JPS63813A - Magnetic recording medium - Google Patents
Magnetic recording mediumInfo
- Publication number
- JPS63813A JPS63813A JP1416686A JP1416686A JPS63813A JP S63813 A JPS63813 A JP S63813A JP 1416686 A JP1416686 A JP 1416686A JP 1416686 A JP1416686 A JP 1416686A JP S63813 A JPS63813 A JP S63813A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- layer
- magnetic recording
- recording medium
- rust preventive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 61
- -1 perfluoroalkyl carboxylate Chemical class 0.000 claims abstract description 53
- 230000005294 ferromagnetic effect Effects 0.000 claims abstract description 34
- 239000000314 lubricant Substances 0.000 claims abstract description 30
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 claims abstract description 25
- 230000003449 preventive effect Effects 0.000 claims abstract description 24
- 125000004433 nitrogen atom Chemical group N* 0.000 claims abstract description 13
- 229910052751 metal Inorganic materials 0.000 claims description 42
- 239000002184 metal Substances 0.000 claims description 42
- 239000010409 thin film Substances 0.000 claims description 28
- 150000002391 heterocyclic compounds Chemical class 0.000 claims description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims description 10
- 239000002253 acid Substances 0.000 abstract description 23
- 239000003795 chemical substances by application Substances 0.000 abstract description 23
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 abstract description 13
- 239000002904 solvent Substances 0.000 abstract description 13
- 238000000576 coating method Methods 0.000 abstract description 11
- 239000011248 coating agent Substances 0.000 abstract description 9
- 238000000151 deposition Methods 0.000 abstract description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 abstract description 6
- 238000001035 drying Methods 0.000 abstract description 5
- 125000000623 heterocyclic group Chemical group 0.000 abstract description 3
- JWYUFVNJZUSCSM-UHFFFAOYSA-N 2-aminobenzimidazole Chemical compound C1=CC=C2NC(N)=NC2=C1 JWYUFVNJZUSCSM-UHFFFAOYSA-N 0.000 abstract description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 abstract 1
- 238000000034 method Methods 0.000 description 27
- 150000001875 compounds Chemical class 0.000 description 20
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 18
- 229920005989 resin Polymers 0.000 description 18
- 239000011347 resin Substances 0.000 description 18
- 235000014113 dietary fatty acids Nutrition 0.000 description 15
- 229930195729 fatty acid Natural products 0.000 description 15
- 239000000194 fatty acid Substances 0.000 description 15
- 229920001577 copolymer Polymers 0.000 description 13
- 150000004665 fatty acids Chemical class 0.000 description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 11
- 229910052799 carbon Inorganic materials 0.000 description 11
- 239000010408 film Substances 0.000 description 11
- 239000000203 mixture Substances 0.000 description 9
- 150000003839 salts Chemical class 0.000 description 9
- 238000003786 synthesis reaction Methods 0.000 description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 7
- 238000005260 corrosion Methods 0.000 description 7
- 230000007797 corrosion Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 150000002148 esters Chemical class 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 7
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 7
- 239000007769 metal material Substances 0.000 description 7
- 229920001225 polyester resin Polymers 0.000 description 7
- 239000004645 polyester resin Substances 0.000 description 7
- WNWHHMBRJJOGFJ-UHFFFAOYSA-N 16-methylheptadecan-1-ol Chemical compound CC(C)CCCCCCCCCCCCCCCO WNWHHMBRJJOGFJ-UHFFFAOYSA-N 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 6
- 239000000956 alloy Substances 0.000 description 6
- 239000011230 binding agent Substances 0.000 description 6
- 230000001050 lubricating effect Effects 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 125000001931 aliphatic group Chemical group 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 229910052731 fluorine Inorganic materials 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 229920005749 polyurethane resin Polymers 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 4
- 150000001412 amines Chemical class 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 125000001153 fluoro group Chemical group F* 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 239000003973 paint Substances 0.000 description 4
- 229920000728 polyester Polymers 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 229910052717 sulfur Inorganic materials 0.000 description 4
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- WFFZELZOEWLYNK-CLFAGFIQSA-N bis[(z)-octadec-9-enyl] hydrogen phosphate Chemical compound CCCCCCCC\C=C/CCCCCCCCOP(O)(=O)OCCCCCCCC\C=C/CCCCCCCC WFFZELZOEWLYNK-CLFAGFIQSA-N 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 230000005415 magnetization Effects 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- SNGREZUHAYWORS-UHFFFAOYSA-N perfluorooctanoic acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F SNGREZUHAYWORS-UHFFFAOYSA-N 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 229920006254 polymer film Polymers 0.000 description 3
- 229920001021 polysulfide Polymers 0.000 description 3
- 239000005077 polysulfide Substances 0.000 description 3
- 150000008117 polysulfides Polymers 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 239000011593 sulfur Substances 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- XDOFQFKRPWOURC-UHFFFAOYSA-N 16-methylheptadecanoic acid Chemical compound CC(C)CCCCCCCCCCCCCCC(O)=O XDOFQFKRPWOURC-UHFFFAOYSA-N 0.000 description 2
- VQGHOUODWALEFC-UHFFFAOYSA-N 2-phenylpyridine Chemical compound C1=CC=CC=C1C1=CC=CC=N1 VQGHOUODWALEFC-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 229910000599 Cr alloy Inorganic materials 0.000 description 2
- CETBSQOFQKLHHZ-UHFFFAOYSA-N Diethyl disulfide Chemical compound CCSSCC CETBSQOFQKLHHZ-UHFFFAOYSA-N 0.000 description 2
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 2
- YWHLKYXPLRWGSE-UHFFFAOYSA-N Dimethyl trisulfide Chemical compound CSSSC YWHLKYXPLRWGSE-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 238000004566 IR spectroscopy Methods 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N N-butylamine Natural products CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- AUNGANRZJHBGPY-SCRDCRAPSA-N Riboflavin Chemical compound OC[C@@H](O)[C@@H](O)[C@@H](O)CN1C=2C=C(C)C(C)=CC=2N=C2C1=NC(=O)NC2=O AUNGANRZJHBGPY-SCRDCRAPSA-N 0.000 description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 2
- RYYWUUFWQRZTIU-UHFFFAOYSA-N Thiophosphoric acid Chemical class OP(O)(S)=O RYYWUUFWQRZTIU-UHFFFAOYSA-N 0.000 description 2
- ISAKRJDGNUQOIC-UHFFFAOYSA-N Uracil Chemical compound O=C1C=CNC(=O)N1 ISAKRJDGNUQOIC-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- POJWUDADGALRAB-UHFFFAOYSA-N allantoin Chemical compound NC(=O)NC1NC(=O)NC1=O POJWUDADGALRAB-UHFFFAOYSA-N 0.000 description 2
- HIMXGTXNXJYFGB-UHFFFAOYSA-N alloxan Chemical compound O=C1NC(=O)C(=O)C(=O)N1 HIMXGTXNXJYFGB-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 125000006267 biphenyl group Chemical group 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- KMGBZBJJOKUPIA-UHFFFAOYSA-N butyl iodide Chemical compound CCCCI KMGBZBJJOKUPIA-UHFFFAOYSA-N 0.000 description 2
- 229910000019 calcium carbonate Inorganic materials 0.000 description 2
- 235000010216 calcium carbonate Nutrition 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- AYTAKQFHWFYBMA-UHFFFAOYSA-N chromium dioxide Chemical compound O=[Cr]=O AYTAKQFHWFYBMA-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- DDRJAANPRJIHGJ-UHFFFAOYSA-N creatinine Chemical compound CN1CC(=O)NC1=N DDRJAANPRJIHGJ-UHFFFAOYSA-N 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- GVPWHKZIJBODOX-UHFFFAOYSA-N dibenzyl disulfide Chemical compound C=1C=CC=CC=1CSSCC1=CC=CC=C1 GVPWHKZIJBODOX-UHFFFAOYSA-N 0.000 description 2
- JTXUVYOABGUBMX-UHFFFAOYSA-N didodecyl hydrogen phosphate Chemical compound CCCCCCCCCCCCOP(O)(=O)OCCCCCCCCCCCC JTXUVYOABGUBMX-UHFFFAOYSA-N 0.000 description 2
- LJSQFQKUNVCTIA-UHFFFAOYSA-N diethyl sulfide Chemical compound CCSCC LJSQFQKUNVCTIA-UHFFFAOYSA-N 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- MVLVMROFTAUDAG-UHFFFAOYSA-N ethyl octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC MVLVMROFTAUDAG-UHFFFAOYSA-N 0.000 description 2
- 239000003925 fat Substances 0.000 description 2
- 235000019197 fats Nutrition 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- UYTPUPDQBNUYGX-UHFFFAOYSA-N guanine Chemical compound O=C1NC(N)=NC2=C1N=CN2 UYTPUPDQBNUYGX-UHFFFAOYSA-N 0.000 description 2
- BXWNKGSJHAJOGX-UHFFFAOYSA-N hexadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCO BXWNKGSJHAJOGX-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- JXDYKVIHCLTXOP-UHFFFAOYSA-N isatin Chemical compound C1=CC=C2C(=O)C(=O)NC2=C1 JXDYKVIHCLTXOP-UHFFFAOYSA-N 0.000 description 2
- TWBYWOBDOCUKOW-UHFFFAOYSA-N isonicotinic acid Chemical compound OC(=O)C1=CC=NC=C1 TWBYWOBDOCUKOW-UHFFFAOYSA-N 0.000 description 2
- HCZHHEIFKROPDY-UHFFFAOYSA-N kynurenic acid Chemical compound C1=CC=C2NC(C(=O)O)=CC(=O)C2=C1 HCZHHEIFKROPDY-UHFFFAOYSA-N 0.000 description 2
- 229910052745 lead Inorganic materials 0.000 description 2
- XMGQYMWWDOXHJM-UHFFFAOYSA-N limonene Chemical compound CC(=C)C1CCC(C)=CC1 XMGQYMWWDOXHJM-UHFFFAOYSA-N 0.000 description 2
- 238000005461 lubrication Methods 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 238000004949 mass spectrometry Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- LQERIDTXQFOHKA-UHFFFAOYSA-N nonadecane Chemical compound CCCCCCCCCCCCCCCCCCC LQERIDTXQFOHKA-UHFFFAOYSA-N 0.000 description 2
- GLDOVTGHNKAZLK-UHFFFAOYSA-N octadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCCCO GLDOVTGHNKAZLK-UHFFFAOYSA-N 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 125000002524 organometallic group Chemical group 0.000 description 2
- PXQPEWDEAKTCGB-UHFFFAOYSA-N orotic acid Chemical compound OC(=O)C1=CC(=O)NC(=O)N1 PXQPEWDEAKTCGB-UHFFFAOYSA-N 0.000 description 2
- 239000012188 paraffin wax Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 150000003014 phosphoric acid esters Chemical class 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 150000003077 polyols Chemical class 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 239000005033 polyvinylidene chloride Substances 0.000 description 2
- VQMSRUREDGBWKT-UHFFFAOYSA-N quinoline-4-carboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=NC2=C1 VQMSRUREDGBWKT-UHFFFAOYSA-N 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000000344 soap Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- YAPQBXQYLJRXSA-UHFFFAOYSA-N theobromine Chemical compound CN1C(=O)NC(=O)C2=C1N=CN2C YAPQBXQYLJRXSA-UHFFFAOYSA-N 0.000 description 2
- RWQNBRDOKXIBIV-UHFFFAOYSA-N thymine Chemical compound CC1=CNC(=O)NC1=O RWQNBRDOKXIBIV-UHFFFAOYSA-N 0.000 description 2
- IIYFAKIEWZDVMP-UHFFFAOYSA-N tridecane Chemical compound CCCCCCCCCCCCC IIYFAKIEWZDVMP-UHFFFAOYSA-N 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- UIYCHXAGWOYNNA-UHFFFAOYSA-N vinyl sulfide Chemical compound C=CSC=C UIYCHXAGWOYNNA-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- AAWZDTNXLSGCEK-LNVDRNJUSA-N (3r,5r)-1,3,4,5-tetrahydroxycyclohexane-1-carboxylic acid Chemical compound O[C@@H]1CC(O)(C(O)=O)C[C@@H](O)C1O AAWZDTNXLSGCEK-LNVDRNJUSA-N 0.000 description 1
