JPS6385017A - Production of nitrogen-containing glass - Google Patents
Production of nitrogen-containing glassInfo
- Publication number
- JPS6385017A JPS6385017A JP22585786A JP22585786A JPS6385017A JP S6385017 A JPS6385017 A JP S6385017A JP 22585786 A JP22585786 A JP 22585786A JP 22585786 A JP22585786 A JP 22585786A JP S6385017 A JPS6385017 A JP S6385017A
- Authority
- JP
- Japan
- Prior art keywords
- nitrogen
- glass
- silicon nitride
- amorphous silicon
- metal oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 title claims abstract description 36
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 title claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 25
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000000203 mixture Substances 0.000 claims abstract description 14
- 239000000843 powder Substances 0.000 claims abstract description 14
- 239000012298 atmosphere Substances 0.000 claims abstract description 13
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 12
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 12
- 229910021417 amorphous silicon Inorganic materials 0.000 claims abstract description 11
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 11
- 238000010438 heat treatment Methods 0.000 claims abstract description 10
- 239000007789 gas Substances 0.000 claims abstract description 9
- 229910052751 metal Chemical class 0.000 claims abstract description 9
- 239000002184 metal Chemical class 0.000 claims abstract description 9
- 238000005979 thermal decomposition reaction Methods 0.000 claims abstract description 7
- 238000001816 cooling Methods 0.000 claims abstract description 6
- 238000002844 melting Methods 0.000 claims abstract description 6
- 150000003839 salts Chemical class 0.000 claims abstract description 4
- 230000008018 melting Effects 0.000 claims description 5
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 abstract description 4
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 abstract 1
- 239000000155 melt Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 description 20
- 239000002994 raw material Substances 0.000 description 7
- 238000000465 moulding Methods 0.000 description 5
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000000075 oxide glass Substances 0.000 description 4
- -1 MfO Chemical compound 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000007496 glass forming Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000011812 mixed powder Substances 0.000 description 3
- 238000010791 quenching Methods 0.000 description 3
- 230000000171 quenching effect Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
- RAABOESOVLLHRU-UHFFFAOYSA-N diazene Chemical compound N=N RAABOESOVLLHRU-UHFFFAOYSA-N 0.000 description 2
- 229910000071 diazene Inorganic materials 0.000 description 2
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium dioxide Chemical compound O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000006104 solid solution Substances 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000007580 dry-mixing Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum oxide Inorganic materials [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- FUJCRWPEOMXPAD-UHFFFAOYSA-N lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 1
- 229910001947 lithium oxide Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- KTUFCUMIWABKDW-UHFFFAOYSA-N oxo(oxolanthaniooxy)lanthanum Chemical compound O=[La]O[La]=O KTUFCUMIWABKDW-UHFFFAOYSA-N 0.000 description 1
- 229910001392 phosphorus oxide Inorganic materials 0.000 description 1
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 description 1
- 229910001950 potassium oxide Inorganic materials 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- VSAISIQCTGDGPU-UHFFFAOYSA-N tetraphosphorus hexaoxide Chemical compound O1P(O2)OP3OP1OP2O3 VSAISIQCTGDGPU-UHFFFAOYSA-N 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Glass Melting And Manufacturing (AREA)
- Glass Compositions (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は窒素含有ガラスの製造法に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a method for manufacturing nitrogen-containing glasses.
近年、新しいガラスとして酸化物ガラス中の酸素を窒素
に置換した窒素含有ガラスが注目されている。窒素含有
ガラスは、その金属組成を同じくする酸化物ガラスに比
較して2強度、硬度、屈折率が大きく、耐熱性にも優れ
る特性を有する。In recent years, nitrogen-containing glasses in which oxygen in oxide glasses is replaced with nitrogen have been attracting attention as new glasses. Nitrogen-containing glass has higher strength, hardness, and refractive index than oxide glass having the same metal composition, and has excellent heat resistance.
窒素含有ガラスは、耐熱性に優れた高温用窓材。Nitrogen-containing glass is a high-temperature window material with excellent heat resistance.
