JPS63167413A - Magnetic recording medium - Google Patents
Magnetic recording mediumInfo
- Publication number
- JPS63167413A JPS63167413A JP31506786A JP31506786A JPS63167413A JP S63167413 A JPS63167413 A JP S63167413A JP 31506786 A JP31506786 A JP 31506786A JP 31506786 A JP31506786 A JP 31506786A JP S63167413 A JPS63167413 A JP S63167413A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- magnetic
- layer
- recording medium
- magnetic recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 74
- 230000005294 ferromagnetic effect Effects 0.000 claims abstract description 53
- 239000000314 lubricant Substances 0.000 claims abstract description 44
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 claims abstract description 40
- 229910052751 metal Inorganic materials 0.000 claims description 59
- 239000002184 metal Substances 0.000 claims description 59
- 239000010409 thin film Substances 0.000 claims description 40
- 230000003449 preventive effect Effects 0.000 claims description 30
- 230000005415 magnetization Effects 0.000 abstract description 6
- 150000001408 amides Chemical class 0.000 abstract description 5
- 239000003112 inhibitor Substances 0.000 abstract description 3
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 230000007423 decrease Effects 0.000 abstract description 2
- 230000003247 decreasing effect Effects 0.000 abstract description 2
- 230000006866 deterioration Effects 0.000 abstract 2
- 125000001183 hydrocarbyl group Chemical group 0.000 abstract 1
- -1 diaryl ketones Chemical class 0.000 description 60
- 239000003795 chemical substances by application Substances 0.000 description 31
- 238000000034 method Methods 0.000 description 26
- 150000001875 compounds Chemical class 0.000 description 20
- 239000011248 coating agent Substances 0.000 description 17
- 238000000576 coating method Methods 0.000 description 17
- 239000010408 film Substances 0.000 description 17
- 229920005989 resin Polymers 0.000 description 17
- 239000011347 resin Substances 0.000 description 17
- 239000002253 acid Substances 0.000 description 16
- 235000014113 dietary fatty acids Nutrition 0.000 description 15
- 229930195729 fatty acid Natural products 0.000 description 15
- 239000000194 fatty acid Substances 0.000 description 15
- 229920001577 copolymer Polymers 0.000 description 13
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 12
- 150000004665 fatty acids Chemical class 0.000 description 12
- 239000002904 solvent Substances 0.000 description 11
- 239000010702 perfluoropolyether Substances 0.000 description 10
- 229910045601 alloy Inorganic materials 0.000 description 9
- 239000000956 alloy Substances 0.000 description 9
- 150000001412 amines Chemical class 0.000 description 9
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 9
- 229920000139 polyethylene terephthalate Polymers 0.000 description 9
- 239000005020 polyethylene terephthalate Substances 0.000 description 9
- 150000003839 salts Chemical class 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 238000001704 evaporation Methods 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 150000002148 esters Chemical class 0.000 description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 7
- 229920001225 polyester resin Polymers 0.000 description 7
- 239000004645 polyester resin Substances 0.000 description 7
- 239000000843 powder Substances 0.000 description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- 239000011230 binding agent Substances 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 150000002391 heterocyclic compounds Chemical class 0.000 description 6
- 150000002430 hydrocarbons Chemical group 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 229910052717 sulfur Inorganic materials 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- 229910000085 borane Inorganic materials 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 239000007769 metal material Substances 0.000 description 5
- 229920005749 polyurethane resin Polymers 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical compound SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 150000004780 naphthols Chemical class 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000003973 paint Substances 0.000 description 4
- 150000002989 phenols Chemical class 0.000 description 4
- 239000011593 sulfur Substances 0.000 description 4
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- QMMFVYPAHWMCMS-UHFFFAOYSA-N Dimethyl sulfide Chemical compound CSC QMMFVYPAHWMCMS-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 239000012965 benzophenone Substances 0.000 description 3
- WFFZELZOEWLYNK-CLFAGFIQSA-N bis[(z)-octadec-9-enyl] hydrogen phosphate Chemical compound CCCCCCCC\C=C/CCCCCCCCOP(O)(=O)OCCCCCCCC\C=C/CCCCCCCC WFFZELZOEWLYNK-CLFAGFIQSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 239000003925 fat Substances 0.000 description 3
- 235000019197 fats Nutrition 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 229920006254 polymer film Polymers 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 229920001021 polysulfide Polymers 0.000 description 3
- 239000005077 polysulfide Substances 0.000 description 3
- 150000008117 polysulfides Polymers 0.000 description 3
- 150000004053 quinones Chemical class 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 3
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- YBJHBAHKTGYVGT-ZKWXMUAHSA-N (+)-Biotin Chemical compound N1C(=O)N[C@@H]2[C@H](CCCCC(=O)O)SC[C@@H]21 YBJHBAHKTGYVGT-ZKWXMUAHSA-N 0.000 description 2
- BIGYLAKFCGVRAN-UHFFFAOYSA-N 1,3,4-thiadiazolidine-2,5-dithione Chemical compound S=C1NNC(=S)S1 BIGYLAKFCGVRAN-UHFFFAOYSA-N 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- WSULSMOGMLRGKU-UHFFFAOYSA-N 1-bromooctadecane Chemical compound CCCCCCCCCCCCCCCCCCBr WSULSMOGMLRGKU-UHFFFAOYSA-N 0.000 description 2
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
- XDOFQFKRPWOURC-UHFFFAOYSA-N 16-methylheptadecanoic acid Chemical compound CC(C)CCCCCCCCCCCCCCC(O)=O XDOFQFKRPWOURC-UHFFFAOYSA-N 0.000 description 2
- LWHDQPLUIFIFFT-UHFFFAOYSA-N 2,3,5,6-tetrabromocyclohexa-2,5-diene-1,4-dione Chemical compound BrC1=C(Br)C(=O)C(Br)=C(Br)C1=O LWHDQPLUIFIFFT-UHFFFAOYSA-N 0.000 description 2
- AIACLXROWHONEE-UHFFFAOYSA-N 2,3-dimethylcyclohexa-2,5-diene-1,4-dione Chemical compound CC1=C(C)C(=O)C=CC1=O AIACLXROWHONEE-UHFFFAOYSA-N 0.000 description 2
- NKTOLZVEWDHZMU-UHFFFAOYSA-N 2,5-xylenol Chemical compound CC1=CC=C(C)C(O)=C1 NKTOLZVEWDHZMU-UHFFFAOYSA-N 0.000 description 2
- NXXYKOUNUYWIHA-UHFFFAOYSA-N 2,6-Dimethylphenol Chemical compound CC1=CC=CC(C)=C1O NXXYKOUNUYWIHA-UHFFFAOYSA-N 0.000 description 2
- GCDBEYOJCZLKMC-UHFFFAOYSA-N 2-hydroxyanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(O)=CC=C3C(=O)C2=C1 GCDBEYOJCZLKMC-UHFFFAOYSA-N 0.000 description 2
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- DXYYSGDWQCSKKO-UHFFFAOYSA-N 2-methylbenzothiazole Chemical compound C1=CC=C2SC(C)=NC2=C1 DXYYSGDWQCSKKO-UHFFFAOYSA-N 0.000 description 2
- VTWDKFNVVLAELH-UHFFFAOYSA-N 2-methylcyclohexa-2,5-diene-1,4-dione Chemical compound CC1=CC(=O)C=CC1=O VTWDKFNVVLAELH-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- SEEZWGFVHCMHJF-UHFFFAOYSA-N 2-nitrosophenol Chemical class OC1=CC=CC=C1N=O SEEZWGFVHCMHJF-UHFFFAOYSA-N 0.000 description 2
- VQGHOUODWALEFC-UHFFFAOYSA-N 2-phenylpyridine Chemical compound C1=CC=CC=C1C1=CC=CC=N1 VQGHOUODWALEFC-UHFFFAOYSA-N 0.000 description 2
- TUAMRELNJMMDMT-UHFFFAOYSA-N 3,5-xylenol Chemical compound CC1=CC(C)=CC(O)=C1 TUAMRELNJMMDMT-UHFFFAOYSA-N 0.000 description 2
- HMNKTRSOROOSPP-UHFFFAOYSA-N 3-Ethylphenol Chemical compound CCC1=CC=CC(O)=C1 HMNKTRSOROOSPP-UHFFFAOYSA-N 0.000 description 2
- NPFYZDNDJHZQKY-UHFFFAOYSA-N 4-Hydroxybenzophenone Chemical compound C1=CC(O)=CC=C1C(=O)C1=CC=CC=C1 NPFYZDNDJHZQKY-UHFFFAOYSA-N 0.000 description 2
- HXDOZKJGKXYMEW-UHFFFAOYSA-N 4-ethylphenol Chemical compound CCC1=CC=C(O)C=C1 HXDOZKJGKXYMEW-UHFFFAOYSA-N 0.000 description 2
- FNYDIAAMUCQQDE-UHFFFAOYSA-N 4-methylbenzene-1,3-diol Chemical compound CC1=CC=C(O)C=C1O FNYDIAAMUCQQDE-UHFFFAOYSA-N 0.000 description 2
- ZBCATMYQYDCTIZ-UHFFFAOYSA-N 4-methylcatechol Chemical compound CC1=CC=C(O)C(O)=C1 ZBCATMYQYDCTIZ-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 229910020630 Co Ni Inorganic materials 0.000 description 2
- 229910002440 Co–Ni Inorganic materials 0.000 description 2
- CETBSQOFQKLHHZ-UHFFFAOYSA-N Diethyl disulfide Chemical compound CCSSCC CETBSQOFQKLHHZ-UHFFFAOYSA-N 0.000 description 2
- YWHLKYXPLRWGSE-UHFFFAOYSA-N Dimethyl trisulfide Chemical compound CSSSC YWHLKYXPLRWGSE-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- NYHBQMYGNKIUIF-UUOKFMHZSA-N Guanosine Chemical compound C1=NC=2C(=O)NC(N)=NC=2N1[C@@H]1O[C@H](CO)[C@@H](O)[C@H]1O NYHBQMYGNKIUIF-UUOKFMHZSA-N 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- MJVAVZPDRWSRRC-UHFFFAOYSA-N Menadione Chemical compound C1=CC=C2C(=O)C(C)=CC(=O)C2=C1 MJVAVZPDRWSRRC-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 2
- REFJWTPEDVJJIY-UHFFFAOYSA-N Quercetin Chemical compound C=1C(O)=CC(O)=C(C(C=2O)=O)C=1OC=2C1=CC=C(O)C(O)=C1 REFJWTPEDVJJIY-UHFFFAOYSA-N 0.000 description 2
- RYYWUUFWQRZTIU-UHFFFAOYSA-N Thiophosphoric acid Chemical class OP(O)(S)=O RYYWUUFWQRZTIU-UHFFFAOYSA-N 0.000 description 2
- IQFYYKKMVGJFEH-XLPZGREQSA-N Thymidine Chemical compound O=C1NC(=O)C(C)=CN1[C@@H]1O[C@H](CO)[C@@H](O)C1 IQFYYKKMVGJFEH-XLPZGREQSA-N 0.000 description 2
- ISAKRJDGNUQOIC-UHFFFAOYSA-N Uracil Chemical compound O=C1C=CNC(=O)N1 ISAKRJDGNUQOIC-UHFFFAOYSA-N 0.000 description 2
- DRTQHJPVMGBUCF-XVFCMESISA-N Uridine Chemical compound O[C@@H]1[C@H](O)[C@@H](CO)O[C@H]1N1C(=O)NC(=O)C=C1 DRTQHJPVMGBUCF-XVFCMESISA-N 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- POJWUDADGALRAB-UHFFFAOYSA-N allantoin Chemical compound NC(=O)NC1NC(=O)NC1=O POJWUDADGALRAB-UHFFFAOYSA-N 0.000 description 2
- HIMXGTXNXJYFGB-UHFFFAOYSA-N alloxan Chemical compound O=C1NC(=O)C(=O)C(=O)N1 HIMXGTXNXJYFGB-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 2
- 229950011260 betanaphthol Drugs 0.000 description 2
- 125000006267 biphenyl group Chemical group 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- PGRHXDWITVMQBC-UHFFFAOYSA-N dehydroacetic acid Chemical compound CC(=O)C1C(=O)OC(C)=CC1=O PGRHXDWITVMQBC-UHFFFAOYSA-N 0.000 description 2
- 238000007033 dehydrochlorination reaction Methods 0.000 description 2
- GVPWHKZIJBODOX-UHFFFAOYSA-N dibenzyl disulfide Chemical compound C=1C=CC=CC=1CSSCC1=CC=CC=C1 GVPWHKZIJBODOX-UHFFFAOYSA-N 0.000 description 2
- LJSQFQKUNVCTIA-UHFFFAOYSA-N diethyl sulfide Chemical compound CCSCC LJSQFQKUNVCTIA-UHFFFAOYSA-N 0.000 description 2
- UKMSUNONTOPOIO-UHFFFAOYSA-N docosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCC(O)=O UKMSUNONTOPOIO-UHFFFAOYSA-N 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- MVLVMROFTAUDAG-UHFFFAOYSA-N ethyl octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC MVLVMROFTAUDAG-UHFFFAOYSA-N 0.000 description 2
- 150000002191 fatty alcohols Chemical class 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- UYTPUPDQBNUYGX-UHFFFAOYSA-N guanine Chemical compound O=C1NC(N)=NC2=C1N=CN2 UYTPUPDQBNUYGX-UHFFFAOYSA-N 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- BXWNKGSJHAJOGX-UHFFFAOYSA-N hexadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCO BXWNKGSJHAJOGX-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- JXDYKVIHCLTXOP-UHFFFAOYSA-N isatin Chemical compound C1=CC=C2C(=O)C(=O)NC2=C1 JXDYKVIHCLTXOP-UHFFFAOYSA-N 0.000 description 2
- KQPYUDDGWXQXHS-UHFFFAOYSA-N juglone Chemical compound O=C1C=CC(=O)C2=C1C=CC=C2O KQPYUDDGWXQXHS-UHFFFAOYSA-N 0.000 description 2
- HCZHHEIFKROPDY-UHFFFAOYSA-N kynurenic acid Chemical compound C1=CC=C2NC(C(=O)O)=CC(=O)C2=C1 HCZHHEIFKROPDY-UHFFFAOYSA-N 0.000 description 2
- 229910052745 lead Inorganic materials 0.000 description 2
- XMGQYMWWDOXHJM-UHFFFAOYSA-N limonene Chemical compound CC(=C)C1CCC(C)=CC1 XMGQYMWWDOXHJM-UHFFFAOYSA-N 0.000 description 2
- 235000020778 linoleic acid Nutrition 0.000 description 2
- OYHQOLUKZRVURQ-IXWMQOLASA-N linoleic acid Natural products CCCCC\C=C/C\C=C\CCCCCCCC(O)=O OYHQOLUKZRVURQ-IXWMQOLASA-N 0.000 description 2
- 230000001050 lubricating effect Effects 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- PCILLCXFKWDRMK-UHFFFAOYSA-N naphthalene-1,4-diol Chemical compound C1=CC=C2C(O)=CC=C(O)C2=C1 PCILLCXFKWDRMK-UHFFFAOYSA-N 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- LQERIDTXQFOHKA-UHFFFAOYSA-N nonadecane Chemical compound CCCCCCCCCCCCCCCCCCC LQERIDTXQFOHKA-UHFFFAOYSA-N 0.000 description 2
- GLDOVTGHNKAZLK-UHFFFAOYSA-N octadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCCCO GLDOVTGHNKAZLK-UHFFFAOYSA-N 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- OIPPWFOQEKKFEE-UHFFFAOYSA-N orcinol Chemical compound CC1=CC(O)=CC(O)=C1 OIPPWFOQEKKFEE-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- PXQPEWDEAKTCGB-UHFFFAOYSA-N orotic acid Chemical compound OC(=O)C1=CC(=O)NC(=O)N1 PXQPEWDEAKTCGB-UHFFFAOYSA-N 0.000 description 2
- CTSLXHKWHWQRSH-UHFFFAOYSA-N oxalyl chloride Chemical compound ClC(=O)C(Cl)=O CTSLXHKWHWQRSH-UHFFFAOYSA-N 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- 239000012188 paraffin wax Substances 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 150000003014 phosphoric acid esters Chemical class 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 229920006122 polyamide resin Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 150000003077 polyols Chemical class 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 239000005033 polyvinylidene chloride Substances 0.000 description 2
- SUVIGLJNEAMWEG-UHFFFAOYSA-N propane-1-thiol Chemical compound CCCS SUVIGLJNEAMWEG-UHFFFAOYSA-N 0.000 description 2
- VQMSRUREDGBWKT-UHFFFAOYSA-N quinoline-4-carboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=NC2=C1 VQMSRUREDGBWKT-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 229960001755 resorcinol Drugs 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 238000006748 scratching Methods 0.000 description 2
- 230000002393 scratching effect Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000000344 soap Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- KZNICNPSHKQLFF-UHFFFAOYSA-N succinimide Chemical compound O=C1CCC(=O)N1 KZNICNPSHKQLFF-UHFFFAOYSA-N 0.000 description 2
- 125000004434 sulfur atom Chemical group 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- YAPQBXQYLJRXSA-UHFFFAOYSA-N theobromine Chemical compound CN1C(=O)NC(=O)C2=C1N=CN2C YAPQBXQYLJRXSA-UHFFFAOYSA-N 0.000 description 2
- 150000003557 thiazoles Chemical class 0.000 description 2
- 150000003566 thiocarboxylic acids Chemical class 0.000 description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 description 2
- RWQNBRDOKXIBIV-UHFFFAOYSA-N thymine Chemical compound CC1=CNC(=O)NC1=O RWQNBRDOKXIBIV-UHFFFAOYSA-N 0.000 description 2
- WYWHKKSPHMUBEB-UHFFFAOYSA-N tioguanine Chemical compound N1C(N)=NC(=S)C2=C1N=CN2 WYWHKKSPHMUBEB-UHFFFAOYSA-N 0.000 description 2
- IIYFAKIEWZDVMP-UHFFFAOYSA-N tridecane Chemical compound CCCCCCCCCCCCC IIYFAKIEWZDVMP-UHFFFAOYSA-N 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- UIYCHXAGWOYNNA-UHFFFAOYSA-N vinyl sulfide Chemical compound C=CSC=C UIYCHXAGWOYNNA-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- DUBNHZYBDBBJHD-UHFFFAOYSA-L ziram Chemical compound [Zn+2].CN(C)C([S-])=S.CN(C)C([S-])=S DUBNHZYBDBBJHD-UHFFFAOYSA-L 0.000 description 2