- OYHQOLUKZRVURQ-NTGFUMLPSA-N (9Z,12Z)-9,10,12,13-tetratritiooctadeca-9,12-dienoic acid Chemical compound C(CCCCCCC\C(=C(/C\C(=C(/CCCCC)\[3H])\[3H])\[3H])\[3H])(=O)O OYHQOLUKZRVURQ-NTGFUMLPSA-N 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 description 1
- QMMJWQMCMRUYTG-UHFFFAOYSA-N 1,2,4,5-tetrachloro-3-(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=C(Cl)C(Cl)=CC(Cl)=C1Cl QMMJWQMCMRUYTG-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- AROCLDYPZXMJPW-UHFFFAOYSA-N 1-(octyldisulfanyl)octane Chemical compound CCCCCCCCSSCCCCCCCC AROCLDYPZXMJPW-UHFFFAOYSA-N 0.000 description 1
- MPPPKRYCTPRNTB-UHFFFAOYSA-N 1-bromobutane Chemical compound CCCCBr MPPPKRYCTPRNTB-UHFFFAOYSA-N 0.000 description 1
- WSULSMOGMLRGKU-UHFFFAOYSA-N 1-bromooctadecane Chemical compound CCCCCCCCCCCCCCCCCCBr WSULSMOGMLRGKU-UHFFFAOYSA-N 0.000 description 1
- CYNYIHKIEHGYOZ-UHFFFAOYSA-N 1-bromopropane Chemical compound CCCBr CYNYIHKIEHGYOZ-UHFFFAOYSA-N 0.000 description 1
- VFWCMGCRMGJXDK-UHFFFAOYSA-N 1-chlorobutane Chemical compound CCCCCl VFWCMGCRMGJXDK-UHFFFAOYSA-N 0.000 description 1
- LDMOEFOXLIZJOW-UHFFFAOYSA-N 1-dodecanesulfonic acid Chemical compound CCCCCCCCCCCCS(O)(=O)=O LDMOEFOXLIZJOW-UHFFFAOYSA-N 0.000 description 1
- ZNJOCVLVYVOUGB-UHFFFAOYSA-N 1-iodooctadecane Chemical compound CCCCCCCCCCCCCCCCCCI ZNJOCVLVYVOUGB-UHFFFAOYSA-N 0.000 description 1
- RZRNAYUHWVFMIP-KTKRTIGZSA-N 1-oleoylglycerol Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OCC(O)CO RZRNAYUHWVFMIP-KTKRTIGZSA-N 0.000 description 1
- RQMWDQMALYNILJ-UHFFFAOYSA-N 2,3,4,5,5-pentachloropenta-2,4-dienoic acid Chemical compound OC(=O)C(Cl)=C(Cl)C(Cl)=C(Cl)Cl RQMWDQMALYNILJ-UHFFFAOYSA-N 0.000 description 1
- YEVQZPWSVWZAOB-UHFFFAOYSA-N 2-(bromomethyl)-1-iodo-4-(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=C(I)C(CBr)=C1 YEVQZPWSVWZAOB-UHFFFAOYSA-N 0.000 description 1
- NYLJHRUQFXQNPN-UHFFFAOYSA-N 2-(tert-butyltrisulfanyl)-2-methylpropane Chemical compound CC(C)(C)SSSC(C)(C)C NYLJHRUQFXQNPN-UHFFFAOYSA-N 0.000 description 1
- SZIFAVKTNFCBPC-UHFFFAOYSA-N 2-chloroethanol Chemical compound OCCCl SZIFAVKTNFCBPC-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- ULRPISSMEBPJLN-UHFFFAOYSA-N 2h-tetrazol-5-amine Chemical compound NC1=NN=NN1 ULRPISSMEBPJLN-UHFFFAOYSA-N 0.000 description 1
- RJNYNDHYSJRRDW-UHFFFAOYSA-N 4-(pyridin-2-yldiazenyl)benzene-1,3-diol Chemical compound OC1=CC(O)=CC=C1N=NC1=CC=CC=N1 RJNYNDHYSJRRDW-UHFFFAOYSA-N 0.000 description 1
- NTSLROIKFLNUIJ-UHFFFAOYSA-N 5-Ethyl-2-methylpyridine Chemical compound CCC1=CC=C(C)N=C1 NTSLROIKFLNUIJ-UHFFFAOYSA-N 0.000 description 1
- QDTDKYHPHANITQ-UHFFFAOYSA-N 7-methyloctan-1-ol Chemical compound CC(C)CCCCCCO QDTDKYHPHANITQ-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- GFFGJBXGBJISGV-UHFFFAOYSA-N Adenine Chemical compound NC1=NC=NC2=C1N=CN2 GFFGJBXGBJISGV-UHFFFAOYSA-N 0.000 description 1
- 229930024421 Adenine Natural products 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- POJWUDADGALRAB-PVQJCKRUSA-N Allantoin Natural products NC(=O)N[C@@H]1NC(=O)NC1=O POJWUDADGALRAB-PVQJCKRUSA-N 0.000 description 1
- 229910000521 B alloy Inorganic materials 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical class [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- ICPHWJOJNPWHQF-UHFFFAOYSA-N C(C(C)C)C1=C(C=CC=C1)S(=P([S-])([O-])[O-])CCCCCCCCC.[Zn+2].C(C(C)C)C1=C(C=CC=C1)S(=P([S-])([O-])[O-])CCCCCCCCC.[Zn+2].[Zn+2] Chemical compound C(C(C)C)C1=C(C=CC=C1)S(=P([S-])([O-])[O-])CCCCCCCCC.[Zn+2].C(C(C)C)C1=C(C=CC=C1)S(=P([S-])([O-])[O-])CCCCCCCCC.[Zn+2].[Zn+2] ICPHWJOJNPWHQF-UHFFFAOYSA-N 0.000 description 1
- DVBSUIROAVSLCA-UHFFFAOYSA-N C(C(C)C)S(=P([S-])([O-])[O-])CCCCC.[Zn+2].C(C(C)C)S(=P([S-])([O-])[O-])CCCCC.[Zn+2].[Zn+2] Chemical compound C(C(C)C)S(=P([S-])([O-])[O-])CCCCC.[Zn+2].C(C(C)C)S(=P([S-])([O-])[O-])CCCCC.[Zn+2].[Zn+2] DVBSUIROAVSLCA-UHFFFAOYSA-N 0.000 description 1
- VLYHYFWHKZDPON-UHFFFAOYSA-N CCCC(C)S(=P(O)(O)S)C(C)C Chemical compound CCCC(C)S(=P(O)(O)S)C(C)C VLYHYFWHKZDPON-UHFFFAOYSA-N 0.000 description 1
- BKKBEZCXJQVAKC-UHFFFAOYSA-N CCCCCCCC1=CC=CC([S+]=P([O-])(O)S)=C1CCCCCCC Chemical compound CCCCCCCC1=CC=CC([S+]=P([O-])(O)S)=C1CCCCCCC BKKBEZCXJQVAKC-UHFFFAOYSA-N 0.000 description 1
- KLXWMFXGEJFIGE-UHFFFAOYSA-N CCCCCCCS(=P(O)(O)S)C1=CC=CC=C1CC(C)C Chemical compound CCCCCCCS(=P(O)(O)S)C1=CC=CC=C1CC(C)C KLXWMFXGEJFIGE-UHFFFAOYSA-N 0.000 description 1
- 229920001747 Cellulose diacetate Polymers 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- HBEMHMNHYDTVRE-UHFFFAOYSA-N ClC(CCCCCCCCCCCCCCCCC(=O)OC)(Cl)Cl Chemical compound ClC(CCCCCCCCCCCCCCCCC(=O)OC)(Cl)Cl HBEMHMNHYDTVRE-UHFFFAOYSA-N 0.000 description 1
- 229910020630 Co Ni Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- AAWZDTNXLSGCEK-UHFFFAOYSA-N Cordycepinsaeure Natural products OC1CC(O)(C(O)=O)CC(O)C1O AAWZDTNXLSGCEK-UHFFFAOYSA-N 0.000 description 1
- 229910002440 Co–Ni Inorganic materials 0.000 description 1
- 229910020707 Co—Pt Inorganic materials 0.000 description 1
- AUNGANRZJHBGPY-UHFFFAOYSA-N D-Lyxoflavin Natural products OCC(O)C(O)C(O)CN1C=2C=C(C)C(C)=CC=2N=C2C1=NC(=O)NC2=O AUNGANRZJHBGPY-UHFFFAOYSA-N 0.000 description 1
- JYFHYPJRHGVZDY-UHFFFAOYSA-N Dibutyl phosphate Chemical compound CCCCOP(O)(=O)OCCCC JYFHYPJRHGVZDY-UHFFFAOYSA-N 0.000 description 1
- HTIRHQRTDBPHNZ-UHFFFAOYSA-N Dibutyl sulfide Chemical compound CCCCSCCCC HTIRHQRTDBPHNZ-UHFFFAOYSA-N 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- 229910017061 Fe Co Inorganic materials 0.000 description 1
- 229910017112 Fe—C Inorganic materials 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 241000885593 Geisha Species 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 239000004439 Isononyl alcohol Substances 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- 229910001260 Pt alloy Inorganic materials 0.000 description 1
- AAWZDTNXLSGCEK-ZHQZDSKASA-N Quinic acid Natural products O[C@H]1CC(O)(C(O)=O)C[C@H](O)C1O AAWZDTNXLSGCEK-ZHQZDSKASA-N 0.000 description 1
- BERPCVULMUPOER-UHFFFAOYSA-N Quinolinediol Chemical compound C1=CC=C2NC(=O)C(O)=CC2=C1 BERPCVULMUPOER-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- 239000004433 Thermoplastic polyurethane Substances 0.000 description 1
- JZRWCGZRTZMZEH-UHFFFAOYSA-N Thiamine Natural products CC1=C(CCO)SC=[N+]1CC1=CN=C(C)N=C1N JZRWCGZRTZMZEH-UHFFFAOYSA-N 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- XYRMLECORMNZEY-UHFFFAOYSA-B [Mo+4].[Mo+4].[Mo+4].[O-]P([O-])([S-])=S.[O-]P([O-])([S-])=S.[O-]P([O-])([S-])=S.[O-]P([O-])([S-])=S Chemical compound [Mo+4].[Mo+4].[Mo+4].[O-]P([O-])([S-])=S.[O-]P([O-])([S-])=S.[O-]P([O-])([S-])=S.[O-]P([O-])([S-])=S XYRMLECORMNZEY-UHFFFAOYSA-B 0.000 description 1
- ACIWXGYNMZKTQB-UHFFFAOYSA-M [Zn+].CC(C)COP([O-])(=S)SCC(C)C Chemical compound [Zn+].CC(C)COP([O-])(=S)SCC(C)C ACIWXGYNMZKTQB-UHFFFAOYSA-M 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229960000643 adenine Drugs 0.000 description 1
- 125000003158 alcohol group Chemical group 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 150000001350 alkyl halides Chemical class 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 229960000458 allantoin Drugs 0.000 description 1
- HFEHLDPGIKPNKL-UHFFFAOYSA-N allyl iodide Chemical compound ICC=C HFEHLDPGIKPNKL-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- HNYOPLTXPVRDBG-UHFFFAOYSA-N barbituric acid Chemical compound O=C1CC(=O)NC(=O)N1 HNYOPLTXPVRDBG-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- AGEZXYOZHKGVCM-UHFFFAOYSA-N benzyl bromide Chemical compound BrCC1=CC=CC=C1 AGEZXYOZHKGVCM-UHFFFAOYSA-N 0.000 description 1
- VBICKXHEKHSIBG-UHFFFAOYSA-N beta-monoglyceryl stearate Natural products CCCCCCCCCCCCCCCCCC(=O)OCC(O)CO VBICKXHEKHSIBG-UHFFFAOYSA-N 0.000 description 1
- 229950011260 betanaphthol Drugs 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- ZLMKQJQJURXYLC-UHFFFAOYSA-N bis(2-ethylhexoxy)-oxophosphanium Chemical compound CCCCC(CC)CO[P+](=O)OCC(CC)CCCC ZLMKQJQJURXYLC-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- AQNQQHJNRPDOQV-UHFFFAOYSA-N bromocyclohexane Chemical compound BrC1CCCCC1 AQNQQHJNRPDOQV-UHFFFAOYSA-N 0.000 description 1
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 1
- MPWHGCIPQIJZDN-UHFFFAOYSA-N butan-1-amine;dibutyl hydrogen phosphate Chemical class CCCCN.CCCCOP(O)(=O)OCCCC MPWHGCIPQIJZDN-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- ABDBNWQRPYOPDF-UHFFFAOYSA-N carbonofluoridic acid Chemical group OC(F)=O ABDBNWQRPYOPDF-UHFFFAOYSA-N 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229960000541 cetyl alcohol Drugs 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- HRYZWHHZPQKTII-UHFFFAOYSA-N chloroethane Chemical compound CCCl HRYZWHHZPQKTII-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 229940109239 creatinine Drugs 0.000 description 1
- TUTWLYPCGCUWQI-UHFFFAOYSA-N decanamide Chemical compound CCCCCCCCCC(N)=O TUTWLYPCGCUWQI-UHFFFAOYSA-N 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000007033 dehydrochlorination reaction Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- BVXOPEOQUQWRHQ-UHFFFAOYSA-N dibutyl phosphite Chemical compound CCCCOP([O-])OCCCC BVXOPEOQUQWRHQ-UHFFFAOYSA-N 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- QBCOASQOMILNBN-UHFFFAOYSA-N didodecoxy(oxo)phosphanium Chemical compound CCCCCCCCCCCCO[P+](=O)OCCCCCCCCCCCC QBCOASQOMILNBN-UHFFFAOYSA-N 0.000 description 1
- HWOMGQSMOYLVHY-UHFFFAOYSA-N didodecyl hydrogen phosphate;octadecan-1-amine Chemical compound CCCCCCCCCCCCCCCCCCN.CCCCCCCCCCCCOP(O)(=O)OCCCCCCCCCCCC HWOMGQSMOYLVHY-UHFFFAOYSA-N 0.000 description 1
- WWTJIQZQNORJND-UHFFFAOYSA-N didodecyl hydrogen phosphate;octan-1-amine Chemical compound CCCCCCCCN.CCCCCCCCCCCCOP(O)(=O)OCCCCCCCCCCCC WWTJIQZQNORJND-UHFFFAOYSA-N 0.000 description 1
- RLULIUSIDLLCSW-UHFFFAOYSA-N diethylcarbamothioylsulfanylselanyl n,n-diethylcarbamodithioate Chemical compound CCN(CC)C(=S)S[Se]SC(=S)N(CC)CC RLULIUSIDLLCSW-UHFFFAOYSA-N 0.000 description 1
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- MZGNSEAPZQGJRB-UHFFFAOYSA-N dimethyldithiocarbamic acid Chemical compound CN(C)C(S)=S MZGNSEAPZQGJRB-UHFFFAOYSA-N 0.000 description 1
- HTDKEJXHILZNPP-UHFFFAOYSA-N dioctyl hydrogen phosphate Chemical compound CCCCCCCCOP(O)(=O)OCCCCCCCC HTDKEJXHILZNPP-UHFFFAOYSA-N 0.000 description 1
- MGUAQZRBWQVVQC-UHFFFAOYSA-N dioctyl hydrogen phosphate;dodecan-1-amine Chemical compound CCCCCCCCCCCCN.CCCCCCCCOP(O)(=O)OCCCCCCCC MGUAQZRBWQVVQC-UHFFFAOYSA-N 0.000 description 1
- PQACFRRGIDICLF-UHFFFAOYSA-N dioctyl hydrogen phosphate;octadecan-1-amine Chemical compound CCCCCCCCCCCCCCCCCCN.CCCCCCCCOP(O)(=O)OCCCCCCCC PQACFRRGIDICLF-UHFFFAOYSA-N 0.000 description 1
- XMQYIPNJVLNWOE-UHFFFAOYSA-N dioctyl hydrogen phosphite Chemical compound CCCCCCCCOP(O)OCCCCCCCC XMQYIPNJVLNWOE-UHFFFAOYSA-N 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- LTYMSROWYAPPGB-UHFFFAOYSA-N diphenyl sulfide Chemical group C=1C=CC=CC=1SC1=CC=CC=C1 LTYMSROWYAPPGB-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- WNUUZVCKZRCFIT-UHFFFAOYSA-N docosane-1-sulfonic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCCS(O)(=O)=O WNUUZVCKZRCFIT-UHFFFAOYSA-N 0.000 description 1