耐摩耗性に優れた硬質ガラスとしての用途がある。It is used as a hard glass with excellent wear resistance.
従来の窒素含有ガラスの製造法としては1例えば
a)窒化珪素、窒化アルミニウム等の金属窒化物と、
5i02 、 At2o3 r Na2O+ Y2
O3+ MyO,CaO等の金属酸化物との混合物を常
圧、窒素雰囲気下で加熱熔解する方法。Conventional methods for producing nitrogen-containing glass include (1) a) metal nitride such as silicon nitride or aluminum nitride;
5i02, At2o3 r Na2O+ Y2
O3+ A method of heating and melting a mixture with metal oxides such as MyO and CaO under normal pressure and nitrogen atmosphere.
が知られているが、この方法では熱分解によるSiOや
N2の飛散が起こる為、窒素含有量の少ないガラスや、
内部に気泡を含んだガラスしか製造できなかった。However, this method causes the scattering of SiO and N2 due to thermal decomposition, so glass with low nitrogen content,
Only glass with bubbles inside could be manufactured.
そこで熱分解を抑える為方法として
b)窒化珪素、窒化アルミニウム等の金属窒化物と+
5i02 、 At203 、 Y2O3、MfO
、aao 、 Nan。Therefore, in order to suppress thermal decomposition, b) metal nitrides such as silicon nitride, aluminum nitride, etc.
5i02, At203, Y2O3, MfO
, aao, Nan.
等の金属酸化物との混合物を1.5〜200 Kg/a
Aの加圧窒素ガス雰囲気下で熔解する方法(特開昭56
−100141号)。1.5 to 200 Kg/a of a mixture with metal oxides such as
A method of melting in a pressurized nitrogen gas atmosphere (Unexamined Japanese Patent Publication No. 56
-100141).
C)アルミナ、シリカおよびゲルマニアの1種以上を1
5モルチ以上固溶した窒化珪素固溶体20〜70モルチ
、シリカ20ルフ0モル係および最終生成物中における
酸化物組成として酸化ナトリウム、酸化カリウム、酸化
リチウム、酸化硼素および酸化リンの1種以上を10〜
30モルチの範囲で合計100モル係になるように配合
した原料混合物を溶融し成形する方法(特公昭53−3
403号)。C) One or more of alumina, silica and germania
20 to 70 moles of silicon nitride solid solution with 5 moles or more, 20 to 70 moles of silica, and 10 to 10 moles of one or more of sodium oxide, potassium oxide, lithium oxide, boron oxide, and phosphorus oxide as the oxide composition in the final product. ~
A method of melting and molding a raw material mixture blended in a range of 30 mol to a total of 100 mol (Japanese Patent Publication No. 53-3
No. 403).
が知られている。しかし、(b)の方法では雰囲気加圧
炉が必要であシ、工業的大量生産に向かない。It has been known. However, method (b) requires a pressurized atmosphere furnace and is not suitable for industrial mass production.
また(C)の方法では一旦窒化珪素固溶体を製造し。In the method (C), a silicon nitride solid solution is first produced.
その焼結体の粉砕粉をガラス原料として用いる為。To use the crushed powder of the sintered body as a raw material for glass.
粉砕におけるコスト、粉砕時における不純物混入の面か
ら工業的製造法として満足のゆくものでない。This method is not satisfactory as an industrial production method in terms of the cost of pulverization and the contamination of impurities during pulverization.
本発明の目的は、上述したような不都合がなく。 The object of the present invention is to avoid the above-mentioned disadvantages.
窒素含有量の多い、均質な窒素含有ガラスの工業的製造
法を提供することにある。An object of the present invention is to provide an industrial method for producing homogeneous nitrogen-containing glass with a high nitrogen content.
