JPS6375740A - 感光性ゴム組成物 - Google Patents

感光性ゴム組成物

Info

Publication number
JPS6375740A
JPS6375740A JP22161186A JP22161186A JPS6375740A JP S6375740 A JPS6375740 A JP S6375740A JP 22161186 A JP22161186 A JP 22161186A JP 22161186 A JP22161186 A JP 22161186A JP S6375740 A JPS6375740 A JP S6375740A
Authority
JP
Japan
Prior art keywords
rubber
photosensitive
composition
rubber composition
compd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22161186A
Other languages
English (en)
Japanese (ja)
Other versions
JPH059018B2 (https=
Inventor
Hiroto Kidokoro
広人 木所
Hideyoshi Sakurai
桜井 英嘉
Mitsuhiro Tamura
光宏 田村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zeon Corp
Original Assignee
Nippon Zeon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Zeon Co Ltd filed Critical Nippon Zeon Co Ltd
Priority to JP22161186A priority Critical patent/JPS6375740A/ja
Publication of JPS6375740A publication Critical patent/JPS6375740A/ja
Publication of JPH059018B2 publication Critical patent/JPH059018B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP22161186A 1986-09-19 1986-09-19 感光性ゴム組成物 Granted JPS6375740A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22161186A JPS6375740A (ja) 1986-09-19 1986-09-19 感光性ゴム組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22161186A JPS6375740A (ja) 1986-09-19 1986-09-19 感光性ゴム組成物

Publications (2)

Publication Number Publication Date
JPS6375740A true JPS6375740A (ja) 1988-04-06
JPH059018B2 JPH059018B2 (https=) 1993-02-03

Family

ID=16769463

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22161186A Granted JPS6375740A (ja) 1986-09-19 1986-09-19 感光性ゴム組成物

Country Status (1)

Country Link
JP (1) JPS6375740A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8573465B2 (en) 2008-02-14 2013-11-05 Ethicon Endo-Surgery, Inc. Robotically-controlled surgical end effector system with rotary actuated closure systems

Also Published As

Publication number Publication date
JPH059018B2 (https=) 1993-02-03

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