JPS6383939A - Production of optical disk substrate - Google Patents
Production of optical disk substrateInfo
- Publication number
- JPS6383939A JPS6383939A JP23059886A JP23059886A JPS6383939A JP S6383939 A JPS6383939 A JP S6383939A JP 23059886 A JP23059886 A JP 23059886A JP 23059886 A JP23059886 A JP 23059886A JP S6383939 A JPS6383939 A JP S6383939A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- plastic sheet
- optical disk
- recording layer
- molded
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 47
- 230000003287 optical effect Effects 0.000 title claims abstract description 22
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000002985 plastic film Substances 0.000 claims abstract description 20
- 230000003647 oxidation Effects 0.000 claims abstract description 10
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 10
- 239000011347 resin Substances 0.000 claims abstract description 8
- 229920005989 resin Polymers 0.000 claims abstract description 8
- 238000000465 moulding Methods 0.000 claims abstract description 7
- 239000010410 layer Substances 0.000 claims description 19
- 239000011241 protective layer Substances 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 6
- 239000011247 coating layer Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 abstract description 8
- 239000000178 monomer Substances 0.000 abstract description 4
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- 230000006866 deterioration Effects 0.000 abstract description 3
- 230000035515 penetration Effects 0.000 abstract 1
- 229920003023 plastic Polymers 0.000 description 9
- 239000004033 plastic Substances 0.000 description 9
- 239000011521 glass Substances 0.000 description 6
- 239000004417 polycarbonate Substances 0.000 description 5
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 3
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 3
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 3
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 230000015654 memory Effects 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910017061 Fe Co Inorganic materials 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- QVYYOKWPCQYKEY-UHFFFAOYSA-N [Fe].[Co] Chemical compound [Fe].[Co] QVYYOKWPCQYKEY-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000012994 photoredox catalyst Substances 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔概要〕
耐酸化性が優れ長寿命な光ディスク基板の製法として、
耐酸化性能の優れたプラスチックシートを型成形して案
内溝を形成した後、この上に透明な樹脂を加えて加圧成
形し、前記プラスチックシートと一体化して形成する方
法。[Detailed Description of the Invention] [Summary] As a method for manufacturing an optical disk substrate with excellent oxidation resistance and long life,
A method in which a plastic sheet with excellent oxidation resistance is molded to form a guide groove, and then a transparent resin is added thereon and pressure molded to form an integral part with the plastic sheet.
本発明はプラスチックよりなり、耐酸化性が優れ長寿命
な光ディスク基板の製造方法に関する。The present invention relates to a method of manufacturing an optical disk substrate made of plastic, which has excellent oxidation resistance and has a long life.
光ディスクは通常の光ディスクと光磁気ディスクとに分
類することができ、共にレーザ光を用いて高密度の情報
記録を行うメモリであり、記録容量が大きく、非接触で
記録と再生を行うことができ、また塵埃の影響を受けな
いなど優れた特徴をもっている。Optical disks can be classified into regular optical disks and magneto-optical disks, both of which are memories that use laser light to record high-density information, have a large storage capacity, and can perform contactless recording and playback. It also has excellent features such as being unaffected by dust.
すなわち、レーザ光はレンズによって直径が約1μmの
小さなスポットに絞り込むことが可能であり、従って1
ビツトの情報記録に要する面積は1μm 2程度で足り
る。In other words, the laser beam can be narrowed down to a small spot with a diameter of about 1 μm by a lens, and therefore 1 μm in diameter.
The area required for recording bit information is approximately 1 μm2.
また、レンズで絞り込まれたレーザ光の焦点面までの距
離は1〜2龍とれるので、非接触化が可能であり、また
基板面では光ビームの径は約1龍となるので、たとえ基
板面に数10μII+2の大きさの塵埃が存在していて
も記録・再生に殆ど影容を与えずに済ませることができ
る。In addition, since the distance to the focal plane of the laser beam narrowed down by the lens is 1 to 2 mm, non-contact is possible.Also, the diameter of the light beam is approximately 1 mm at the substrate surface, so even if the substrate surface Even if there is dust with a size of several tens of μII+2, it can be done with almost no effect on recording and reproduction.