- DEQUKPCANKRTPZ-UHFFFAOYSA-N (2,3-dihydroxyphenyl)-phenylmethanone Chemical compound OC1=CC=CC(C(=O)C=2C=CC=CC=2)=C1O DEQUKPCANKRTPZ-UHFFFAOYSA-N 0.000 description 1
- MAOBFOXLCJIFLV-UHFFFAOYSA-N (2-aminophenyl)-phenylmethanone Chemical class NC1=CC=CC=C1C(=O)C1=CC=CC=C1 MAOBFOXLCJIFLV-UHFFFAOYSA-N 0.000 description 1
- OJFZCPMENWLPRI-UHFFFAOYSA-N (2-ethylphenyl)-phenylmethanone Chemical compound CCC1=CC=CC=C1C(=O)C1=CC=CC=C1 OJFZCPMENWLPRI-UHFFFAOYSA-N 0.000 description 1
- HJIAMFHSAAEUKR-UHFFFAOYSA-N (2-hydroxyphenyl)-phenylmethanone Chemical class OC1=CC=CC=C1C(=O)C1=CC=CC=C1 HJIAMFHSAAEUKR-UHFFFAOYSA-N 0.000 description 1
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical class OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 1
- URBLVRAVOIVZFJ-UHFFFAOYSA-N (3-methylphenyl)-phenylmethanone Chemical compound CC1=CC=CC(C(=O)C=2C=CC=CC=2)=C1 URBLVRAVOIVZFJ-UHFFFAOYSA-N 0.000 description 1
- AAWZDTNXLSGCEK-LNVDRNJUSA-N (3r,5r)-1,3,4,5-tetrahydroxycyclohexane-1-carboxylic acid Chemical compound O[C@@H]1CC(O)(C(O)=O)C[C@@H](O)C1O AAWZDTNXLSGCEK-LNVDRNJUSA-N 0.000 description 1
- RBKHNGHPZZZJCI-UHFFFAOYSA-N (4-aminophenyl)-phenylmethanone Chemical compound C1=CC(N)=CC=C1C(=O)C1=CC=CC=C1 RBKHNGHPZZZJCI-UHFFFAOYSA-N 0.000 description 1
- WXPWZZHELZEVPO-UHFFFAOYSA-N (4-methylphenyl)-phenylmethanone Chemical compound C1=CC(C)=CC=C1C(=O)C1=CC=CC=C1 WXPWZZHELZEVPO-UHFFFAOYSA-N 0.000 description 1
- OYHQOLUKZRVURQ-NTGFUMLPSA-N (9Z,12Z)-9,10,12,13-tetratritiooctadeca-9,12-dienoic acid Chemical compound C(CCCCCCC\C(=C(/C\C(=C(/CCCCC)\[3H])\[3H])\[3H])\[3H])(=O)O OYHQOLUKZRVURQ-NTGFUMLPSA-N 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 description 1
- WMOZEDPTXMXSFB-UHFFFAOYSA-N 1,1-dioxo-2,5-dihydrothiophen-3-ol Chemical compound OC1=CCS(=O)(=O)C1 WMOZEDPTXMXSFB-UHFFFAOYSA-N 0.000 description 1
- AMXKVIWWXBYXRS-UHFFFAOYSA-N 1,1-dioxothiolan-3-ol Chemical compound OC1CCS(=O)(=O)C1 AMXKVIWWXBYXRS-UHFFFAOYSA-N 0.000 description 1
- QMMJWQMCMRUYTG-UHFFFAOYSA-N 1,2,4,5-tetrachloro-3-(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=C(Cl)C(Cl)=CC(Cl)=C1Cl QMMJWQMCMRUYTG-UHFFFAOYSA-N 0.000 description 1
- FMRLRBCECZNJNN-UHFFFAOYSA-N 1,2,5-trihydroxyanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=C(O)C(O)=CC=C3C(=O)C2=C1O FMRLRBCECZNJNN-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- LRMDXTVKVHKWEK-UHFFFAOYSA-N 1,2-diaminoanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=C(N)C(N)=CC=C3C(=O)C2=C1 LRMDXTVKVHKWEK-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N 1,4-Benzenediol Natural products OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- YFBUDXNMBTUSOC-UHFFFAOYSA-N 1,4-dihydroquinoxaline-2,3-dithione Chemical compound C1=CC=C2NC(=S)C(=S)NC2=C1 YFBUDXNMBTUSOC-UHFFFAOYSA-N 0.000 description 1
- UOFGSWVZMUXXIY-UHFFFAOYSA-N 1,5-Diphenyl-3-thiocarbazone Chemical compound C=1C=CC=CC=1N=NC(=S)NNC1=CC=CC=C1 UOFGSWVZMUXXIY-UHFFFAOYSA-N 0.000 description 1
- BOKGTLAJQHTOKE-UHFFFAOYSA-N 1,5-dihydroxynaphthalene Chemical compound C1=CC=C2C(O)=CC=CC2=C1O BOKGTLAJQHTOKE-UHFFFAOYSA-N 0.000 description 1
- XVMVHWDCRFNPQR-UHFFFAOYSA-N 1,5-dinitroanthracene-9,10-dione Chemical compound O=C1C=2C([N+](=O)[O-])=CC=CC=2C(=O)C2=C1C=CC=C2[N+]([O-])=O XVMVHWDCRFNPQR-UHFFFAOYSA-N 0.000 description 1
- AROCLDYPZXMJPW-UHFFFAOYSA-N 1-(octyldisulfanyl)octane Chemical compound CCCCCCCCSSCCCCCCCC AROCLDYPZXMJPW-UHFFFAOYSA-N 0.000 description 1
- FHMMQQXRSYSWCM-UHFFFAOYSA-N 1-aminonaphthalen-2-ol Chemical compound C1=CC=C2C(N)=C(O)C=CC2=C1 FHMMQQXRSYSWCM-UHFFFAOYSA-N 0.000 description 1
- VKMGBXBPIXBQQO-UHFFFAOYSA-N 1-bromobutane;phosphoric acid Chemical compound CCCCBr.OP(O)(O)=O VKMGBXBPIXBQQO-UHFFFAOYSA-N 0.000 description 1
- CYNYIHKIEHGYOZ-UHFFFAOYSA-N 1-bromopropane Chemical compound CCCBr CYNYIHKIEHGYOZ-UHFFFAOYSA-N 0.000 description 1
- VFWCMGCRMGJXDK-UHFFFAOYSA-N 1-chlorobutane Chemical compound CCCCCl VFWCMGCRMGJXDK-UHFFFAOYSA-N 0.000 description 1
- RMSOEGBYNWXXBG-UHFFFAOYSA-N 1-chloronaphthalen-2-ol Chemical compound C1=CC=CC2=C(Cl)C(O)=CC=C21 RMSOEGBYNWXXBG-UHFFFAOYSA-N 0.000 description 1
- LDMOEFOXLIZJOW-UHFFFAOYSA-N 1-dodecanesulfonic acid Chemical compound CCCCCCCCCCCCS(O)(=O)=O LDMOEFOXLIZJOW-UHFFFAOYSA-N 0.000 description 1
- OCTVBIMNIWNLEM-UHFFFAOYSA-N 1-iodobutane;phosphoric acid Chemical compound CCCCI.OP(O)(O)=O OCTVBIMNIWNLEM-UHFFFAOYSA-N 0.000 description 1
- ZNJOCVLVYVOUGB-UHFFFAOYSA-N 1-iodooctadecane Chemical compound CCCCCCCCCCCCCCCCCCI ZNJOCVLVYVOUGB-UHFFFAOYSA-N 0.000 description 1
- LNETULKMXZVUST-UHFFFAOYSA-N 1-naphthoic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1 LNETULKMXZVUST-UHFFFAOYSA-N 0.000 description 1
- YCANAXVBJKNANM-UHFFFAOYSA-N 1-nitroanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2[N+](=O)[O-] YCANAXVBJKNANM-UHFFFAOYSA-N 0.000 description 1
- SSHIVHKMGVBXTJ-UHFFFAOYSA-N 1-nitronaphthalen-2-ol Chemical compound C1=CC=CC2=C([N+]([O-])=O)C(O)=CC=C21 SSHIVHKMGVBXTJ-UHFFFAOYSA-N 0.000 description 1
- YXAOOTNFFAQIPZ-UHFFFAOYSA-N 1-nitrosonaphthalen-2-ol Chemical compound C1=CC=CC2=C(N=O)C(O)=CC=C21 YXAOOTNFFAQIPZ-UHFFFAOYSA-N 0.000 description 1
- RZRNAYUHWVFMIP-KTKRTIGZSA-N 1-oleoylglycerol Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OCC(O)CO RZRNAYUHWVFMIP-KTKRTIGZSA-N 0.000 description 1
- RTBLQUHRYUVODL-UHFFFAOYSA-N 2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-pentadecafluoro-n-octadecyloctanamide Chemical compound CCCCCCCCCCCCCCCCCCNC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RTBLQUHRYUVODL-UHFFFAOYSA-N 0.000 description 1
- MTYGYDUMMAMTRV-KTKRTIGZSA-N 2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-pentadecafluorooctyl (Z)-octadec-9-enoate Chemical compound FC(C(C(C(C(C(COC(CCCCCCC\C=C/CCCCCCCC)=O)(F)F)(F)F)(F)F)(F)F)(F)F)(C(F)(F)F)F MTYGYDUMMAMTRV-KTKRTIGZSA-N 0.000 description 1
- RQMWDQMALYNILJ-UHFFFAOYSA-N 2,3,4,5,5-pentachloropenta-2,4-dienoic acid Chemical compound OC(=O)C(Cl)=C(Cl)C(Cl)=C(Cl)Cl RQMWDQMALYNILJ-UHFFFAOYSA-N 0.000 description 1
- WOHLSTOWRAOMSG-UHFFFAOYSA-N 2,3-dihydro-1,3-benzothiazole Chemical compound C1=CC=C2SCNC2=C1 WOHLSTOWRAOMSG-UHFFFAOYSA-N 0.000 description 1
- QWBBPBRQALCEIZ-UHFFFAOYSA-N 2,3-dimethylphenol Chemical compound CC1=CC=CC(O)=C1C QWBBPBRQALCEIZ-UHFFFAOYSA-N 0.000 description 1
- VXSCPERJHPWROZ-UHFFFAOYSA-N 2,4,5-trimethylphenol Chemical compound CC1=CC(C)=C(O)C=C1C VXSCPERJHPWROZ-UHFFFAOYSA-N 0.000 description 1
- PFEFOYRSMXVNEL-UHFFFAOYSA-N 2,4,6-tritert-butylphenol Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 PFEFOYRSMXVNEL-UHFFFAOYSA-N 0.000 description 1
- GPASWZHHWPVSRG-UHFFFAOYSA-N 2,5-dimethylbenzene-1,4-diol Chemical compound CC1=CC(O)=C(C)C=C1O GPASWZHHWPVSRG-UHFFFAOYSA-N 0.000 description 1
- JCARTGJGWCGSSU-UHFFFAOYSA-N 2,6-dichlorobenzoquinone Chemical compound ClC1=CC(=O)C=C(Cl)C1=O JCARTGJGWCGSSU-UHFFFAOYSA-N 0.000 description 1
- YEVQZPWSVWZAOB-UHFFFAOYSA-N 2-(bromomethyl)-1-iodo-4-(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=C(I)C(CBr)=C1 YEVQZPWSVWZAOB-UHFFFAOYSA-N 0.000 description 1
- NYLJHRUQFXQNPN-UHFFFAOYSA-N 2-(tert-butyltrisulfanyl)-2-methylpropane Chemical compound CC(C)(C)SSSC(C)(C)C NYLJHRUQFXQNPN-UHFFFAOYSA-N 0.000 description 1
- XOGPDSATLSAZEK-UHFFFAOYSA-N 2-Aminoanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(N)=CC=C3C(=O)C2=C1 XOGPDSATLSAZEK-UHFFFAOYSA-N 0.000 description 1
- JWYUFVNJZUSCSM-UHFFFAOYSA-N 2-aminobenzimidazole Chemical compound C1=CC=C2NC(N)=NC2=C1 JWYUFVNJZUSCSM-UHFFFAOYSA-N 0.000 description 1
- PCFUWBOSXMKGIP-UHFFFAOYSA-N 2-benzylpyridine Chemical compound C=1C=CC=NC=1CC1=CC=CC=C1 PCFUWBOSXMKGIP-UHFFFAOYSA-N 0.000 description 1
- SZIFAVKTNFCBPC-UHFFFAOYSA-N 2-chloroethanol Chemical compound OCCCl SZIFAVKTNFCBPC-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- YEDUAINPPJYDJZ-UHFFFAOYSA-N 2-hydroxybenzothiazole Chemical compound C1=CC=C2SC(O)=NC2=C1 YEDUAINPPJYDJZ-UHFFFAOYSA-N 0.000 description 1
- FLFWJIBUZQARMD-UHFFFAOYSA-N 2-mercapto-1,3-benzoxazole Chemical compound C1=CC=C2OC(S)=NC2=C1 FLFWJIBUZQARMD-UHFFFAOYSA-N 0.000 description 1
- 229940054266 2-mercaptobenzothiazole Drugs 0.000 description 1
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 1
- VBIXSHPPIPNDLW-UHFFFAOYSA-N 2-nitrosobenzene-1,3-diol Chemical compound OC1=CC=CC(O)=C1N=O VBIXSHPPIPNDLW-UHFFFAOYSA-N 0.000 description 1
- SYUYTOYKQOAVDW-UHFFFAOYSA-N 2-nitrosonaphthalen-1-ol Chemical compound C1=CC=C2C(O)=C(N=O)C=CC2=C1 SYUYTOYKQOAVDW-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- ULRPISSMEBPJLN-UHFFFAOYSA-N 2h-tetrazol-5-amine Chemical compound NC1=NN=NN1 ULRPISSMEBPJLN-UHFFFAOYSA-N 0.000 description 1
- UEIZUEWXLJOVLD-UHFFFAOYSA-N 3-(1-methylpyrrolidin-3-yl)pyridine Chemical compound C1N(C)CCC1C1=CC=CN=C1 UEIZUEWXLJOVLD-UHFFFAOYSA-N 0.000 description 1
- FAYFWMOSHFCQPG-UHFFFAOYSA-N 3-Methyl sulfolene Chemical compound CC1=CCS(=O)(=O)C1 FAYFWMOSHFCQPG-UHFFFAOYSA-N 0.000 description 1
- ZBUUHLDYMKTVLT-UHFFFAOYSA-N 3-amino-2-sulfanylidene-1,3-thiazolidin-4-one Chemical compound NN1C(=O)CSC1=S ZBUUHLDYMKTVLT-UHFFFAOYSA-N 0.000 description 1
- XGCZABZDVJOWTL-UHFFFAOYSA-N 3-methyl-4-nitrosophenol Chemical compound CC1=CC(O)=CC=C1N=O XGCZABZDVJOWTL-UHFFFAOYSA-N 0.000 description 1
- CMJLMPKFQPJDKP-UHFFFAOYSA-N 3-methylthiolane 1,1-dioxide Chemical compound CC1CCS(=O)(=O)C1 CMJLMPKFQPJDKP-UHFFFAOYSA-N 0.000 description 1
- CDMKLKAZVMTVHX-UHFFFAOYSA-N 4,5-dihydro-1,3-thiazol-3-ium-4-carboxylate Chemical compound OC(=O)C1CSC=N1 CDMKLKAZVMTVHX-UHFFFAOYSA-N 0.000 description 1
- IYDQSPIOJHDHHO-UHFFFAOYSA-N 4,6-dimethylbenzene-1,3-diol Chemical compound CC1=CC(C)=C(O)C=C1O IYDQSPIOJHDHHO-UHFFFAOYSA-N 0.000 description 1
- DDTHMESPCBONDT-UHFFFAOYSA-N 4-(4-oxocyclohexa-2,5-dien-1-ylidene)cyclohexa-2,5-dien-1-one Chemical compound C1=CC(=O)C=CC1=C1C=CC(=O)C=C1 DDTHMESPCBONDT-UHFFFAOYSA-N 0.000 description 1
- XRTJYEIMLZALBD-UHFFFAOYSA-N 4-(6-methyl-1,3-benzothiazol-2-yl)aniline Chemical compound S1C2=CC(C)=CC=C2N=C1C1=CC=C(N)C=C1 XRTJYEIMLZALBD-UHFFFAOYSA-N 0.000 description 1
- RJNYNDHYSJRRDW-UHFFFAOYSA-N 4-(pyridin-2-yldiazenyl)benzene-1,3-diol Chemical compound OC1=CC(O)=CC=C1N=NC1=CC=CC=N1 RJNYNDHYSJRRDW-UHFFFAOYSA-N 0.000 description 1
- GQBONCZDJQXPLV-UHFFFAOYSA-N 4-aminoisoindole-1,3-dione Chemical compound NC1=CC=CC2=C1C(=O)NC2=O GQBONCZDJQXPLV-UHFFFAOYSA-N 0.000 description 1
- BJBGAAAJTDQABC-UHFFFAOYSA-N 4-nitrosobenzene-1,3-diol Chemical compound OC1=CC=C(N=O)C(O)=C1 BJBGAAAJTDQABC-UHFFFAOYSA-N 0.000 description 1
- JSTCPNFNKICNNO-UHFFFAOYSA-N 4-nitrosophenol Chemical compound OC1=CC=C(N=O)C=C1 JSTCPNFNKICNNO-UHFFFAOYSA-N 0.000 description 1
- MEPYMUOZRROULQ-UHFFFAOYSA-N 4-tert-butyl-2,6-dimethylphenol Chemical compound CC1=CC(C(C)(C)C)=CC(C)=C1O MEPYMUOZRROULQ-UHFFFAOYSA-N 0.000 description 1
- XESZUVZBAMCAEJ-UHFFFAOYSA-N 4-tert-butylcatechol Chemical compound CC(C)(C)C1=CC=C(O)C(O)=C1 XESZUVZBAMCAEJ-UHFFFAOYSA-N 0.000 description 1
- QHPQWRBYOIRBIT-UHFFFAOYSA-N 4-tert-butylphenol Chemical compound CC(C)(C)C1=CC=C(O)C=C1 QHPQWRBYOIRBIT-UHFFFAOYSA-N 0.000 description 1
- ZOXMLSDKXHNVOQ-UHFFFAOYSA-N 4h-1,4-thiazine Chemical compound N1C=CSC=C1 ZOXMLSDKXHNVOQ-UHFFFAOYSA-N 0.000 description 1
- NTSLROIKFLNUIJ-UHFFFAOYSA-N 5-Ethyl-2-methylpyridine Chemical compound CCC1=CC=C(C)N=C1 NTSLROIKFLNUIJ-UHFFFAOYSA-N 0.000 description 1
- RYFCSYHXNOKHCK-UHFFFAOYSA-N 5-amino-3h-1,3-thiazole-2-thione Chemical compound NC1=CNC(=S)S1 RYFCSYHXNOKHCK-UHFFFAOYSA-N 0.000 description 1
- PXRKCOCTEMYUEG-UHFFFAOYSA-N 5-aminoisoindole-1,3-dione Chemical compound NC1=CC=C2C(=O)NC(=O)C2=C1 PXRKCOCTEMYUEG-UHFFFAOYSA-N 0.000 description 1
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 1
- YYVYAPXYZVYDHN-UHFFFAOYSA-N 9,10-phenanthroquinone Chemical compound C1=CC=C2C(=O)C(=O)C3=CC=CC=C3C2=C1 YYVYAPXYZVYDHN-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- GFFGJBXGBJISGV-UHFFFAOYSA-N Adenine Chemical compound NC1=NC=NC2=C1N=CN2 GFFGJBXGBJISGV-UHFFFAOYSA-N 0.000 description 1
- 229930024421 Adenine Natural products 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- POJWUDADGALRAB-PVQJCKRUSA-N Allantoin Natural products NC(=O)N[C@@H]1NC(=O)NC1=O POJWUDADGALRAB-PVQJCKRUSA-N 0.000 description 1
- UWFBNDCJKXSUON-UHFFFAOYSA-N B.CN Chemical compound B.CN UWFBNDCJKXSUON-UHFFFAOYSA-N 0.000 description 1
- 235000021357 Behenic acid Nutrition 0.000 description 1
- DWRXFEITVBNRMK-UHFFFAOYSA-N Beta-D-1-Arabinofuranosylthymine Natural products O=C1NC(=O)C(C)=CN1C1C(O)C(O)C(CO)O1 DWRXFEITVBNRMK-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical class [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- HSMVTJWKFMDRMH-UHFFFAOYSA-N C(C(C)C)C1=C(C=CC=C1)S(=P([S-])([O-])[O-])CCCCCCC.[Zn+2].C(C(C)C)C1=C(C=CC=C1)S(=P([S-])([O-])[O-])CCCCCCC.[Zn+2].[Zn+2] Chemical compound C(C(C)C)C1=C(C=CC=C1)S(=P([S-])([O-])[O-])CCCCCCC.[Zn+2].C(C(C)C)C1=C(C=CC=C1)S(=P([S-])([O-])[O-])CCCCCCC.[Zn+2].[Zn+2] HSMVTJWKFMDRMH-UHFFFAOYSA-N 0.000 description 1
- ICPHWJOJNPWHQF-UHFFFAOYSA-N C(C(C)C)C1=C(C=CC=C1)S(=P([S-])([O-])[O-])CCCCCCCCC.[Zn+2].C(C(C)C)C1=C(C=CC=C1)S(=P([S-])([O-])[O-])CCCCCCCCC.[Zn+2].[Zn+2] Chemical compound C(C(C)C)C1=C(C=CC=C1)S(=P([S-])([O-])[O-])CCCCCCCCC.[Zn+2].C(C(C)C)C1=C(C=CC=C1)S(=P([S-])([O-])[O-])CCCCCCCCC.[Zn+2].[Zn+2] ICPHWJOJNPWHQF-UHFFFAOYSA-N 0.000 description 1
- DVBSUIROAVSLCA-UHFFFAOYSA-N C(C(C)C)S(=P([S-])([O-])[O-])CCCCC.[Zn+2].C(C(C)C)S(=P([S-])([O-])[O-])CCCCC.[Zn+2].[Zn+2] Chemical compound C(C(C)C)S(=P([S-])([O-])[O-])CCCCC.[Zn+2].C(C(C)C)S(=P([S-])([O-])[O-])CCCCC.[Zn+2].[Zn+2] DVBSUIROAVSLCA-UHFFFAOYSA-N 0.000 description 1
- DKYOIVGCRYOGCO-UHFFFAOYSA-N C(C)(C)S(=P([S-])([O-])[O-])C(CCC)C.[Zn+2].C(C)(C)S(=P([S-])([O-])[O-])C(CCC)C.[Zn+2].[Zn+2] Chemical compound C(C)(C)S(=P([S-])([O-])[O-])C(CCC)C.[Zn+2].C(C)(C)S(=P([S-])([O-])[O-])C(CCC)C.[Zn+2].[Zn+2] DKYOIVGCRYOGCO-UHFFFAOYSA-N 0.000 description 1
- YUKVCUGORLEVFP-UHFFFAOYSA-N CCCCCCCC1=CC=CC([S+]=P([O-])([O-])[S-])=C1CCCCCCC.CCCCCCCC1=CC=CC([S+]=P([O-])([O-])[S-])=C1CCCCCCC.[Zn+2].[Zn+2].[Zn+2] Chemical compound CCCCCCCC1=CC=CC([S+]=P([O-])([O-])[S-])=C1CCCCCCC.CCCCCCCC1=CC=CC([S+]=P([O-])([O-])[S-])=C1CCCCCCC.[Zn+2].[Zn+2].[Zn+2] YUKVCUGORLEVFP-UHFFFAOYSA-N 0.000 description 1
- 229920001747 Cellulose diacetate Polymers 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- HBEMHMNHYDTVRE-UHFFFAOYSA-N ClC(CCCCCCCCCCCCCCCCC(=O)OC)(Cl)Cl Chemical compound ClC(CCCCCCCCCCCCCCCCC(=O)OC)(Cl)Cl HBEMHMNHYDTVRE-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- AAWZDTNXLSGCEK-UHFFFAOYSA-N Cordycepinsaeure Natural products OC1CC(O)(C(O)=O)CC(O)C1O AAWZDTNXLSGCEK-UHFFFAOYSA-N 0.000 description 1
- 229910020674 Co—B Inorganic materials 0.000 description 1
- 229910020707 Co—Pt Inorganic materials 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- MIKUYHXYGGJMLM-GIMIYPNGSA-N Crotonoside Natural products C1=NC2=C(N)NC(=O)N=C2N1[C@H]1O[C@@H](CO)[C@H](O)[C@@H]1O MIKUYHXYGGJMLM-GIMIYPNGSA-N 0.000 description 1
- NYHBQMYGNKIUIF-UHFFFAOYSA-N D-guanosine Natural products C1=2NC(N)=NC(=O)C=2N=CN1C1OC(CO)C(O)C1O NYHBQMYGNKIUIF-UHFFFAOYSA-N 0.000 description 1
- 239000004287 Dehydroacetic acid Substances 0.000 description 1
- JYFHYPJRHGVZDY-UHFFFAOYSA-N Dibutyl phosphate Chemical compound CCCCOP(O)(=O)OCCCC JYFHYPJRHGVZDY-UHFFFAOYSA-N 0.000 description 1