本発明の要旨は、非晶質窒化珪素粉末及びガラスを構成
する金属酸化物又は熱分解により前記金属酸化物となる
金属塩類(以下両者を総称してガラス形成性化合物とい
う。)の1種以上の混合物を、窒素含有ガス雰囲気下で
1400〜1800°Cで加熱後、急冷することにある
。The gist of the present invention is to provide one or more types of amorphous silicon nitride powder and metal oxides constituting glass or metal salts that become the metal oxides through thermal decomposition (hereinafter both are collectively referred to as glass-forming compounds). The method consists of heating the mixture at 1400 to 1800°C under a nitrogen-containing gas atmosphere and then rapidly cooling it.
非晶質窒化珪素粉末としては、従来公知の方法で製造さ
れたものを使用することができる。例えば、四塩化珪素
とアンモニアとを液相又は気相で反応させた反応生成物
をさらに加熱処理して得られる物質で1通常のX線回折
によって明確な回折現象が現われない、所謂非晶質の粉
末が挙げられる。尚、上記反応生成物については、加熱
処理の条件によって、X線回折でわずかに回折現象が現
われる粉末も得られるが、このような粉末も本発明にお
ける非晶質窒化珪素粉末に包含される。As the amorphous silicon nitride powder, those manufactured by conventionally known methods can be used. For example, a so-called amorphous material is a substance obtained by further heat-treating the reaction product of silicon tetrachloride and ammonia in a liquid or gas phase. powder. It should be noted that, depending on the conditions of the heat treatment, the above-mentioned reaction product may be a powder that shows a slight diffraction phenomenon in X-ray diffraction, and such powder is also included in the amorphous silicon nitride powder in the present invention.
ガラスを構成する金属酸化物の具体例としては。Specific examples of metal oxides that make up glass include:
At203 、8102 、 Y2O3、La2O3、
MfO、TiO2、CaO。At203, 8102, Y2O3, La2O3,
MfO, TiO2, CaO.
Nano等が挙げられるが、これらに限定されるもので
はない。また、ガラス生成過程中熱分解により前記金属
の酸化物を生成するものを使用してもよく9例として、
それら金属の炭酸塩、塩基性炭酸塩、しゅう酸等の有機
酸塩、水酸化物等が挙げられるが、これらに限定される
ものではない。Examples include Nano and the like, but are not limited to these. In addition, materials that generate oxides of the metals through thermal decomposition during the glass production process may also be used, as nine examples:
Examples include carbonates, basic carbonates, organic acid salts such as oxalic acid, hydroxides, etc. of these metals, but are not limited to these.
非晶質窒化珪素とガラス形成性化合物は生成物中の窒素
含有ガラス中の窒素含有量として2〜20原子チ、特に
5〜20°原子チになる割合で混合することが好ましい
。窒素含有量が増加すると。The amorphous silicon nitride and the glass-forming compound are preferably mixed in such a proportion that the nitrogen content in the nitrogen-containing glass in the product is from 2 to 20 atoms, particularly from 5 to 20 atoms. As nitrogen content increases.
ガラス生成温度が高温側にずれると同時に硬度。As the glass formation temperature shifts to the high temperature side, the hardness increases.
強度、屈折率も大きくなる。窒素含有量が2原子係よシ
少なくなると、窒素含有ガラスとしての特徴がほとんど
なくなシ、酸化物ガラスと比べて性質に差がない。The strength and refractive index also increase. When the nitrogen content is reduced by two atoms, the characteristics of a nitrogen-containing glass are almost completely lost, and there is no difference in properties compared to oxide glasses.
各原料を混合する方法については特に制限はなく、それ
自体公知の方法9例えば乾式混合する方法、原料各成分
と実質的に反応しない不活性媒体中で湿式混合した後、
不活性媒体を除去する方法等を採用することができる。There is no particular restriction on the method of mixing each raw material, and there are any known methods 9, such as dry mixing, wet mixing in an inert medium that does not substantially react with each component of the raw materials, and then
A method of removing an inert medium, etc. can be adopted.
混合装置としては。As a mixing device.
V型混合機、ボールミル、振動ボールミル等が好ましく
使用される。混合粉末の別の調製法として。V-type mixers, ball mills, vibrating ball mills, etc. are preferably used. As an alternative method of preparing mixed powders.