- ILRSCQWREDREME-UHFFFAOYSA-N dodecanamide Chemical compound CCCCCCCCCCCC(N)=O ILRSCQWREDREME-UHFFFAOYSA-N 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 150000002191 fatty alcohols Chemical class 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- JVZRCNQLWOELDU-UHFFFAOYSA-N gamma-Phenylpyridine Natural products C1=CC=CC=C1C1=CC=NC=C1 JVZRCNQLWOELDU-UHFFFAOYSA-N 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- FEEPBTVZSYQUDP-UHFFFAOYSA-N heptatriacontanediamide Chemical compound NC(=O)CCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCC(N)=O FEEPBTVZSYQUDP-UHFFFAOYSA-N 0.000 description 1
- VHHHONWQHHHLTI-UHFFFAOYSA-N hexachloroethane Chemical compound ClC(Cl)(Cl)C(Cl)(Cl)Cl VHHHONWQHHHLTI-UHFFFAOYSA-N 0.000 description 1
- SSILHZFTFWOUJR-UHFFFAOYSA-N hexadecane-1-sulfonic acid Chemical compound CCCCCCCCCCCCCCCCS(O)(=O)=O SSILHZFTFWOUJR-UHFFFAOYSA-N 0.000 description 1
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 description 1
- 229940091173 hydantoin Drugs 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- 150000002497 iodine compounds Chemical class 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- SFIHQZFZMWZOJV-HZJYTTRNSA-N linoleamide Chemical compound CCCCC\C=C/C\C=C/CCCCCCCC(N)=O SFIHQZFZMWZOJV-HZJYTTRNSA-N 0.000 description 1
- 239000012280 lithium aluminium hydride Substances 0.000 description 1
- HWYHZTIRURJOHG-UHFFFAOYSA-N luminol Chemical compound O=C1NNC(=O)C2=C1C(N)=CC=C2 HWYHZTIRURJOHG-UHFFFAOYSA-N 0.000 description 1
- 239000006247 magnetic powder Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000002480 mineral oil Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- RZRNAYUHWVFMIP-UHFFFAOYSA-N monoelaidin Natural products CCCCCCCCC=CCCCCCCCC(=O)OCC(O)CO RZRNAYUHWVFMIP-UHFFFAOYSA-N 0.000 description 1
- AZHYTXUTACODCW-UHFFFAOYSA-L n,n-dimethylcarbamodithioate;iron(2+) Chemical compound [Fe+2].CN(C)C([S-])=S.CN(C)C([S-])=S AZHYTXUTACODCW-UHFFFAOYSA-L 0.000 description 1
- RKISUIUJZGSLEV-UHFFFAOYSA-N n-[2-(octadecanoylamino)ethyl]octadecanamide Chemical compound CCCCCCCCCCCCCCCCCC(=O)NCCNC(=O)CCCCCCCCCCCCCCCCC RKISUIUJZGSLEV-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- GOQYKNQRPGWPLP-UHFFFAOYSA-N n-heptadecyl alcohol Natural products CCCCCCCCCCCCCCCCCO GOQYKNQRPGWPLP-UHFFFAOYSA-N 0.000 description 1
- SNMVRZFUUCLYTO-UHFFFAOYSA-N n-propyl chloride Chemical compound CCCCl SNMVRZFUUCLYTO-UHFFFAOYSA-N 0.000 description 1
- PVWOIHVRPOBWPI-UHFFFAOYSA-N n-propyl iodide Chemical compound CCCI PVWOIHVRPOBWPI-UHFFFAOYSA-N 0.000 description 1
- 150000004780 naphthols Chemical class 0.000 description 1
- LYRFLYHAGKPMFH-UHFFFAOYSA-N octadecanamide Chemical compound CCCCCCCCCCCCCCCCCC(N)=O LYRFLYHAGKPMFH-UHFFFAOYSA-N 0.000 description 1
- CACRRXGTWZXOAU-UHFFFAOYSA-N octadecane-1-sulfonic acid Chemical compound CCCCCCCCCCCCCCCCCCS(O)(=O)=O CACRRXGTWZXOAU-UHFFFAOYSA-N 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 235000019198 oils Nutrition 0.000 description 1
- 235000014593 oils and fats Nutrition 0.000 description 1
- FATBGEAMYMYZAF-KTKRTIGZSA-N oleamide Chemical compound CCCCCCCC\C=C/CCCCCCCC(N)=O FATBGEAMYMYZAF-KTKRTIGZSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 229960005010 orotic acid Drugs 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- MOQRZWSWPNIGMP-UHFFFAOYSA-N pentyl octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCCCCC MOQRZWSWPNIGMP-UHFFFAOYSA-N 0.000 description 1
- PCIUEQPBYFRTEM-UHFFFAOYSA-N perfluorodecanoic acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F PCIUEQPBYFRTEM-UHFFFAOYSA-N 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000008301 phosphite esters Chemical class 0.000 description 1
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920005906 polyester polyol Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- JWVCLYRUEFBMGU-UHFFFAOYSA-N quinazoline Chemical compound N1=CN=CC2=CC=CC=C21 JWVCLYRUEFBMGU-UHFFFAOYSA-N 0.000 description 1
- QMVCLSHKMIGEFN-UHFFFAOYSA-N quinolin-2-ylhydrazine Chemical compound C1=CC=CC2=NC(NN)=CC=C21 QMVCLSHKMIGEFN-UHFFFAOYSA-N 0.000 description 1
- YHUVMHKAHWKQBI-UHFFFAOYSA-N quinoline-2,3-dicarboxylic acid Chemical compound C1=CC=C2N=C(C(O)=O)C(C(=O)O)=CC2=C1 YHUVMHKAHWKQBI-UHFFFAOYSA-N 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000002151 riboflavin Substances 0.000 description 1
- 235000019192 riboflavin Nutrition 0.000 description 1
- 229960002477 riboflavin Drugs 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 235000003441 saturated fatty acids Nutrition 0.000 description 1
- 150000004671 saturated fatty acids Chemical class 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- NSVHDIYWJVLAGH-UHFFFAOYSA-M silver;n,n-diethylcarbamodithioate Chemical compound [Ag+].CCN(CC)C([S-])=S NSVHDIYWJVLAGH-UHFFFAOYSA-M 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- MYOWBHNETUSQPA-UHFFFAOYSA-N tetradecane-1-sulfonic acid Chemical compound CCCCCCCCCCCCCCS(O)(=O)=O MYOWBHNETUSQPA-UHFFFAOYSA-N 0.000 description 1
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
- 229960004559 theobromine Drugs 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- KYMBYSLLVAOCFI-UHFFFAOYSA-N thiamine Chemical compound CC1=C(CCO)SCN1CC1=CN=C(C)N=C1N KYMBYSLLVAOCFI-UHFFFAOYSA-N 0.000 description 1
- 235000019157 thiamine Nutrition 0.000 description 1
- 229960003495 thiamine Drugs 0.000 description 1
- 239000011721 thiamine Substances 0.000 description 1
- 150000003557 thiazoles Chemical class 0.000 description 1
- 150000003558 thiocarbamic acid derivatives Chemical class 0.000 description 1
- 150000003566 thiocarboxylic acids Chemical class 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- 229940113082 thymine Drugs 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- XTTGYFREQJCEML-UHFFFAOYSA-N tributyl phosphite Chemical compound CCCCOP(OCCCC)OCCCC XTTGYFREQJCEML-UHFFFAOYSA-N 0.000 description 1
- OHRVKCZTBPSUIK-UHFFFAOYSA-N tridodecyl phosphate Chemical compound CCCCCCCCCCCCOP(=O)(OCCCCCCCCCCCC)OCCCCCCCCCCCC OHRVKCZTBPSUIK-UHFFFAOYSA-N 0.000 description 1
- IVIIAEVMQHEPAY-UHFFFAOYSA-N tridodecyl phosphite Chemical compound CCCCCCCCCCCCOP(OCCCCCCCCCCCC)OCCCCCCCCCCCC IVIIAEVMQHEPAY-UHFFFAOYSA-N 0.000 description 1
- QOQNJVLFFRMJTQ-UHFFFAOYSA-N trioctyl phosphite Chemical compound CCCCCCCCOP(OCCCCCCCC)OCCCCCCCC QOQNJVLFFRMJTQ-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- ILLOBGFGKYTZRO-UHFFFAOYSA-N tris(2-ethylhexyl) phosphite Chemical compound CCCCC(CC)COP(OCC(CC)CCCC)OCC(CC)CCCC ILLOBGFGKYTZRO-UHFFFAOYSA-N 0.000 description 1
- SVETUDAIEHYIKZ-IUPFWZBJSA-N tris[(z)-octadec-9-enyl] phosphate Chemical compound CCCCCCCC\C=C/CCCCCCCCOP(=O)(OCCCCCCCC\C=C/CCCCCCCC)OCCCCCCCC\C=C/CCCCCCCC SVETUDAIEHYIKZ-IUPFWZBJSA-N 0.000 description 1
- 239000011882 ultra-fine particle Substances 0.000 description 1
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 1
- 150000004670 unsaturated fatty acids Chemical class 0.000 description 1
- 229940035893 uracil Drugs 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- KAKZBPTYRLMSJV-UHFFFAOYSA-N vinyl-ethylene Natural products C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 1
- 239000010698 whale oil Substances 0.000 description 1
- BOXSVZNGTQTENJ-UHFFFAOYSA-L zinc dibutyldithiocarbamate Chemical compound [Zn+2].CCCCN(C([S-])=S)CCCC.CCCCN(C([S-])=S)CCCC BOXSVZNGTQTENJ-UHFFFAOYSA-L 0.000 description 1
- RKQOSDAEEGPRER-UHFFFAOYSA-L zinc diethyldithiocarbamate Chemical compound [Zn+2].CCN(CC)C([S-])=S.CCN(CC)C([S-])=S RKQOSDAEEGPRER-UHFFFAOYSA-L 0.000 description 1
- PXJZGBFRKRTOPA-UHFFFAOYSA-L zinc;[2,3-di(nonyl)phenyl]sulfanyl-dioxido-sulfanylidene-$l^{5}-phosphane Chemical compound [Zn+2].CCCCCCCCCC1=CC=CC(SP([O-])([O-])=S)=C1CCCCCCCCC PXJZGBFRKRTOPA-UHFFFAOYSA-L 0.000 description 1
- KMNUDJAXRXUZQS-UHFFFAOYSA-L zinc;n-ethyl-n-phenylcarbamodithioate Chemical compound [Zn+2].CCN(C([S-])=S)C1=CC=CC=C1.CCN(C([S-])=S)C1=CC=CC=C1 KMNUDJAXRXUZQS-UHFFFAOYSA-L 0.000 description 1
- DUBNHZYBDBBJHD-UHFFFAOYSA-L ziram Chemical compound [Zn+2].CN(C)C([S-])=S.CN(C)C([S-])=S DUBNHZYBDBBJHD-UHFFFAOYSA-L 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、真空芸者やスパッタリング等の真空薄膜形成
技術等の手法により非磁性支持体上に強磁性金属薄膜を
磁性層として形成した、いわゆる強(d性金属薄膜型の
磁気記録媒体に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a so-called magnetic layer in which a ferromagnetic metal thin film is formed as a magnetic layer on a non-magnetic support by vacuum thin film forming techniques such as vacuum Geisha and sputtering. This relates to a strong (d) metal thin film type magnetic recording medium.
〔発明の]5要〕
本発明は、非磁性支持体上に強磁性金属薄膜を磁性層と
して形成してなる磁気記録媒体において、磁性層である
強磁性金属薄膜上に窒素原子を含む複素環化合物を主成
分とする防錆剤層及びパーフルオロアルキルカルボン酸
エステルを含有する潤滑剤層をこの順に被着することに
より、あらゆる使用条件下においても優れた走行性。[5 points of the invention] The present invention provides a magnetic recording medium in which a ferromagnetic metal thin film is formed as a magnetic layer on a non-magnetic support, in which a heterocyclic ring containing a nitrogen atom is formed on the ferromagnetic metal thin film as the magnetic layer. Excellent runnability under all usage conditions by applying a rust preventive layer mainly composed of a compound and a lubricant layer containing a perfluoroalkyl carboxylic acid ester in this order.
耐摩耗性、耐久性を発揮し、良好な耐蝕性を有する磁気
記録媒体を提供しようとするものである。The object of the present invention is to provide a magnetic recording medium that exhibits wear resistance, durability, and has good corrosion resistance.
〔従来の技術]
従来より磁気記録媒体としては、非磁性支持体上にr
F e 2031 G oを含有するr−FezO=
。[Prior Art] Conventionally, as a magnetic recording medium, r
r-FezO containing Fe 2031 Go =
.
Fe、04.coを含有するF eloir−F ez
o、3とFe30aとのへルトライド化合物、Coを含
有するベルトライド化合物、CrO2等の酸化物強磁性
粉末あるいはFe、Co、Ni等を主成分とする合金磁
性粉末等のむ)未磁性材料を塩化ビニル−酢酸ビニル系
共重合体、ポリエステル樹脂、ポリウレタン樹脂等の有
機バインダー中に分散セしめた磁性塗料を塗布・乾燥す
ることにより作製される塗布型の磁気記録媒体が広く使
用されている。Fe, 04. Feloir-Fez containing co
Non-magnetic materials such as ferrolide compounds of o, 3 and Fe30a, bertolide compounds containing Co, oxide ferromagnetic powders such as CrO2, or alloy magnetic powders mainly composed of Fe, Co, Ni, etc. Coated magnetic recording media are widely used, which are produced by applying and drying a magnetic paint dispersed in an organic binder such as a vinyl chloride-vinyl acetate copolymer, polyester resin, or polyurethane resin.
これに対して、高密度磁気記録への要求の高まりととも
に、co−Ni合金等の強磁性金属材料を、メツキや真
空薄膜形成技術(真空薄着法やスパッタリング法、イオ
ンブレーティング法等)によってポリエステルフィルム
やポリイミドフィルム等の非磁性支持体上に直接被着し
た、いわゆる強磁性金属薄膜型の磁気記録媒体が促案さ
れ、注目を集めている。この強磁性金属ijl膜型磁気
記録媒体は、抗磁力や角形比等に優れ、短波長での電磁
変換特性に優れるばかりでなく、磁性層の厚みを極めて
薄くすることが可能であるため記録Jiffや再生時の
厚み1員失が著しく小さいこと、磁性層中に非磁性材で
ある存機バインダーを混入する必要がないため磁性材料
の充填密度を高めることができること等、数々の利点を
有している。On the other hand, with the increasing demand for high-density magnetic recording, ferromagnetic metal materials such as co-Ni alloys can be made into polyester by plating or vacuum thin film formation technology (vacuum thin deposition method, sputtering method, ion blating method, etc.). A so-called ferromagnetic metal thin film type magnetic recording medium, which is directly deposited on a non-magnetic support such as a film or a polyimide film, has been proposed and is attracting attention. This ferromagnetic metal ijl film type magnetic recording medium not only has excellent coercive force and squareness ratio, and has excellent electromagnetic conversion characteristics at short wavelengths, but also has the ability to make the magnetic layer extremely thin, making it possible to record Jiff It has a number of advantages, including a significantly small loss of one member in the thickness during playback and reproduction, and the ability to increase the packing density of the magnetic material because there is no need to mix a non-magnetic binder into the magnetic layer. ing.