- HTIRHQRTDBPHNZ-UHFFFAOYSA-N Dibutyl sulfide Chemical compound CCCCSCCCC HTIRHQRTDBPHNZ-UHFFFAOYSA-N 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- ORAWFNKFUWGRJG-UHFFFAOYSA-N Docosanamide Chemical compound CCCCCCCCCCCCCCCCCCCCCC(N)=O ORAWFNKFUWGRJG-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- 229910017061 Fe Co Inorganic materials 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- KDXKERNSBIXSRK-YFKPBYRVSA-N L-lysine Chemical compound NCCCC[C@H](N)C(O)=O KDXKERNSBIXSRK-YFKPBYRVSA-N 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- OYHQOLUKZRVURQ-HZJYTTRNSA-N Linoleic acid Chemical compound CCCCC\C=C/C\C=C/CCCCCCCC(O)=O OYHQOLUKZRVURQ-HZJYTTRNSA-N 0.000 description 1
- KDXKERNSBIXSRK-UHFFFAOYSA-N Lysine Natural products NCCCCC(N)C(O)=O KDXKERNSBIXSRK-UHFFFAOYSA-N 0.000 description 1
- 239000004472 Lysine Substances 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 229910019440 Mg(OH) Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- YXOLAZRVSSWPPT-UHFFFAOYSA-N Morin Chemical compound OC1=CC(O)=CC=C1C1=C(O)C(=O)C2=C(O)C=C(O)C=C2O1 YXOLAZRVSSWPPT-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- JHQYNYXQKSKNAK-UHFFFAOYSA-N OP(O)O.OP(O)O Chemical class OP(O)O.OP(O)O JHQYNYXQKSKNAK-UHFFFAOYSA-N 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- 229910001260 Pt alloy Inorganic materials 0.000 description 1
- ZVOLCUVKHLEPEV-UHFFFAOYSA-N Quercetagetin Natural products C1=C(O)C(O)=CC=C1C1=C(O)C(=O)C2=C(O)C(O)=C(O)C=C2O1 ZVOLCUVKHLEPEV-UHFFFAOYSA-N 0.000 description 1
- AAWZDTNXLSGCEK-ZHQZDSKASA-N Quinic acid Natural products O[C@H]1CC(O)(C(O)=O)C[C@H](O)C1O AAWZDTNXLSGCEK-ZHQZDSKASA-N 0.000 description 1
- BERPCVULMUPOER-UHFFFAOYSA-N Quinolinediol Chemical compound C1=CC=C2NC(=O)C(O)=CC2=C1 BERPCVULMUPOER-UHFFFAOYSA-N 0.000 description 1
- HWTZYBCRDDUBJY-UHFFFAOYSA-N Rhynchosin Natural products C1=C(O)C(O)=CC=C1C1=C(O)C(=O)C2=CC(O)=C(O)C=C2O1 HWTZYBCRDDUBJY-UHFFFAOYSA-N 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 239000004433 Thermoplastic polyurethane Substances 0.000 description 1
- JZRWCGZRTZMZEH-UHFFFAOYSA-N Thiamine Natural products CC1=C(CCO)SC=[N+]1CC1=CN=C(C)N=C1N JZRWCGZRTZMZEH-UHFFFAOYSA-N 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- DGEZNRSVGBDHLK-UHFFFAOYSA-N [1,10]phenanthroline Chemical compound C1=CN=C2C3=NC=CC=C3C=CC2=C1 DGEZNRSVGBDHLK-UHFFFAOYSA-N 0.000 description 1
- XYRMLECORMNZEY-UHFFFAOYSA-B [Mo+4].[Mo+4].[Mo+4].[O-]P([O-])([S-])=S.[O-]P([O-])([S-])=S.[O-]P([O-])([S-])=S.[O-]P([O-])([S-])=S Chemical compound [Mo+4].[Mo+4].[Mo+4].[O-]P([O-])([S-])=S.[O-]P([O-])([S-])=S.[O-]P([O-])([S-])=S.[O-]P([O-])([S-])=S XYRMLECORMNZEY-UHFFFAOYSA-B 0.000 description 1
- ACIWXGYNMZKTQB-UHFFFAOYSA-M [Zn+].CC(C)COP([O-])(=S)SCC(C)C Chemical compound [Zn+].CC(C)COP([O-])(=S)SCC(C)C ACIWXGYNMZKTQB-UHFFFAOYSA-M 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229960000643 adenine Drugs 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 150000001335 aliphatic alkanes Chemical group 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 125000003282 alkyl amino group Chemical group 0.000 description 1
- 150000001350 alkyl halides Chemical class 0.000 description 1
- 229960000458 allantoin Drugs 0.000 description 1
- BHELZAPQIKSEDF-UHFFFAOYSA-N allyl bromide Chemical group BrCC=C BHELZAPQIKSEDF-UHFFFAOYSA-N 0.000 description 1
- HFEHLDPGIKPNKL-UHFFFAOYSA-N allyl iodide Chemical compound ICC=C HFEHLDPGIKPNKL-UHFFFAOYSA-N 0.000 description 1
- VMWZRHGIAVCFNS-UHFFFAOYSA-J aluminum;lithium;tetrahydroxide Chemical compound [Li+].[OH-].[OH-].[OH-].[OH-].[Al+3] VMWZRHGIAVCFNS-UHFFFAOYSA-J 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 235000010323 ascorbic acid Nutrition 0.000 description 1
- 229960005070 ascorbic acid Drugs 0.000 description 1
- 239000011668 ascorbic acid Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 229940116226 behenic acid Drugs 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- AGEZXYOZHKGVCM-UHFFFAOYSA-N benzyl bromide Chemical compound BrCC1=CC=CC=C1 AGEZXYOZHKGVCM-UHFFFAOYSA-N 0.000 description 1
- LUFPJJNWMYZRQE-UHFFFAOYSA-N benzylsulfanylmethylbenzene Chemical compound C=1C=CC=CC=1CSCC1=CC=CC=C1 LUFPJJNWMYZRQE-UHFFFAOYSA-N 0.000 description 1
- IQFYYKKMVGJFEH-UHFFFAOYSA-N beta-L-thymidine Natural products O=C1NC(=O)C(C)=CN1C1OC(CO)C(O)C1 IQFYYKKMVGJFEH-UHFFFAOYSA-N 0.000 description 1
- DRTQHJPVMGBUCF-PSQAKQOGSA-N beta-L-uridine Natural products O[C@H]1[C@@H](O)[C@H](CO)O[C@@H]1N1C(=O)NC(=O)C=C1 DRTQHJPVMGBUCF-PSQAKQOGSA-N 0.000 description 1
- VBICKXHEKHSIBG-UHFFFAOYSA-N beta-monoglyceryl stearate Natural products CCCCCCCCCCCCCCCCCC(=O)OCC(O)CO VBICKXHEKHSIBG-UHFFFAOYSA-N 0.000 description 1
- 229960002685 biotin Drugs 0.000 description 1
- 235000020958 biotin Nutrition 0.000 description 1
- 239000011616 biotin Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- ZLMKQJQJURXYLC-UHFFFAOYSA-N bis(2-ethylhexoxy)-oxophosphanium Chemical compound CCCCC(CC)CO[P+](=O)OCC(CC)CCCC ZLMKQJQJURXYLC-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- VEWFZHAHZPVQES-UHFFFAOYSA-N boron;n,n-diethylethanamine Chemical compound [B].CCN(CC)CC VEWFZHAHZPVQES-UHFFFAOYSA-N 0.000 description 1
- RJTANRZEWTUVMA-UHFFFAOYSA-N boron;n-methylmethanamine Chemical compound [B].CNC RJTANRZEWTUVMA-UHFFFAOYSA-N 0.000 description 1
- AQNQQHJNRPDOQV-UHFFFAOYSA-N bromocyclohexane Chemical compound BrC1CCCCC1 AQNQQHJNRPDOQV-UHFFFAOYSA-N 0.000 description 1
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 1
- MPWHGCIPQIJZDN-UHFFFAOYSA-N butan-1-amine;dibutyl hydrogen phosphate Chemical compound CCCCN.CCCCOP(O)(=O)OCCCC MPWHGCIPQIJZDN-UHFFFAOYSA-N 0.000 description 1
- XHFAYNOPYQKUNS-UHFFFAOYSA-N butan-1-amine;dioctyl hydrogen phosphate Chemical compound CCCCN.CCCCCCCCOP(O)(=O)OCCCCCCCC XHFAYNOPYQKUNS-UHFFFAOYSA-N 0.000 description 1
- KMGBZBJJOKUPIA-UHFFFAOYSA-N butyl iodide Chemical compound CCCCI KMGBZBJJOKUPIA-UHFFFAOYSA-N 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- ABDBNWQRPYOPDF-UHFFFAOYSA-N carbonofluoridic acid Chemical compound OC(F)=O ABDBNWQRPYOPDF-UHFFFAOYSA-N 0.000 description 1
- OXVVNXMNLYYMOL-UHFFFAOYSA-N carbonyl chloride fluoride Chemical compound FC(Cl)=O OXVVNXMNLYYMOL-UHFFFAOYSA-N 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- RECUKUPTGUEGMW-UHFFFAOYSA-N carvacrol Chemical compound CC(C)C1=CC=C(C)C(O)=C1 RECUKUPTGUEGMW-UHFFFAOYSA-N 0.000 description 1
- HHTWOMMSBMNRKP-UHFFFAOYSA-N carvacrol Natural products CC(=C)C1=CC=C(C)C(O)=C1 HHTWOMMSBMNRKP-UHFFFAOYSA-N 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229960000541 cetyl alcohol Drugs 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- IPPWILKGXFOXHO-UHFFFAOYSA-N chloranilic acid Chemical compound OC1=C(Cl)C(=O)C(O)=C(Cl)C1=O IPPWILKGXFOXHO-UHFFFAOYSA-N 0.000 description 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- HRYZWHHZPQKTII-UHFFFAOYSA-N chloroethane Chemical compound CCCl HRYZWHHZPQKTII-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- GVJHHUAWPYXKBD-UHFFFAOYSA-N d-alpha-tocopherol Natural products OC1=C(C)C(C)=C2OC(CCCC(C)CCCC(C)CCCC(C)C)(C)CCC2=C1C GVJHHUAWPYXKBD-UHFFFAOYSA-N 0.000 description 1
- TUTWLYPCGCUWQI-UHFFFAOYSA-N decanamide Chemical compound CCCCCCCCCC(N)=O TUTWLYPCGCUWQI-UHFFFAOYSA-N 0.000 description 1
- 235000019258 dehydroacetic acid Nutrition 0.000 description 1
- 229940061632 dehydroacetic acid Drugs 0.000 description 1
- 230000005347 demagnetization Effects 0.000 description 1
- CTQLLNPCVYVLIZ-UHFFFAOYSA-N dibutyl hydrogen phosphate;octadecan-1-amine Chemical compound CCCCOP(O)(=O)OCCCC.CCCCCCCCCCCCCCCCCCN CTQLLNPCVYVLIZ-UHFFFAOYSA-N 0.000 description 1
- GHEXFKZHUQGYPQ-UHFFFAOYSA-N dibutyl hydrogen phosphate;octan-1-amine Chemical compound CCCCCCCCN.CCCCOP(O)(=O)OCCCC GHEXFKZHUQGYPQ-UHFFFAOYSA-N 0.000 description 1
- BVXOPEOQUQWRHQ-UHFFFAOYSA-N dibutyl phosphite Chemical compound CCCCOP([O-])OCCCC BVXOPEOQUQWRHQ-UHFFFAOYSA-N 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- QBCOASQOMILNBN-UHFFFAOYSA-N didodecoxy(oxo)phosphanium Chemical compound CCCCCCCCCCCCO[P+](=O)OCCCCCCCCCCCC QBCOASQOMILNBN-UHFFFAOYSA-N 0.000 description 1
- JTXUVYOABGUBMX-UHFFFAOYSA-N didodecyl hydrogen phosphate Chemical compound CCCCCCCCCCCCOP(O)(=O)OCCCCCCCCCCCC JTXUVYOABGUBMX-UHFFFAOYSA-N 0.000 description 1
- RLULIUSIDLLCSW-UHFFFAOYSA-N diethylcarbamothioylsulfanylselanyl n,n-diethylcarbamodithioate Chemical compound CCN(CC)C(=S)S[Se]SC(=S)N(CC)CC RLULIUSIDLLCSW-UHFFFAOYSA-N 0.000 description 1
- LMBWSYZSUOEYSN-UHFFFAOYSA-N diethyldithiocarbamic acid Chemical compound CCN(CC)C(S)=S LMBWSYZSUOEYSN-UHFFFAOYSA-N 0.000 description 1
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- MZGNSEAPZQGJRB-UHFFFAOYSA-N dimethyldithiocarbamic acid Chemical compound CN(C)C(S)=S MZGNSEAPZQGJRB-UHFFFAOYSA-N 0.000 description 1
- OBISXEJSEGNNKL-UHFFFAOYSA-N dinitrogen-n-sulfide Chemical compound [N-]=[N+]=S OBISXEJSEGNNKL-UHFFFAOYSA-N 0.000 description 1
- HTDKEJXHILZNPP-UHFFFAOYSA-N dioctyl hydrogen phosphate Chemical compound CCCCCCCCOP(O)(=O)OCCCCCCCC HTDKEJXHILZNPP-UHFFFAOYSA-N 0.000 description 1
- MGUAQZRBWQVVQC-UHFFFAOYSA-N dioctyl hydrogen phosphate;dodecan-1-amine Chemical compound CCCCCCCCCCCCN.CCCCCCCCOP(O)(=O)OCCCCCCCC MGUAQZRBWQVVQC-UHFFFAOYSA-N 0.000 description 1
- PQACFRRGIDICLF-UHFFFAOYSA-N dioctyl hydrogen phosphate;octadecan-1-amine Chemical compound CCCCCCCCCCCCCCCCCCN.CCCCCCCCOP(O)(=O)OCCCCCCCC PQACFRRGIDICLF-UHFFFAOYSA-N 0.000 description 1
- KXXQSHNWBBSIII-UHFFFAOYSA-N dioctyl hydrogen phosphate;octan-1-amine Chemical compound CCCCCCCCN.CCCCCCCCOP(O)(=O)OCCCCCCCC KXXQSHNWBBSIII-UHFFFAOYSA-N 0.000 description 1
- XMQYIPNJVLNWOE-UHFFFAOYSA-N dioctyl hydrogen phosphite Chemical compound CCCCCCCCOP(O)OCCCCCCCC XMQYIPNJVLNWOE-UHFFFAOYSA-N 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- LTYMSROWYAPPGB-UHFFFAOYSA-N diphenyl sulfide Chemical compound C=1C=CC=CC=1SC1=CC=CC=C1 LTYMSROWYAPPGB-UHFFFAOYSA-N 0.000 description 1
- OAEGRYMCJYIXQT-UHFFFAOYSA-N dithiooxamide Chemical compound NC(=S)C(N)=S OAEGRYMCJYIXQT-UHFFFAOYSA-N 0.000 description 1
- 229950004394 ditiocarb Drugs 0.000 description 1
- WNUUZVCKZRCFIT-UHFFFAOYSA-N docosane-1-sulfonic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCCS(O)(=O)=O WNUUZVCKZRCFIT-UHFFFAOYSA-N 0.000 description 1
- ILRSCQWREDREME-UHFFFAOYSA-N dodecanamide Chemical compound CCCCCCCCCCCC(N)=O ILRSCQWREDREME-UHFFFAOYSA-N 0.000 description 1
- JRBPAEWTRLWTQC-UHFFFAOYSA-N dodecylamine Chemical class CCCCCCCCCCCCN JRBPAEWTRLWTQC-UHFFFAOYSA-N 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- ZEUUVJSRINKECZ-UHFFFAOYSA-N ethanedithioic acid Chemical compound CC(S)=S ZEUUVJSRINKECZ-UHFFFAOYSA-N 0.000 description 1
- DUYAAUVXQSMXQP-UHFFFAOYSA-N ethanethioic S-acid Chemical compound CC(S)=O DUYAAUVXQSMXQP-UHFFFAOYSA-N 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- JVZRCNQLWOELDU-UHFFFAOYSA-N gamma-Phenylpyridine Natural products C1=CC=CC=C1C1=CC=NC=C1 JVZRCNQLWOELDU-UHFFFAOYSA-N 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229940029575 guanosine Drugs 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- FEEPBTVZSYQUDP-UHFFFAOYSA-N heptatriacontanediamide Chemical compound NC(=O)CCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCC(N)=O FEEPBTVZSYQUDP-UHFFFAOYSA-N 0.000 description 1
- VHHHONWQHHHLTI-UHFFFAOYSA-N hexachloroethane Chemical compound ClC(Cl)(Cl)C(Cl)(Cl)Cl VHHHONWQHHHLTI-UHFFFAOYSA-N 0.000 description 1
- HSEMFIZWXHQJAE-UHFFFAOYSA-N hexadecanamide Chemical compound CCCCCCCCCCCCCCCC(N)=O HSEMFIZWXHQJAE-UHFFFAOYSA-N 0.000 description 1
- SSILHZFTFWOUJR-UHFFFAOYSA-N hexadecane-1-sulfonic acid Chemical compound CCCCCCCCCCCCCCCCS(O)(=O)=O SSILHZFTFWOUJR-UHFFFAOYSA-N 0.000 description 1
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 description 1
- 229940091173 hydantoin Drugs 0.000 description 1
- 125000000687 hydroquinonyl group Chemical group C1(O)=C(C=C(O)C=C1)* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- FUCOMWZKWIEKRK-UHFFFAOYSA-N iodocyclohexane Chemical compound IC1CCCCC1 FUCOMWZKWIEKRK-UHFFFAOYSA-N 0.000 description 1
- XJTQJERLRPWUGL-UHFFFAOYSA-N iodomethylbenzene Chemical compound ICC1=CC=CC=C1 XJTQJERLRPWUGL-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- VYFOAVADNIHPTR-UHFFFAOYSA-N isatoic anhydride Chemical compound NC1=CC=CC=C1CO VYFOAVADNIHPTR-UHFFFAOYSA-N 0.000 description 1
- LVPMIMZXDYBCDF-UHFFFAOYSA-N isocinchomeronic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)N=C1 LVPMIMZXDYBCDF-UHFFFAOYSA-N 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- MWDZOUNAPSSOEL-UHFFFAOYSA-N kaempferol Natural products OC1=C(C(=O)c2cc(O)cc(O)c2O1)c3ccc(O)cc3 MWDZOUNAPSSOEL-UHFFFAOYSA-N 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- BEJNERDRQOWKJM-UHFFFAOYSA-N kojic acid Chemical compound OCC1=CC(=O)C(O)=CO1 BEJNERDRQOWKJM-UHFFFAOYSA-N 0.000 description 1
- 229960004705 kojic acid Drugs 0.000 description 1
- WZNJWVWKTVETCG-UHFFFAOYSA-N kojic acid Natural products OC(=O)C(N)CN1C=CC(=O)C(O)=C1 WZNJWVWKTVETCG-UHFFFAOYSA-N 0.000 description 1
- SFIHQZFZMWZOJV-HZJYTTRNSA-N linoleamide Chemical compound CCCCC\C=C/C\C=C/CCCCCCCC(N)=O SFIHQZFZMWZOJV-HZJYTTRNSA-N 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- HWYHZTIRURJOHG-UHFFFAOYSA-N luminol Chemical compound O=C1NNC(=O)C2=C1C(N)=CC=C2 HWYHZTIRURJOHG-UHFFFAOYSA-N 0.000 description 1
- 239000006247 magnetic powder Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002480 mineral oil Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- RZRNAYUHWVFMIP-UHFFFAOYSA-N monoelaidin Natural products CCCCCCCCC=CCCCCCCCC(=O)OCC(O)CO RZRNAYUHWVFMIP-UHFFFAOYSA-N 0.000 description 1
- UXOUKMQIEVGVLY-UHFFFAOYSA-N morin Natural products OC1=CC(O)=CC(C2=C(C(=O)C3=C(O)C=C(O)C=C3O2)O)=C1 UXOUKMQIEVGVLY-UHFFFAOYSA-N 0.000 description 1
- 235000007708 morin Nutrition 0.000 description 1
- AZHYTXUTACODCW-UHFFFAOYSA-L n,n-dimethylcarbamodithioate;iron(2+) Chemical compound [Fe+2].CN(C)C([S-])=S.CN(C)C([S-])=S AZHYTXUTACODCW-UHFFFAOYSA-L 0.000 description 1
- RKISUIUJZGSLEV-UHFFFAOYSA-N n-[2-(octadecanoylamino)ethyl]octadecanamide Chemical compound CCCCCCCCCCCCCCCCCC(=O)NCCNC(=O)CCCCCCCCCCCCCCCCC RKISUIUJZGSLEV-UHFFFAOYSA-N 0.000 description 1
- GOQYKNQRPGWPLP-UHFFFAOYSA-N n-heptadecyl alcohol Natural products CCCCCCCCCCCCCCCCCO GOQYKNQRPGWPLP-UHFFFAOYSA-N 0.000 description 1
- SNMVRZFUUCLYTO-UHFFFAOYSA-N n-propyl chloride Chemical compound CCCCl SNMVRZFUUCLYTO-UHFFFAOYSA-N 0.000 description 1
- PVWOIHVRPOBWPI-UHFFFAOYSA-N n-propyl iodide Chemical compound CCCI PVWOIHVRPOBWPI-UHFFFAOYSA-N 0.000 description 1
- NXPPAOGUKPJVDI-UHFFFAOYSA-N naphthalene-1,2-diol Chemical compound C1=CC=CC2=C(O)C(O)=CC=C21 NXPPAOGUKPJVDI-UHFFFAOYSA-N 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- LYRFLYHAGKPMFH-UHFFFAOYSA-N octadecanamide Chemical compound CCCCCCCCCCCCCCCCCC(N)=O LYRFLYHAGKPMFH-UHFFFAOYSA-N 0.000 description 1
- CACRRXGTWZXOAU-UHFFFAOYSA-N octadecane-1-sulfonic acid Chemical compound CCCCCCCCCCCCCCCCCCS(O)(=O)=O CACRRXGTWZXOAU-UHFFFAOYSA-N 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 235000019198 oils Nutrition 0.000 description 1
- 235000014593 oils and fats Nutrition 0.000 description 1
- FATBGEAMYMYZAF-KTKRTIGZSA-N oleamide Chemical compound CCCCCCCC\C=C/CCCCCCCC(N)=O FATBGEAMYMYZAF-KTKRTIGZSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 235000021313 oleic acid Nutrition 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 229960005010 orotic acid Drugs 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- DXGLGDHPHMLXJC-UHFFFAOYSA-N oxybenzone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1 DXGLGDHPHMLXJC-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- MOQRZWSWPNIGMP-UHFFFAOYSA-N pentyl octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCCCCC MOQRZWSWPNIGMP-UHFFFAOYSA-N 0.000 description 1