ここで、光ディスクは記録媒体として低融点金属を用い
、情報の記録と再生を穴(ピント)の有無により行う読
み出し専用メモリ(Read 0nly Memory
)であるのに対し、光磁気ディスクは記録媒体が垂直磁
化した磁性膜からなり、レーザ照射された磁性膜の温度
上昇による磁化反転が情報の記録と消去に用いられ、磁
性膜からの反射光あるいは透過光の偏光面の回転が磁化
方向により異なるのを利用して再生が行われている。
−
そして、かかる記録媒体は案内溝を備えたガラスあるい
はプラスチックなどの透明基板上に保護層を介して層形
成されており、透明基板を通してレーザ光の照射が行わ
れている。Here, an optical disk is a read-only memory that uses a low-melting point metal as a recording medium and records and reproduces information depending on the presence or absence of a hole (focus).
), on the other hand, in a magneto-optical disk, the recording medium is made of a perpendicularly magnetized magnetic film, and the magnetization reversal caused by the temperature rise of the magnetic film irradiated with a laser is used to record and erase information, and the reflected light from the magnetic film is Alternatively, reproduction is performed by utilizing the fact that the rotation of the polarization plane of transmitted light differs depending on the magnetization direction.
- Such a recording medium is formed as a layer on a transparent substrate such as glass or plastic provided with a guide groove with a protective layer interposed therebetween, and laser light is irradiated through the transparent substrate.
本発明はかかる案内溝を備えたプラスチック光ディスク
基板の製法に関するものである。The present invention relates to a method of manufacturing a plastic optical disk substrate provided with such a guide groove.
ディスク面上の任意の位置に正確に情報を記録し、また
再生するには正確な位置決めが必要であり、基板上には
同心円状あるいは渦巻き状の浅い案内溝(プリグループ
)が微少な間隔を保って設置られている。Precise positioning is necessary to accurately record and reproduce information at any position on the disk surface, and concentric or spiral shallow guide grooves (pre-groups) are formed on the substrate at minute intervals. It is maintained and installed.
例えば案内溝の幅は0.7 μm、深さは0.07μm
、相互のピッチは1.6μm程度と綱かい。For example, the width of the guide groove is 0.7 μm and the depth is 0.07 μm.
, the mutual pitch is about 1.6 μm.
第3図は光ディスクの構成を示す部分断面図であって、
案内溝が形成されている基板1の上に保護層2.記録層
3.被ff1層4と順次積層して形成されている。FIG. 3 is a partial cross-sectional view showing the structure of an optical disc,
A protective layer 2 is formed on the substrate 1 in which the guide groove is formed. Recording layer 3. It is formed by sequentially stacking the ff1 layer 4.
ここで、基板1はプラスチックよりなる場合は予め案内
溝が型形成されているスタンパと言われる金型を用いて
、ポリメチルメタクリレート(略称r’HMA)ポリカ
ーボネート(略称PC)など透明な合成樹脂をモールド
成形して厚さが1.2mm程度のディスク状の基板1が
作られている。Here, when the substrate 1 is made of plastic, a transparent synthetic resin such as polymethyl methacrylate (abbreviated as r'HMA) or polycarbonate (abbreviated as PC) is used using a mold called a stamper in which guide grooves are formed in advance. A disk-shaped substrate 1 having a thickness of about 1.2 mm is produced by molding.
また、基板1がガラス円板よりなる場合は、この上に紫
外線硬化樹脂を塗布し、この上にスタンパを押し当て、
基板側から紫外線を照射して硬化させ、その後にスタン
バを剥離して案内溝を形成するPP法が開発されている
。In addition, when the substrate 1 is made of a glass disk, an ultraviolet curable resin is applied thereon, and a stamper is pressed onto it.
A PP method has been developed in which the substrate is irradiated with ultraviolet rays to cure it, and then the stand bar is peeled off to form guide grooves.