しかしながら、上述の@磁性金属薄膜型の磁気記録媒体
では、磁性層表面の平滑性が極めて良好であるために実
質的な接触面積が大きくなり、凝着現象(いわゆるはり
つき)が起こり易(なったりFi!擦係数が大きくなる
等、耐久性や走行性等に欠点が多く、その改善が大きな
課題となっている。However, in the @magnetic metal thin film type magnetic recording medium described above, the surface smoothness of the magnetic layer is extremely good, so the effective contact area is large, and adhesion phenomena (so-called sticking) are likely to occur. It has many drawbacks in terms of durability, running performance, etc., such as a large Fi! coefficient of friction, and its improvement has become a major issue.
−般に、磁気記録媒体は磁気信号の記録・再生の過程で
磁気ヘッドとの高速相対遅動のもとにおかれ、その際走
行が円滑に、かつ安定な状態で行われなければならない
、また、磁気ヘッドとの接触による摩耗や損傷はなるべ
く少ないほうがよい。- In general, a magnetic recording medium is subjected to high-speed relative slow movement with a magnetic head during the recording and reproducing process of magnetic signals, and during this time, the medium must run smoothly and stably. Further, it is better to minimize wear and damage caused by contact with the magnetic head.
あるいは、強磁性金属薄膜型の磁気記録媒体では、磁性
層が金属材料により構成されることから、保存中、特に
高温、高温下にさらされた場合、磁性層表面に腐食を生
じやすく、このため飽和磁化量や抗磁力等が経口的に劣
化する等の問題があった。Alternatively, in ferromagnetic metal thin film type magnetic recording media, the magnetic layer is composed of a metal material, so during storage, especially when exposed to high temperatures or high temperatures, the surface of the magnetic layer tends to corrode. There were problems such as saturation magnetization, coercive force, etc. deteriorating orally.
このように、上述の強磁性金属薄膜型の磁気記録媒体で
は、走行性、耐久性、耐蝕性等の実用特性に問題が多(
、したがって従来、潤滑剤や防錆剤等の被着による改善
が試みられている。As described above, the above-mentioned ferromagnetic metal thin film type magnetic recording media has many problems in practical properties such as runnability, durability, and corrosion resistance.
Therefore, attempts have been made to improve this by applying lubricants, rust preventives, etc.
しかしながら、これら従来の試みも未だ充分なものとは
言い難<、例えば、従来広く用いられている潤滑剤の使
用温度範囲は限られており、特に、O〜−5℃のような
低温下では固体または凍結するものが多く、充分にその
潤滑効果を発揮させることができないという問題がある
。However, these conventional attempts are still far from satisfactory.For example, the operating temperature range of conventionally widely used lubricants is limited, especially at low temperatures such as O to -5℃. There is a problem in that many of them are solid or frozen, and their lubricating effect cannot be fully exerted.
本発明は、かかる実用特性をより一層の改善を目的とす
るもので、走行性、耐久性、耐蝕性に優れるとともに、
これら実用特性が広い使用温度条件下においても保たれ
る磁気記録媒体の提供を目的とする。The present invention aims to further improve such practical characteristics, and has excellent running properties, durability, and corrosion resistance.
The object of the present invention is to provide a magnetic recording medium that maintains these practical characteristics even under a wide range of operating temperatures.
本発明者等は、上述の目的を達成せんものと鋭意研究の
結果、パーフルオロアルキルカルボン酸エステルが広い
温度範囲に亘って優れた潤滑性を発揮すること、また窒
素原子を含む複素環化合物が耐蝕性の改善に有効である
こと、さらに強磁性金属薄膜上に先ず防錆剤層を被着し
その上に潤滑剤層を被着した場合に、防錆剤層、潤滑剤
層がそれぞれより有効に働くこと、等を見出し本発明を
完成するに至ったものである。The inventors of the present invention have conducted extensive research to achieve the above objectives, and have found that perfluoroalkylcarboxylic acid esters exhibit excellent lubricity over a wide temperature range, and that heterocyclic compounds containing nitrogen atoms It is effective in improving corrosion resistance, and furthermore, when a rust preventive layer is first deposited on a ferromagnetic metal thin film and a lubricant layer is deposited on top of that, the rust preventive layer and lubricant layer are They discovered that the method works effectively and completed the present invention.
すなわち、本発明の磁気記録媒体は、非磁性支持体上に
強磁性金属薄膜を形成し、前記強磁性金属薄膜上に窒素
原子を含む複素環化合物を主成分とする防錆剤層及びパ
ーフルオロアルキルカルボン酸エステルを含存する潤滑
剤層をこの順に被着したことを特徴とするものである。That is, in the magnetic recording medium of the present invention, a ferromagnetic metal thin film is formed on a nonmagnetic support, and a rust preventive layer containing a nitrogen atom-containing heterocyclic compound as a main component and a perfluorinated metal thin film are formed on the ferromagnetic metal thin film. It is characterized in that a lubricant layer containing an alkyl carboxylic acid ester is deposited in this order.
本発明の磁気記録媒体において、潤滑剤層の潤滑剤成分
として使用されるパーフルオロアルキルカルボン酸エス
テルは、−般式
%式%()
(式中のXは水素原子、フン素原子またはその両者であ
り、n≧6、m≦20+1、a≧8、b≦22+1であ
る。)
で表される化合物である。In the magnetic recording medium of the present invention, the perfluoroalkyl carboxylic acid ester used as the lubricant component of the lubricant layer has the general formula % () (where X is a hydrogen atom, a fluorine atom, or both and n≧6, m≦20+1, a≧8, b≦22+1).
このパーフルオロアルキルカルボン酸エステルは、常温
で固体のパーフルオロアルキルカルボン酸をエステル化
させ、融点を下げるとともにアルコール部の効果を伴わ
せ、潤滑効果を低温域にまで広げたものである。This perfluoroalkylcarboxylic acid ester is obtained by esterifying a perfluoroalkylcarboxylic acid that is solid at room temperature, lowering the melting point and adding the effect of an alcohol moiety, thereby extending the lubricating effect to a low temperature range.
上記−般式(りにおいて、C,X、で示される脂肪族炭
化水素基の炭素数aは8以上とすることが好ましい、炭
素数aが8未満であると潤滑性が不足する。実際には、
炭素数18未満の直鎖状アルキル基、あるいは炭素数が
それ以上の場合には二重結合を持たせるか技分かれさせ
た脂肪族炭化水素基とすることにより上述の目的を達成
することができた。また、上記脂肪族炭化水素基は、含
フツ素脂肪族炭化水素基であってもよく、したがって、
式中Xは水素原子ばかりでなく、フッ素原子、あるいは
水素原子とフッ素原子の両者であってもよい。In the above general formula (2), the aliphatic hydrocarbon group represented by C, teeth,
The above purpose can be achieved by using a linear alkyl group with less than 18 carbon atoms, or an aliphatic hydrocarbon group with a double bond or with different techniques when the number of carbon atoms is more than 18. Ta. Further, the aliphatic hydrocarbon group may be a fluorine-containing aliphatic hydrocarbon group, and therefore,
In the formula, X may be not only a hydrogen atom but also a fluorine atom, or both a hydrogen atom and a fluorine atom.
一方、パーフルオロアルキルカルボン酸部の炭素数nは
、6以上であることが好ましい、この炭素数nが6未満
であるとやはり潤滑性が不足する。On the other hand, the carbon number n of the perfluoroalkyl carboxylic acid moiety is preferably 6 or more. If the carbon number n is less than 6, the lubricity will be insufficient.
ただし、この炭素数nがあまり大き過ぎると、低温域で
凝固するようになることから、実用上はn≦10程度に
抑えることが好ましい。However, if the carbon number n is too large, it will solidify in a low temperature range, so in practice it is preferable to keep n≦10.
上記パーフルオロアルキルカルボン酸エステルは、−般
式
%式%()
(式中のnは6以上の整数であり、mは2n+1以下の
整数である。)
で表されるパーフルオロカルボン酸と、−i弐C,Xb
O1+ ・・・ (III)(式
中のXは水素原子、フッ素原子またはその両者であり、
aは8以上の整数、bは2a+1以下の整数である。)
で表されるアルコール類をほぼ等モル量で反応させるこ
とによって合成することができる0反応式を示せば次の
ようなものである。The perfluoroalkyl carboxylic acid ester is a perfluorocarboxylic acid represented by the general formula % (in the formula, n is an integer of 6 or more, and m is an integer of 2n+1 or less); -i2C,Xb
O1+ ... (III) (X in the formula is a hydrogen atom, a fluorine atom, or both,
a is an integer of 8 or more, and b is an integer of 2a+1 or less. ) The reaction formula that can be synthesized by reacting alcohols represented by the following in approximately equimolar amounts is as follows.
C,F−COOH+ C,XbOH
−−C,F、C00C,Xb ・−−m式本発明の磁
気記録媒体においては、上述のパーフルオロアルキルカ
ルボン酸エステルを華独で21滑剤として用いてもよい
が、従来公知の潤滑剤と混合して用い、さらに使用温度
帯域の拡大を図るようにしてもよい。C, F-COOH+ C, However, it may be used in combination with a conventionally known lubricant to further expand the operating temperature range.
使用される潤滑剤としては、脂肪酸またはその金属塩、
脂肪酸アミド、脂肪酸エステル、脂肪族アルコールまた
はそのアルコキシド、脂肪族アミン、多価アルコール、
ソルビタンエステル、マンニラタンエステル、硫黄化脂
肪酸、脂肪族メルカプタン、変性シリコーンオイル、パ
ーフルオロアルキルエチレンオキシド、パーフルオロポ
リエーテル類、高級アルキルスルホン酸またはその金属
塩、パーフルオロアルキルスルホン酸またはそのアンモ
ニウム塩あるいはその金属塩、パーフルオロアルキルカ
ルボン酸またはその金属塩、等が例示される。The lubricants used include fatty acids or their metal salts;
Fatty acid amide, fatty acid ester, fatty alcohol or its alkoxide, fatty amine, polyhydric alcohol,
Sorbitan ester, manniratan ester, sulfurized fatty acid, aliphatic mercaptan, modified silicone oil, perfluoroalkyl ethylene oxide, perfluoropolyethers, higher alkyl sulfonic acid or its metal salt, perfluoroalkyl sulfonic acid or its ammonium salt, or its Examples include metal salts, perfluoroalkylcarboxylic acids or metal salts thereof, and the like.
さらには、より厳しい使用条件に対処し、かつ潤滑効果
を持続させるために、重量比で30=70〜70:30
程度の配合比で極圧剤を併用してもよい。Furthermore, in order to cope with more severe usage conditions and maintain the lubricating effect, the weight ratio is 30=70 to 70:30.
An extreme pressure agent may be used in combination at a certain mixing ratio.
上記極圧剤は、境界潤滑’pH域において部分的に金属
接触を生したとき、これに伴う摩擦熱によって金属面と
反応し、反応生成物被膜を形成することにより摩擦・摩
耗防止作用を行うものであって、リン系極圧剤、イオウ
系極圧剤、ハロゲン系極圧剤、有機金属系極圧剤、m金
型極圧剤等が知られている。When the above-mentioned extreme pressure agent makes partial metal contact in the boundary lubrication pH range, it reacts with the metal surface due to the accompanying frictional heat, forming a reaction product film to prevent friction and wear. Known examples include phosphorus-based extreme-pressure agents, sulfur-based extreme-pressure agents, halogen-based extreme-pressure agents, organometallic-based extreme-pressure agents, m-mold extreme-pressure agents, and the like.
具体的に例示すれば、上記リン系極圧剤としては、トリ
ブチルホスフェート トリオクチルホスフェート、トリ
ー2−エチルへキシルホスフェート、トリラウリルホス
フェート、トリオレイルホスフェート。ジブチルホスフ
ェート、ジオクチルホスフェート、ジー2−エチルへキ
シルホスフェート、ジラウリルホスフェート、ジオレイ
ルホスフェート等のリン酸エステル、トリブチルホスフ
ァイト、トリオクチルホスファイト、トリー2−エチル
へキンルホスファイト、トリラウリルホスファイト、ト
リオレイルホスファイト、ジブチルホスファイト ジオ
クチルホスファイト、ジー2−エチルへキシルホスファ
イト、ジラウリルホスファイト、ジオレイルホスファイ
ト等の亜リン酸エステル、ジブチルホスフェートブチル
アミン塩。Specifically, examples of the phosphorus extreme pressure agent include tributyl phosphate, trioctyl phosphate, tri-2-ethylhexyl phosphate, trilauryl phosphate, and trioleyl phosphate. Phosphate esters such as dibutyl phosphate, dioctyl phosphate, di-2-ethylhexyl phosphate, dilauryl phosphate, dioleyl phosphate, tributyl phosphite, trioctyl phosphite, tri-2-ethylhexyl phosphite, trilauryl phosphite , trioleylphosphite, dibutyl phosphite, phosphite esters such as dioctyl phosphite, di-2-ethylhexyl phosphite, dilauryl phosphite, dioleyl phosphite, and dibutyl phosphate butylamine salts.
ジブチルホスフェートオクチルアミン塩、ジブチルホス
フェートステアリルアミン塩、ジブチルホスフェートブ
チルアミン塩、ジオクチルホスフニートオクチルアミン
塩、ジオクチルホスフェートラウリルアミン塩、ジオク
チルホスフェートステアリルアミン塩、ジー2−エチル
へキシルホスフェートブチルアミン塩、ジー2−エチル
へキシルホスフェートブチルアミン塩、ジー2−エチル
へキシルホスフェートラウリルアミン塩、ジー2−エチ
ルへキシルホスフエートステアリルアミン塩、ジラウリ
ルホスフェートブチルアミン塩。Dibutylphosphate octylamine salt, dibutylphosphate stearylamine salt, dibutylphosphate butylamine salt, dioctylphosphneetooctylamine salt, dioctylphosphate laurylamine salt, dioctylphosphate stearylamine salt, di-2-ethylhexylphosphate butylamine salt, di-2-ethyl Hexylphosphate butylamine salt, di-2-ethylhexylphosphate laurylamine salt, di-2-ethylhexylphosphate stearylamine salt, dilaurylphosphate butylamine salt.