非晶質窒化珪素の前駆体1例えばシリコンジイミド又は
シリコンテトラミドにガラス形成性化合物を混合分散さ
せ1分散物を加熱処理する方法も採用することができる
。これらの混合方法において。It is also possible to adopt a method in which a glass-forming compound is mixed and dispersed in an amorphous silicon nitride precursor 1, such as silicon diimide or silicon tetraamide, and the dispersion is heat-treated. In these mixing methods.
非晶質窒化珪素粉末又はその前駆体は水や酸素に対して
極めて敏感であるので、制御された不活性雰囲気下で取
り扱うことが必要である。Amorphous silicon nitride powder or its precursors are extremely sensitive to water and oxygen and require handling under a controlled inert atmosphere.
加熱熔解に先立ち、原料粉末の混合物を用いて所望形状
に対応する成形体にすることが好ましい。Prior to heating and melting, it is preferable to form a molded article into a desired shape using a mixture of raw material powders.
成形体の製法として、原料粉末を金型に入れ一軸プレス
成形する方法、または、−軸プレス成形後さらにラバー
プレス成形する方法等を採用することができる。As a method for manufacturing the molded body, a method of putting the raw material powder into a mold and uniaxial press molding, a method of further performing rubber press molding after -axial press molding, etc. can be adopted.
本発明においては、混合粉末あるいはその成形体を窒素
含有ガス雰囲気中で加熱熔解して、窒素含有ガラスを得
る。In the present invention, a mixed powder or a compact thereof is heated and melted in a nitrogen-containing gas atmosphere to obtain a nitrogen-containing glass.
窒素含有ガス雰囲気の例としては、窒素ガス。An example of a nitrogen-containing gas atmosphere is nitrogen gas.
アンモニアガス雰囲気、これらを含有するアルゴンガス
雰囲気等が挙げられる。Examples include an ammonia gas atmosphere and an argon gas atmosphere containing these.
加熱温度は、1400〜1800°Cが好ましい。The heating temperature is preferably 1400 to 1800°C.
加熱温度が1400°cxp低いと十分に熔解せず。If the heating temperature is 1400°cxp lower, it will not melt sufficiently.
均質なガラスが得難くなる。また、1800°Cを超え
ると熱分解により、 SIO,N2 ガス等の飛散が起
こり、所望の組成からずれたガラスが生成するようにな
る。加熱時間は5〜180分、好ましくは30〜60分
である。It becomes difficult to obtain homogeneous glass. Further, when the temperature exceeds 1800°C, thermal decomposition causes scattering of SIO, N2 gas, etc., and glass with a composition deviated from the desired composition is produced. The heating time is 5 to 180 minutes, preferably 30 to 60 minutes.
加熱後の急冷速度は10〜6000°C/分、特に30
0〜2000°C/分であることが好ましい。The quenching rate after heating is 10-6000°C/min, especially 30°C/min.
It is preferable that it is 0-2000 degreeC/min.
急冷速度が10’(:’/分より小さいとガラスが結晶
化ガラスとなりやすく、急冷速度が6000°つ扮よシ
大きいと冷却時の熱応力によりガラスが破懐されやすく
なる。If the quenching rate is less than 10'/min, the glass tends to become crystallized glass, and if the quenching rate is more than 6,000°, the glass tends to break due to thermal stress during cooling.
本発明によれば、従来の酸化物ガラスに比較して強度、
硬度屈折率が大きく、耐熱性にも優れた窒素含有ガラス
を工業的規模で容易に製造することができる。また、こ
のようにして製造された窒素含有ガラスは前記従来法に
より製造されたガラスに比較して均質でむらの少ない大
型のガラスが得られ易い。According to the present invention, compared to conventional oxide glasses, strength,
Nitrogen-containing glass with high hardness, high refractive index, and excellent heat resistance can be easily produced on an industrial scale. Furthermore, the nitrogen-containing glass produced in this manner is more likely to be homogeneous and large in size with less unevenness than the glass produced by the conventional method.
以下に実施例を挙げ本発明を具体的に説明するが1本発
明はこれに限定されるものではない。The present invention will be specifically explained below with reference to Examples, but the present invention is not limited thereto.