また、ガラス基板上にフォトレジストを塗布し、これに
選択露光と現像を行って案内溝パターンを窓開けし、プ
ラズマエツチングして案内溝を形成する方法もある。Another method is to apply a photoresist onto a glass substrate, selectively expose and develop the photoresist to open a guide groove pattern, and then perform plasma etching to form the guide grooves.
ここで、基板1がガラスよりなり、この上に直接に記録
層3を設ける場合は支障はないが、基板1がPMM^や
PCなどのようなプラスチックスを用いてなる場合には
保護層2の形成が必要である。Here, there is no problem if the substrate 1 is made of glass and the recording layer 3 is provided directly thereon, but if the substrate 1 is made of plastic such as PMM^ or PC, the protective layer 2 formation is necessary.
この理由は、 PMMAやPCなどのプラスチック基板
は透湿性やガス吸着性が強く、そのため記録層3の酸化
を生じ光ディスクが劣化することによる。The reason for this is that plastic substrates such as PMMA and PC have strong moisture permeability and gas adsorption properties, which causes oxidation of the recording layer 3 and deteriorates the optical disc.
そのため、真空蒸着あるいはスバフタなどの方法により
窒化珪素(si:+Nt)や窒化アルミ (A#N)な
どの保護層2を約1000人程度の厚さに成膜するなく
、ピンホールができ易いと云う問題がある。Therefore, the protective layer 2, such as silicon nitride (si: +Nt) or aluminum nitride (A#N), is not deposited to a thickness of about 1,000 layers using methods such as vacuum evaporation or vacuum deposition, and pinholes are likely to form. There is a problem.
また、ポリ塩化ビニル、ポリ塩化ビニリデンなど透湿性
が少ない樹脂を基板1の上に被覆することも行われたが
、案内溝の形状を損なうため良い結果は得られていない
。Furthermore, coating the substrate 1 with a resin having low moisture permeability such as polyvinyl chloride or polyvinylidene chloride has been attempted, but good results have not been obtained because the shape of the guide groove is damaged.
光ディスクへの情報の記録と再生は基板1を通して記録
層3にレーザ光を照射することにより行われており、基
板1がガラスよりなる場合は記録層の劣化は少ないが、
プラスチックスよりなる場合は透湿や吸着ガスやモノマ
の移行による劣化が著しく、これを防ぐために保8!層
2の形成が必要である。Recording and reproduction of information on an optical disk is performed by irradiating the recording layer 3 with laser light through the substrate 1. If the substrate 1 is made of glass, the recording layer will not deteriorate much;
If it is made of plastic, it will deteriorate significantly due to moisture permeation and migration of adsorbed gases and monomers, so to prevent this, please use 8! Formation of layer 2 is necessary.
ここで、案内溝つきのガラス基板は製造効率が劣り、ま
たコスト高につくことからプラスチック基板の使用が望
ましく、そのため耐酸化性能と耐湿性の優れた基板の実
用化が望まれていた。Here, since glass substrates with guide grooves have poor manufacturing efficiency and are expensive, it is desirable to use plastic substrates.Therefore, it has been desired to put into practical use substrates with excellent oxidation resistance and moisture resistance.
上記の問題は透明基板がスタンバに耐酸化性能の優れた
プラスチックシートを型成形して案内溝を形成した後、
この上に透明な樹脂を加えて加圧成形し、前記プラスチ
ックシートと一体化して形成する光ディスク基板の製造
方法により解決することができる。The above problem can be solved after the transparent substrate is molded with a plastic sheet with excellent oxidation resistance on the stand bar to form the guide groove.
This problem can be solved by a method of manufacturing an optical disc substrate in which a transparent resin is added thereon, pressure molded, and integrated with the plastic sheet.
本発明は従来の光ディスクの構成として、基板1は記録
層3の支持担体であると共に光学的にも優れた材料から
なることを必要条件としていたのを改め、記録N3との
隣接体と基板とを異なる材料で形成することにより保護
層2の必要性を無くするものである。The present invention changes the conventional structure of an optical disc, which requires that the substrate 1 is a supporting carrier for the recording layer 3 and is also made of an optically excellent material. By forming the protective layer 2 from a different material, the need for the protective layer 2 is eliminated.