ジラウリルホスフェートオクチルアミン塩、ジラウリル
ホスフェートラウリルアミン塩、ジラウリルホスフェー
トステアリルアミン塩、ジオレイルホスフェートブチル
アミン塩、ジオレイルホスフェートオクチルアミン塩、
ジオレイルホスフェートラウリルアミン塩、ジオレイル
ホスフェートステアリルアミン塩等のリン酸エステルア
ミン塩が挙げられる。dilauryl phosphate octylamine salt, dilauryl phosphate traurylamine salt, dilauryl phosphate stearylamine salt, dioleyl phosphate butylamine salt, dioleyl phosphate octylamine salt,
Examples include phosphate ester amine salts such as dioleyl phosphate lauryl amine salt and dioleyl phosphate stearyl amine salt.
上記イオウ系極圧剤としては、硫化抹香鯨油、硫黄化ジ
ペンテン等不飽和結合を有する鉱油、油脂や脂肪酸等に
硫黄を加えて加熱することにより製造される硫化油脂類
、二硫化ジベンジル、二硫化ジフェニル、二硫化ジ−t
−ブチル、二硫化ジー5ec−ブチル、二硫化ジ−n−
ブチル、二硫化ジーL−オクチル、二硫化ジエチル等の
ジチルファイド類、硫化ヘンシル、硫化ジフェニル、硫
化ジビニル、硫化ジメナル、硫化ジエチル、硫化ジー【
−ブチル、硫化ジーsec −ブチル5硫化ジーn−ブ
チル等のモノサルファイド類、三硫化ジメチル、三硫化
ジ−t−ブチル、ポリ硫化ジ−t−ノニル、オレフィン
ポリサルファイド等のポリサルファイド類、−般式
%式%()
(但し、式中Rは炭化水素基を表す。)で示されるチオ
カーボネート類、元素硫黄等が挙げられる。The above-mentioned sulfur-based extreme pressure agents include mineral oils with unsaturated bonds such as sulfurized whale oil and sulfurized dipentene, sulfurized oils and fats produced by adding sulfur to fats and oils and fatty acids, and heating them, dibenzyl disulfide, and disulfide. diphenyl, di-t disulfide
-butyl, di-5ec-butyl disulfide, di-n- disulfide
Dithylphides such as butyl, di-L-octyl disulfide, diethyl disulfide, hensyl sulfide, diphenyl sulfide, divinyl sulfide, dimenal sulfide, diethyl sulfide, di-sulfide [
-butyl, di-sec sulfide -butyl 5 monosulfides such as di-n-butyl sulfide, polysulfides such as dimethyl trisulfide, di-t-butyl trisulfide, di-t-nonyl polysulfide, olefin polysulfide, - general formula Examples include thiocarbonates represented by the formula % (in the formula, R represents a hydrocarbon group), elemental sulfur, and the like.
上記ハロゲン系極圧剤としては、臭化アリル1臭化オク
タデシル、臭化シクロヘキシル、臭化ステアリル、臭化
ベンジル等の臭素化合物、ヨウ化ヘンシル、ヨウ化アリ
ル、ヨウ化ブチル、ヨウ化オクタデシル、ヨウ化ソクロ
ヘキシル等のヨウ素化合物、ヘキサクロロエタン、モノ
クロルエタン。Examples of the halogen-based extreme pressure agent include bromine compounds such as allyl bromide-octadecyl bromide, cyclohexyl bromide, stearyl bromide, benzyl bromide, hensyl iodide, allyl iodide, butyl iodide, octadecyl iodide, Iodine compounds such as isochlorohexyl chloride, hexachloroethane, monochloroethane.
塩素化パラフィン、塩素化ジフェニル、塩素化油脂、メ
チルトリクロロステアレート、ペンタクロロペンタジェ
ン酸、ヘキサクロルナフテン酸化合物のエステル、ヘキ
サクロルナフテン酸化合物のイミド誘ぶ体等の塩素化合
物が挙げられる。Examples include chlorine compounds such as chlorinated paraffin, chlorinated diphenyl, chlorinated fats and oils, methyl trichlorostearate, pentachloropentadienoic acid, esters of hexachloronaphthenic acid compounds, and imide derivatives of hexachloronaphthenic acid compounds.
上記有機金属系極圧剤としては、ジイソブチルジチオリ
ン酸亜鉛、イソブチルペンチルジチオリン酸亜鉛、イソ
プロピル−1−メチルブチルジチオリン酸、イソブチル
ノニルフエニルジチオリン酸亜鉛、イソブチルヘプチル
フエニルジチオリン酸、ジヘプチルフェニルジチオリン
酸、ジノニルフヱニルジチオリン酸亜鉛、モリブデンジ
チオフォスフェート等のチオリン酸塩類、ジメチルジチ
オカルバミン酸亜鉛、ジエチルジチオカルバミン酸亜鉛
、ジブチルジチオカルバミン酸亜鉛、エチルフエニルジ
チオカルバミン酸亜鉛、ジヘンジルジチオ力ルバミン酸
亜鉛、ジメチルジチオカルバミン酸亜鉛、ジメチルジチ
オカルバミン鍍銅、ジメチルジチオカルバミン酸鉄、ジ
エチルジチオカルバミン酸セレン、ジエチルジチオカル
バミン酸銀等のチオカルバミン酸塩類、モリブデン、ア
ンチモン等の金属アルキルジチオカルバミン酸塩類、等
が挙げられる。Examples of the organometallic extreme pressure agents include zinc diisobutyldithiophosphate, zinc isobutylpentyldithiophosphate, isopropyl-1-methylbutyldithiophosphate, zinc isobutylnonylphenyldithiophosphate, isobutylheptylphenyldithiophosphate, and diheptylphenyldithiophosphate. , zinc dinonylphenyl dithiophosphate, thiophosphates such as molybdenum dithiophosphate, zinc dimethyldithiocarbamate, zinc diethyldithiocarbamate, zinc dibutyldithiocarbamate, zinc ethylphenyldithiocarbamate, zinc dihendyldithiorubamate, dimethyldithiocarbamic acid Examples include thiocarbamates such as zinc, dimethyldithiocarbamin-coated copper, iron dimethyldithiocarbamate, selenium diethyldithiocarbamate, and silver diethyldithiocarbamate, and metal alkyldithiocarbamates such as molybdenum and antimony.
上記複合型極圧剤としては、ジー2−エチルへキシルチ
オリン酸アミン等のジアルキルチオリン酸アミン類、塩
化プロピルホスフェート、臭化プロピルホスフェート、
ヨウ化プロピルホスフェート、塩化ブチルホスフェート
、臭化ブチルホスフェート、ヨウ化ブチルホスフェート
等に代表されるハロゲン化アルキルのリン酸エステル類
、クロロナフサザンテート等の他、−M式
%式%
R
8R
(但し、各−般式中Rは水素原子またはアルキル基、ア
ルケニル基、アリール基を表す。)で示されるチオフォ
スフェート類、−般式(但し、式中Rは水素原子または
アルキル基、アルケニル基、アリール基を表す。)
で示されるチオフォスファイト類等が効果が高い。Examples of the composite extreme pressure agent include dialkylthiophosphate amines such as di-2-ethylhexylthiophosphate amine, propyl chloride, propyl bromide,
In addition to phosphoric acid esters of alkyl halides such as propyl iodide, butyl chloride, butyl bromide, butyl iodide, chloronaphsanthate, etc., -M formula % formula % R 8R (However, , thiophosphates represented by the general formula (wherein R represents a hydrogen atom, an alkyl group, an alkenyl group, or an aryl group); The thiophosphites represented by (representing a group) are highly effective.
上述の極圧剤は単体で使用してもよいが、2種以上を混
合して使用することも可能である。The above-mentioned extreme pressure agents may be used alone, but it is also possible to use a mixture of two or more types.
−方、本発明の磁気記録媒体において、防錆剤層の防錆
剤として使用される窒素原子を含む複素環化合物は、強
磁性金属’iil膜の耐蝕性改善に非常に有効で、した
がって、上記パーフルオロアルキルカルボン酸エステル
を含有する潤滑剤のをする潤滑作用と相俟って、磁気記
録媒体の耐久性を向上することができる。- On the other hand, in the magnetic recording medium of the present invention, the nitrogen atom-containing heterocyclic compound used as the rust preventive agent in the rust preventive layer is very effective in improving the corrosion resistance of the ferromagnetic metal film, and therefore, Coupled with the lubricating action of the lubricant containing the perfluoroalkyl carboxylic acid ester, the durability of the magnetic recording medium can be improved.
使用可能な窒素原子を含む複素環化合物とじては、アク
リジン、2.2’、2”−テルピリジルネオクプロイン
、2.2°−ジピリジルヘンゾトリアヅール、5−メチ
ルヘンシトリアゾール、バソフェナンドロリン、1.1
0−フェナントロリン、アルデヒドコリジン、ヘンシル
ピリジン、フェニルピリジン、キナゾリン、2−ヘプタ
デシルイミダヅール等の他、フェノール性水酸基を有す
る化合物、例えば4−(2−ピリジルアゾ)−レゾルシ
ン1−(2−ピリジルアゾ)−2−ナフトール、4−キ
ノリツール、4−メチル−2−キノリツール、8−キノ
リツール、キノリンジオール等、カルボキシル基を有す
る化合物、例えばキヌレン酸、アクリジン酸、アトファ
ン。Examples of usable heterocyclic compounds containing a nitrogen atom include acridine, 2.2',2''-terpyridylneocuproine, 2.2°-dipyridylhenzotriazole, 5-methylhencytriazole, and bathofenand. Lorin, 1.1
In addition to 0-phenanthroline, aldehyde collidine, hensylpyridine, phenylpyridine, quinazoline, 2-heptadecyl imidazur, etc., compounds having a phenolic hydroxyl group, such as 4-(2-pyridylazo)-resorcin 1-(2 Compounds having carboxyl groups such as -pyridylazo)-2-naphthol, 4-quinolitool, 4-methyl-2-quinolitool, 8-quinolitool, quinolinediol, such as kynurenic acid, acridic acid, atophane.
キルナジン酸、シンコニン酸、イソニコチン酸。kirnadic acid, cinchoninic acid, isonicotinic acid.
2.5−ピリジンジカルボン酸、キニン酸等、アミノ基
又はイミノ基を有する化合物、例えば2−アミノベンズ
イミダゾール、5−アミノ−IH−テトラゾール、5−
アミノ−L H−1,2,4−トリアゾール。アデニン
、グアニン、ルミノール、2−ヒドラジノキノリン、チ
アミン等、カルボニル基を有する化合物、例えばリボフ
ラビン、テオブロミン。2. Compounds having an amino group or imino group such as 5-pyridinedicarboxylic acid and quinic acid, such as 2-aminobenzimidazole, 5-amino-IH-tetrazole, 5-
Amino-L H-1,2,4-triazole. Compounds having a carbonyl group such as adenine, guanine, luminol, 2-hydrazinoquinoline, thiamine, etc., such as riboflavin, theobromine.
アラントイン、アロキサン、2−チオバルビッール酸、
ビオルル酸5 イサチン、ヒダントイン、チミン、バル
ビッール酸、オロチン酸、ウラシル5スクンンイミド、
クレアチニン、2−ピロリドン等が挙げられる。Allantoin, alloxan, 2-thiobarbic acid,
Bioluric acid 5 isatin, hydantoin, thymine, barbituric acid, orotic acid, uracil 5 scunnimide,
Examples include creatinine and 2-pyrrolidone.
上述の窒素原子を含む複素環化合物は単独で防錆剤とし
て用いてもよいが、従来公知の防錆剤と混合して用いて
もよい。使用可能な防錆剤としては、通常この種の磁気
記録媒体の防錆剤として使用されるものであれば9口(
可なるものであってもよく、例えばフェノール類、ナフ
トール類、キノン類、ジアリールケトン、酸素原子を含
む複素環化合物、硫黄原子を含む複素環化合物、メルカ
プト基を有する化合物、チオカルボン酸またはその塩、
チアゾール系化合物等が挙げられる。The above-mentioned nitrogen atom-containing heterocyclic compound may be used alone as a rust preventive agent, or may be used in combination with a conventionally known rust preventive agent. Usable rust preventives include those normally used as rust preventive agents for this type of magnetic recording media.
For example, phenols, naphthols, quinones, diaryl ketones, heterocyclic compounds containing an oxygen atom, heterocyclic compounds containing a sulfur atom, compounds having a mercapto group, thiocarboxylic acids or salts thereof,
Examples include thiazole compounds.
本発明の磁気記録媒体では、第1図に示すように、非磁
性支持体(1)上に強磁性金属薄膜(2)を形成し、こ
の強も荘性金属薄膜(2)の表面に先ず上記窒素原子を
含む複素環化合物を主成分とする防錆剤層(3)を塗布
した後、この上に上記パーフルオロアルキルカルボン酸
エステルを含有する潤滑剤N(4)を塗布する。このよ
うに防錆剤層(3)と潤滑剤層(4)とを2層以上に分
けて被着すると、これらを混合して塗布した場合に比べ
てより一層優れた効果が発揮される。In the magnetic recording medium of the present invention, as shown in FIG. After applying the rust preventive layer (3) containing the nitrogen atom-containing heterocyclic compound as a main component, the lubricant N (4) containing the perfluoroalkyl carboxylic acid ester is applied thereon. When the rust preventive layer (3) and the lubricant layer (4) are applied as two or more layers in this manner, a more excellent effect is exhibited than when a mixture of these layers is applied.
