JPS6376251A - Sample stage for scanning electron microscope - Google Patents
Sample stage for scanning electron microscopeInfo
- Publication number
- JPS6376251A JPS6376251A JP21709886A JP21709886A JPS6376251A JP S6376251 A JPS6376251 A JP S6376251A JP 21709886 A JP21709886 A JP 21709886A JP 21709886 A JP21709886 A JP 21709886A JP S6376251 A JPS6376251 A JP S6376251A
- Authority
- JP
- Japan
- Prior art keywords
- movement
- sample
- observation point
- rotation
- circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001514 detection method Methods 0.000 claims description 7
- 230000001678 irradiating effect Effects 0.000 abstract 3
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 5
- 238000010894 electron beam technology Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔発明の目的〕
(産業上の利用分野)
本発明は回転可能な走査電子顕微鏡用試料ステージ(以
下試料ステージと称する)に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Field of Industrial Application) The present invention relates to a rotatable sample stage for a scanning electron microscope (hereinafter referred to as sample stage).
(従来の技術)
試料ステージの中には、x−y−z方向の動作以外に試
料回転の動作も行なえるものがある。その軸内の1つに
は試料表面と2次電子信号検出器の相対位置関係を回転
により調整するということがある。(Prior Art) Some sample stages are capable of rotating the sample in addition to movement in the x-y-z directions. One of these axes is adjusting the relative positional relationship between the sample surface and the secondary electron signal detector by rotation.
従来の試料ステージの概略構成を第3図に示す。FIG. 3 shows a schematic configuration of a conventional sample stage.
即ち、試料1を保持するホルダ2が回転軸3に支持され
、回転軸3とその回転駆動機構4を塔載するホルダ支部
部5がX−Yテーブル6上を平行移動する。7は走査電
子ビーム照射位置は固定である。試料1上で走査電子ビ
ーム7の照射を受ける微小部位が画像としてWRaされ
る。That is, a holder 2 holding a sample 1 is supported by a rotating shaft 3, and a holder branch portion 5 on which the rotating shaft 3 and its rotational drive mechanism 4 are mounted moves in parallel on an XY table 6. 7, the scanning electron beam irradiation position is fixed. A minute portion of the sample 1 that is irradiated with the scanning electron beam 7 is displayed as an image WRa.
(発明が解決しようとする問題点)
従来の試料ステージにおいて、試料1の表面上で走査電
子ビーム7の照射を受ける位置は試料1の任意位置であ
るから通常回転軸3の中心位置とは一致しない、この一
致しない状態で現在観察している画像の方向を角度θだ
け回転させるべく、試料ステージを回転させたときに生
じる問題点を第4図に基づいて説明する。(Problems to be Solved by the Invention) In the conventional sample stage, the position on the surface of the sample 1 that is irradiated with the scanning electron beam 7 is an arbitrary position on the sample 1, and therefore does not normally coincide with the center position of the rotation axis 3. The problem that occurs when the sample stage is rotated in order to rotate the direction of the currently observed image by an angle θ in this mismatched state will be explained based on FIG. 4.
8は試料1における回転中心、9は走査電子ビーム7の
照射位置、 10は試料1を角度θだけ回転させたとき
に回転前に照射位置にあったam点が移動している位置
である。このように回転にともない観察点10がビーム
照射位1i9からずれてしまうため従来1回転後、オペ
レータが目視で探索しなからa要点lOの画像が得られ
るまで試行錯誤的に試料ステージを平行移動させること
により、同Wt基点10をビーム照射位置9に戻す作業
が必要になるという不具合があった。8 is the rotation center of the sample 1, 9 is the irradiation position of the scanning electron beam 7, and 10 is the position to which the am point, which was at the irradiation position before rotation, moves when the sample 1 is rotated by an angle θ. In this way, the observation point 10 shifts from the beam irradiation position 1i9 as it rotates, so conventionally, after one rotation, the operator does not search visually and moves the sample stage in parallel by trial and error until an image at point 10 is obtained. As a result, there was a problem in that it was necessary to return the Wt base point 10 to the beam irradiation position 9.
本発明の目的は、この不具合を解決するために。The purpose of the present invention is to solve this problem.
回転にともなうam点の移動を自動的に補正する試料ス
テージを提供することを目的とする。It is an object of the present invention to provide a sample stage that automatically corrects the movement of the am point due to rotation.