すなわち、塩化ビニル、塩化ビニリデン、ビニルアルコ
ール、弗化ビニル、弗化ビニリデンなどの樹脂は透湿性
が少なく、耐酸化性能が優れていることから、これで記
録層3の隣接体を形成し、また光学的性質の優れている
P)11’lAやPCなどの基板材料を用いて基板本体
を形成するのである。That is, since resins such as vinyl chloride, vinylidene chloride, vinyl alcohol, vinyl fluoride, and vinylidene fluoride have low moisture permeability and excellent oxidation resistance, they form an adjoining body of the recording layer 3, and The substrate body is formed using a substrate material such as P)11'lA or PC, which has excellent optical properties.
次に、記録層3の隣接体には案内溝を形成することが必
要であるが、このような微細な凹凸を型成形するにはプ
ラスチックシートの厚さが薄いほど成形性がよい。Next, it is necessary to form a guide groove in the adjacent body of the recording layer 3, but the thinner the plastic sheet is, the better the moldability is in order to mold such fine irregularities.
そこで、本発明は第1図に示すように先ず案内溝が型形
成されているスタンパ5の上にプラスチックシー1・6
を位置決めして加圧成形した後、この上に溶融した基板
材料7を供給し、型8を用いて加圧成形することにより
プラスチックシート6と基板材料7とが一体化した基板
1を得るものである。Therefore, as shown in FIG. 1, the present invention first places plastic sheets 1 and 6 on top of a stamper 5 on which guide grooves are molded.
After positioning and pressure molding, a molten substrate material 7 is supplied onto this and pressure molding is performed using a mold 8 to obtain a substrate 1 in which the plastic sheet 6 and the substrate material 7 are integrated. It is.
このような基板はプラスチックシート6により湿気やモ
ノマーなどの浸透が遮断されているので、直接に記録層
3の形成が可能となる。Since the plastic sheet 6 prevents moisture, monomer, etc. from penetrating into such a substrate, the recording layer 3 can be directly formed thereon.
プラスチックシートとして弗化ビニル(厚さ200μm
)を弗化ビニリデン(厚さ200μm)+塩化ビニル(
厚さ160μm)+塩化ビニリデン(厚さ230μmL
ビニルアルコール(厚さ300 μm)を用い、加圧成
形機を用いてスタンバに温度100℃、40kg/ c
m2の条件で加圧し、幅0.7 μm、深さ0.07μ
m、ピッチ1.6μmの案内溝をプラスチックシートに
転写した。Vinyl fluoride (thickness 200μm) as a plastic sheet
) to vinylidene fluoride (thickness 200 μm) + vinyl chloride (
thickness 160μm) + vinylidene chloride (thickness 230μmL)
Using vinyl alcohol (thickness: 300 μm), use a pressure molding machine in a stand bar at a temperature of 100°C and a weight of 40 kg/c.
Pressure is applied under the conditions of m2, width 0.7 μm, depth 0.07 μm
Guide grooves with a pitch of 1.6 μm and a pitch of 1.6 μm were transferred onto a plastic sheet.
次に、そのま\の状態で溶融状G(150℃)のPMM
Aをプラスチックシートの上に置き、先と同じ条件(温
度100℃、40 kg/ cm2)で加圧成形して厚
さが1.2mmの基板を形成した。Next, PMM in the molten state (150°C) is
A was placed on a plastic sheet and pressure molded under the same conditions as before (temperature 100°C, 40 kg/cm2) to form a substrate with a thickness of 1.2 mm.
また、比較のためにPMMAのみでも基板を形成した。Further, for comparison, a substrate was formed using only PMMA.
次に、か\る基板の上にスパッタ法によりテルビウム・
鉄・コバルト(Te Fe Co)を1100nの厚さ
に形成して記録層3とし、更にこの上に引き続いて窒化
珪素(SiJ4)を1100nの厚さにスパッタして被
覆層4とし光磁気ディスクを形成した。Next, terbium was deposited on the substrate by sputtering.