実施例1
シリコンジイミドを1200°Cで熱処理して得た非晶
質窒化珪素粉末13,09 、 Y2O382,0?及
び5iO25,Ofを窒素ガス雰囲気下振動ボールミル
で1時間混合した。得られた混合粉末約202を内径2
5rLrInの金型を用いて150Kq/−の圧力で成
形した。成形体を窒化硼素製のルツボに入れ。Example 1 Amorphous silicon nitride powder 13,09, Y2O382,0? obtained by heat-treating silicon diimide at 1200°C. and 5iO25,Of were mixed for 1 hour in a vibrating ball mill under a nitrogen gas atmosphere. The obtained mixed powder is approximately 20 mm in diameter
Molding was performed using a 5rLrIn mold at a pressure of 150Kq/-. Place the molded body in a boron nitride crucible.
窒素ガス雰囲気下で、室温から1200’Cまでを1時
間、1200’Cから1400°Cまでを4時間。Under a nitrogen gas atmosphere, from room temperature to 1200'C for 1 hour, and from 1200'C to 1400°C for 4 hours.
さらに1400°Cから1600°Cまでを2時間。Another 2 hours from 1400°C to 1600°C.
1600°Cで1時間保持して熔解された後、 100
0”C7分で1000’Cまで急冷することにより、窒
素含有ガラスを得た。その窒素含有量は11.5原子%
(理論量は13.7原子%)であった。After being melted by holding at 1600°C for 1 hour, 100
A nitrogen-containing glass was obtained by rapidly cooling to 1000'C in 7 minutes at 0'C. Its nitrogen content was 11.5 at%.
(Theoretical amount was 13.7 at%).
実施例2〜4
第1表に示す各権組成の原料を実施例1と同様の手順で
ガラス化させた。得られた窒素含有ガラスの窒素含有量
を第1表に示す。Examples 2 to 4 Raw materials having the respective compositions shown in Table 1 were vitrified in the same manner as in Example 1. The nitrogen content of the obtained nitrogen-containing glass is shown in Table 1.
第 1 表Chapter 1 Table
Claims (1)
物又は熱分解により前記金属酸化物となる金属塩類の1
種以上の混合物を、窒素含有ガス雰囲気下に加熱熔解後
、急冷することを特徴とする窒素含有ガラスの製造法。 2、窒素含有量が2〜20原子%の割合である特許請求
の範囲第1項記載の窒素含有ガラスの製造法。[Claims] 1. Metal oxides constituting amorphous silicon nitride powder and glass or metal salts that become the metal oxides through thermal decomposition.
A method for producing nitrogen-containing glass, which comprises heating and melting a mixture of at least one species in a nitrogen-containing gas atmosphere and then rapidly cooling the mixture. 2. The method for producing a nitrogen-containing glass according to claim 1, wherein the nitrogen content is 2 to 20 atomic %.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22585786A JPS6385017A (en) | 1986-09-26 | 1986-09-26 | Production of nitrogen-containing glass |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22585786A JPS6385017A (en) | 1986-09-26 | 1986-09-26 | Production of nitrogen-containing glass |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6385017A true JPS6385017A (en) | 1988-04-15 |
Family
ID=16835933
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22585786A Pending JPS6385017A (en) | 1986-09-26 | 1986-09-26 | Production of nitrogen-containing glass |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6385017A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63242943A (en) * | 1987-03-31 | 1988-10-07 | Shimadzu Corp | Oxynitride glass and its production |
JPH029729A (en) * | 1988-06-28 | 1990-01-12 | Shimadzu Corp | Device for producing oxynitride glass fiber |
-
1986
- 1986-09-26 JP JP22585786A patent/JPS6385017A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63242943A (en) * | 1987-03-31 | 1988-10-07 | Shimadzu Corp | Oxynitride glass and its production |
JPH029729A (en) * | 1988-06-28 | 1990-01-12 | Shimadzu Corp | Device for producing oxynitride glass fiber |
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