このように2層に分けて塗布する場合、上記防錆剤層(
3)あるいは上記潤滑剤層(4)の塗布量としては、そ
れぞれ0.5 mir/ rl〜I OOmg/ n(
であるのが好ましく、1躍/耐〜20■/%であるのが
より好ましい。塗布量があまり少なすぎると、耐蝕性改
善の効果、あるいは摩擦係数の低減、耐摩耗性、走行性
、耐久性改善の効果が不足し、逆に多過ぎると、摺動部
材と強磁性金属薄膜との間ではりつき現象が起こり、却
って走行性が悪くなる。When coating in two layers like this, the above rust preventive layer (
3) Alternatively, the coating amount of the lubricant layer (4) is 0.5 mir/rl to IOOmg/n(
It is preferable that it is, and it is more preferable that it is 1 stroke/durability to 20 cm/%. If the amount applied is too small, the effects of improving corrosion resistance, reducing the coefficient of friction, improving wear resistance, runnability, and durability will be insufficient. On the other hand, if the amount is too large, the sliding member and the ferromagnetic metal thin film will not be effective. A sticking phenomenon occurs between the wheels, which actually worsens the running performance.
塗布方法としては、上記窒素原子を含む複素環化合物あ
るいはパーフルオロアルキルカルボン酸エステルを)容
媒に溶解した後、ロールコートスプレーコート、スピン
コードディッピング等の通常の塗布手段を用いて塗布す
ればよい。As for the coating method, after dissolving the above-mentioned nitrogen atom-containing heterocyclic compound or perfluoroalkyl carboxylic acid ester in a medium, the coating may be applied using a conventional coating method such as roll coating, spray coating, or spin cord dipping. .
本発明が通用される磁気記録媒体は、非磁性支持体(1
)上に磁性層として強磁性金属薄膜(2)を設けたもの
であるが、ここで非磁性支持体(1)の素材としては、
ポリエチレンテレフタレート等のポリエステル類、ポリ
エチレン、ポリプロピレン等のポリオレフィン類、セル
ローストリアセテート、セルロースダイアセテート、セ
ルロースアセテートブチレート等のセルロース誘導体、
ポリ塩化ビニル、ポリ塩化ビニリデン等のビニル系樹脂
、ポリカーボネート1 ポリイミド、ポリアミドイミド
等のプラスチック、アルミニウム合金、チタン合金等の
軽金属、アルミナガラス等のセラミックス等が挙げられ
る。この非磁性支持体(1)の形態としては、フィルム
、シート、ディスク、カード。The magnetic recording medium to which the present invention is applied is a non-magnetic support (1
), on which a ferromagnetic metal thin film (2) is provided as a magnetic layer, but here the material of the non-magnetic support (1) is:
Polyesters such as polyethylene terephthalate, polyolefins such as polyethylene and polypropylene, cellulose derivatives such as cellulose triacetate, cellulose diacetate, and cellulose acetate butyrate,
Examples include vinyl resins such as polyvinyl chloride and polyvinylidene chloride, plastics such as polycarbonate 1 polyimide and polyamideimide, light metals such as aluminum alloys and titanium alloys, and ceramics such as alumina glass. The nonmagnetic support (1) may be in the form of a film, sheet, disk, or card.
ドラム等のいずれでもよい。Any drum or the like may be used.
上記非磁性支持体(1)には、その表面に山状突起やし
わ状突起1粒状突起等の突起を1種以上を形成し、表面
粗さをコントロールしてもよい。The surface roughness of the non-magnetic support (1) may be controlled by forming one or more types of protrusions such as mountain-like protrusions or wrinkle-like protrusions on the surface of the non-magnetic support (1).
上記山状突起は、例えば高分子フィルム製膜時に粒径5
00〜3000人程度の無Ja微粒子を内添することに
より形成され、高分子フィルム表面からの高さは100
〜1000人、密度はおよそI X l O’〜l0X
IO’個/ 1m ”とする。山伏突起を形成するため
に使用される無機微粒子としては、炭酸カルシウム(C
aCOa)やシリカ、アルミナ等が好適である。For example, the above-mentioned mountain-like protrusions have a particle size of 5 when forming a polymer film.
It is formed by internally adding Ja-free fine particles of about 0.00 to 3000, and the height from the surface of the polymer film is 100.
~1000 people, density approximately IXlO'~10X
IO'pieces/1m''.The inorganic fine particles used to form the Yamabushi projections include calcium carbonate (C
aCOa), silica, alumina, etc. are suitable.
上記しわ状突起は、例えば特定の混合溶媒を用いた樹脂
の希yi溶液を塗布乾燥することにより形成される起伏
であって、その高さは0.01〜10μm、好ましくは
0.03〜0.5μm、突起間の最短間隔は0.1〜2
0μmとする。このしわ状突起を形成するための樹脂と
しては、ポリエチレンテレフタレート、ポリエチレンナ
フタレート等の飽和ポリエステル、ポリアミド、ポリス
チロール、ポリカーボネート、ポリアクリレート、ポリ
スルホン、ポリエーテルスルホン、ポリ塩化ビニル、ポ
リ塩化ビニリデン、ポリビニルブチラール、ポリフェニ
レンオキサイド、フェノキシ樹脂等の各種樹脂の単体、
混合体または共重合体であり、可溶性溶剤を有するもの
が適している。そして、これらの樹脂をその良溶媒に溶
解せしめた樹脂濃度1〜loooppmの溶液に、その
樹脂の貧溶媒であって前記良溶媒より高い沸点を有する
溶媒を樹脂に対して10〜100倍量添加した溶液を、
高分子フィルムの表面に塗布・乾燥することにより、非
常に微細なしわ状凹凸を有するgiNを得ることができ
る。The wrinkle-like protrusions are undulations formed by applying and drying a dilute yi solution of resin using a specific mixed solvent, for example, and the height thereof is 0.01 to 10 μm, preferably 0.03 to 0.0 μm. .5 μm, the shortest distance between protrusions is 0.1-2
It is set to 0 μm. Examples of resins used to form these wrinkle-like projections include saturated polyesters such as polyethylene terephthalate and polyethylene naphthalate, polyamides, polystyrene, polycarbonates, polyacrylates, polysulfones, polyethersulfones, polyvinyl chloride, polyvinylidene chloride, and polyvinyl butyral. , polyphenylene oxide, phenoxy resin, etc.,
Mixtures or copolymers with soluble solvents are suitable. Then, a solvent that is a poor solvent for the resin and has a boiling point higher than the good solvent is added in an amount of 10 to 100 times the amount of the resin to a solution in which these resins are dissolved in the good solvent at a resin concentration of 1 to 100 ppm. The solution was
By coating and drying on the surface of a polymer film, giN having extremely fine wrinkle-like irregularities can be obtained.
粒状突起は、アクリル樹脂等の有機超微粒子またはシリ
カ、金属粉等の無機微粒子を球状あるいは半球状に付着
させることにより形成される。この粒状突起の高さは、
50〜500人、密度は1×106〜50XIO’個/
龍2程度とする。The granular protrusions are formed by attaching organic ultrafine particles such as acrylic resin or inorganic fine particles such as silica or metal powder in a spherical or semispherical shape. The height of this granular protrusion is
50-500 people, density 1x106-50XIO' pieces/
Ryu 2 level.
これら突起の少なくとも一種以上を非磁性支持体(1)
上に形成すれば、磁性層である強磁性金属薄膜(2)の
表面性が制御されるが、2種以上を組み合わせることに
より効果が増し、特に山状突起を設けたベースフィルム
上にしわ状突起とつぶ状突起を形成すれば、掻めて耐久
性、走行性が改善される。At least one type of these protrusions is attached to a non-magnetic support (1).
If formed on the base film with ridges, the surface properties of the ferromagnetic metal thin film (2), which is the magnetic layer, can be controlled, but the effect is enhanced by combining two or more types. By forming protrusions and lump-like protrusions, durability and runnability can be improved by scratching.
この場合、突起の全体としての高さは、100〜200
0人の範囲内であることが好ましく、その密度は1m”
当り平均でlXl0’〜I X 10’個であることが
好ましい。In this case, the overall height of the protrusion is 100 to 200
Preferably within the range of 0 people, the density is 1m”
It is preferable that the average number of particles per unit is 1X10' to 1X10'.
また、上記磁性層である強磁性金属薄膜(2)は、真空
蒸着法やイオンブレーティング法、スパッタリング法等
の真空薄膜形成技術により連続膜として形成される。Further, the ferromagnetic metal thin film (2), which is the magnetic layer, is formed as a continuous film by a vacuum thin film forming technique such as a vacuum evaporation method, an ion blasting method, or a sputtering method.
上記真空蒸着法は、10−’〜l O−”Torrの真
空下で強磁性金属材料を抵抗加熱、高周波加熱、電子ビ
ーム加熱等により蒸発させ、ディスク基板上に蒸発金属
(強磁性金属材料)を沈着するというものであり、−i
に高い抗磁力を得るため基板に対して上記強磁性金属材
料を斜めに蒸着する斜方蒸着法が採用される。あるいは
、より高い抗磁力を得るために酸素雰囲気中で上記蒸着
を行うものも含まれる。In the vacuum evaporation method, a ferromagnetic metal material is evaporated by resistance heating, high frequency heating, electron beam heating, etc. under a vacuum of 10-' to 1 O-'' Torr, and the evaporated metal (ferromagnetic metal material) is deposited on a disk substrate. -i
In order to obtain a high coercive force, an oblique deposition method is employed in which the ferromagnetic metal material is deposited obliquely to the substrate. Alternatively, it also includes those in which the vapor deposition is performed in an oxygen atmosphere in order to obtain higher coercive force.
上記イオンブレーティング法も真空τ着法の一種であり
、10−4〜10−’Torrの不活性ガス雰囲気中で
DCグロー放電、RFグロー放電を起こして、放電中で
上記強磁性金属材料を蒸発させるというものである。The above ion blating method is also a type of vacuum τ deposition method, in which DC glow discharge and RF glow discharge are caused in an inert gas atmosphere of 10-4 to 10-' Torr, and the above-mentioned ferromagnetic metal material is It is evaporated.
上記スパッタリング法は、101〜10−’Torrの
アルゴンガスを主成分とする雰囲気中でグロー放電を起
こし、生したアルゴンガスイオンでターゲット表面の原
子をたたき出すというものであり、グロー放電の方法に
より直流2掻、3掻スバフタ法や、高周波スパッタ法、
またはマグネトロン放電を利用したマグネトロンスパッ
タ法等がある。The above sputtering method involves generating glow discharge in an atmosphere mainly composed of argon gas at 101 to 10 Torr, and using the generated argon gas ions to knock out atoms on the target surface. 2-stroke, 3-stroke bafta method, high frequency sputtering method,
Alternatively, there is a magnetron sputtering method using magnetron discharge.
このスパッタリング法による場合には、C「やW。When using this sputtering method, C" and W.
■等の下地膜を形成しておいてもよい。A base film such as (2) may be formed in advance.
なお、上記いずれの方法においても、基板上にあらかじ
めBi、Sb、Pb、Sn、Ga、In。In any of the above methods, Bi, Sb, Pb, Sn, Ga, and In are preliminarily deposited on the substrate.
Cd、Ge、Si、TI等の下地金属層を被着形成して
おき、基板面に対して垂直方向から成膜することにより
、磁気異方性の配向かなく面内等方生に優れた磁性層を
形成することができ、例えば磁気ディスクとする場合に
は好適である。By pre-depositing a base metal layer such as Cd, Ge, Si, TI, etc., and depositing the film in a direction perpendicular to the substrate surface, it is possible to achieve excellent in-plane isotropy without magnetic anisotropy orientation. It is possible to form a magnetic layer, and is suitable for use in, for example, magnetic disks.
このような真空薄膜形成技術により強磁性金属薄膜(2
)を形成する際に、使用される強磁性金属材料としては
、Fe、Co、Ni等の金属の他に、Go−Ni合金、
Co−Pt合金、Co−Ni−Pt合金、Fe−Co合
金、Fe−Ni合金、Fe−Co−Ni合金、Fe−C
o−B合金、C。Using this vacuum thin film formation technology, a ferromagnetic metal thin film (2
), the ferromagnetic metal materials used include metals such as Fe, Co, and Ni, as well as Go-Ni alloy,
Co-Pt alloy, Co-Ni-Pt alloy, Fe-Co alloy, Fe-Ni alloy, Fe-Co-Ni alloy, Fe-C
o-B alloy, C.
−Ni−Fe−8合金、Co−Cr合金あるいはこれら
にCr、A1等の金属が含有されたもの等が挙げられる
。特に、Co−Cr合金を使用した場合には、垂直磁化
膜が形成される。Examples include -Ni-Fe-8 alloy, Co-Cr alloy, and those containing metals such as Cr and A1. In particular, when a Co--Cr alloy is used, a perpendicularly magnetized film is formed.
形成される磁性層の膜厚は、0.04〜1μm程度であ
る。The thickness of the magnetic layer formed is approximately 0.04 to 1 μm.
また、第2図に示すように、非磁性支持体(1)の前記
強磁性金r;X薄膜(2)が設けられる面とは反封側の
面に、いわゆるバノクコー) 層(5)を形成してもよ
い。バックコート層(5)は、結合剤樹脂と粉末成分と
を有機溶媒に混合分散させたバックコート用塗料を非磁
性支持体(1)面に塗布することにより形成される。In addition, as shown in FIG. 2, a so-called Banokko layer (5) is formed on the surface of the non-magnetic support (1) opposite to the surface on which the ferromagnetic gold layer (2) is provided. may be formed. The back coat layer (5) is formed by applying a back coat paint in which a binder resin and a powder component are mixed and dispersed in an organic solvent to the surface of the nonmagnetic support (1).