(問題点を解決するための手段)
第1図は本発明の試料ステージのブロック構成図である
。11はセンサにより試料の回転中心の位置を検出する
手段、12は回転操作の指示を得て、回転にともなうI
l!察点基点動量を演算する手段、13は回転にともな
い移動するIIIM!!点をビーム照射位置に戻すべく
補正制御する手段より本発明に係る試料ステージは構成
されている。(Means for Solving the Problems) FIG. 1 is a block diagram of the sample stage of the present invention. 11 is a means for detecting the position of the center of rotation of the sample using a sensor; 12 is a means for obtaining rotation operation instructions and detecting the rotation center position of the sample;
l! Means for calculating the observation point base point movement, 13 is IIIM that moves with rotation! ! The sample stage according to the present invention is comprised of means for performing correction control to return the point to the beam irradiation position.
(作 用)
第1図における本発明を構成する各手段の作用を第4r
i!iを参照しながら説明する。ここで第4図において
便宜上ビーム照射位置9を原点とするX−Y座標系を考
える。試料1における回転中心8の位置は試料1のX−
Y平行移動により変化する。(Function) The function of each means constituting the present invention in FIG.
i! This will be explained with reference to i. Here, in FIG. 4, for the sake of convenience, an X-Y coordinate system with the beam irradiation position 9 as the origin will be considered. The position of the rotation center 8 in sample 1 is
Changes due to Y parallel movement.
回転中心の位置検出手段11は試料1の上記平行移動量
をセンサにより検出し、回転中心8の座標(a、b)を
算出し、記憶する。観察点の移動量演算手段12は、試
料1の回転操作指示量θの入力をうけて、上記座標情報
とあわせて回転にともなうI!察点点10X方向、Y方
向についての移動量ΔX。The rotation center position detection means 11 detects the amount of parallel movement of the sample 1 using a sensor, calculates and stores the coordinates (a, b) of the rotation center 8. The movement amount calculating means 12 of the observation point receives the rotation operation instruction amount θ of the sample 1, and calculates I! along with the rotation along with the above coordinate information. Movement amount ΔX in the X direction and Y direction of the observation point 10.
Δyを各4式■、■により算出し、記憶する。Calculate Δy using each of the four formulas ① and ② and store it.
1Δxl=lpsin(θ÷90°−α)−al ・・
・■1Δyl = I #cos (θ÷90°−a)
−b l −■ここに α=Tan−” (−)
・・・■am点の補正制御手段13は上記移
動量情報ΔX。1Δxl=lpsin(θ÷90°−α)−al ・・
・■1Δyl = I #cos (θ÷90°−a)
−b l −■Here α=Tan−” (−)
...■The correction control means 13 for the am point uses the above-mentioned movement amount information ΔX.
Δyを用いて、移動してきたw4察点10をビーム照射
位!i!9に戻すべく試料1を平行移動させる。Using Δy, beam irradiation position to the moving w4 observation point 10! i! Sample 1 is moved in parallel to return to 9.
(実施例)
以下1本発明の一実施例について図面を参照しながら説
明する。(Example) An example of the present invention will be described below with reference to the drawings.
第2図において、16は試料ステージ機構部でその細部
は第3図に示す通りである。17は機構部の制御回路で
モータ駆動により試料を平行移動・回転動作させるべく
制御する。18は回転中心位置の検出回路でエンコーダ
等のセンサにより1機構部16の移動変化量を検出して
、ビーム照射位置をX−Y座mW点としたときの試料の
回転中心の座標を算出し、記憶する。ここでビーム照射
位置を原点とする方法は次の通りである。即ち、機構部
16の動作開始時における状態において、試料の回転中
心がビーム照射位置となるように予め機械的に調整して
おく、こうしておいて、動作開始時に検出回路18の値
を零にリセットすることによりビーム照射位置を原点と
して登録できる。In FIG. 2, reference numeral 16 denotes a sample stage mechanism section, the details of which are shown in FIG. 3. Reference numeral 17 denotes a control circuit for the mechanical section, which controls the sample to move in parallel and rotate by driving a motor. Reference numeral 18 denotes a rotation center position detection circuit that detects the amount of change in movement of the first mechanical part 16 using a sensor such as an encoder, and calculates the coordinates of the rotation center of the sample when the beam irradiation position is set to the X-Y point mW. ,Remember. Here, the method of setting the beam irradiation position as the origin is as follows. That is, in the state at the start of operation of the mechanism section 16, the rotation center of the sample is adjusted mechanically in advance so as to be at the beam irradiation position, and the value of the detection circuit 18 is reset to zero at the start of operation. By doing this, the beam irradiation position can be registered as the origin.
19は試料移動操作回路で、オペレータが試料の平行移
動ならびに回転動作をコンソール等により指定するため
の回路である。指定動作量は機構部制御回路17に出力
されて、それに対応した動作が実施される。Reference numeral 19 denotes a sample movement operation circuit, which is used by an operator to specify parallel movement and rotation of the sample using a console or the like. The specified operation amount is output to the mechanism control circuit 17, and the corresponding operation is executed.