Iron-cobalt (Te Fe Co) was formed to a thickness of 1100 nm to form a recording layer 3, and silicon nitride (SiJ4) was then sputtered to a thickness of 1100 nm to form a coating layer 4 on top of this to form a magneto-optical disk. Formed.
第2図はこれら各種の光磁気ディスクについて、半導体
レーザを用い、周波数0.5 MHz、出力2.5mW
で記録し、80℃の環境のもとで、出力0.8mWで再
生させる加速試験を行った結果である。Figure 2 shows these various magneto-optical disks using a semiconductor laser at a frequency of 0.5 MHz and an output of 2.5 mW.
These are the results of an accelerated test in which data was recorded at 80° C. and reproduced at an output of 0.8 mW.
すなわちPMMAO上に直接に記録層3を設けた比較例
9は僅か100時間程度で急激に劣化するのに対し、弗
化ビニルと弗化ビニリデンのシートを用いた光ディスク
10.11はC/N(Carrier−1evel/N
o1se−1evel)の減少は少なく安定であり、ま
た塩化ビニルと塩化ビニリデンのシートを用いた光ディ
スク12.13とビニルアルコールを用いた光ディスク
14も比較例9に較べて墨かに劣化を抑制することがで
きた。In other words, Comparative Example 9, in which the recording layer 3 was provided directly on PMMAO, rapidly deteriorated after only about 100 hours, whereas optical disc 10.11, which used a sheet of vinyl fluoride and vinylidene fluoride, had a C/N ( Carrier-1 level/N
o1se-1evel) is small and stable, and the optical disk 12.13 using a sheet of vinyl chloride and vinylidene chloride and the optical disk 14 using vinyl alcohol also suppress deterioration in black color compared to Comparative Example 9. was completed.
以上記したように本発明の実施によりプラスチック基板
を用いる場合に透湿やモノマなどによる記録層の劣化を
抑制することができ、これにより光ディスクの信頬性の
向上が可能となる。As described above, by carrying out the present invention, when a plastic substrate is used, it is possible to suppress deterioration of the recording layer due to moisture permeation, monomer, etc., thereby making it possible to improve the reliability of the optical disc.
第1図は光ディスク基板の製造方法を示す断面図、
第2図は実施例の経時変化図、
第3図は光ディスクの構成を示す部分断面図、である。
図において、
1は基板、 2は保護層、3は記録層、
4は被覆層、5はユタ、バ、 6は
プラスチツクシート、7は基板材料、
である。FIG. 1 is a sectional view showing a method of manufacturing an optical disc substrate, FIG. 2 is a diagram showing changes over time in an example, and FIG. 3 is a partial sectional view showing the structure of an optical disc. In the figure, 1 is a substrate, 2 is a protective layer, 3 is a recording layer,
4 is a covering layer, 5 is a plastic sheet, 6 is a plastic sheet, and 7 is a substrate material.
Claims (1)
層と順次層形成してなる光ディスクにおいて、 前記透明基板がスタンパに耐酸化性能の優れたプラスチ
ックシートを型成形して案内溝を形成した後、この上に
透明な樹脂を加えて加圧成形し、前記プラスチックシー
トと一体化して形成することを特徴とする光ディスク基
板の製造方法。[Claims] An optical disc in which a protective layer, a recording layer, and a coating layer are sequentially formed on a transparent substrate provided with a guide groove, wherein the transparent substrate is formed by molding a plastic sheet with excellent oxidation resistance into a stamper. A method for manufacturing an optical disk substrate, characterized in that after forming a guide groove, a transparent resin is added thereon and pressure molded to form the guide groove integrally with the plastic sheet.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23059886A JPS6383939A (en) | 1986-09-29 | 1986-09-29 | Production of optical disk substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23059886A JPS6383939A (en) | 1986-09-29 | 1986-09-29 | Production of optical disk substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6383939A true JPS6383939A (en) | 1988-04-14 |
Family
ID=16910254
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23059886A Pending JPS6383939A (en) | 1986-09-29 | 1986-09-29 | Production of optical disk substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6383939A (en) |
-
1986
- 1986-09-29 JP JP23059886A patent/JPS6383939A/en active Pending
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