- PCIUEQPBYFRTEM-UHFFFAOYSA-N perfluorodecanoic acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F PCIUEQPBYFRTEM-UHFFFAOYSA-N 0.000 description 1
- 210000004303 peritoneum Anatomy 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- LULCPJWUGUVEFU-UHFFFAOYSA-N phthiocol Chemical compound C1=CC=C2C(=O)C(C)=C(O)C(=O)C2=C1 LULCPJWUGUVEFU-UHFFFAOYSA-N 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920005906 polyester polyol Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 235000013824 polyphenols Nutrition 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002620 polyvinyl fluoride Polymers 0.000 description 1
- GJAWHXHKYYXBSV-UHFFFAOYSA-N pyridinedicarboxylic acid Natural products OC(=O)C1=CC=CN=C1C(O)=O GJAWHXHKYYXBSV-UHFFFAOYSA-N 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 235000005875 quercetin Nutrition 0.000 description 1
- 229960001285 quercetin Drugs 0.000 description 1
- JWVCLYRUEFBMGU-UHFFFAOYSA-N quinazoline Chemical compound N1=CN=CC2=CC=CC=C21 JWVCLYRUEFBMGU-UHFFFAOYSA-N 0.000 description 1
- QMVCLSHKMIGEFN-UHFFFAOYSA-N quinolin-2-ylhydrazine Chemical compound C1=CC=CC2=NC(NN)=CC=C21 QMVCLSHKMIGEFN-UHFFFAOYSA-N 0.000 description 1
- YHUVMHKAHWKQBI-UHFFFAOYSA-N quinoline-2,3-dicarboxylic acid Chemical compound C1=CC=C2N=C(C(O)=O)C(C(=O)O)=CC2=C1 YHUVMHKAHWKQBI-UHFFFAOYSA-N 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- HSSLDCABUXLXKM-UHFFFAOYSA-N resorufin Chemical compound C1=CC(=O)C=C2OC3=CC(O)=CC=C3N=C21 HSSLDCABUXLXKM-UHFFFAOYSA-N 0.000 description 1
- KIWUVOGUEXMXSV-UHFFFAOYSA-N rhodanine Chemical compound O=C1CSC(=S)N1 KIWUVOGUEXMXSV-UHFFFAOYSA-N 0.000 description 1
- 235000003441 saturated fatty acids Nutrition 0.000 description 1
- 150000004671 saturated fatty acids Chemical class 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- NSVHDIYWJVLAGH-UHFFFAOYSA-M silver;n,n-diethylcarbamodithioate Chemical compound [Ag+].CCN(CC)C([S-])=S NSVHDIYWJVLAGH-UHFFFAOYSA-M 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229960002317 succinimide Drugs 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- MBDNRNMVTZADMQ-UHFFFAOYSA-N sulfolene Chemical compound O=S1(=O)CC=CC1 MBDNRNMVTZADMQ-UHFFFAOYSA-N 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- MYOWBHNETUSQPA-UHFFFAOYSA-N tetradecane-1-sulfonic acid Chemical compound CCCCCCCCCCCCCCS(O)(=O)=O MYOWBHNETUSQPA-UHFFFAOYSA-N 0.000 description 1
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
- 229960004559 theobromine Drugs 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- KYMBYSLLVAOCFI-UHFFFAOYSA-N thiamine Chemical compound CC1=C(CCO)SCN1CC1=CN=C(C)N=C1N KYMBYSLLVAOCFI-UHFFFAOYSA-N 0.000 description 1
- 235000019157 thiamine Nutrition 0.000 description 1
- 229960003495 thiamine Drugs 0.000 description 1
- 239000011721 thiamine Substances 0.000 description 1
- YUKQRDCYNOVPGJ-UHFFFAOYSA-N thioacetamide Chemical compound CC(N)=S YUKQRDCYNOVPGJ-UHFFFAOYSA-N 0.000 description 1
- DLFVBJFMPXGRIB-UHFFFAOYSA-N thioacetamide Natural products CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 1
- 150000003558 thiocarbamic acid derivatives Chemical class 0.000 description 1
- NBOMNTLFRHMDEZ-UHFFFAOYSA-N thiosalicylic acid Chemical compound OC(=O)C1=CC=CC=C1S NBOMNTLFRHMDEZ-UHFFFAOYSA-N 0.000 description 1
- 229940103494 thiosalicylic acid Drugs 0.000 description 1
- ZEMGGZBWXRYJHK-UHFFFAOYSA-N thiouracil Chemical compound O=C1C=CNC(=S)N1 ZEMGGZBWXRYJHK-UHFFFAOYSA-N 0.000 description 1
- 229950000329 thiouracil Drugs 0.000 description 1
- 229940104230 thymidine Drugs 0.000 description 1
- 229940113082 thymine Drugs 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229960003087 tioguanine Drugs 0.000 description 1
- 235000010384 tocopherol Nutrition 0.000 description 1
- 229960001295 tocopherol Drugs 0.000 description 1
- 229930003799 tocopherol Natural products 0.000 description 1
- 239000011732 tocopherol Substances 0.000 description 1
- LGQXXHMEBUOXRP-UHFFFAOYSA-N tributyl borate Chemical compound CCCCOB(OCCCC)OCCCC LGQXXHMEBUOXRP-UHFFFAOYSA-N 0.000 description 1
- STCOOQWBFONSKY-UHFFFAOYSA-N tributyl phosphate Chemical compound CCCCOP(=O)(OCCCC)OCCCC STCOOQWBFONSKY-UHFFFAOYSA-N 0.000 description 1
- XTTGYFREQJCEML-UHFFFAOYSA-N tributyl phosphite Chemical compound CCCCOP(OCCCC)OCCCC XTTGYFREQJCEML-UHFFFAOYSA-N 0.000 description 1
- OHRVKCZTBPSUIK-UHFFFAOYSA-N tridodecyl phosphate Chemical compound CCCCCCCCCCCCOP(=O)(OCCCCCCCCCCCC)OCCCCCCCCCCCC OHRVKCZTBPSUIK-UHFFFAOYSA-N 0.000 description 1
- IVIIAEVMQHEPAY-UHFFFAOYSA-N tridodecyl phosphite Chemical compound CCCCCCCCCCCCOP(OCCCCCCCCCCCC)OCCCCCCCCCCCC IVIIAEVMQHEPAY-UHFFFAOYSA-N 0.000 description 1
- AJSTXXYNEIHPMD-UHFFFAOYSA-N triethyl borate Chemical compound CCOB(OCC)OCC AJSTXXYNEIHPMD-UHFFFAOYSA-N 0.000 description 1
- QOQNJVLFFRMJTQ-UHFFFAOYSA-N trioctyl phosphite Chemical compound CCCCCCCCOP(OCCCCCCCC)OCCCCCCCC QOQNJVLFFRMJTQ-UHFFFAOYSA-N 0.000 description 1
- MDCWDBMBZLORER-UHFFFAOYSA-N triphenyl borate Chemical compound C=1C=CC=CC=1OB(OC=1C=CC=CC=1)OC1=CC=CC=C1 MDCWDBMBZLORER-UHFFFAOYSA-N 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- LTEHWCSSIHAVOQ-UHFFFAOYSA-N tripropyl borate Chemical compound CCCOB(OCCC)OCCC LTEHWCSSIHAVOQ-UHFFFAOYSA-N 0.000 description 1
- ILLOBGFGKYTZRO-UHFFFAOYSA-N tris(2-ethylhexyl) phosphite Chemical compound CCCCC(CC)COP(OCC(CC)CCCC)OCC(CC)CCCC ILLOBGFGKYTZRO-UHFFFAOYSA-N 0.000 description 1
- RTMBXAOPKJNOGZ-UHFFFAOYSA-N tris(2-methylphenyl) borate Chemical compound CC1=CC=CC=C1OB(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C RTMBXAOPKJNOGZ-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000011882 ultra-fine particle Substances 0.000 description 1
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 1
- 150000004670 unsaturated fatty acids Chemical class 0.000 description 1
- 229940035893 uracil Drugs 0.000 description 1
- DRTQHJPVMGBUCF-UHFFFAOYSA-N uracil arabinoside Natural products OC1C(O)C(CO)OC1N1C(=O)NC(=O)C=C1 DRTQHJPVMGBUCF-UHFFFAOYSA-N 0.000 description 1
- 229940045145 uridine Drugs 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- KAKZBPTYRLMSJV-UHFFFAOYSA-N vinyl-ethylene Natural products C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 1
- 239000010698 whale oil Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- BOXSVZNGTQTENJ-UHFFFAOYSA-L zinc dibutyldithiocarbamate Chemical compound [Zn+2].CCCCN(C([S-])=S)CCCC.CCCCN(C([S-])=S)CCCC BOXSVZNGTQTENJ-UHFFFAOYSA-L 0.000 description 1
- RKQOSDAEEGPRER-UHFFFAOYSA-L zinc diethyldithiocarbamate Chemical compound [Zn+2].CCN(CC)C([S-])=S.CCN(CC)C([S-])=S RKQOSDAEEGPRER-UHFFFAOYSA-L 0.000 description 1
- PXJZGBFRKRTOPA-UHFFFAOYSA-L zinc;[2,3-di(nonyl)phenyl]sulfanyl-dioxido-sulfanylidene-$l^{5}-phosphane Chemical compound [Zn+2].CCCCCCCCCC1=CC=CC(SP([O-])([O-])=S)=C1CCCCCCCCC PXJZGBFRKRTOPA-UHFFFAOYSA-L 0.000 description 1
- AUMBZPPBWALQRO-UHFFFAOYSA-L zinc;n,n-dibenzylcarbamodithioate Chemical compound [Zn+2].C=1C=CC=CC=1CN(C(=S)[S-])CC1=CC=CC=C1.C=1C=CC=CC=1CN(C(=S)[S-])CC1=CC=CC=C1 AUMBZPPBWALQRO-UHFFFAOYSA-L 0.000 description 1
- KMNUDJAXRXUZQS-UHFFFAOYSA-L zinc;n-ethyl-n-phenylcarbamodithioate Chemical compound [Zn+2].CCN(C([S-])=S)C1=CC=CC=C1.CCN(C([S-])=S)C1=CC=CC=C1 KMNUDJAXRXUZQS-UHFFFAOYSA-L 0.000 description 1
- GVJHHUAWPYXKBD-IEOSBIPESA-N α-tocopherol Chemical compound OC1=C(C)C(C)=C2O[C@@](CCC[C@H](C)CCC[C@H](C)CCCC(C)C)(C)CCC2=C1C GVJHHUAWPYXKBD-IEOSBIPESA-N 0.000 description 1
Landscapes
- Lubricants (AREA)
- Paints Or Removers (AREA)
- Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、真空蒸着やスパッタリング等の真空薄膜形成
技術等の手法により非磁性支持体上に強磁性金属薄膜を
磁性層として形成した、いわゆる強磁性金属薄膜型の磁
気記録媒体に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a so-called magnetic layer in which a ferromagnetic metal thin film is formed as a magnetic layer on a non-magnetic support by vacuum thin film forming techniques such as vacuum evaporation and sputtering. The present invention relates to a ferromagnetic metal thin film type magnetic recording medium.
本発明は、非磁性支持体上に強磁性金属薄膜を磁性層と
して形成してなる磁気記録媒体において、磁性層である
強磁性金属薄膜上にN−置換パーフルオロアルカンアミ
ドを防錆剤として塗布し、その上層にさらに潤滑剤層を
形成することにより、高温、高温等の条件下においても
磁性層表面に錆がほとんど発生せず、保持力や飽和磁化
量等の磁気特性の経口変化の少ない、且つ走行性及び耐
久性に優れた磁気記録媒体を提供しようとするもので°
ある。The present invention provides a magnetic recording medium in which a ferromagnetic metal thin film is formed as a magnetic layer on a non-magnetic support, in which an N-substituted perfluoroalkanamide is coated as a rust preventive agent on the ferromagnetic metal thin film that is the magnetic layer. However, by forming an additional lubricant layer on top of the lubricant layer, there is almost no rust on the magnetic layer surface even under high temperature conditions, and there is little change in magnetic properties such as coercive force and saturation magnetization. The aim is to provide a magnetic recording medium with excellent runnability and durability.
be.
従来より磁気記録媒体としては、非磁性支持体上にr
FexOs、Coを含有するγ−Fez○3゜Fe3
O4,coを含有するF 8204,7 F e z
○。Conventionally, as a magnetic recording medium, r
γ-Fez○3°Fe3 containing FexOs, Co
F 8204,7 F e z containing O4,co
○.
とF2O3とのベルトライド化合物、Coを含有するベ
ルトライド化合物、CrO□等の酸化物強磁性粉末ある
いはFe、Co、N!等を主成分とする合金磁性粉末等
の粉末磁性材料を塩化ビニル−酢酸ビニル系共重合体、
ポリエステル樹脂、ポリウレタン樹脂等の有機バインダ
ー中に分散甘しめた磁性塗料を塗布・乾燥することによ
り作製される塗布型の磁気記録媒体が広く使用されてい
る。and F2O3, ferromagnetic compounds containing Co, oxide ferromagnetic powders such as CrO□, or Fe, Co, N! A powder magnetic material such as an alloy magnetic powder whose main components are vinyl chloride-vinyl acetate copolymer,
Coating-type magnetic recording media, which are manufactured by coating and drying a magnetic paint dispersed in an organic binder such as polyester resin or polyurethane resin, are widely used.
これに対して、高密度磁気記録への要求の高まりととも
に、Co−Ni合金等の強磁性金属材料を、メッキや真
空gt膜形成技術(真空蒸着法やスパッタリング法、イ
オンブレーティング法等)によってポリエステルフィル
ムやポリイミドフィルム等の非磁性支持体上に直接被着
した、いわゆる強磁性金属薄膜型の磁気記録媒体が提案
され、注目を集めている。この強磁性金属1を成型磁気
記録媒体は、抗磁力や角形比等に優れ、短波長での電磁
変換特性に優れるばかりでなく、磁性層の厚みを極めて
薄(することが可能であるため記録減磁や再生時の厚み
損失が著しく小さいこと、磁性層中に非磁性材である有
機バインダーを混入する必要がないため磁性材料の充填
密度を高めることができること等、数々の利点を有して
いる。On the other hand, with the increasing demand for high-density magnetic recording, ferromagnetic metal materials such as Co-Ni alloys have been developed using plating and vacuum GT film forming techniques (vacuum evaporation, sputtering, ion blating, etc.). A so-called ferromagnetic metal thin film type magnetic recording medium, which is directly deposited on a non-magnetic support such as a polyester film or a polyimide film, has been proposed and is attracting attention. A magnetic recording medium made of this ferromagnetic metal 1 not only has excellent coercive force and squareness, and has excellent electromagnetic conversion characteristics at short wavelengths, but also has an extremely thin magnetic layer, making it possible to record It has a number of advantages, including extremely low thickness loss during demagnetization and reproduction, and the ability to increase the packing density of magnetic material because there is no need to mix a non-magnetic organic binder into the magnetic layer. There is.
しかしながら、上述の強磁性金属薄膜型の磁気記録媒体
は、磁性層が金属であるために、保存中、特に高温ない
し高湿下に放置された場合、磁性層表面に腐食を生じや
すく、このため飽和磁化量の如き磁気特性が経口的に劣
化する問題があった。However, since the magnetic layer of the above-mentioned ferromagnetic metal thin film type magnetic recording medium is made of metal, the surface of the magnetic layer tends to corrode during storage, especially when left under high temperature or high humidity. There was a problem that magnetic properties such as saturation magnetization deteriorated over time.
また、上記強磁性金属薄膜型の磁気記録媒体は、磁性層
表面の平滑性が極めて良好であるために実質的な接触面
積が大きくなり、′a着現象(いわゆる貼付き)が起こ
り易くなったり摩擦係数が大きくなる等、耐久性や走行
性等に欠点が多く、その改善も問題となっている。In addition, in the above-mentioned ferromagnetic metal thin film type magnetic recording medium, since the surface of the magnetic layer has extremely good smoothness, the substantial contact area becomes large, making it easy for 'a adhesion phenomenon (so-called sticking) to occur. There are many drawbacks in terms of durability, running performance, etc., such as a large coefficient of friction, and improvement thereof is also a problem.
本発明は高温ないし高温下においても磁性層表面に鯖が
ほとんど発生せず、磁気特性の経日変化の少ない、且つ
走行性及び耐久性に優れた強磁性金属薄膜型の磁気記録
媒体を提供することを目的とし、上述の問題点を解決し
ようとするものである。The present invention provides a ferromagnetic metal thin film type magnetic recording medium that hardly generates grains on the surface of the magnetic layer even at high temperatures or high temperatures, has little change in magnetic properties over time, and has excellent running properties and durability. The aim is to solve the above-mentioned problems.
本発明者等は、上述の目的を達成せんものと鋭意研究の
結果、強磁性金属薄膜上にN−置換パーフルオロアルカ
ンアミドを塗布し、その上層に潤滑剤層を形成すること
によって、良好な防錆効果を発渾し、且つ走行性及び耐
久性に優れることを見出し本発明を完成するに至ったも
のであって、非磁性支持体上に形成された強磁性金属T
!腹膜上N−置換パーフルオロアルカンアミドを塗布し
、その上層に潤滑剤層を順次形成したことを特徴とする
ものである。As a result of intensive research to achieve the above-mentioned object, the inventors of the present invention have found that by coating an N-substituted perfluoroalkanamide on a ferromagnetic metal thin film and forming a lubricant layer on top of it, a good The present invention has been completed by discovering that a ferromagnetic metal T formed on a non-magnetic support has a rust-preventing effect and is excellent in runnability and durability.
! It is characterized in that an N-substituted perfluoroalkanamide is applied onto the peritoneum, and a lubricant layer is sequentially formed on top of the N-substituted perfluoroalkanamide.
本発明で防錆剤として使用されるN−置換パーフルオロ
アルカンアミドは、一般式
%式%()
(但し、式中Rは炭化水素基であり、nは3以上の整数
である。)
で示される化合物である。The N-substituted perfluoroalkane amide used as a rust inhibitor in the present invention has the general formula %() (wherein R is a hydrocarbon group and n is an integer of 3 or more.) The compound shown is
ここで上記(1)式中アルカン部の炭化水素基Rは、直
鎖状でも、枝分かれ状でもよく、また脂環状、芳香環を
含んでいてもよい、特に、二重結合を含むものであれば
より好ましい。Here, the hydrocarbon group R in the alkane moiety in the above formula (1) may be linear or branched, or may contain an alicyclic or aromatic ring, especially one containing a double bond. is more preferable.
上記(I)式で示されるN−置換パーフルオロアルカン
アミドは、以下の(A)式で示される合成法によって容
易に合成することが可能である。The N-substituted perfluoroalkane amide represented by the above formula (I) can be easily synthesized by the synthesis method represented by the following formula (A).
・・・ (A)
上記パーフルオロカルボン酸クロリドについては、ホー
プジエン(LHauptschein)の方法〔ジャー
ナル オブ アメリカン ケミカル ソサエティ 75
B? (1953))もしくは、本発明者が提案
した特願昭61−26577号の方法によって合成可能
である。°例えば、特願昭61−26577号明細書に
は、相当するパーフルオロカルボン酸(C,IF、、1
.、C00H)をジメチルホルムアミド(DMF)存在
下で塩化チオニル(SOCh)と反応させ塩素化する方
法が開示されている0反応式を示せば次の通りである。... (A) Regarding the above perfluorocarboxylic acid chloride, the method of LHauptschein [Journal of American Chemical Society 75]
B? (1953)) or can be synthesized by the method proposed by the present inventor in Japanese Patent Application No. 61-26577. For example, in Japanese Patent Application No. 61-26577, the corresponding perfluorocarboxylic acid (C, IF, 1
.. , C00H) with thionyl chloride (SOCh) in the presence of dimethylformamide (DMF) to chlorinate the reaction formula.
DMF ・・・ (B)
(式中nは整数を表す、)゛
また、長鎖アミンについては、相当するカルボン酸をチ
オニルクロリドあるいはオキサリルクロリドを用いて塩
化物とした後、アンモニアと反応させ酸アミドとし、そ
れを水酸化リチウムアルミニウムで還元することにより
得ることができる。DMF... (B) (In the formula, n represents an integer.) In addition, for long-chain amines, the corresponding carboxylic acid is converted into a chloride using thionyl chloride or oxalyl chloride, and then the acid is reacted with ammonia. It can be obtained by reducing the amide with lithium aluminum hydroxide.