ここで、バックコート用塗料に使用される結合剤樹脂と
しては、例えば塩化ビニル−酢酸ビニル系共重合体、塩
化ビニル−塩化ビニリデン共重合体、塩化ビニル−アク
リロニトリル共重合体、アクリル酸エステル−アクリロ
ニトリル共重合体、熱可塑性ポリウレタンエラストマー
、ボリフ、化ビニル、塩化ビニリデン−アクリロニトリ
ル共重合体、ブタジェン−アクリロニトリル共重合体、
ポリアミド樹脂、ポリビニルブチラール、セルロース誘
導体、ポリエステル樹脂、ポリブタジェン等の合成ゴム
系樹脂、フェノール樹脂、エポキシ樹脂、ポリウレタン
硬化型樹脂、メラミン樹脂、アルキ、ド樹脂、シリコー
ン樹脂、アクリル系反応樹脂、エポキシ−ポリアミド樹
脂、ニトロセルロース−メラミン樹脂、高分子量ポリエ
ステル樹脂とイソシアナートプレポリマーの混合物、メ
タクリル酸塩共重合体とジイソシアナートプレポリマー
の混合物、ポリエステルポリオールとポリイソシアナー
トとの混合物、尿素ホルムアルデヒド樹脂、低分子量グ
リコール/高分子量ジオール/トリフェニルメタントリ
イソシアナートの混合物、ポリアミン樹脂及びこれらの
混合物等が挙げられる。Examples of the binder resin used in the back coat paint include vinyl chloride-vinyl acetate copolymer, vinyl chloride-vinylidene chloride copolymer, vinyl chloride-acrylonitrile copolymer, and acrylic ester-acrylonitrile copolymer. copolymer, thermoplastic polyurethane elastomer, borif, vinyl chloride, vinylidene chloride-acrylonitrile copolymer, butadiene-acrylonitrile copolymer,
Synthetic rubber resins such as polyamide resins, polyvinyl butyral, cellulose derivatives, polyester resins, and polybutadiene, phenolic resins, epoxy resins, polyurethane curable resins, melamine resins, alkylene resins, silicone resins, acrylic reaction resins, epoxy-polyamides resins, nitrocellulose-melamine resins, mixtures of high molecular weight polyester resins and isocyanate prepolymers, mixtures of methacrylate copolymers and diisocyanate prepolymers, mixtures of polyester polyols and polyisocyanates, urea formaldehyde resins, low Examples include mixtures of molecular weight glycol/high molecular weight diol/triphenylmethane triisocyanate, polyamine resins, and mixtures thereof.
あるいは、粉末成分の分散性の改善を図るために、親水
性極性基を持った結合剤樹脂を使用してもよい。Alternatively, a binder resin having a hydrophilic polar group may be used to improve the dispersibility of the powder component.
具体的には、 SOJ、 O5OxM、 C00M
、 P(OH)2(式中、Mは水素原子またはアルカ
リ金属を表し、M′は水素原子5アルカリ金属または炭
化水素基を表す。)から選ばれた親水性極性基を導入し
たポリウレタン樹脂、ポリエステル樹脂、塩化ビニル−
酢酸ビニル系共重合体、塩化ビニリデン系共重合体、ア
クリル酸エステル系共重合体、ブタジェン系共重合体等
が使用可能である。Specifically, SOJ, O5OxM, C00M
, a polyurethane resin into which a hydrophilic polar group selected from P(OH)2 (wherein M represents a hydrogen atom or an alkali metal, and M' represents a hydrogen atom and an alkali metal or a hydrocarbon group); Polyester resin, vinyl chloride
Vinyl acetate copolymers, vinylidene chloride copolymers, acrylic ester copolymers, butadiene copolymers, etc. can be used.
上記親水性極性基の導入方法としては、(M脂の種類に
応して種々の方法が考えられるが、例えばポリウレタン
樹脂やポリエステル樹脂に上記親水性極性基を導入する
には次のような方法によればよい。As a method for introducing the above-mentioned hydrophilic polar group, (various methods can be considered depending on the type of M resin, for example, to introduce the above-mentioned hydrophilic polar group into polyurethane resin or polyester resin, the following method is used. According to
(11ポリウレタン又はポリエステルの原料である2塩
基酸あるいはポリオール等に前記現水性極性基を予め導
入しておく方法。(11 A method in which the above-mentioned water-based polar group is introduced in advance into a dibasic acid, polyol, etc. that is a raw material for polyurethane or polyester.
(2)末端若しくは側鎖にOH基を残存させζおき、こ
のOH基を親水性極性基を持った化合物により変性する
方法。(2) A method in which an OH group is left at the terminal or side chain, and this OH group is modified with a compound having a hydrophilic polar group.
(2)の方法による場合には、
分子中に親水性極性基とハロゲン(例えば塩素)を含有
する化合物と、原料に多官能のポリオールを用いポリマ
ー鎖の末端若しくは側鎖にOH基が残存したポリウレタ
ン樹脂またはポリエステル樹脂とを、両成分が熔解性の
あるジメチルホルムアミド、ジメチルスルホキシド等の
溶剤に溶解し、ピリジン、ピコリン、トリエチルアミン
等のアミン類やエチレンオキサイド、プロピレンオキサ
イド等のエポキシ化合物等の脱塩酸剤の存在下でのOH
基と塩素との脱塩酸反応により親水性極性基を導入する
方法。In the case of method (2), a compound containing a hydrophilic polar group and a halogen (e.g. chlorine) is used as a raw material, and a polyfunctional polyol is used as a raw material, and an OH group remains at the end or side chain of the polymer chain. Polyurethane resin or polyester resin is dissolved in a solvent such as dimethylformamide or dimethyl sulfoxide in which both components are soluble, and amines such as pyridine, picoline, triethylamine, and epoxy compounds such as ethylene oxide and propylene oxide are dehydrochlorinated. OH in the presence of agent
A method of introducing a hydrophilic polar group through a dehydrochlorination reaction between the group and chlorine.
[21−2
分子中に親水性極性基とOH基とを含有する化合物と、
ポリマー鎖の末端若しくは側鎖にOHIが残存したポリ
ウレタン樹脂またはポリエステル樹脂とを、ジイソソア
ナート化合物を介して反応させる方法。[21-2 A compound containing a hydrophilic polar group and an OH group in the molecule,
A method of reacting a polyurethane resin or a polyester resin in which OHI remains at the end or side chain of a polymer chain via a diisoanate compound.
がある。There is.
また、上記共重合体系結合剤樹脂に親水性極性基を導入
するには、
(3)共重合モノマーとして、親水性極性基及び共重合
可能な二重結合を存する化合物を使用する方法。In order to introduce a hydrophilic polar group into the copolymer-based binder resin, (3) a method of using a compound having a hydrophilic polar group and a copolymerizable double bond as a copolymerizable monomer.
(4)共重合モノマーとして、活性水素及び共重合可能
な二重結合を存する化合物を使用し、共重合体の側鎖に
上記活性水素を導入しておき、現水性極性基及び上記活
性水素と反応可能な基を存する化合物により変性する方
法。(4) As a copolymerizable monomer, use a compound containing active hydrogen and a copolymerizable double bond, introduce the above active hydrogen into the side chain of the copolymer, and combine it with the current aqueous polar group and the above active hydrogen. A method of modification with a compound containing a reactive group.
(5)共重合モノマーとして、活性水素と反応可能な基
及び共重合可能な二重結合を有する化合物を使用し、共
重合体の側鎖に上記活性水素と反応可能な基を導入して
おき、親水性極性基及び上記活性水素を有する化合物に
より変性する方法。(5) As a copolymerization monomer, use a compound having a group that can react with active hydrogen and a double bond that can be copolymerized, and introduce the group that can react with active hydrogen into the side chain of the copolymer. , a method of modifying with a hydrophilic polar group and a compound having the above-mentioned active hydrogen.
等が挙げられる。etc.
一方、上記粉末成分としては、導電性を付与するだめの
カーボン系微粉末(例えば、ファーネスカーボン、チャ
ンネルカーボン、アセチレンカーボン、サーマルカーボ
ン、ランプカーボン等が挙げられるが、なかでもファー
ネスカーボンやサーマルカーボンが好適である。)、無
機顔料(表面粗度のコントロール及び耐久性向上のため
に添加されるa F eoOH1α−F ego y
+ CrJx + T+ Ox + ZnO,S i
o+5iOtlSiOz ・2HzO,Alz(h −
2SiCh ’ 2Hz0 、3Mg0−4SiOz
・HtO,MgCO5・Mg(Oll)z + 3Hz
O,AlzOt、CaCO3゜hgco、、5b2o、
等)が挙げられる。On the other hand, the above-mentioned powder components include carbon-based fine powders that impart conductivity (e.g., furnace carbon, channel carbon, acetylene carbon, thermal carbon, lamp carbon, etc., among which furnace carbon and thermal carbon are used). ), inorganic pigments (added to control surface roughness and improve durability),
+ CrJx + T+ Ox + ZnO, Si
o+5iOtlSiOz ・2HzO,Alz(h −
2SiCh' 2Hz0, 3Mg0-4SiOz
・HtO, MgCO5・Mg(Oll)z + 3Hz
O, AlzOt, CaCO3゜hgco, 5b2o,
etc.).
さらに、上記バックコート用塗料の有機溶剤としては、
アセトン、メチルエチルケトン、メチルイソブチルケト
ン、シクロヘキサノン等のケトン系溶剤、酢酸メチル、
酢酸エチル、酢酸ブチル。Furthermore, as the organic solvent for the above-mentioned back coat paint,
Ketone solvents such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, methyl acetate,
Ethyl acetate, butyl acetate.
乳酸エチル、酢酸グリコールモノエチルエーテル等のエ
ステル系溶剤、グリコールジメチルエーテル、グリコー
ルモノエチルエーテル。ジオキサン等のグリコールエー
テル系溶剤、ヘンゼン、トルエン2キソレン等の芳香族
炭化水素系溶剤、ヘキサン、ヘプタン等の脂肪族炭化水
素系溶剤、メチレンクロライド、エチレンクロライド、
四塩化炭素、クロロホルム、エチレンクロルヒドリン、
ジクロルベンゼン等の塩素化炭化水素系)8剤等、汎用
の7容剤を用いることができる。Ester solvents such as ethyl lactate and glycol monoethyl acetate, glycol dimethyl ether, and glycol monoethyl ether. Glycol ether solvents such as dioxane, aromatic hydrocarbon solvents such as Hensen, toluene, dixolene, aliphatic hydrocarbon solvents such as hexane and heptane, methylene chloride, ethylene chloride,
Carbon tetrachloride, chloroform, ethylene chlorohydrin,
A general-purpose 7-volume agent can be used, such as a chlorinated hydrocarbon-based agent such as dichlorobenzene.
前述のバックコート層(5)には潤滑剤を併用してもよ
い。この場合、上記バックコート層(5)中に潤滑剤を
内添する方法、あるいはハックコート層(5)上に潤滑
剤を被着する方法がある。いずれにしても、上記潤滑剤
としては、脂肪酸、脂肪酸エステル、脂肪酸アミド、金
属石鹸、脂肪族アルコール、パラフィン、ソリコーン等
、従来ヨリ周知の潤滑剤が使用できる。A lubricant may be used in combination with the above-mentioned back coat layer (5). In this case, there is a method of internally adding a lubricant to the back coat layer (5) or a method of depositing a lubricant on the hack coat layer (5). In any case, as the lubricant, conventionally well-known lubricants such as fatty acids, fatty acid esters, fatty acid amides, metal soaps, aliphatic alcohols, paraffins, and soricones can be used.
これら潤滑剤を例示すれば、先ず、脂肪酸としては、ラ
ウリン酸、ミリスチン酸、バルミチン酸、ステアリン酸
、ヘヘン酸、オレイン酸、リノール酸、リルン酸等の炭
素数が12以上の飽和脂肪酸あるいは不飽和脂肪酸が使
用できる。Examples of these lubricants include fatty acids such as saturated fatty acids having 12 or more carbon atoms, such as lauric acid, myristic acid, valmitic acid, stearic acid, hehenic acid, oleic acid, linoleic acid, and lyuronic acid, or unsaturated fatty acids. Fatty acids can be used.
脂肪酸エステルとしては、ステアリン酸エチル、ステア
リン酸ブチル、ステアリン酸アミル、ステアリン酸モノ
グリセリド、オレイン酸モノグ11セリド等が使用でき
る。As the fatty acid ester, ethyl stearate, butyl stearate, amyl stearate, stearic acid monoglyceride, oleic acid monoglyceride, etc. can be used.
脂肪酸アミドとしては、カプロン酸アミド、カプリン酸
アミド、ラウリン酸アミド、バルミチン酸アミド、ステ
アリン酸アミド、ヘヘン酸アミド、オレイン酸アミド、
リノール酸アミド、メチレンビスステアリン酸アミド、
エチレンビスステアリン酸アミド等が使用できる。Examples of fatty acid amides include caproic acid amide, capric acid amide, lauric acid amide, valmitic acid amide, stearic acid amide, hehenic acid amide, oleic acid amide,
linoleic acid amide, methylene bisstearic acid amide,
Ethylene bisstearamide, etc. can be used.
金属石鹸としては、前述の脂肪酸のZn、 Pb、 N
i。The metal soaps include the aforementioned fatty acids Zn, Pb, and N.
i.
Co、 Fe、 A1. Mg、 Sr、 Cu等との
塩、あるいはラウリルスルホン酸、パルミチルスルホン
酸、ミリスチルスルホン酸、ステアリルスルホン酸、ベ
ヘニルスルホン酸、オレイルスルホン酸、リノールスル
ホン酸、リルンスルホン酸等のスルホン酸と上記金属と
の塩等が使用できる。Co, Fe, A1. Salts with Mg, Sr, Cu, etc., or sulfonic acids such as lauryl sulfonic acid, palmitylsulfonic acid, myristylsulfonic acid, stearylsulfonic acid, behenylsulfonic acid, oleylsulfonic acid, linolesulfonic acid, lilinsulfonic acid and the above metals. Salt, etc. can be used.
脂肪族アルコールとしては、セチルアルコール、ステア
リルアルコール等が使用できる。As the aliphatic alcohol, cetyl alcohol, stearyl alcohol, etc. can be used.
パリフィンとしては、n−ノナデカン、n−トリデカン
、n−トコサン等の飽和炭化水素が使用できる。Saturated hydrocarbons such as n-nonadecane, n-tridecane, and n-tocosan can be used as the paraffin.
シリコーンとしては、水素がアルキル基またはフェニル
基で部分置換されたポリシロキサン及びそれらを脂肪酸
、脂肪族アルコール、脂肪酸アミド等で変性したもの等
が使用できる。As silicones, polysiloxanes in which hydrogen is partially substituted with alkyl groups or phenyl groups, and those modified with fatty acids, aliphatic alcohols, fatty acid amides, etc. can be used.
さらには、先の潤滑剤層(4)と同様のパーフルオロア
ルキルカルボン酸エステルを含有する潤滑剤を使用して
もよい。Furthermore, a lubricant containing the same perfluoroalkyl carboxylic acid ester as in the previous lubricant layer (4) may be used.
窒素原子を含む複素環化合物を主成分とする防錆剤層及
びパーフルオロアルキルカルボン酸エステルを含有する
潤滑剤層は、強磁性金属薄膜に強固に付着し、良好な潤
滑効果を発揮して摩擦係数を低減するとともに、強磁性
金属薄膜での錆の発生を防止する。特に、パーフルオロ
アルギルカルボン酸エステルは低温下においても良好な
潤滑効果を発揮するので、使用温度範囲の拡大が図られ
る。The rust preventive layer, which is mainly composed of a heterocyclic compound containing nitrogen atoms, and the lubricant layer, which contains perfluoroalkyl carboxylic acid ester, firmly adhere to the ferromagnetic metal thin film, exhibiting a good lubrication effect and reducing friction. This reduces the coefficient and prevents rust from occurring in ferromagnetic metal thin films. In particular, perfluoroargyl carboxylic acid ester exhibits a good lubricating effect even at low temperatures, so the temperature range in which it can be used can be expanded.