20は11!察点移動量演算回路で操作回路19から回
転動作量の入力をうけたときに、検出回路18から回転
動作前の回転中心の座標をよみとり式■、■。20 is 11! When the detection point movement amount calculation circuit receives the input of the amount of rotational movement from the operation circuit 19, the coordinates of the center of rotation before the rotational movement are read from the detection circuit 18.
■にもとづいて、a基点の移動量を算出し、それを機構
部制御回路17に出力する。これによりa基点をビーム
照射位置に戻す動作が自動的に実施される。Based on (2), the amount of movement of the base point a is calculated and outputted to the mechanism control circuit 17. As a result, the operation of returning the base point a to the beam irradiation position is automatically performed.
〔発明の効果〕
以上説明したごとく、本発明によれば、試料回転時にお
ける観察点の移動が自動的に補正されるため効率的なm
sが可能になるという効果がある。[Effects of the Invention] As explained above, according to the present invention, the movement of the observation point during sample rotation is automatically corrected, so that efficient m
This has the effect of enabling s.
第1図は本発明のブロック構成図、第2図は本発明の一
実施例の概略説明図、第3図は従来の試料ステージの構
成図、第4図は従来の試料ステージの問題点ならびに本
発明の詳細な説明する図である。
1・・・試料 2・・・ホルダ3・・
・回転軸 8・・・回転中心9・・・ビ
ーム照射位[10・・・観察点16・・・試料ステージ
機構部 17・・・4!&構部制御回路18・・・回
転中心位置検出回路 19・・・試料移動操作回路20
・・・観察点移動量演算回路
代理人 弁理士 則 近 憲 佑
同 三俣弘文
第1図
第2図FIG. 1 is a block configuration diagram of the present invention, FIG. 2 is a schematic explanatory diagram of an embodiment of the present invention, FIG. 3 is a configuration diagram of a conventional sample stage, and FIG. 4 shows the problems and problems of the conventional sample stage. FIG. 2 is a diagram illustrating the present invention in detail. 1... Sample 2... Holder 3...
・Rotation axis 8...Rotation center 9...Beam irradiation position [10...Observation point 16...Sample stage mechanism 17...4! & Structure control circuit 18...Rotation center position detection circuit 19...Sample movement operation circuit 20
... Observation point movement amount calculation circuit agent Patent attorney Nori Chika Ken Yudo Hirofumi Mitsumata Figure 1 Figure 2
Claims (1)
記回転軸の回転中心位置を検出する検出手段と、この回
転中心位置と回転軸の回転角より試料表面の観察点の移
動距離を演算する演算手段と、この演算手段の演算結果
より前記観察点の移動を自動的に補正する補正手段とを
備えることを特徴とする走査電子顕微鏡用試料ステージ
。In a rotatable sample stage for a scanning electron microscope, a detection means detects a rotation center position of the rotation axis, and a calculation means calculates a movement distance of an observation point on a sample surface from the rotation center position and a rotation angle of the rotation axis. , and correction means for automatically correcting the movement of the observation point based on the calculation result of the calculation means.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21709886A JPS6376251A (en) | 1986-09-17 | 1986-09-17 | Sample stage for scanning electron microscope |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21709886A JPS6376251A (en) | 1986-09-17 | 1986-09-17 | Sample stage for scanning electron microscope |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6376251A true JPS6376251A (en) | 1988-04-06 |
Family
ID=16698811
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21709886A Pending JPS6376251A (en) | 1986-09-17 | 1986-09-17 | Sample stage for scanning electron microscope |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6376251A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0340350A (en) * | 1989-07-05 | 1991-02-21 | Jeol Ltd | Analyzer device using charged particle beam |
US6444991B1 (en) | 1999-07-19 | 2002-09-03 | Jeol Ltd. | Scanning charged-particle beam instrument |
JP2010277721A (en) * | 2009-05-26 | 2010-12-09 | Hitachi High-Technologies Corp | Rotation center search method and rotation center search system of sample holder for charged particle beam device |
CN107991512A (en) * | 2017-11-09 | 2018-05-04 | 深圳市华星光电技术有限公司 | Detection platform based on atomic force microscope |
-
1986
- 1986-09-17 JP JP21709886A patent/JPS6376251A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0340350A (en) * | 1989-07-05 | 1991-02-21 | Jeol Ltd | Analyzer device using charged particle beam |
US6444991B1 (en) | 1999-07-19 | 2002-09-03 | Jeol Ltd. | Scanning charged-particle beam instrument |
JP2010277721A (en) * | 2009-05-26 | 2010-12-09 | Hitachi High-Technologies Corp | Rotation center search method and rotation center search system of sample holder for charged particle beam device |
CN107991512A (en) * | 2017-11-09 | 2018-05-04 | 深圳市华星光电技术有限公司 | Detection platform based on atomic force microscope |
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