(例えばナガセ(A、Nagase)等の方法、アグリ
カルチャー バイオロジカル ケミストリー 47 5
3上述の防錆剤を強磁性金属薄膜上に付着させる方法と
しては、防錆剤を適当な溶媒に希釈して強磁性金属薄膜
表面に塗布する方法、あるいは防錆剤の蒸気を強磁性金
属薄膜表面にあてる方法等各種の手段を用いることがで
きる。(For example, the method of Nagase et al., Agriculture Biological Chemistry 47 5
3 The above-mentioned rust preventive can be applied to the ferromagnetic metal thin film by diluting the rust preventive in an appropriate solvent and applying it to the surface of the ferromagnetic metal thin film, or by applying the vapor of the rust preventive to the ferromagnetic metal thin film. Various methods can be used, such as applying it to the surface of a thin film.
このようにして防錆剤層を形成した磁気記録媒体は、さ
らに防錆剤層の上層に潤滑剤を主体とする潤滑剤層を形
成する。潤滑剤層を形成することによって、磁気記録媒
体の耐摩耗性、走行性、耐久性が大幅に改善される。従
って、上記N−置換パーフルオロアルカンアミドからな
る防錆剤層の耐蝕作用と相まって磁気記録媒体の特性向
上が図れる。The magnetic recording medium on which the rust preventive layer has been formed in this manner further has a lubricant layer containing a lubricant as a main layer above the rust preventive layer. By forming a lubricant layer, the wear resistance, running properties, and durability of the magnetic recording medium are significantly improved. Therefore, in combination with the corrosion-resistant effect of the rust preventive layer made of the N-substituted perfluoroalkanamide, the characteristics of the magnetic recording medium can be improved.
上述のように防錆剤層及び潤滑剤層を形成した磁気記録
媒体は、第1図に示すように、非磁性支持体(1)1強
磁性金属薄膜(2)、防錆剤層(4)、潤滑剤層(3)
の順に順次積層した構成となる。すなわち、防錆効果を
有する層と潤滑効果を有する眉を別々に積層形成した二
層構造とする。As shown in FIG. 1, a magnetic recording medium on which a rust preventive layer and a lubricant layer are formed as described above includes a nonmagnetic support (1), a ferromagnetic metal thin film (2), and a rust preventive layer (4). ), lubricant layer (3)
It has a structure in which the layers are sequentially laminated in this order. That is, it has a two-layer structure in which a layer having a rust-preventing effect and a layer having a lubricating effect are separately laminated.
ここで、上記防錆剤IJ(4)は、上述のN−置換パー
フルオロアルカンアミドのみを被着形成してもよいが、
必要に応じてその他の防錆剤及び極圧剤等を適当量添加
してもよい。上記防錆剤N(4)を強磁性金属薄膜(2
)上に形成する場合には、その塗布量は磁気記録媒体1
−当り0.5〜100■程度が好ましく、1〜20■/
Mであるのがより好ましい。この塗布量が余り少なすぎ
ると耐蝕性改善の効果が顕れず、一方あまり多すぎると
摺動部材と強磁性金属薄膜との間で貼付き現象が起こり
走行性が悪化してしまう。Here, the rust preventive agent IJ (4) may be formed by depositing only the above-mentioned N-substituted perfluoroalkanamide, but
If necessary, appropriate amounts of other rust preventive agents, extreme pressure agents, etc. may be added. The above rust preventive agent N (4) is applied to a ferromagnetic metal thin film (2
), the coating amount is equal to that of the magnetic recording medium 1.
- Preferably about 0.5 to 100 ■/per, and 1 to 20 ■/
M is more preferable. If the coating amount is too small, the effect of improving corrosion resistance will not be apparent, while if it is too large, a sticking phenomenon will occur between the sliding member and the ferromagnetic metal thin film, resulting in poor running properties.
上記防錆剤層(4)に使用可能なその他の防錆剤として
は、通常この種の磁気記録媒体の防錆剤として使用され
るものであれば如何なるものであってもよく、例えばフ
ェノール類、ナフトール類、キノン類、ジアリールケト
ン、窒素原子を含む複素環化合物、酸素原子を含む複素
環化合物、硫黄原子を含む複素環化合物、メルカプト基
を有する化合物、チオカルボン酸またはその塩、チアゾ
ール系化合物等が挙げられる。具体的に例示すれば次の
通りである。Other rust preventives that can be used in the rust preventive layer (4) may include any rust preventive agent that is normally used as a rust preventive agent for this type of magnetic recording medium, such as phenols. , naphthols, quinones, diaryl ketones, heterocyclic compounds containing a nitrogen atom, heterocyclic compounds containing an oxygen atom, heterocyclic compounds containing a sulfur atom, compounds having a mercapto group, thiocarboxylic acids or their salts, thiazole compounds, etc. can be mentioned. Specific examples are as follows.
先ず、上記フェノール類としては、二価フェノール、ア
ルキルフェノールあるいはニトロソフェノールが挙げら
れる。First, the above-mentioned phenols include dihydric phenols, alkylphenols, and nitrosophenols.
上記二価フェノールとしては、ハイドロキノン。The dihydric phenol mentioned above is hydroquinone.
レゾルシン、カテコール等の純フェノール類、及びそれ
らのアルキルアミノ、ニトロ、ハロゲノ置換体、例えば
、2−メチルハイドロキノン、4−メチルレゾルシノー
ル、5−メチルレゾルシノール、4−メチルピロカテコ
ール、2,5−ジメチルハイドロキノン、4,6−ジメ
チルレゾルシノール。Pure phenols such as resorcinol and catechol, and alkylamino, nitro, and halogeno substituted products thereof, such as 2-methylhydroquinone, 4-methylresorcinol, 5-methylresorcinol, 4-methylpyrocatechol, 2,5-dimethylhydroquinone , 4,6-dimethylresorcinol.
2.5−ジメチルレゾルシノール、2−イソプロピル−
5−メチルハイドロキノン+ 2 tart−ブチ
ルハイドロキノン、215−ジーtert−ブチルハイ
ドロキノン、4−tert−ブチルカテコール、2−ア
ミルゾルシノール、2−レゾルシノール、2゜5−ジク
ロロヒドロキノン等が挙げられる。 上記アルキルフェ
ノールとは、−価フエノールのアルキル置換体を指し、
例えば、0−クレゾール。2.5-dimethylresorcinol, 2-isopropyl-
Examples include 5-methylhydroquinone + 2-tart-butylhydroquinone, 215-di-tert-butylhydroquinone, 4-tert-butylcatechol, 2-amylsorcinol, 2-resorcinol, 2°5-dichlorohydroquinone, and the like. The above alkylphenol refers to an alkyl substituted product of -valent phenol,
For example, 0-cresol.
m−クレゾール、p−クレゾール、0−エチルフェノー
ル、m−エチルフェノール、p−エチルフェノール、2
.3−ジメチルフェノール、2,5−ジメチルフェノー
ル、2.6−ジメチルフェノール。m-cresol, p-cresol, 0-ethylphenol, m-ethylphenol, p-ethylphenol, 2
.. 3-dimethylphenol, 2,5-dimethylphenol, 2,6-dimethylphenol.
3.4−ジメチルフェノール、3,5−ジメチルフェノ
ール、 2,4.6−)ジメチルフェノール、 2
,4.5−トリメチルフェノール、5−イソプロピル−
2−メチルフェノール、p−tert−ブチルフェノー
ル、2.6−ジーter t−ブチル−p−クレゾール
。3.4-dimethylphenol, 3,5-dimethylphenol, 2,4.6-)dimethylphenol, 2
, 4.5-trimethylphenol, 5-isopropyl-
2-Methylphenol, p-tert-butylphenol, 2,6-tert-butyl-p-cresol.
4.4′−メチレンビス2,6−シーtert−ブチル
フェノール、2.6−シメチルー4−tert−ブチル
フェノール、 2,4.6− トリーtert−ブチ
ルフェノール等が挙げられる。Examples include 4,4'-methylenebis-2,6-tert-butylphenol, 2,6-dimethyl-4-tert-butylphenol, and 2,4,6-tri-tert-butylphenol.
上記ニトロソフェノールとしては、例えば、4−ニトロ
ソ−2−メトキシ−1−フェノール、4−ニトロソ−2
−エトキシ−1−フェノール、6−ニトロソ−〇−クレ
ゾール、4−ニトロソ−m−クレゾール、0−ニトロソ
フェノール、2−ニトロラフエノール。2−ニトロソレ
ゾルシン、4−ニトロソレゾルシン、p−ニトロソフェ
ノール等が挙げられる。Examples of the above nitrosophenols include 4-nitroso-2-methoxy-1-phenol, 4-nitroso-2
-Ethoxy-1-phenol, 6-nitroso-〇-cresol, 4-nitroso-m-cresol, 0-nitrosophenol, 2-nitrolaphenol. Examples include 2-nitrosoresorcin, 4-nitrosoresorcin, p-nitrosophenol, and the like.
次に、上記ナフトール類としては、α−ナフトール、β
−ナフトール、1,2−ナフタレンジオール。Next, the naphthols mentioned above include α-naphthol, β-naphthol,
- Naphthol, 1,2-naphthalenediol.
1.3−ナフタレンジオール、1,4−ナフタレンジオ
ール、1,5−ナフタレンジオール、1.7−ナフタレ
ンジオール、1.8−ナフタレンジオール、2.3−ナ
フタレンジオール、 1,4.5−ナフタレントリオー
ル、 1,2゜5.8−ナフタレンテトラオール等の純
ナフトール類、及びニトロ、ニトロソ、アミノ、ハロゲ
ノi!tAナフトール類、例えば1−クロロ−2−ナフ
トール、2゜4〜ジクロロ−1−ナフトール、1−二ト
ロー2−ナフトール、1.6−シニトロー2−ナフトー
ル、1−ニトロソ−2−ナフトール、2−ニトロソ−1
−ナフトール、1−アミノ−2−ナフトール等が挙げら
れる。1.3-naphthalenediol, 1,4-naphthalenediol, 1,5-naphthalenediol, 1.7-naphthalenediol, 1.8-naphthalenediol, 2.3-naphthalenediol, 1,4.5-naphthalenediol , 1,2゜5.8-Naphthalenetetraol and other pure naphthols, and nitro, nitroso, amino, halogeno i! tA naphthols, such as 1-chloro-2-naphthol, 2°4-dichloro-1-naphthol, 1-nitro-2-naphthol, 1,6-sinitro-2-naphthol, 1-nitroso-2-naphthol, 2- Nitroso-1
-naphthol, 1-amino-2-naphthol, and the like.
上記キノン類としては、p−ベンゾキノン、0−ベンゾ
キノン、1.2−ナフトキノン、1.4−ナフトキノン
、2.6−ナフトキノン、アントラキノン、9゜10−
フェナントレンキノン、ジフェノキノン等の置換基のな
いキノン類、メチル−p−ベンゾキノン、2.3−ジメ
チル−p−ベンゾキノン、2−メチル−1,4−ナフト
キノン、2−メチルアントラキノン等のメチルキノン類
、2.5−ジヒドロキシ−p−ベンゾキノン5テトラヒ
ドロキシ−p−ベンゾキノン、5−ヒドロキシ−1,4
−ナフトキノン、2.3−ジヒドロキシ−1,4−ナフ
トキノン、5.8−ジヒドロキシ−1,4−ナフドキノ
ン、2−ヒドロキシアントラキノン、1゜2−ジとドロ
キシアントラキノン、 1,2.3−1−リヒドロキシ
アントラキノン、 1.2.4− )リヒドロキシアン
トラキノン、 1,2.5− トリヒドロキシアントラ
キノン、 1,2.6−)リヒドロキシアントラキノン
、1゜2.7− )リヒドロキシアントラキノン等のヒ
ドロキシキノン類、2−アミノアントラキノン、1.2
−ジアミノアントラキノン等のアミノキノン類、1−ニ
トロアントラキノン、1.5−ジニトロアントラキノン
等のニトロキノン類、2.6−ジクロロ−p−ベンゾキ
ノン、テトラクロロ−p−ベンゾキノン、テトラブロモ
−p−ベンゾキノン等のハロゲノキノン類、あるいは2
種以上の置換基を有するキノン類、例えば2.5−ジク
ロロ−3,6−ジヒドロキシ−p−ベンゾキノン、1−
メチル−2−ヒドロキシ−1,4−ナフトキノン等が挙
げられる。The above quinones include p-benzoquinone, 0-benzoquinone, 1.2-naphthoquinone, 1.4-naphthoquinone, 2.6-naphthoquinone, anthraquinone, 9゜10-
Quinones without substituents such as phenanthrenequinone and diphenoquinone; methylquinones such as methyl-p-benzoquinone, 2,3-dimethyl-p-benzoquinone, 2-methyl-1,4-naphthoquinone and 2-methylanthraquinone;2. 5-dihydroxy-p-benzoquinone 5-tetrahydroxy-p-benzoquinone, 5-hydroxy-1,4
-naphthoquinone, 2.3-dihydroxy-1,4-naphthoquinone, 5.8-dihydroxy-1,4-naphdoquinone, 2-hydroxyanthraquinone, 1゜2-di-droxyanthraquinone, 1,2.3-1- Hydroxyquinones such as lihydroxyanthraquinone, 1.2.4-)lihydroxyanthraquinone, 1,2.5-trihydroxyanthraquinone, 1,2.6-)lihydroxyanthraquinone, 1゜2.7-)lihydroxyanthraquinone 2-aminoanthraquinone, 1.2
-Aminoquinones such as diaminoanthraquinone, nitroquinones such as 1-nitroanthraquinone and 1,5-dinitroanthraquinone, and halogenoquinones such as 2,6-dichloro-p-benzoquinone, tetrachloro-p-benzoquinone, and tetrabromo-p-benzoquinone. , or 2
Quinones having more than one substituent, such as 2,5-dichloro-3,6-dihydroxy-p-benzoquinone, 1-
Examples include methyl-2-hydroxy-1,4-naphthoquinone.
上記ジアリールケトンとしては、ベンゾフェノン及びそ
の誘導体が挙げられ、例えばベンゾフェノン、4−メチ
ルベンゾフェノン、3−メチルベンゾフェノン、3.4
−ジメチルベンゾフェノン、4゜4′−ジメチルベンゾ
フェノン、 3.4’−ジメチルベンゾフェノン、4−
エチルベンゾフェノン等のアルキル置換体、4−ヒドロ
キシベンゾフェノン。Examples of the diaryl ketone include benzophenone and derivatives thereof, such as benzophenone, 4-methylbenzophenone, 3-methylbenzophenone, 3.4
-dimethylbenzophenone, 4゜4'-dimethylbenzophenone, 3.4'-dimethylbenzophenone, 4-
Alkyl substituted products such as ethylbenzophenone, 4-hydroxybenzophenone.
4.4”−ジヒドロキシベンゾフェノン、 2,3.4
− )ジヒドロキシベンゾフェノン、2.4−ジヒドロ
キシベンゾフェノン、2.2′、5.6’−テトラヒド
ロキシベンゾフェノン、 2.3’、4.4’、6−ペ
ンタヒドロキシベンゾフェノン等のヒドロキシベンゾフ
ェノン類、4−アミノベンゾフェノン、 4.4’−ジ
アミノベンゾフェノン等のアミノベンゾフェノン類、あ
るいは2種以上の置換基を有するベンゾフェノン類、例
えば4−メトキシ−2−ヒドロキシベンゾフェノン、
2.2’−ジヒドロキシ−4−メトキシベンゾフェノン
等が挙げられる。4.4”-dihydroxybenzophenone, 2,3.4
-) Hydroxybenzophenones such as dihydroxybenzophenone, 2.4-dihydroxybenzophenone, 2.2', 5.6'-tetrahydroxybenzophenone, 2.3', 4.4', 6-pentahydroxybenzophenone, 4-amino Benzophenone, aminobenzophenones such as 4'-diaminobenzophenone, or benzophenones having two or more substituents, such as 4-methoxy-2-hydroxybenzophenone,
2.2'-dihydroxy-4-methoxybenzophenone and the like can be mentioned.
上記窒素原子を含む複素環化合物としては、アクリジン
、2.2°、2−テルピリジルネオクプロイン、2.2
”−ジピリジルベンゾトリアゾール、5−メチルベンゾ
トリアゾール、バソフェナンドロリン、1.10−フェ
ナントロリン、アルデヒドコリジン、ベンジルピリジン
、フェニルピリジン、キナゾリン、2−ヘプタデシルイ
ミダゾール等の他、フェノール性水酸基を有する化合物
、例えば4−(2−ピリジルアゾ)−レゾルシン1−(
2−ピリジルアゾ)−2−ナフトール、4−キノリツー
ル、4−メチル−2−キノリツール、8−キノリツール
、キノリンジオール等、カルボキシル基を有する化合物
、例えばキヌレン酸、アクリジン酸、アトファン、キル
ナジン酸、シンコニン酸、イソニコチン!、 2.5−
ピリジンジカルボン酸、キニン酸等、アミノ基又はイミ
ノ基を有する化合物、例えば2−アミノベンズイミダゾ
ール、5−アミノ−IH−テトラゾール。Examples of the nitrogen atom-containing heterocyclic compound include acridine, 2.2°, 2-terpyridylneocuproine, 2.2
"-dipyridylbenzotriazole, 5-methylbenzotriazole, bathophenandroline, 1,10-phenanthroline, aldehyde collidine, benzylpyridine, phenylpyridine, quinazoline, 2-heptadecylimidazole, etc., as well as compounds having a phenolic hydroxyl group , for example 4-(2-pyridylazo)-resorcin 1-(
Compounds having a carboxyl group such as 2-pyridylazo)-2-naphthol, 4-quinolitool, 4-methyl-2-quinolitool, 8-quinolitool, quinolinediol, such as kynurenic acid, acridic acid, atophane, kirnadic acid, cinchoninic acid, Isonicotine! , 2.5-
Compounds having an amino group or imino group such as pyridinedicarboxylic acid and quinic acid, such as 2-aminobenzimidazole and 5-amino-IH-tetrazole.
5−アミノ−I H−1,2,4−トリアゾール、アデ
ニン、グアニン、ルミノール、2−ヒドラジノキノリン
、チアミン等、カルボニル基を有する化合物、例えばり
ボフラビン、テオブロミン、アラントイン、アロキサン
、2−チオバルビッール酸、ビオルル酸、イサチン、ヒ
ダントイン、チミン、バルビッール酸、オロチン酸、ウ
ラシル、スクシンイミド、タレアチニン、2−ピロリド
ン等が挙げられる。5-amino-I H-1,2,4-triazole, adenine, guanine, luminol, 2-hydrazinoquinoline, thiamine, etc. Compounds having a carbonyl group, such as boflavin, theobromine, allantoin, alloxan, 2-thiobarbylic acid , bioluric acid, isatin, hydantoin, thymine, barbylic acid, orotic acid, uracil, succinimide, taleatinin, 2-pyrrolidone, and the like.
上記酸素原子を含む複素環化合物としては、トコフェロ
ール、モリン、ケルセチン、アスコルビン酸、無水1.
8−ナフタル酸、レゾルフィン、コウジ酸、デヒドロ酢
酸、オキサゾール、3−アミノフタルイミド、4−アミ
ノフタルイミド、ウリジン、チミジン、グアノシン、無
水イサト酸等が挙げられる。Examples of the above-mentioned heterocyclic compounds containing an oxygen atom include tocopherol, morin, quercetin, ascorbic acid, anhydride 1.
Examples include 8-naphthalic acid, resorufin, kojic acid, dehydroacetic acid, oxazole, 3-aminophthalimide, 4-aminophthalimide, uridine, thymidine, guanosine, isatoic anhydride, and the like.
上記硫黄原子を含む複素環化合物としては、スルホラン
、3−ヒドロキシスルホラン、3−メチルスルホラン、
スルホレン、3−ヒドロキシスルホレン、3−メチルス
ルホレン、ローダニン、3−アミノローダニン、チアゾ
リン−4−カルボン酸、4H−1,4−チアジン、ビオ
チン、3.6−チオキサンチンジアミン、3,6−チオ
キサンチンジアミン−10,10−ジオキシド等が挙げ
られる。Examples of the above-mentioned heterocyclic compounds containing a sulfur atom include sulfolane, 3-hydroxysulfolane, 3-methylsulfolane,
Sulfolene, 3-hydroxysulfolene, 3-methylsulfolene, rhodanine, 3-aminorhodanine, thiazoline-4-carboxylic acid, 4H-1,4-thiazine, biotin, 3,6-thioxanthine diamine, 3,6 -thioxanthin diamine-10,10-dioxide and the like.
上記メルカプト基を有する化合物としては、2−ベンゾ
オキサゾールチオール、チオフェノール。Examples of the compound having a mercapto group include 2-benzoxazolethiol and thiophenol.
チオサリチル酸、プロパンチオール、チオウラシル、2
,3−キノキサリンジチオール、ジチゾン、チオオキシ
ン、2−ベンズイミダゾールチオール。Thiosalicylic acid, propanethiol, thiouracil, 2
, 3-quinoxalinedithiol, dithizone, thioxin, 2-benzimidazolethiol.
6−チオグアニン、5−ニトロ−2〜ベンズイミダゾ↓
ルチオール、5−アミノ−1,3,4−チアゾール−2
−チオール等が挙げられる。6-thioguanine, 5-nitro-2~benzimidazo↓
Ruthiol, 5-amino-1,3,4-thiazole-2
-Thiol and the like.
上記チオカルボン酸またはその塩としては、ジエチルジ
チオカルバミン酸ナトリウム、エタンチオ酸、ルベアン
酸、チオアセトアミド、エタンジチオ酸等が挙げられる
。Examples of the thiocarboxylic acid or its salt include sodium diethyldithiocarbamate, ethanethioic acid, rubeanic acid, thioacetamide, ethanedithioic acid, and the like.
