the light emission near the end surface mainly contributes. in spite of,
Since the radiation angle is small and the light emitting area is small, for example, the incident power to the same graded index optical fiber as above is about 80 μW, and the incident power to the optical fiber is about the same. This invention takes advantage of the edge-emitting type light-emitting diode's small radiation angle and small light-emitting area, and improves the light-emitting output itself to increase the incident power to the optical fiber. The purpose is to provide

【問題点を解決するための手段】[Means to solve the problem]

この発明の発光ダイオードは、p型またはn型半導体基
板の1表面上に順次形成された活性層及び反対導電型半
導体層をメサストライプ状の埋め込み構造とし、該活性
層のストライプ方向の長さを長くして、光学利得の生じ
る波長の光を端面から取り出すようにしたことを特徴と
する。
The light emitting diode of the present invention has an active layer and an opposite conductivity type semiconductor layer sequentially formed on one surface of a p-type or n-type semiconductor substrate in a mesa stripe-like buried structure, and the length of the active layer in the stripe direction is It is characterized in that it is made long so that light of a wavelength at which an optical gain occurs is extracted from the end face.

【作  用】[For production]

活性層が励起されると、自然放出光の長波長側に利得の
生じる帯域が現れる。そこで、活性層を長くすることに
よってその帯域の光の増幅作用を強くすることができる
。その結果、この帯域のスペクl−ルの狭い光が増幅さ
れて大出力となって端面より放射されることになる。
When the active layer is excited, a band where gain occurs appears on the long wavelength side of spontaneously emitted light. Therefore, by lengthening the active layer, the amplification effect of light in that band can be strengthened. As a result, light with a narrow spectrum in this band is amplified, becomes a large output, and is emitted from the end face.

【実 施 例】【Example】

第1図ないし第3図において、n−1nP基板1の1表
面上に、n−1nPバッファ層2、InGaAs P活
性層3、p−InP電流閉じ込め層4 、p−1nGa
AsPキャップ層5を順次エピタキシャル成長させた後
、幅数μmのストライプ状のメサ部が残るようにエツチ
ングする。つぎに、このメサ部の両脇にp−1nP層6
 、n−InP層7およびρ−1nP層8を順次を成長
させてこのメサ部を埋め込む。さらにこれらの北に5i
02絶縁層9を設け、この5i02絶縁層9にストライ
プ状の窓を形成する。そしてこの上に電極10を設けて
この窓部分つまりメザスI・ライブ部分のみにおいてコ
ンタクトが形成されるようにする。 また、n−InP基板1の裏面に電極11を設ける。 そして、活性層3の厚さは約0.1μmとし、基板1の
長さを数mtnとして活性層3の長さを十分に長くする
。発光側の端面21.22には反射率が約5%程度の無
反射コーティングを施す。 電極10.11間に電流を流すと、数/−Z mの幅の
メサスl〜ライブから電流が注入され、同じ程度の幅の
活性層3から発光する。そしてこの光は反射率が低くさ
れた端面21.22より効率よく外部に取り出される。 この場合、外部に出力される光は、発光方向の活性増長
が長いので特定波長帯域の成分が増幅され、大きな出力
となっている。すなわち、一般に第4図A、Bに示すよ
うに、活性層が励起状態になると、自然放出光の長波長
側に利得のある帯域が生じる。そこで、活性層3を上記
のように長くすることによってこの帯域の光が増幅され
、端面21.22から発光スペクトルの半値幅が小さく
出力が大きい出力光が放出されることになる。 このため、光の放射角が小さくしかも発光領域が小さい
という端面発光型発光ダイオードの利点を生かしながら
、出力を面発光型発光ダイオード並に大きくすることが
できるため、光ファイバへの入射パワーを大きくするこ
とができる。 なお、端面21.22の両方から光を出力せず片面より
光を出力させればよい場合には、他方の面に反射膜を設
けることもできる。また、活性層に超格子構造を採用す
ることもてきる。
1 to 3, on one surface of an n-1nP substrate 1, an n-1nP buffer layer 2, an InGaAsP active layer 3, a p-InP current confinement layer 4, a p-1nGa
After the AsP cap layer 5 is epitaxially grown in sequence, it is etched so that a striped mesa portion with a width of several μm remains. Next, p-1nP layers 6 are placed on both sides of this mesa part.
, an n-InP layer 7 and a ρ-1nP layer 8 are sequentially grown to fill this mesa portion. 5i further north of these
A 02 insulating layer 9 is provided, and striped windows are formed in this 5i02 insulating layer 9. Then, an electrode 10 is provided on this so that a contact is formed only in this window portion, that is, in the mezas I/live portion. Further, an electrode 11 is provided on the back surface of the n-InP substrate 1. The thickness of the active layer 3 is about 0.1 μm, and the length of the substrate 1 is set to several mtn, so that the length of the active layer 3 is made sufficiently long. A non-reflective coating with a reflectance of about 5% is applied to the end faces 21 and 22 on the light emitting side. When a current is passed between the electrodes 10 and 11, the current is injected from the mesus l~live having a width of several/-Z m, and light is emitted from the active layer 3 having the same width. This light is efficiently extracted to the outside through the end surfaces 21 and 22 whose reflectance is lowered. In this case, the light output to the outside has a long activity increase in the light emission direction, so components in a specific wavelength band are amplified, resulting in a large output. That is, generally, as shown in FIGS. 4A and 4B, when the active layer is in an excited state, a band with gain is generated on the long wavelength side of spontaneously emitted light. Therefore, by making the active layer 3 longer as described above, the light in this band is amplified, and output light with a small half-value width of the emission spectrum and a large output is emitted from the end faces 21 and 22. Therefore, while taking advantage of the edge-emitting type light-emitting diode's small radiation angle and small light-emitting area, it is possible to increase the output as much as that of a surface-emitting type light-emitting diode, thereby increasing the power incident on the optical fiber. can do. In addition, when it is sufficient to output light from one side without outputting light from both of the end faces 21 and 22, a reflective film may be provided on the other side. It is also possible to adopt a superlattice structure for the active layer.