以下、本発明の具体的な実施例について説明するが、本
発明はこれら実施例に限定されるものではない。Hereinafter, specific examples of the present invention will be described, but the present invention is not limited to these examples.
先ず、以下の合成例により各種パーフルオロアルキルカ
ルボン酸エステルを合成した。First, various perfluoroalkyl carboxylic acid esters were synthesized using the following synthesis examples.
合成例1゜
ノナデカフルオロデカン酸イソステアリルエステルC1
h(Cflz)s−C)I−CHz−OCO(CFz)
8ch(CLLCL
イソステアリルアルコールとノナデカフルオロデカン酸
をトルエン中、p−)ルエンスルホン酸を触媒としてエ
ステル反応を行った。すなわち、1時間加熱還流後、3
時間かけて溶媒中の水分を除去し、さらにトルエンを減
圧下、エバポレータを用いて除き、真空蒸留して精製し
た。(なお、イソステアリルアルコールは、市販のイソ
ステアリン酸をn−ブチルエステル化後、水素化リヂウ
ムアルミニウムで還元して合成した。)得られた留分の
沸点す、p、は140〜145℃10、2 mm)Ig
であった。Synthesis Example 1゜Nonadecafluorodecanoic acid isostearyl ester C1
h(Cflz)s-C)I-CHz-OCO(CFz)
8ch (CLLC) An ester reaction was carried out between isostearyl alcohol and nonadecafluorodecanoic acid in toluene using p-)luenesulfonic acid as a catalyst. That is, after heating under reflux for 1 hour, 3
Water in the solvent was removed over time, toluene was removed under reduced pressure using an evaporator, and the mixture was purified by vacuum distillation. (Isostearyl alcohol was synthesized by converting commercially available isostearic acid into n-butyl ester and then reducing it with lithium aluminum hydride.) The boiling point of the obtained fraction, p, was 140 to 145°C. , 2 mm) Ig
Met.
また、生成物のはには、赤外分光分析(IR)。In addition, the product was analyzed using infrared spectroscopy (IR).
該磁気共鳴分析(NMR)、質量分析(MASS)によ
って行った。その結果、1210〜1380cm−’に
かけてCF結合特有の吸収、1780cm−’にエステ
ルの吸収、2910c+n−’にCHの伸縮振動による
吸収が見られ、また化学イオン法によるマススペクトル
では、分子イオンビークM゛が765に見られることか
ら、この構造を決定した。The analysis was carried out by magnetic resonance analysis (NMR) and mass spectrometry (MASS). As a result, an absorption peculiar to the CF bond was observed from 1210 to 1380 cm-', an absorption of ester at 1780 cm-', and an absorption due to the CH stretching vibration at 2910c+n-'. This structure was determined because " is observed in 765.
合成例2゜
ペンタデカフルオロオクタン酸
イソステアリルエステル
CL (CI!2) a−CI−CH2−OCO(CF
z) 、CF1シ
(C1+2)ACI+3
先の合成例1と同様の方法により、イソステアリルアル
コールとペンタデカフルオロオクタン酸をトルエン中、
p−トルエンスルホン酸を触媒として反応させた。Synthesis Example 2゜Pentadecafluorooctanoic acid isostearyl ester CL (CI!2) a-CI-CH2-OCO (CF
z), CF1(C1+2)ACI+3 By the same method as in Synthesis Example 1 above, isostearyl alcohol and pentadecafluorooctanoic acid were added in toluene.
The reaction was carried out using p-toluenesulfonic acid as a catalyst.
b、p、 120〜134℃(0,2mmtlH)
IR1200〜1400cm−’
1 7 8 0cm−’
2 9 20c糟1
M” 665
合成例3゜
ペンタデカフルオロオクタン酸イソノニルエステル(C
Hz)zC(CHt)CH(CHz)CI(tcHzQ
co(CFz)6cPs先の合成例1と同様の方法によ
り、イソノニルアルコールとペンタデカフルオロオクタ
ン酸をトルエン中、I)−トルエンスルホン酸を触媒と
して反応させた。b, p, 120-134℃ (0.2mmtlH)
IR1200-1400cm-'1780cm-'2920cm1M''665 Synthesis Example 3゜Pentadecafluorooctanoic acid isononyl ester (C
Hz)zC(CHt)CH(CHz)CI(tcHzQ
co(CFz)6cPs By the same method as in Synthesis Example 1 above, isononyl alcohol and pentadecafluorooctanoic acid were reacted in toluene using I)-toluenesulfonic acid as a catalyst.
b、ρ、 94℃(0,2mmHg)IR1210〜
1390cm−’
1785cm−’
2850〜2960C+I−’
M” 539
合成例4゜
ペンタデカフルオロオクタン酸すルイルエステルCHユ
(CL) 3 (CHIC)l=c)I) 2 (CH
り 5Oco (CFz) 6CF3先の合成例1と同
様の方法により、リルイルアルコールとペンタデカフル
オロオクタン酸をトルエン中、p−トルエンスルホン酸
を触媒として反応させた。b, ρ, 94℃ (0.2mmHg) IR1210~
1390cm-'1785cm-'2850-2960C+I-'M" 539 Synthesis Example 4゜Pentadecafluorooctanoic acid sulfuryl ester CH (CL) 3 (CHIC)l=c)I) 2 (CH
5Oco (CFz) 6CF3 By the same method as in Synthesis Example 1 above, lilyl alcohol and pentadecafluorooctanoic acid were reacted in toluene using p-toluenesulfonic acid as a catalyst.
b、p、 135〜139℃(0,2mmHg)I
R1210〜1380C+l−’
1780cm−’
2850〜3020cm−’
M’ 663
実施例
14μm厚のポリエチレンテレフタレートフィルムに斜
め蒸着法によりCoを被着させ、膜厚1000人の強磁
性金属薄膜を形成した。b, p, 135-139℃ (0.2mmHg)I
R1210-1380C+l-'1780cm-'2850-3020cm-'M' 663 Example 1 Co was deposited on a polyethylene terephthalate film with a thickness of 4 μm by an oblique evaporation method to form a ferromagnetic metal thin film with a thickness of 1000 μm.
次に、この強磁性金属薄膜表面に、第1表に示す防錆剤
を溶媒(アセトン;エチルエーテル−1: l)で希釈
した溶液を塗布量が10mg/n(となるように塗布し
、乾燥した。さらに、この防錆剤層上に第1表に示すパ
ーフルオロアルキルカルボン酸エステル(先の合成例で
合成したもの)を溶媒(アセトン:エチルエーテル=1
:1)で希釈した溶液を塗布量がLow/rrfとなる
ように塗布し、乾燥後、1/2インチ幅に裁断してサン
プルテープを作製した。Next, on the surface of this ferromagnetic metal thin film, a solution prepared by diluting the rust preventive shown in Table 1 with a solvent (acetone; ethyl ether-1: l) was applied at a coating amount of 10 mg/n. Further, perfluoroalkylcarboxylic acid esters (synthesized in the previous synthesis example) shown in Table 1 were placed on this rust preventive layer in a solvent (acetone: ethyl ether = 1
The solution diluted with: 1) was applied in a coating amount of Low/rrf, and after drying, it was cut into 1/2 inch width to prepare a sample tape.
(以下余白)
第1表(A)
第1表(B)
作製された各サンプルテープについて、初期の保持力(
Hc+)と飽和磁化1i(Is+) 、及び45℃。(Left below) Table 1 (A) Table 1 (B) Initial holding power (
Hc+) and saturation magnetization 1i (Is+), and 45°C.
80%RH下に1週間放置した後保持力(Hcz)と飽
和磁化ft(Isz)を測定し、その変化率を次式にし
たがって求めた。なお、比較例として、全く防錆剤を被
着しないブランクテープについても変化率を調べた。結
果を第2表に示す。After being left under 80% RH for one week, the coercive force (Hcz) and saturation magnetization ft (Isz) were measured, and the rate of change was determined according to the following formula. As a comparative example, the rate of change was also investigated for a blank tape to which no rust preventive was applied. The results are shown in Table 2.
Hcの変化率−(HC2Hc+)/llc+ X100
(X)−(21式Isの変化率=(Isz Is+)
/Is+ X100(χ) ・+31式(以下余白)
第2表
なお、実施例の各サンプルテープには錆の発生は認めら
れなかったが、比較例のブランクテープにはかなり請が
発生した。Rate of change in Hc - (HC2Hc+)/llc+ X100
(X) - (Change rate of formula 21 Is = (Isz Is+)
/Is+
次に、作製された各サンプルテープについて、温度25
℃、相対湿度(RH)50%、および−5℃の各条件下
での動g擦係数及びシャトル耐久性を測定した。この動
摩擦係数は、材質がステンレス(SUS304)のガイ
ドビンを用い、−定のテンションをかけ5IIIIII
/secの速度で送り、試験したものである。また、シ
ャトル耐久性は、1回につき2分間のシャトル走行を行
い、出力が一3dB低下までのシャトル回数で評価した
。メチル耐久性はポーズ状態での出力の一3dBまでの
減衰時間を評価した。なお、比較例として、全く潤滑剤
を被着しないブランクテープについても測定した。結果
を第3表(A)及び第3表(B)に示す。Next, for each sample tape produced, a temperature of 25
The dynamic g-friction coefficient and shuttle durability were measured under the following conditions: 50% relative humidity (RH), and -5°C. This coefficient of dynamic friction was determined by using a guide bottle made of stainless steel (SUS304) and applying a constant tension of -5IIIIII.
The test was carried out by feeding at a speed of /sec. In addition, the shuttle durability was evaluated by running the shuttle for 2 minutes each time, and determining the number of shuttle runs until the output decreased by 13 dB. Methyl durability was evaluated by evaluating the decay time for the output to -3 dB in a pause state. As a comparative example, a blank tape to which no lubricant was applied was also measured. The results are shown in Table 3 (A) and Table 3 (B).
(以下余白)
第3表(A)
第3表(B)
この表からも明らかなように、本発明の各実施例は、常
温、低温の各条件下で動摩擦係数が小さく、走行が極め
て安定しており、また100回往復走行後もテープ表面
の損傷は全く見られなかった。また、耐久性も極めて良
く、150回シャトル走行を行っても出力の一3dB低
下は見られなかった。これに対して、潤滑剤層のない比
較例のテープでは、摩擦係数が往復走行回数が多くなる
につれて大となり、走行も不安定でテープの摩耗が見ら
れ、耐久性も悪いものであった。(Margins below) Table 3 (A) Table 3 (B) As is clear from this table, each example of the present invention has a small dynamic friction coefficient under both normal temperature and low temperature conditions, and the running is extremely stable. Moreover, even after running back and forth 100 times, no damage was observed on the tape surface. Furthermore, the durability was extremely good, and even after 150 shuttle runs, no decrease in output by 13 dB was observed. On the other hand, in the tape of the comparative example without a lubricant layer, the friction coefficient increased as the number of reciprocating runs increased, running was unstable, tape wear was observed, and durability was poor.
以上の説明からも明らかなように、本発明においては磁
性層である強磁性金属薄llり表面に、窒素原子を含む
複素環化合物を土成分とする防錆剤層とパーフルオロア
ルキルカルボン酸エステルを含存する潤滑剤層を2層に
分けて被着形成しているので、各層の有する防錆効果、
あるいは潤滑効果がより一層有効に光重され、実用特性
の大幅な改善を図ることが可能となり、走行安定性や耐
摩耗性、耐蝕性に優れた磁気記録媒体とすることができ
る。As is clear from the above explanation, in the present invention, a rust preventive layer containing a nitrogen atom-containing heterocyclic compound as a soil component and a perfluoroalkyl carboxylic acid ester are provided on the surface of the thin ferromagnetic metal that is the magnetic layer. Since the lubricant layer containing
Alternatively, the lubricating effect can be further effectively increased, making it possible to significantly improve the practical characteristics, resulting in a magnetic recording medium with excellent running stability, wear resistance, and corrosion resistance.
また、特にパーフルオロアルキルカルボン酸エステルの
擬固点温度が低いことから、低温下での使用時にも上述
の実用特性は確保され、磁気記録媒体の使用温度帯域の
拡大を図ることが可能となる。In addition, since the pseudo-solidification temperature of perfluoroalkyl carboxylic acid ester is particularly low, the above-mentioned practical characteristics are ensured even when used at low temperatures, making it possible to expand the operating temperature range of magnetic recording media. .
第1図は本発明を適用した磁気記録媒体の一例を示す要
部拡大断面図であり、第2図は本発明の他の例を示す要
部拡大断面図である。
l・・・非磁性支持体
2・・・強磁性金属薄膜
3・・・防錆剤層
4・・・潤滑剤層FIG. 1 is an enlarged cross-sectional view of a main part showing an example of a magnetic recording medium to which the present invention is applied, and FIG. 2 is an enlarged cross-sectional view of a main part showing another example of the present invention. l...Nonmagnetic support 2...Ferromagnetic metal thin film 3...Rust preventive layer 4...Lubricant layer
Claims (1)
金属薄膜上に窒素原子を含む複素環化合物を主成分とす
る防錆剤層及びパーフルオロアルキルカルボン酸エステ
ルを含有する潤滑剤層をこの順に被着したことを特徴と
する磁気記録媒体。A ferromagnetic metal thin film is formed on a non-magnetic support, and a rust preventive layer containing a nitrogen atom-containing heterocyclic compound as a main component and a lubricant layer containing a perfluoroalkyl carboxylic acid ester are formed on the ferromagnetic metal thin film. A magnetic recording medium characterized in that the following are deposited in this order.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1416686A JPS63813A (en) | 1986-01-25 | 1986-01-25 | Magnetic recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1416686A JPS63813A (en) | 1986-01-25 | 1986-01-25 | Magnetic recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63813A true JPS63813A (en) | 1988-01-05 |
Family
ID=11853557
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1416686A Pending JPS63813A (en) | 1986-01-25 | 1986-01-25 | Magnetic recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63813A (en) |
-
1986
- 1986-01-25 JP JP1416686A patent/JPS63813A/en active Pending
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