上記チアゾール系化合物としては、ビスムチオール■、
ジアゾスルフィド、アゾスルフイム、1゜3.4−チア
ジアゾール、ビスムチオール、ビアズチオール、ベンゾ
チアゾール、2−メチルベンゾチアゾール、2−(p−
アミノフェニル)−6−メチルベンゾチアゾール、2−
メルカプトベンゾチアゾール。The above thiazole compounds include bismuthiol■,
Diazosulfide, azosulfime, 1゜3.4-thiadiazole, bismuthiol, biazthiol, benzothiazole, 2-methylbenzothiazole, 2-(p-
aminophenyl)-6-methylbenzothiazole, 2-
Mercaptobenzothiazole.
ベンゾチアゾリン、2−ベンゾチアゾリン、ベンゾチア
ゾロン等が挙げられる。Examples include benzothiazoline, 2-benzothiazoline, benzothiazolone and the like.
また、防錆剤N(4)に添加される極圧剤ば、境界潤滑
領域において部分的に金属接触を生じたとき、これに伴
う摩擦熱によって金属面と反応し、反応生成物被膜を形
成することにより摩擦・摩耗防止作用を行うものであっ
て、ホウ素系掻圧剤。In addition, when the extreme pressure agent added to rust preventive agent N (4) makes partial metal contact in the boundary lubrication area, it reacts with the metal surface due to the accompanying frictional heat, forming a reaction product film. This is a boron-based scratching agent that acts to prevent friction and wear.
リン系極圧剤、イオウ系極圧剤、ハロゲン系橿圧剤、存
機金属系極圧剤、複合型極圧剤等が知られている。Phosphorus-based extreme pressure agents, sulfur-based extreme pressure agents, halogen-based extreme pressure agents, residual metal-based extreme pressure agents, composite extreme pressure agents, and the like are known.
具体的に例示すれば、上記ホウ素系掻圧剤としては、ホ
ウ酸トリブチル、ホウ酸トリオクタデシル、ホウ酸トリ
フェニル、ホウ酸トリトリル、ホウ酸トリエチル、ホウ
酸トリプロピル、ホウ酸トリメンチル等が挙げられる。Specifically, examples of the boron-based scratching agent include tributyl borate, triotadecyl borate, triphenyl borate, tritolyl borate, triethyl borate, tripropyl borate, trimentyl borate, etc. .
上記リン系極圧剤としては、トリブチルホスフェート、
トリオクチルホスフェート、トリー2−エチルへキシル
ホスフェート、トリラウリルホスフェート トリオレイ
ルホスフェート、ジブチルホスフェート、ジオクチルホ
スフェート ジ−2−エチルへキシルホスフェート、ジ
ラウリルホスフェート、ジオレイルホスフェート等のリ
ン酸エステル、トリブチルホスファイト、トリオクチル
ホスファイト、トリー2−エチルへキシルホスファイト
1 トリラウリルホスファイト、トリオレイルホスファ
イト、ジブチルホスファイト、ジオクチルホスファイト
、ジー2−エチルへキシルホスファイト、ジラウリルホ
スファイト、ジオレイルホスファイト等の亜リン酸エス
テル、ジブチルホスフェートブチルアミン塩、ジブチル
ホスフェートオクチルアミン塩、ジブチルホスフェート
ステアリルアミン塩、ジオクチルホスフェートブチルア
ミン塩、ジオクチルホスフェートオクチルアミン塩、ジ
オクチルホスフェートラウリルアミン塩。The above-mentioned phosphorus-based extreme pressure agent includes tributyl phosphate,
Trioctyl phosphate, tri-2-ethylhexyl phosphate, trilauryl phosphate Trioleyl phosphate, dibutyl phosphate, dioctyl phosphate Di-2-ethylhexyl phosphate, dilauryl phosphate, dioleyl phosphate, etc. phosphate esters, tributyl phosphite, Trioctyl phosphite, tri-2-ethylhexyl phosphite 1 trilauryl phosphite, trioleylphosphite, dibutyl phosphite, dioctyl phosphite, di-2-ethylhexyl phosphite, dilauryl phosphite, dioleyl phosphite Phosphite esters such as dibutyl phosphate butylamine salt, dibutyl phosphate octylamine salt, dibutyl phosphate stearylamine salt, dioctyl phosphate butylamine salt, dioctyl phosphate octylamine salt, dioctyl phosphate laurylamine salt.
ジオクチルホスフェートステアリルアミン塩、ジー2−
エチルへキシルホスフェートブチルアミン塩、ジー2−
エチルへキシルホスフェートオクチルアミン塩、ジー2
−エチルへキシルホスフェートラウリルアミン塩、ジー
2−エチルへキシルホスフェートステアリルアミン塩、
ジラウリルホスフェートブチルアミン塩2 ジラウリル
ホスフェートオクチルアミン塩、ジラウリルホスフェー
トラウリルアミン塩、ジラウリルホスフェートステアリ
ルアミン塩、ジオレイルホスフェートブチルアミン塩、
ジオレイルホスフェートオクチルアミン塩、ジオレイル
ホスフェートラウリルアミン塩。Dioctyl phosphate stearylamine salt, di-2-
Ethylhexylphosphate butylamine salt, di-2-
Ethylhexylphosphate octylamine salt, G2
-Ethylhexylphosphate laurylamine salt, di-2-ethylhexylphosphate stearylamine salt,
Dilaurylphosphate butylamine salt 2 Dilaurylphosphate octylamine salt, dilaurylphosphate laurylamine salt, dilaurylphosphate stearylamine salt, dioleylphosphate butylamine salt,
Dioleyl phosphate octylamine salt, dioleyl phosphate laurylamine salt.
ジオレイルホスフェートステアリルアミン塩等のリン酸
エステルアミン塩が挙げられる。Examples include phosphate ester amine salts such as dioleyl phosphate stearyl amine salt.
上記イオウ系極圧剤としては、硫化抹香鯨油、硫黄化ジ
ペンテン等不飽和結合を有する鉱油、油脂や脂肪酸等に
硫黄を加えて加熱することにより製造される硫化油脂類
、二硫化ジベンジル、二硫化ジフェニル、二硫化ジ−t
−ブチル5二硫化ジー5ee−ブチル、二硫化ジ−n−
ブチル、二硫化ジーむ−オクチル、二硫化ジエチル等の
ジサルファイド類、硫化ベンジル、硫化ジフェニル、硫
化ジビニル、硫化ジメチル、硫化ジエチル、硫化ジー1
−ブチル、硫化ジー5ec−ブチル、硫化ジ−n−ブチ
ル等のモノサルファイド類、三硫化ジメチル、三硫化ジ
−t−ブチル、ポリ硫化ジー1−ノニル、オレフィンポ
リサルファイド等のポリサルファイド類、一般式
%式%([)
([)
(但し、式中Rは炭化水素基を表す。)で示されるチオ
カーボネー)[、元素硫黄等が挙げられる。The above-mentioned sulfur-based extreme pressure agents include mineral oils with unsaturated bonds such as sulfurized whale oil and sulfurized dipentene, sulfurized oils and fats produced by adding sulfur to fats and oils and fatty acids, and heating them, dibenzyl disulfide, and disulfide. diphenyl, di-t disulfide
-butyl 5 disulfide di-5ee-butyl, disulfide di-n-
Disulfides such as butyl, octyl disulfide, diethyl disulfide, benzyl sulfide, diphenyl sulfide, divinyl sulfide, dimethyl sulfide, diethyl sulfide, di-1 sulfide
- Monosulfides such as butyl, di-5ec-butyl sulfide, di-n-butyl sulfide, polysulfides such as dimethyl trisulfide, di-t-butyl trisulfide, di-1-nonyl polysulfide, and olefin polysulfide, general formula % Examples include thiocarbonate represented by the formula %([) ([) (wherein R represents a hydrocarbon group)], elemental sulfur, and the like.
上記ハロゲン系極圧剤としては、臭化アリル。The halogen-based extreme pressure agent is allyl bromide.
臭化オクタデシル、臭化シクロヘキシル、臭化ステアリ
ル、臭化ベンジル等の臭素化合物、ヨウ化ベンジル、ヨ
ウ化アリル、ヨウ化ブチル、ヨウ化オクタデシル、ヨウ
化シクロヘキシル等のヨウ1化合物、ヘキサクロロエタ
ン、モノクロルエタン。Bromine compounds such as octadecyl bromide, cyclohexyl bromide, stearyl bromide, benzyl bromide, io-1 compounds such as benzyl iodide, allyl iodide, butyl iodide, octadecyl iodide, cyclohexyl iodide, hexachloroethane, monochloroethane .
塩素化パラフィン、塩素化ジフェニル、塩素化油脂、メ
チルトリクロロステアレート、ペンタクロロペンタジェ
ン酸、ヘキサクロルナフテン酸化合物のエステル、ヘキ
サクロルナフテン酸化合物のイミド誘導体等の塩素化合
物が挙げられる。Examples include chlorine compounds such as chlorinated paraffin, chlorinated diphenyl, chlorinated fats and oils, methyl trichlorostearate, pentachloropentadienoic acid, esters of hexachloronaphthenic acid compounds, and imide derivatives of hexachloronaphthenic acid compounds.
上記有機金属系極圧剤としては、ジイソブチルジチオリ
ン酸亜鉛、イソブチルペンチルジチオリン酸亜鉛、イソ
プロピル−1−メチルブチルジチオリン酸亜鉛、イソブ
チルノニルフェニルジチオリン酸亜鉛、イソブチルヘプ
チルフェニルジチオリン酸亜鉛、ジヘプチルフェニルジ
チオリン酸亜鉛、ジノニルフェニルジチオリン酸亜鉛、
モリブデンジチオフォスフェート等のチオリン酸塩類、
ジメチルジチオカルバミン酸亜鉛、ジエチルジチオカル
バミン酸亜鉛、ジブチルジチオカルバミン酸亜鉛、エチ
ルフェニルジチオカルバミン酸亜鉛。The organometallic extreme pressure agents include zinc diisobutyldithiophosphate, zinc isobutylpentyldithiophosphate, zinc isopropyl-1-methylbutyldithiophosphate, zinc isobutylnonylphenyldithiophosphate, zinc isobutylheptylphenyldithiophosphate, and zinc diheptylphenyldithiophosphate. Zinc, dinonylphenyl dithiophosphate zinc,
thiophosphates such as molybdenum dithiophosphate,
Zinc dimethyldithiocarbamate, zinc diethyldithiocarbamate, zinc dibutyldithiocarbamate, zinc ethylphenyldithiocarbamate.
ジベンジルジチオカルバミン酸亜鉛、ジメチルジチオカ
ルバミン酸亜鉛、ジメチルジチオカルバミン鍍銅、ジメ
チルジチオカルバミン酸鉄、ジエチルジチオカルバミン
酸セレン、ジエチルジチオカルバミン酸銀等のチオカル
バミン酸塩類、モリブデン、アンチモン等の金属アルキ
ルジチオカルバミン酸塩類、等が挙げられる。Thiocarbamates such as zinc dibenzyldithiocarbamate, zinc dimethyldithiocarbamate, copper plated dimethyldithiocarbamate, iron dimethyldithiocarbamate, selenium diethyldithiocarbamate, silver diethyldithiocarbamate, metal alkyldithiocarbamates such as molybdenum and antimony, etc. Can be mentioned.
上記複合型極圧剤としては、ジー2−エチルへキシルチ
オリン酸アミン等のジアルキルチオリン酸アミン類、塩
化プロピルホスフェート臭化プロピルホスフェート、ヨ
ウ化プロピルホスフェート、塩化ブチルホスフェート、
臭化ブチルホスフェート、ヨウ化ブチルホスフェート等
に代表されるハロゲン化アルキルのリン酸エステル類、
クロロナフサザンテート等の他、一般式
%式%()
(但し、各一般式中Rは水素原子またはアルキル基、ア
ルケニル基、アリール基を表す、)で示されるチオフォ
スフェート[、一般式(但し、式中Rは水素原子または
アルキル基、アルケニル基、了り−ル基を表す。)
で示されるチオフォスファイト類等が効果が高い。Examples of the composite extreme pressure agent include dialkylthiophosphate amines such as di-2-ethylhexylthiophosphate amine, propyl chloride, propyl bromide, propyl iodide, butyl chloride,
Phosphate esters of alkyl halides such as butyl bromide phosphate, butyl iodide phosphate, etc.
In addition to chloronaphsanthate, thiophosphates represented by the general formula % () (wherein R in each general formula represents a hydrogen atom, an alkyl group, an alkenyl group, or an aryl group) , in which R represents a hydrogen atom, an alkyl group, an alkenyl group, or an aryol group) are highly effective.
上述の極圧剤は単体で使用してもよいが、2種以上を混
合して使用することも可能である。The above-mentioned extreme pressure agents may be used alone, but it is also possible to use a mixture of two or more types.
一方、上記潤滑剤層(3)は、潤滑剤を塗布してなるも
ので、必要に応じて極圧剤を添加してもよい、その添加
量は潤滑剤に対して極圧剤10〜30重■%の範囲内と
する。上記潤滑剤N(3)には、前述の防錆剤を添加し
、さらに防錆効果を向上させてもよい。該潤滑剤層(3
)を上記防錆剤層(4)上に塗布形成する場合には、そ
の塗布量は磁気記録媒体1−当り0.5〜100■程度
が好ましく、1〜20■/イであるのがより好ましい。On the other hand, the lubricant layer (3) is formed by applying a lubricant, and if necessary, an extreme pressure agent may be added thereto. The weight shall be within the range of %. The above-mentioned rust preventive agent may be added to the lubricant N(3) to further improve the rust preventive effect. The lubricant layer (3
) is coated on the rust preventive layer (4), the coating amount is preferably about 0.5 to 100 cm per 1 of the magnetic recording medium, and more preferably 1 to 20 cm per square. preferable.
この塗布量が余り少なすぎると潤滑効果が顕れず、一方
あまり多すぎると摺動部材と強磁性金属薄膜との間で貼
付き現象が起こり走行性が悪化してしまう。If the coating amount is too small, the lubricating effect will not be apparent, while if it is too large, a sticking phenomenon will occur between the sliding member and the ferromagnetic metal thin film, resulting in poor running performance.
上記潤滑剤層(3)で使用可能な潤滑剤としては、従来
公知の通常の潤滑剤が使用でき、例えば脂肪酸またはそ
の金属塩、脂肪酸アミド、脂肪酸エステル、脂肪族アル
コールまたはそのアルコキシド、脂肪族アミン、多価ア
ルコール、ソルビタンエステル、マンニソタンエステル
、硫黄化脂肪酸、脂肪族メルカプタン、変性シリコーン
オイル、パーフルオロアルキルエチレンオキシド、パー
フルオロポリエーテル類、高級アルキルスルホン酸また
はその金属塩、パーフルオロアルキルスルホン酸または
そのアンモニウム塩あるいはその金属塩、パーフルオロ
アルキルカルボン酸またはこれら金属塩(カルボン酸パ
ーフルオロアルキルエステルまたはパーフルオロアルキ
ルカルボン酸エステル等が例示され、これらを単独、も
しくは2種以上を混合して使用すればよい、勿論、使用
可能な潤滑剤はこれらに限らず、従来公知のものがいず
れも使用可能であることは言うまでもない。As the lubricant that can be used in the lubricant layer (3), conventionally known ordinary lubricants can be used, such as fatty acids or metal salts thereof, fatty acid amides, fatty acid esters, fatty alcohols or alkoxides thereof, and fatty amines. , polyhydric alcohols, sorbitan esters, mannisotan esters, sulfurized fatty acids, aliphatic mercaptans, modified silicone oils, perfluoroalkyl ethylene oxides, perfluoropolyethers, higher alkyl sulfonic acids or their metal salts, perfluoroalkyl sulfonic acids or its ammonium salt or its metal salt, perfluoroalkylcarboxylic acid or these metal salts (carboxylic acid perfluoroalkyl ester or perfluoroalkylcarboxylic acid ester, etc. are exemplified, and these are used alone or in a mixture of two or more types) Of course, the usable lubricants are not limited to these, and it goes without saying that any conventionally known lubricants can be used.
特に、パーフルオロポリエーテル、カルボン酸パーフル
オロアルキルエステル、パーフルオロアルキルカルボン
酸エステルは、低温特性に優れているため、これらを潤
滑剤の一部として用いることによって使用温度域の拡大
が図れる。In particular, perfluoropolyethers, perfluoroalkyl carboxylic acid esters, and perfluoroalkyl carboxylic acid esters have excellent low-temperature properties, so by using these as part of the lubricant, the operating temperature range can be expanded.
上記パーフルオロポリエーテルとしては、−aCF、云
OCF (CF s) CF x→=rモOCF a−
T→CF sや、一般式
%式%
(上記一般式中のX+ 3’、q−rは整数で、いず
れも40〜500の範囲内にあるものが好ましい、)で
表されるポリエーテルやこれらポリエーテルの分子末端
に水酸基、カルボキシル基、リン酸基。The above-mentioned perfluoropolyethers include -aCF, 云OCF (CF s) CF x→=rmoOCF a-
T→CF s, polyether represented by the general formula % (X+ 3', qr in the above general formula are integers, preferably within the range of 40 to 500), These polyethers have hydroxyl, carboxyl, and phosphoric acid groups at the molecular ends.
スルホン酸基またはこれらの塩、エステル基等の極性基
が導入されたもの等が挙げられ、優れた潤滑性の他、耐
酸化性を有するものである。具体的には、例えばモンテ
ジソン社製、商品名フォンプリン、デュポン社製、商品
名タライトソクス等が挙げられる。Examples include those into which polar groups such as sulfonic acid groups, salts thereof, and ester groups have been introduced, and have excellent lubricity and oxidation resistance. Specifically, examples include Fonprin, a product manufactured by Montegisson, and Talite Sox, a product manufactured by DuPont.
上記カルボン酸パーフルオロアルキルエステルは、一般
式
(但し、上記一般式において、n≧4、m≦2n+1、
j≧0、k≧3である。)
で表される化合物である。ここで、カルボン酸の脂肪族
炭化水素基(−C,lH,)のnの数としては4以上で
あればよいが、好ましくは12以上である。The above carboxylic acid perfluoroalkyl ester has the general formula (however, in the above general formula, n≧4, m≦2n+1,
j≧0, k≧3. ) is a compound represented by Here, the number of n in the aliphatic hydrocarbon group (-C, lH,) of the carboxylic acid may be 4 or more, but preferably 12 or more.
また、この脂肪族炭化水素基としては、飽和、不飽和の
何れでもよく、直鎖状であっても側鎖を存していてもよ
い。Further, this aliphatic hydrocarbon group may be either saturated or unsaturated, and may be linear or have a side chain.
具体的には、例えばオレイン酸ペンタデカフルオロオク
チルエステル、リルン酸ペンタデカフルオロオクチルエ
ステル、リノール酸ペンタデカフルオロオクチルエステ
ル、リノール酸ノナデカフルオロデシルエステル、イソ
ステアリン酸ノナデカフルオロデシルエステル、ブタン
酸ペンタデカフルオロデシルエステル等が挙げられる。Specifically, for example, oleic acid pentadecafluorooctyl ester, lylunic acid pentadecafluorooctyl ester, linoleic acid pentadecafluorooctyl ester, linoleic acid nonadecafluorodecyl ester, isostearic acid nonadecafluoroodecyl ester, butanoic acid pentadeca Examples include fluorodecyl ester.
上記パーフルオロアルキルカルボン酸エステルは、一般
式
数1〜25の炭化水素基を表す。)
で示される化合物である。The above-mentioned perfluoroalkyl carboxylic acid ester represents a hydrocarbon group having a general formula number of 1 to 25. ) is a compound represented by
具体的には、例えばノナデカフルオロデカン酸イソステ
アリルエステル、ペンタデ力フルオロオクタン酸イソス
テアリルエステル、ペンタデカフルオロオクタン酸イソ
ノニルエステル、ペンタデカフルオロオクタン酸すルイ
ルエステル、ノナデカフルオロデカン酸すルイルエステ
ル、ノナデカフルオロデカン酸すルニルエステル等が挙
げられる。Specifically, for example, nonadecafluorodecanoic acid isostearyl ester, pentadecafluorooctanoic acid isostearyl ester, pentadecafluorooctanoic acid isononyl ester, pentadecafluorooctanoic acid sulfur ester, nonadecafluorooctanoic acid sulfur ester , nonadecafluorodecanoic acid runyl ester, and the like.
また、磁気ヘッドと磁気記録媒体の摺動摩擦による磁気
ヘッドの偏摩耗を防止するために、アミンボランを添加
してもよい、その添加量は潤滑剤に対してアミンボラン
10〜30重量%の範囲内とする。In addition, in order to prevent uneven wear of the magnetic head due to sliding friction between the magnetic head and the magnetic recording medium, amine borane may be added.The amount of amine borane added is within the range of 10 to 30% by weight of the lubricant. do.
使用可能なアミンボランとしては例えば、■ジメチルア
ミンボラン((C1,) xHN−BHり )■ピリジ
ンボラン(CsHsN−BH3)0モルフォリンボラン
(0(CHtCL)NトB113 )■トリメチルアミ
ンボラン((CH3)3N−BHi )■トリエチルア
ミンボラン((CzHs)J−BHs)■t−ブチルア
ミンポラン((Cut) scNHg ’ BHi)■
N、N−ジメチルアニリンボラン(C−RsN(CtH
%)諺・88.)@’;イア7’oヒル7 ミ7ホ−y
ンC((CIliLCH) tNト811s)■アン
モニアポラン(NH,・BH3)[相]モノメチルアミ
ンボラン((Ct13)N)lz・B11.)等が挙げ
られる。Examples of amine borane that can be used include: ■ dimethylamine borane ((C1,) 3N-BHi)■Triethylamineborane ((CzHs)J-BHs)■t-butylamineporane ((Cut) scNHg' BHi)■
N,N-dimethylanilineborane (C-RsN(CtH
%) Proverb 88. ) @'; ia 7'o hill 7 mi 7 ho-y
C ((CIliLCH) tNt811s) ■ Ammoniaporane (NH,.BH3) [Phase] Monomethylamine borane ((Ct13)N)lz.B11. ) etc.