【発明の効果】【Effect of the invention】

この発明の発光ダイオードによれば、端面の小さな領域
より小さな放射角でスペクl−ルの狭い大きな出力の光
を放射させることかできるので、端面に結合された光フ
ァイバへの光入射パワーを大きくすることができる。
According to the light emitting diode of the present invention, it is possible to emit light with a narrow spectrum and high output at a radiation angle smaller than that of a small area on the end face, so that the light incident power to the optical fiber coupled to the end face can be increased. can do.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明の一実施例の平面図、第2図は第X図
のA−A線断面図、第3図は第1図のB−B線断面図、
第4図A、Bは自然放出光強度及び利得係数の特性を表
すグラフである。 1・・・n−InP基板、2・・・バッファ層、3・・
・活性層、4・・・電流閉じ込め層、5・・・キャップ
層、6・・・p−1nP層、7・−n−1nP層、8−
p−1nP層、9・・・絶縁層、10.11・・・電極
、21.22・・・端面。
FIG. 1 is a plan view of an embodiment of the present invention, FIG. 2 is a sectional view taken along line A-A in FIG.
FIGS. 4A and 4B are graphs showing characteristics of spontaneous emission light intensity and gain coefficient. 1... n-InP substrate, 2... buffer layer, 3...
・Active layer, 4... Current confinement layer, 5... Cap layer, 6... p-1nP layer, 7...-n-1nP layer, 8-
p-1nP layer, 9... Insulating layer, 10.11... Electrode, 21.22... End surface.

Claims (1)

【特許請求の範囲】[Claims] (1)p型またはn型半導体基板の1表面上に順次形成
された活性層及び反対導電型半導体層をメサストライプ
状の埋め込み構造とし、該活性層のストライプ方向の長
さを長くして、光学利得の生じる波長の光を端面から取
り出すようにした発光ダイオード。
(1) An active layer and an opposite conductivity type semiconductor layer sequentially formed on one surface of a p-type or n-type semiconductor substrate are formed into a buried structure in the form of a mesa stripe, and the length of the active layer in the stripe direction is lengthened, A light emitting diode that extracts light at a wavelength that produces optical gain from its end face.
JP61232454A 1986-09-30 1986-09-30 Light emitting diode Pending JPS6386579A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61232454A JPS6386579A (en) 1986-09-30 1986-09-30 Light emitting diode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61232454A JPS6386579A (en) 1986-09-30 1986-09-30 Light emitting diode

Publications (1)

Publication Number Publication Date
JPS6386579A true JPS6386579A (en) 1988-04-16

Family

ID=16939537

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61232454A Pending JPS6386579A (en) 1986-09-30 1986-09-30 Light emitting diode

Country Status (1)

Country Link
JP (1) JPS6386579A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01312871A (en) * 1988-06-10 1989-12-18 Omron Tateisi Electron Co Semiconductor light emitting diode for slit-light
JPH02205365A (en) * 1989-02-03 1990-08-15 Nippon Telegr & Teleph Corp <Ntt> Superluminescent diode
JPH0335567A (en) * 1989-07-03 1991-02-15 Nippon Telegr & Teleph Corp <Ntt> Semiconductor light emitting diode
JPH04310974A (en) * 1991-04-09 1992-11-02 Ricoh Co Ltd Image recorder
JP2002164575A (en) * 2000-11-27 2002-06-07 Nichia Chem Ind Ltd Nitride semiconductor light emitting element

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01312871A (en) * 1988-06-10 1989-12-18 Omron Tateisi Electron Co Semiconductor light emitting diode for slit-light
JPH02205365A (en) * 1989-02-03 1990-08-15 Nippon Telegr & Teleph Corp <Ntt> Superluminescent diode
JPH0335567A (en) * 1989-07-03 1991-02-15 Nippon Telegr & Teleph Corp <Ntt> Semiconductor light emitting diode
JPH04310974A (en) * 1991-04-09 1992-11-02 Ricoh Co Ltd Image recorder
JP2002164575A (en) * 2000-11-27 2002-06-07 Nichia Chem Ind Ltd Nitride semiconductor light emitting element

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