上記潤滑剤N(3)には、上記潤滑剤やアミンボランの
他、必要に応じて極圧剤や防錆剤を添加してもよい。上
記極圧剤や防錆剤は、前述の防錆剤N(4)に添加でき
るものと同様なものが使用可能であり、所定の特性が得
られるように適宜選択すればよい。In addition to the above-mentioned lubricant and amine borane, an extreme pressure agent and a rust preventive agent may be added to the above-mentioned lubricant N(3) as necessary. As the extreme pressure agent and rust preventive agent, the same ones as those that can be added to the above-mentioned rust preventive agent N(4) can be used, and they may be appropriately selected so as to obtain predetermined characteristics.
本発明が適用される磁気記録媒体は、非磁性支持体上に
磁性層として強磁性金属薄膜を設けたものであるが、こ
こで非磁性支持体の素材としては、ポリエチレンテレフ
タレート等のポリエステル類、ポリエチレン、ポリプロ
ピレン等のポリオレフィン類、セルローストリアセテー
トセルロースダイアセテート、セルロースアセテートブ
チレート等のセルロース誘導体、ポリ塩化ビニル、ポリ
塩化ビニリデン等のビニル系樹脂、ポリカーボネート、
ポリイミド、ポリアミドイミド等のプラスチック、アル
ミニウム合金、チタン合金等の軽金属、アルミナガラス
等のセラミックス等が挙げられる。The magnetic recording medium to which the present invention is applied is one in which a ferromagnetic metal thin film is provided as a magnetic layer on a non-magnetic support, and the material for the non-magnetic support may include polyesters such as polyethylene terephthalate, Polyolefins such as polyethylene and polypropylene, cellulose derivatives such as cellulose triacetate, cellulose diacetate, and cellulose acetate butyrate, vinyl resins such as polyvinyl chloride and polyvinylidene chloride, polycarbonate,
Examples include plastics such as polyimide and polyamideimide, light metals such as aluminum alloys and titanium alloys, and ceramics such as alumina glass.
この非磁性支持体の形態としては、フィルム、シート、
ディスク、カード、ドラム等のいずれでもよい。The forms of this non-magnetic support include film, sheet,
It may be a disk, card, drum, etc.
上記非磁性支持体には、その表面に山状突起やしわ枝突
起9粒状突起等の突起を1種以上を形成し、表面粗さを
コントロールしてもよい。The surface roughness of the non-magnetic support may be controlled by forming one or more types of protrusions such as mountain-like protrusions and 9-grain protrusions on the surface of the non-magnetic support.
上記山状突起は、例えば高分子フィルム製膜時に粒径5
00〜3000人程度の無81微粒子を内添することに
より形成され、高分子フィルム表面からの高さは100
〜1000人、密度はおよそlXl0’〜l0XIO’
個/ 1m ”とする。山状突起を形成するために使用
される無機微粒子としては、炭酸カルシウム(CaCO
s)やシリカ、アルミナ等が好適である。For example, the above-mentioned mountain-like protrusions have a particle size of 5 when forming a polymer film.
It is formed by internally adding 0.00 to 3000 particles, and the height from the surface of the polymer film is 100.
~1000 people, density approximately lXl0'~l0XIO'
pieces/1m”.The inorganic fine particles used to form the mountain-like protrusions include calcium carbonate (CaCO
S), silica, alumina, etc. are suitable.
上記しわ状突起は、例えば特定の混合溶媒を用いた樹脂
の希薄溶液を塗布乾燥することにより形成される起伏で
あって、その高さは0.01〜10μm、好ましくは0
.03〜0.5μm、突起間の最短間隔は0.1〜20
μmとする。このしわ状突起を形成するための樹脂とし
ては、ポリエチレンテレフタレート、ポリエチレンナフ
タレート等の飽和ポリエステル、ポリアミド、ポリスチ
ロール、ポリカーボネート、ポリアクリレート、ポリス
ルホン、ポリエーテルスルホン、ポリ塩化ビニル、ポリ
塩化ビニリデン、ポリビニルブチラール、ポリフェニレ
ンオキサイド、フェノキシ樹脂等の各種樹脂の単体、混
合体または共重合体であり、可溶性溶剤を有するものが
適している。そして、これらの樹脂をその良溶媒に溶解
せしめた樹脂濃度1〜11000ppの溶液に、その樹
脂の貧溶媒であって前記良溶媒より高い沸点を有する溶
媒を樹脂に対して10〜100倍量添加した溶液を、高
分子フィルムの表面に塗布・乾燥することにより、非常
に微細なしわ状凹凸を有する”i1層を得ることができ
る。The wrinkle-like protrusions are undulations formed by, for example, applying and drying a dilute solution of resin using a specific mixed solvent, and the height thereof is 0.01 to 10 μm, preferably 0.
.. 03~0.5μm, the shortest distance between protrusions is 0.1~20
Let it be μm. Examples of resins used to form these wrinkle-like projections include saturated polyesters such as polyethylene terephthalate and polyethylene naphthalate, polyamides, polystyrene, polycarbonates, polyacrylates, polysulfones, polyethersulfones, polyvinyl chloride, polyvinylidene chloride, and polyvinyl butyral. A single substance, a mixture, or a copolymer of various resins such as polyphenylene oxide, phenoxy resin, etc., and those having a soluble solvent are suitable. Then, a solvent that is a poor solvent for the resin and has a boiling point higher than the good solvent is added in an amount of 10 to 100 times the amount of the resin to a solution in which these resins are dissolved in the good solvent and the resin concentration is 1 to 11,000 pp. By applying and drying the solution on the surface of a polymer film, an "i1 layer" having very fine wrinkle-like irregularities can be obtained.
粒状突起は、アクリル樹脂等の有機超微粒子またはシリ
カ、金属粉等の無機微粒子を球状あるいは半球状に付着
させることにより形成される。この粒状突起の高さは、
50〜500人、密度は1XIO’ 〜50X10b個
/la” i度トスル。The granular protrusions are formed by attaching organic ultrafine particles such as acrylic resin or inorganic fine particles such as silica or metal powder in a spherical or semispherical shape. The height of this granular protrusion is
50 to 500 people, density 1XIO' to 50X10b/la'' i degree tossle.
これら突起の少なくとも一種以上を形成すれば磁性層で
ある強磁性金属薄膜の表面性が制御されるが、2種以上
を組み合わせることにより効果が増し、特に山状突起を
設けたベースフィルム上にしわ状突起とつぶ状突起を形
成すれば、極めて耐久性、走行性が改善される。The surface properties of the ferromagnetic metal thin film that is the magnetic layer can be controlled by forming at least one type of these protrusions, but the effect is enhanced by combining two or more types. By forming the protrusions and the protrusions, durability and running properties are greatly improved.
この場合、突起の全体としての高さは、100〜200
0人の範囲内であることが好ましく、その密度はln+
”当り平均で1×105〜1×10?個であることが好
ましい。In this case, the overall height of the protrusion is 100 to 200
The density is preferably within the range of 0 people, and the density is ln+
It is preferable that the average number of particles per unit is 1 x 105 to 1 x 10?.
また、上記磁性層である強磁性金属薄膜は、真空蒸着法
やイオンブレーティング法、スパッタリング法等の真空
薄膜形成技術により連続膜として形成される。Further, the ferromagnetic metal thin film that is the magnetic layer is formed as a continuous film by a vacuum thin film forming technique such as a vacuum evaporation method, an ion blating method, or a sputtering method.
上記真空蒸着法は、10−’〜10−”Torrの真空
下で強磁性金属材料を抵抗加熱、高周波加熱、電子ビー
ム加熱等により蒸発させ、ディスク基板上に蒸発金属(
強磁性金属材料)を沈着するというものであり、一般に
高い抗磁力を得るため基板に対して上記強磁性金属材料
を斜めに蒸着する斜方蒸着法が採用される。あるいは、
より高い抗磁力を得るために酸素雰凹気中で上記蒸着を
行うものも含まれる。In the vacuum evaporation method described above, a ferromagnetic metal material is evaporated by resistance heating, high frequency heating, electron beam heating, etc. under a vacuum of 10-' to 10-'' Torr, and the evaporated metal (
Generally, in order to obtain a high coercive force, an oblique evaporation method is employed in which the ferromagnetic metal material is deposited obliquely to the substrate. or,
It also includes those in which the vapor deposition is performed in an oxygen atmosphere in order to obtain higher coercive force.
上記イオンブレーティング法も真空蒸着法の一種であり
、10−4〜10−’Torrの不活性ガス雰囲気中で
DCグロー放電、RFグロー放電を起こして、放電中で
上記強磁性金属材料を蒸発させるというものである。The above-mentioned ion brating method is also a type of vacuum deposition method, in which DC glow discharge and RF glow discharge are caused in an inert gas atmosphere of 10-4 to 10-' Torr, and the above-mentioned ferromagnetic metal material is evaporated during the discharge. It is to let them do so.
上記スパッタリング法は、10−’〜10−’Torr
のアルゴンガスを主成分とする雰囲気中でグロー放電を
起こし、生じたアルゴンガスイオンでターゲット表面の
原子をたたき出すというものであり、グロー放電の方法
により直流2極、3極スパツク法や、高周波スパッタ法
、またはマグネトロン放電を利用したマグネトロンスパ
ッタ法等がある。The above sputtering method uses 10-' to 10-' Torr.
A glow discharge is caused in an atmosphere mainly composed of argon gas, and the generated argon gas ions are used to knock out atoms on the target surface. method, or magnetron sputtering method using magnetron discharge.
このスパッタリング法による場合には、CrやW。In the case of this sputtering method, Cr or W is used.
V等の下地膜を形成しておいてもよい。A base film such as V may be formed in advance.
なお、上記いずれの方法においても、基板上にあらかじ
めBl、 Sb、 Pb、 Sn、 Ga、 I
n。In any of the above methods, Bl, Sb, Pb, Sn, Ga, I
n.
Cd、Ge、Si、TI等の下地金属層を被着形成して
おき、基板面に対して垂直方向から成膜することにより
、磁気異方性の配向かなく面内等方法に優れた磁性層を
形成することができ、例えば磁気ディスクとする場合に
は好適である。By pre-depositing a base metal layer such as Cd, Ge, Si, TI, etc., and depositing the film in a direction perpendicular to the substrate surface, excellent magnetic properties can be achieved in an in-plane manner without magnetic anisotropy orientation. It is suitable for forming a layer, for example, into a magnetic disk.
このような真空薄膜形成技術により金属磁性薄膜を形成
する際に、使用される強磁性金属材料としては、Fe、
Co、Ni等の金属の他に、C。When forming a metal magnetic thin film using such vacuum thin film forming technology, the ferromagnetic metal materials used include Fe,
In addition to metals such as Co and Ni, C.
−Ni合金、Co−Pt合金、Co−Ni−Pt合金、
Fe−Co合金、Fe−Ni合金、Fe−Co−Ni合
金、 Fe−Co−B合金、 Co−N1−Fe−B
合金、Co−Cr合金あるいはこれらにCr、A1等の
金属が含有されたもの等が挙げられる。特に、Co−C
r合金を使用した場合には、垂直磁化膜が形成される。-Ni alloy, Co-Pt alloy, Co-Ni-Pt alloy,
Fe-Co alloy, Fe-Ni alloy, Fe-Co-Ni alloy, Fe-Co-B alloy, Co-N1-Fe-B
Examples include alloys, Co-Cr alloys, and those containing metals such as Cr and A1. In particular, Co-C
When r-alloy is used, a perpendicularly magnetized film is formed.
このような手法により形成される磁性層の膜厚は、0.
04〜1μm程度である。The thickness of the magnetic layer formed by such a method is 0.
It is about 0.04 to 1 μm.
また、非磁性支持体の前記磁性層が設けられる面とは反
対側の面に、いわゆるバックコート層を形成してもよい
。バックコート層は、結合剤樹脂と粉末成分とを有機溶
媒に混合分散させたバックコート用塗料を非磁性支持体
面に塗布することにより形成される。Furthermore, a so-called back coat layer may be formed on the surface of the nonmagnetic support opposite to the surface on which the magnetic layer is provided. The back coat layer is formed by coating the surface of the nonmagnetic support with a back coat paint in which a binder resin and a powder component are mixed and dispersed in an organic solvent.
ここで、バックコート用塗料に使用される結合剤樹脂と
しては、例えば塩化ビニル−酢酸ビニル系共重合体、塩
化ビニル−塩化ビニリデン共重合体、塩化ビニル−アク
リロニトリル共重合体、アクリル酸エステル−アクリロ
ニトリル共重合体、熱可塑性ポリウレタンエラストマー
、ポリフッ化ビニル、塩化ビニリデン−アクリロニトリ
ル共重合体、ブタジェン−アクリロニトリル共重合体、
ポリアミド樹脂、ポリビニルブチラール、セルロース誘
導体、ポリエステル樹脂、ポリブタジェン等の合成ゴム
系樹脂、フェノール樹脂、エポキシ樹脂、ポリウレタン
硬化型樹脂、メラミン樹脂、アルキッド樹脂、シリコー
ン樹脂、アクリル系反応樹脂、エポキシ−ポリアミド樹
脂、ニトロセルロース−メラミン樹脂、高分子量ポリエ
ステル樹脂とイソシアナートプレポリマーの混合物、メ
タクリル酸塩共重合体とジイソシアナートプレボリマー
の混合物、ポリエステルポリオールとポリイソシアナー
トとの混合物、尿素ホルムアルデヒド樹脂、低分子量グ
リコール/高分子lジオール/トリフェニルメタントリ
イソシアナートの混合物、ポリアミン樹脂及びこれらの
混合物等が挙げられる。Examples of the binder resin used in the back coat paint include vinyl chloride-vinyl acetate copolymer, vinyl chloride-vinylidene chloride copolymer, vinyl chloride-acrylonitrile copolymer, and acrylic ester-acrylonitrile copolymer. copolymer, thermoplastic polyurethane elastomer, polyvinyl fluoride, vinylidene chloride-acrylonitrile copolymer, butadiene-acrylonitrile copolymer,
Synthetic rubber resins such as polyamide resins, polyvinyl butyral, cellulose derivatives, polyester resins, and polybutadiene, phenolic resins, epoxy resins, polyurethane curable resins, melamine resins, alkyd resins, silicone resins, acrylic reaction resins, epoxy-polyamide resins, Nitrocellulose-melamine resins, mixtures of high molecular weight polyester resins and isocyanate prepolymers, mixtures of methacrylate copolymers and diisocyanate prepolymers, mixtures of polyester polyols and polyisocyanates, urea formaldehyde resins, low molecular weight glycols /polymeric diol/triphenylmethane triisocyanate mixture, polyamine resin, and mixtures thereof.
あるいは、粉末成分の分散性の改善を図るために、親水
性極性基を持った結合剤樹脂を使用してもよい。Alternatively, a binder resin having a hydrophilic polar group may be used to improve the dispersibility of the powder component.
具体的には、−go迷−0503M、 C00M、−
ド(OM’)*(式中、Mは水素原子またはアルカリ金
属を表し、M゛は水素原子、アルカリ金属または炭化水
素基を表す、)から選ばれた親水性極性基を導入したポ
リウレタン樹脂、ポリエステル樹脂、塩化ビニル−酢酸
ビニル系共重合体、塩化ビニリデン系共重合体、アクリ
ル酸エステル系共重合体、ブタジェン系共重合体等が使
用可能である。Specifically, -go-maze-0503M, C00M, -
polyurethane resin into which a hydrophilic polar group selected from (OM') * (wherein M represents a hydrogen atom or an alkali metal, and M represents a hydrogen atom, an alkali metal or a hydrocarbon group); Polyester resins, vinyl chloride-vinyl acetate copolymers, vinylidene chloride copolymers, acrylic ester copolymers, butadiene copolymers, etc. can be used.
上記親水性極性基の導入方法としては、樹脂の種類に応
じて種々の方法が考えられるが、例えばポリウレタン樹
脂やポリエステル樹脂に上記親水性冷性基を導入するに
は次のような方法によればよい。Various methods can be used to introduce the above-mentioned hydrophilic polar groups depending on the type of resin. For example, the following methods can be used to introduce the above-mentioned hydrophilic cold groups into polyurethane resins and polyester resins. Bye.
(11ポリウレタン又はポリエステルの原料である2塩
基酸あるいはポリオール等に前記親水性極性基を予め導
入しておく方法。(11 A method in which the hydrophilic polar group is introduced in advance into a dibasic acid, polyol, etc. that is a raw material for polyurethane or polyester.
(2)末端若しくは側鎖にOH基を残存させておき、こ
のOH基を親水性極性基を持った化合物により変性する
方法。(2) A method in which an OH group is left at the terminal or side chain, and this OH group is modified with a compound having a hydrophilic polar group.
(2)の方法による場合には、
+21−1
分子中に親水性極性基とハロゲン(例えば塩素)を含存
する化合物と、原料に多官能のポリオールを用いポリマ
ー鎖の末端若しくは側鎖にOH基が残存したポリウレタ
ン樹脂またはポリエステル樹脂とを、両成分が溶解性の
あるジメチルホルムアミド、ジメチルスルホキシド等の
溶剤に溶解し、とリジン、ピコリン、トリエチルアミン
等のアミン類やエチレンオキサイド、プロピレンオキサ
イド等のエポキシ化合物等の脱塩酸剤の存在下での0H
基と塩素との脱塩酸反応により親水性極性基を導入する
方法。In the case of method (2), +21-1 a compound containing a hydrophilic polar group and a halogen (e.g. chlorine) in the molecule, and a polyfunctional polyol as a raw material, and an OH group at the end or side chain of the polymer chain. The remaining polyurethane resin or polyester resin is dissolved in a solvent such as dimethylformamide or dimethyl sulfoxide in which both components are soluble, and amines such as lysine, picoline, triethylamine, and epoxy compounds such as ethylene oxide and propylene oxide are dissolved. 0H in the presence of a dehydrochlorination agent such as
A method of introducing a hydrophilic polar group through a dehydrochlorination reaction between the group and chlorine.
+2+−2
分子中に親水性極性基とOH基とを含育する化合物と、
ポリマー鎖の末端若しくは側鎖にOH基が残存したポリ
ウレタン樹脂またはポリエステル樹脂とを、ジイソシア
ナート化合物を介して反応させる方法。+2+-2 A compound containing a hydrophilic polar group and an OH group in the molecule,
A method of reacting a polyurethane resin or a polyester resin in which an OH group remains at the end or side chain of a polymer chain via a diisocyanate compound.
がある。There is.
また、上記共重合体系結合剤樹脂に親水性極性基を導入
するには、
(3)共重合モノマーとして、親水性極性基及び共重合
可能な二重結合を存する化合物を使用する方法。In order to introduce a hydrophilic polar group into the copolymer-based binder resin, (3) a method of using a compound having a hydrophilic polar group and a copolymerizable double bond as a copolymerizable monomer.
(4)共重合モノマーとして、活性水素及び共重合可能
な二重結合を有する化合物を使用し、共重合体の側鎖に
上記活性水素を導入しておき、親木性極性基及び上記活
性水素と反応可能な基を有する化合物により変性する方
法。(4) As a copolymerizable monomer, a compound having active hydrogen and a copolymerizable double bond is used, and the above active hydrogen is introduced into the side chain of the copolymer. A method of modifying with a compound having a group capable of reacting with.
(5)共重合モノマーとして、活性水素と反応可能な基
及び共重合可能な二重結合を有する化合物を使用し、共
重合体の側鎖に上記活性水素と反応可能な基を導入して
おき、親水性極性基及び上記活性水素を存する化合物に
より変性する方法。(5) As a copolymerization monomer, use a compound having a group that can react with active hydrogen and a double bond that can be copolymerized, and introduce the group that can react with active hydrogen into the side chain of the copolymer. , a method of modification with a compound containing a hydrophilic polar group and the above-mentioned active hydrogen.
等が挙げられる。etc.
一方、上記粉末成分としては、導電性を付与するための
カーボン系微粉末(例えば、ファーネスカーボン、チャ
ンネルカーボン、アセチレンカーボン、サーマルカーボ
ン、ランプカーボン等が挙げられるが、なかでもファー
ネスカーボンやサーマルカーボンが好適である。)、無
機顔料(表面粗度のコントロール及び耐久性向上のため
に添加されるα−Fe0OH,α−Ferns + C
rzOs + T iOg + ZnO,S r O+
SiO□Sing・21(go、AhOs・2SiO□
・21110 、3台go・4510g ・HIO2M
gC0+ ・Mg(OH) t ・3HtOtAlzQ
+、CaC01+MgC0z、5btOs等)が挙げら
れる。On the other hand, the above-mentioned powder component includes carbon-based fine powder for imparting conductivity (for example, furnace carbon, channel carbon, acetylene carbon, thermal carbon, lamp carbon, etc., among which furnace carbon and thermal carbon are used). ), inorganic pigments (α-Fe0OH, α-Ferns + C added to control surface roughness and improve durability)
rzOs + T iOg + ZnO, S r O+
SiO□Sing・21(go, AhOs・2SiO□
・21110, 3 units go・4510g ・HIO2M
gC0+ ・Mg(OH) t ・3HtOtAlzQ
+, CaC01+MgC0z, 5btOs, etc.).
さらに、上記バックコート用塗料の有機溶剤としては、
アセトン、メチルエチルケトン、メチルイソブチルケト
ン、シクロヘキサノン等のケトン系溶剤、酢酸メチル、
酢酸エチル、酢酸ブチル。Furthermore, as the organic solvent for the above-mentioned back coat paint,
Ketone solvents such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, methyl acetate,
Ethyl acetate, butyl acetate.
乳酸エチル、酢酸グリコールモノエチルエーテル等のエ
ステル系溶剤、グリコールジメチルエーテル、グリコー
ルモノエチルエーテル、ジオキサン等のグリコールエー
テル系溶剤、ベンゼン、トルエン、キシレン等の芳香族
炭化水素系溶剤、ヘキサン、ヘプタン等の脂肪族炭化水
素系溶剤、メチレンクロライド、エチレンクロライド、
四塩化炭素、クロロホルム、エチレンクロルヒドリン、
ジクロルベンゼン等の塩素化炭化水素系溶剤等、汎用の
溶剤を用いることができる。Ester solvents such as ethyl lactate and glycol monoethyl acetate, glycol ether solvents such as glycol dimethyl ether, glycol monoethyl ether, and dioxane, aromatic hydrocarbon solvents such as benzene, toluene, and xylene, and fats such as hexane and heptane. Group hydrocarbon solvents, methylene chloride, ethylene chloride,
Carbon tetrachloride, chloroform, ethylene chlorohydrin,
General-purpose solvents such as chlorinated hydrocarbon solvents such as dichlorobenzene can be used.
前述のバックコート層には潤滑剤を併用してもよい、こ
の場合、上記バックコート層中に潤滑剤を内添する方法
、あるいはバンクコート層上に潤滑剤を被着する方法が
ある。いずれにしても、上記潤滑剤としては、脂肪酸、
脂肪酸エステル、脂肪酸アミド、金属石鹸、脂肪族アル
コール、パラフィン、シリコーン等、従来より周知の潤
滑剤が使用できる。A lubricant may be used in combination with the above-mentioned back coat layer. In this case, there is a method of adding the lubricant internally to the back coat layer, or a method of depositing the lubricant on the bank coat layer. In any case, the above-mentioned lubricants include fatty acids,
Conventionally known lubricants such as fatty acid esters, fatty acid amides, metal soaps, fatty alcohols, paraffins, and silicones can be used.
これら潤滑剤を例示すれば、先ず、脂肪酸としては、ラ
ウリン酸、ミリスチン酸、バルミチン酸、ステアリン酸
、ベヘン酸、オレイン酸、リノール酸、リルン酸等の炭
素数が12以上の飽和脂肪酸あるいは不飽和脂肪酸が使
用できる。Examples of these lubricants include fatty acids such as saturated fatty acids having 12 or more carbon atoms, such as lauric acid, myristic acid, valmitic acid, stearic acid, behenic acid, oleic acid, linoleic acid, and lylunic acid, or unsaturated fatty acids. Fatty acids can be used.
脂肪酸エステルとしては、ステアリン酸エチル、ステア
リン酸ブチル、ステアリン酸アミル、ステアリン酸モノ
グリセリド、オレイン酸モノグリセリド等が使用できる
。As the fatty acid ester, ethyl stearate, butyl stearate, amyl stearate, stearic acid monoglyceride, oleic acid monoglyceride, etc. can be used.
脂肪酸アミドとしては、カプロン酸アミド、カプリン酸
アミド、ラウリン酸アミド、パルミチン酸アミド、ステ
アリン酸アミド、ベヘン酸アミド、オレイン酸アミド、
リノール酸アミド、メチレンビスステアリン酸アミド、
エチレンビスステアリン酸アミド等が使用できる。Examples of fatty acid amides include caproic acid amide, capric acid amide, lauric acid amide, palmitic acid amide, stearic acid amide, behenic acid amide, oleic acid amide,
linoleic acid amide, methylene bisstearic acid amide,
Ethylene bisstearamide, etc. can be used.
金属石鹸としては、前述の脂肪酸のZn、 Pb、 N
i。The metal soaps include the aforementioned fatty acids Zn, Pb, and N.
i.
Go+ Fe、 AI、 Mg+ Sr+ Cu等との
塩、あるいはラウリルスルホン酸、パルミチルスルホン
酸、ミリスチルスルホン酸、ステアリルスルホン酸、ベ
ヘニルスルホン酸、オレイルスルホン酸、リノールスル
ホン酸、リルンスルホン酸等のスルホン酸と上記金属と
の塩等が使用できる。Salts with Go+ Fe, AI, Mg+ Sr+ Cu, etc., or with sulfonic acids such as lauryl sulfonic acid, palmitylsulfonic acid, myristyl sulfonic acid, stearyl sulfonic acid, behenyl sulfonic acid, oleyl sulfonic acid, linolesulfonic acid, lilinsulfonic acid, etc. Salts with the above metals can be used.
脂肪族アルコールとしては、セチルアルコール、ステア
リルアルコール等が使用できる。As the aliphatic alcohol, cetyl alcohol, stearyl alcohol, etc. can be used.
パラフィンとしては、n−ノナデカン、n−トリデカン
、n−トコサン等の飽和炭化水素が使用できる。As the paraffin, saturated hydrocarbons such as n-nonadecane, n-tridecane, and n-tocosan can be used.
シリコーンとしては、水素がアルキル基またはフェニル
基で部分置換されたポリシロキサン及びそれらを脂肪酸
、脂肪族アルコール、脂肪酸アミド等で変性したもの等
が使用できる。As silicones, polysiloxanes in which hydrogen is partially substituted with alkyl groups or phenyl groups, and those modified with fatty acids, aliphatic alcohols, fatty acid amides, etc. can be used.
さらには、先の磁性層表面に付着されるトップコート層
と同様の潤滑剤を添加してもよい。Furthermore, a lubricant similar to that of the top coat layer attached to the surface of the magnetic layer may be added.
以上述べたように、磁性層である強磁性金属薄膜上にN
−置換パーフルオロアルカンアミドを付着せしめること
により、上記強磁性金属薄膜での錆の発生が防止される
。As mentioned above, N
By depositing the -substituted perfluoroalkanamide, the formation of rust in the ferromagnetic metal thin film is prevented.
また、防錆剤層の上層に潤滑剤層を形成することにより
、走行性、耐久性が改善される。Furthermore, by forming a lubricant layer on top of the rust preventive layer, running properties and durability are improved.
以下、本発明の具体的な実施例について説明するが、本
発明はこれら実施例に限定されるものではない。Hereinafter, specific examples of the present invention will be described, but the present invention is not limited to these examples.
N−置換パーフルオロアルカンアミドを用いて強磁性金
属fI膜型の磁気記録媒体を作製した。A ferromagnetic metal fI film type magnetic recording medium was fabricated using an N-substituted perfluoroalkanamide.
実施例1
14μmpJのポリエチレンテレフタレートフィルムに
斜め蒸着法によりCOを被着させ、膜厚1000人の強
磁性金属薄膜を形成した。Example 1 CO was deposited on a 14 μmpJ polyethylene terephthalate film by oblique evaporation to form a ferromagnetic metal thin film with a thickness of 1000 μm.
次に、この強磁性金属薄膜表面上に、N−ステアリルペ
ンタデカフルオロオクタンアミド(CJ+5CON)I
CIJ*y)を塗布量が5g/I+(となるように塗布
した後、潤滑剤としてパーフルオロポリエーテルを塗布
量が5■/dとなるように塗布乾燥し、8ミリ幅に裁断
してサンプルテープを作成した。Next, on the surface of this ferromagnetic metal thin film, N-stearylpentadecafluorooctaneamide (CJ+5CON) I
After applying CIJ*y) in an amount of 5 g/I+, apply perfluoropolyether as a lubricant in an amount of 5 g/d, dry, and cut into 8 mm width. A sample tape was created.
実施例2
14μmfq、のポリエチレンテレフタレートフィルム
に斜め蒸着法によりCoを被着させ、膜厚1000人の
強磁性金属薄膜を形成した。Example 2 Co was deposited on a 14 μm fq polyethylene terephthalate film by oblique evaporation to form a ferromagnetic metal thin film with a thickness of 1000 μm.
次に、この強磁性金属薄膜表面上に、N−リルニルペン
タデカフルオロオクタンアミド(C?FISCONHC
+sHi+)を塗布量が5■/Mとなるように塗布した
後、潤滑剤としてパーフルオロポリエーテルを塗布量が
5#/イとなるように塗布乾燥し、8ミリ幅に裁断して
サンプルテープを作成した。Next, on the surface of this ferromagnetic metal thin film, N-lynylpentadecafluorooctaneamide (C?FISCONHC) was applied.
+sHi+) in an amount of 5#/M, then apply perfluoropolyether as a lubricant in an amount of 5#/I, dry it, cut it into 8mm width and make a sample tape. It was created.
実施例3
14μm厚のポリエチレンテレフタレートフィルムに斜
め蒸着法によりCoを被着させ、膜厚1000人の強磁
性金属薄膜を形成した。Example 3 Co was deposited on a 14 μm thick polyethylene terephthalate film by oblique evaporation to form a 1000 μm thick ferromagnetic metal thin film.
次に、この強磁性金属薄膜表面上に、N−イソステアリ
ルペンタデカフルオロオクタンアミド(CJIscON
Hisoc+ lH3?)を塗布量が5*/n(となる
ように塗布した後、潤滑剤としてパーフルオロポリエー
テルを塗布量が5■/dとなるように塗布乾燥し、8ミ
リ幅に裁断してサンプルテープを作成した。Next, N-isostearylpentadecafluorooctaneamide (CJIscON) was applied on the surface of this ferromagnetic metal thin film.
Hisoc+ lH3? ) to a coating amount of 5*/n(), apply perfluoropolyether as a lubricant to a coating amount of 5*/d, dry it, cut it into 8 mm width and make a sample tape. It was created.
実施例4
14μm厚のポリエチレンテレフタレートフィルムに斜
め蒸着法によりCOを被着させ、膜厚1000人の強磁
性金属’Fill膜を形成した。Example 4 CO was deposited on a 14 μm thick polyethylene terephthalate film by an oblique evaporation method to form a ferromagnetic metal fill film with a thickness of 1000 μm.
次に、この強磁性金NTR膜表面上に、ベンタデを塗布
量が5■/n(となるように塗布した後、潤滑剤として
パーフルオロポリエーテルを塗布量が5■/Mとなるよ
うに塗布乾燥し、8ミリ幅に裁断してサンプルテープを
作成した。Next, on the surface of this ferromagnetic gold NTR film, Bentade was applied at a coating amount of 5 ■/n, and then perfluoropolyether was applied as a lubricant at a coating amount of 5 ■/M. After coating and drying, sample tapes were prepared by cutting into 8 mm width.
実施例5
14μm厚のポリエチレンテレフタレートフィルムに斜
め蒸着法によりCoを被着させ、膜厚1000人の強磁
性金属薄膜を形成した。Example 5 Co was deposited on a 14 μm thick polyethylene terephthalate film by an oblique evaporation method to form a 1000 μm thick ferromagnetic metal thin film.
次に、この強磁性金属″Ti1M表面上に、N−ノニル
ペンタデカフルオロオクタンアミドCCqF l5cO
N)ICJ+q)を塗布量が5■/dとなるように塗布
した後、潤滑剤としてパーフルオロポリエーテルを塗布
量が5 yt / cdとなるように塗布乾燥し、8ミ
リ幅に裁断してサンプルテープを作成した。Next, on the surface of this ferromagnetic metal "Ti1M, N-nonylpentadecafluorooctaneamide CCqF l5cO
N) After applying ICJ+q) to a coating amount of 5 yt/d, apply perfluoropolyether as a lubricant to a coating amount of 5 yt/cd, dry, and cut into 8 mm width. A sample tape was created.
実施例6
14μm厚のポリエチレンテレフタレートフィルムに斜
め蒸着法によりCOを被着させ、膜厚1000人の強磁
性金属薄膜を形成した。Example 6 CO was deposited on a 14 μm thick polyethylene terephthalate film by oblique evaporation to form a 1000 μm thick ferromagnetic metal thin film.
次に、この強磁性金属薄膜表面上に、N−シクロへキシ
ルペンタデカフルオロオクタンアミドうに塗布した後、
潤滑剤としてパーフルオロポリエーテルを塗布量が5■
/イとなるように塗布乾燥し、8ミリ幅に裁断してサン
プルテープを作成した。Next, after coating N-cyclohexylpentadecafluorooctaneamide on the surface of this ferromagnetic metal thin film,
The amount of perfluoropolyether applied as a lubricant is 5■
The sample tape was prepared by applying and drying the sample tape so as to give a width of 8 mm.
実施例7
14μm厚のポリエチレンテレフタレートフィルムに斜
め蒸着法によりCoを被着させ、膜厚1000人の強磁
性金属薄膜を形成した。Example 7 Co was deposited on a 14 μm thick polyethylene terephthalate film by an oblique evaporation method to form a 1000 μm thick ferromagnetic metal thin film.
次に、この強磁性金属mli!表面上に、N−オレイル
ノナデカフルオロオクタンアミド(CJ I 9CON
HC+eHss)を塗布量が5■/dとなるように塗布
した後、潤滑剤としてパーフルオロポリエーテルを塗布
量が5■/dとなるように塗布乾燥し、8ミリ幅に裁断
してサンプルテープを作成した。Next, this ferromagnetic metal mli! On the surface, N-oleyl nonadecafluorooctanamide (CJ I 9CON
After applying HC + eHss) at a coating amount of 5 ■/d, apply perfluoropolyether as a lubricant at a coating amount of 5 ■/d, drying, cutting into 8 mm width and making sample tape. It was created.
作製された各サンプルテープについて、初期の保持力(
Hc+)と飽和磁化量(Is+) 、及び温度45℃、
相対湿度80%下に1週間放置した後保持力(Ilcg
)と飽和磁化!(1st)を測定し、その変化率を次式
に従って求めた。尚、比較例1として全く防錆剤を被着
しない潤滑剤層だけのブランクテープについても変化率
を調べた。結果を第1表に示す。For each sample tape prepared, the initial holding power (
Hc+), saturation magnetization (Is+), and temperature 45°C,
Retention power (Ilcg) after being left under 80% relative humidity for one week
) and saturation magnetization! (1st) was measured, and the rate of change was determined according to the following formula. As Comparative Example 1, the rate of change was also investigated for a blank tape with only a lubricant layer and no rust preventive applied thereon. The results are shown in Table 1.
Hcの変化率=(Hcg−Hc+)/Hc、’X100
(χ)Isの変化率−(Isz Is+)/Is+
X 100(χ)第1表
上記の表からも明らかなように、本発明の各実施例は、
温度45℃、相対湿度80%RH下に1週間放置という
条件下でも掻めて安定しており、Heの変化率及びIs
の変化率ともに極めて小さく、さらには錆の発生も認め
られなかった。これに対して、防錆剤層のない比較例の
テープでは、Heの変化率及びIsの変化率ともに太き
(、錆がかなりの量発生するなど耐蝕性の悪いものであ
った。Rate of change in Hc = (Hcg-Hc+)/Hc, 'X100
(χ) Rate of change of Is - (Isz Is+)/Is+
X 100 (χ) Table 1 As is clear from the above table, each embodiment of the present invention is
It is extremely stable even when left for one week at a temperature of 45°C and a relative humidity of 80% RH, and the rate of change in He and Is
The rate of change in both values was extremely small, and no rust was observed. On the other hand, the tape of the comparative example without a rust preventive layer had a large change rate of He and a large change rate of Is (and had poor corrosion resistance, with a considerable amount of rust generated).
次に、上記各実施例で作製した各実施例サンプルテープ
を用いて温度25℃、相対湿度(RH)60%の条件下
での動摩擦係数及びシャトル耐久性を測定した。この動
摩擦係数は、材質がステンレス(SUS 304)のガ
イドピンを用い、一定のテンションをかけ5fl/se
cの速度で送り、試験したものである。また、シャトル
耐久性は、1回につき2分間のシャトル走行を行い、出
力が一3dB低下までのシャトル回数で評価した。スチ
ル耐久性はポーズ状態での出力の一3dBまでの減衰時
間を評価した。尚、比較例2として防錆剤層及び潤滑剤
層を全く塗布しないブランクテープについても測定した
。測定結果を第2表に示す。Next, the dynamic friction coefficient and shuttle durability were measured under conditions of a temperature of 25° C. and a relative humidity (RH) of 60% using the sample tapes produced in each of the above examples. This coefficient of dynamic friction was determined by using a guide pin made of stainless steel (SUS 304) and applying a constant tension of 5fl/se.
The test was conducted by feeding at a speed of c. In addition, the shuttle durability was evaluated by running the shuttle for 2 minutes each time, and determining the number of shuttle runs until the output decreased by 13 dB. Still durability was evaluated by evaluating the decay time for the output to -3 dB in a pause state. As Comparative Example 2, a blank tape without any rust preventive layer or lubricant layer was also measured. The measurement results are shown in Table 2.
(以下余白)
第2表
第2表から明らかなように、各実施例のサンプルテープ
は動摩擦係数が小さく、走行性が極めて安定しており、
また100回往復走行もテープ表面の損傷は全く見られ
なかった。また、スチル耐久性も極めて良く、150回
シャトル走行をおこなっても出力の一3dB低下は見ら
れなかった。これに対して、比較例テープでは、摩擦係
数が往復走行回数が多くなるにつれ大となり、走行も不
安−〇一
定でテープの摩擦が見られ、耐久性も悪いものであった
。(Left below) Table 2 As is clear from Table 2, the sample tapes of each example had a small coefficient of dynamic friction and extremely stable running properties.
Further, no damage was observed on the tape surface even after 100 reciprocating runs. Furthermore, the still durability was extremely good, and even after 150 shuttle runs, no decrease in output by 13 dB was observed. On the other hand, in the case of the comparative tape, the coefficient of friction increased as the number of reciprocating runs increased, and the running was unstable and the tape showed constant friction, and its durability was poor.
以上の説明からも明らかなように、本発明においては、
強磁性金属薄膜型の磁気記録媒体の磁性層上にN−置換
パーフルオロアルカンアミドを主成分とする防錆剤を塗
布し、且つその上層に潤滑剤層を設けているため、高温
ないし高湿下においても磁性層である強磁性金属薄膜表
面での錆の発生が防止され、保持力や飽和磁化量等の磁
気特性の経口変化も少なく、且つ動摩擦係数の小さい走
行安定性及び耐久性に優れた磁気記録媒体とすることが
できる。As is clear from the above description, in the present invention,
A rust preventive agent containing N-substituted perfluoroalkanamide as a main component is coated on the magnetic layer of a ferromagnetic metal thin film type magnetic recording medium, and a lubricant layer is provided on top of this, so it can withstand high temperatures or high humidity. Rust is prevented from forming on the surface of the ferromagnetic metal thin film that is the magnetic layer underneath, and there is little change in magnetic properties such as coercive force and saturation magnetization, and it has excellent running stability and durability with a small coefficient of dynamic friction. It can be used as a magnetic recording medium.
第1図は本発明を適用した磁気記録媒体の一構成例を示
す要部拡大断面図である。
1・・・非磁性支持体
2・・・強磁性金属薄膜
3・・・潤滑剤層
4・・・防錆剤層FIG. 1 is an enlarged sectional view of a main part showing an example of the structure of a magnetic recording medium to which the present invention is applied. 1...Nonmagnetic support 2...Ferromagnetic metal thin film 3...Lubricant layer 4...Rust preventive layer
Claims (1)
金属薄膜上にN−置換パーフルオロアルカンアミドを含
有する防錆剤層及び潤滑剤層を順次形成してなる磁気記
録媒体。A magnetic recording medium comprising a ferromagnetic metal thin film formed on a non-magnetic support, and a rust preventive layer containing an N-substituted perfluoroalkanamide and a lubricant layer sequentially formed on the ferromagnetic metal thin film.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31506786A JPS63167413A (en) | 1986-12-27 | 1986-12-27 | Magnetic recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31506786A JPS63167413A (en) | 1986-12-27 | 1986-12-27 | Magnetic recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63167413A true JPS63167413A (en) | 1988-07-11 |
Family
ID=18061029
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP31506786A Pending JPS63167413A (en) | 1986-12-27 | 1986-12-27 | Magnetic recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63167413A (en) |
-
1986
- 1986-12-27 JP JP31506786A patent/JPS63167413A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0229014B1 (en) | Magnetic recording medium | |
JPS6346619A (en) | Magnetic recording medium | |
JPS63167413A (en) | Magnetic recording medium | |
JPH01207263A (en) | Perfluoroalkylsulfonic acid amine salt, lubricant consisting essentially of said salt and magnetic recording medium using said amine salt as lubricant | |
JPS6346618A (en) | Magnetic recording medium | |
JPS639011A (en) | Magnetic recording medium | |
JPS639012A (en) | Magnetic recording medium | |
JPS62266727A (en) | Magnetic recording medium | |
JPS62157319A (en) | Magnetic recording medium | |
JPS62266728A (en) | Magnetic recording medium | |
JPS63167414A (en) | Magnetic recording medium | |
JP2771806B2 (en) | Magnetic recording media | |
JP2650244B2 (en) | Magnetic recording media | |
JPS62162225A (en) | Magnetic recording medium | |
JPS62172524A (en) | Magnetic recording medium | |
JP2580684B2 (en) | Magnetic recording medium and method of manufacturing the same | |
JPS63188820A (en) | Magnetic recording medium | |
JPS62209718A (en) | Magnetic recording medium | |
JPS62266729A (en) | Magnetic recording medium | |
JPS62172520A (en) | Magnetic recording medium | |
JPS62239315A (en) | Magnetic recording medium | |
JPS63188819A (en) | Magnetic recording medium | |
JPS62172529A (en) | Magnetic recording medium | |
JPS62172522A (en) | Magnetic recording medium | |
JPS62177719A (en) | Magnetic recording medium |