JPS6373572A - Edge-emitting light-emitting diode - Google Patents
Edge-emitting light-emitting diodeInfo
- Publication number
- JPS6373572A JPS6373572A JP61218404A JP21840486A JPS6373572A JP S6373572 A JPS6373572 A JP S6373572A JP 61218404 A JP61218404 A JP 61218404A JP 21840486 A JP21840486 A JP 21840486A JP S6373572 A JPS6373572 A JP S6373572A
- Authority
- JP
- Japan
- Prior art keywords
- face
- light
- type
- shaped
- light emitting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims abstract description 7
- 239000004065 semiconductor Substances 0.000 claims abstract description 6
- 238000002347 injection Methods 0.000 claims abstract description 4
- 239000007924 injection Substances 0.000 claims abstract description 4
- 238000005253 cladding Methods 0.000 claims description 4
- 230000010355 oscillation Effects 0.000 abstract description 13
- 230000003287 optical effect Effects 0.000 abstract description 9
- 238000005530 etching Methods 0.000 abstract description 3
- 229910052581 Si3N4 Inorganic materials 0.000 abstract description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 abstract description 2
- 230000005855 radiation Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000013307 optical fiber Substances 0.000 description 3
- 238000003486 chemical etching Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000009331 sowing Methods 0.000 description 1
Landscapes
- Led Devices (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は端面発光ダイオードに関し、特に光フアイバ通
信等に適用する端面発光ダイオードに関する3
〔従来の技術〕
光フアイバ通信を目的とする発光ダイオードは、高輝度
で、光ファイバと結合する光出力が大きいことが重要で
ある。[Detailed Description of the Invention] [Industrial Field of Application] The present invention relates to an edge light emitting diode, and particularly relates to an edge light emitting diode applied to optical fiber communication, etc. 3. [Prior Art] A light emitting diode intended for optical fiber communication , it is important to have high brightness and large optical power to couple with the optical fiber.
従来、高い光出力を有する発光ダイオードとしては、工
学図書株式会社発行の書籍「光通信素子工学」 (昭和
59年初版発行)の128〜134頁に記載されている
ように、ストライプ状の発光領域を有するダブルヘテロ
積層構造の端面から光を取出す端面発光ダイオード等が
開発されている。Conventionally, light emitting diodes with high optical output have been developed using striped light emitting areas, as described on pages 128 to 134 of the book "Optical Communication Device Engineering" published by Kogaku Tosho Co., Ltd. (first edition published in 1982). Edge light emitting diodes and the like have been developed that emit light from the end face of a double-hetero laminated structure.
従来、この種の端面発光ダイオードは、上述したように
、発光領域がストライプ状となっており、また、端面は
通常、この発光領域と直交する平坦面となっているので
、利得領域長が長く誘導放出光成分が大きくなり高出力
化が容易であった。Conventionally, in this type of edge-emitting diode, the light-emitting region has a striped shape, as described above, and the end face is usually a flat surface perpendicular to the light-emitting region, so the gain region length is long. The stimulated emission light component became large, making it easy to increase the output.
しかしながら、この端面発光ダイオードは、高い光出力
が得易いものの、誘導放出成分が大きくなるため、低温
でレーザ発振し易くなり、広い温度範囲で安定に動作さ
せることが困難であった。However, although this edge-emitting diode can easily provide a high optical output, it has a large stimulated emission component, which makes it prone to laser oscillation at low temperatures, making it difficult to operate stably over a wide temperature range.
そこで、レーザ発振を抑えるために、光を収出す端面に
無反射膜を形成する方法が一般に用いられている。Therefore, in order to suppress laser oscillation, a method is generally used in which a non-reflective film is formed on the end face from which light is extracted.
上述した従来の端面発光ダイオードは、ストライブ状の
発光領域と、この発光領域と直交し平坦面の端面に設け
られた無反射膜を有する構成となっているので、レーザ
発振を充分抑制するには、無反射膜の反射率を0.1%
程度、又はそれより低くくすることが必要であり、この
ような低反射率を高い再現性で実現することは困難であ
るため、高い光出力を安定して得ることが困難であると
いう問題点があった。The conventional edge-emitting diode described above has a stripe-shaped light-emitting region and an anti-reflection film that is perpendicular to the light-emitting region and provided on the flat end face, so it is difficult to sufficiently suppress laser oscillation. The reflectance of the non-reflective film is 0.1%.
The problem is that it is difficult to stably obtain high optical output because it is difficult to achieve such a low reflectance with high reproducibility. was there.
本発明の目的は、レーザ発振を抑え、広い温度範囲で高
い光出力を安定して得ることのできる端面発光ダイオー
ドを提供することにある。An object of the present invention is to provide an edge-emitting diode that can suppress laser oscillation and stably obtain high optical output over a wide temperature range.
本発明の端面発光ダイオードは、半導体基板上に活性層
と、この活性層を上下から挟むクラッド層と、ストライ
ブ状の発光領域を形成するためのストライブ状の電流注
入部とを有するダブルヘテロ積層構造を備え、このダブ
ルヘテロ積層構造の端面から出力光を放射する端面発光
ダイオードにおいて、前記出力光を放射する端面を、発
光軸に対して所定の角度をもつ斜面にして構成される。The edge light emitting diode of the present invention is a double heterostructure having an active layer on a semiconductor substrate, cladding layers sandwiching the active layer from above and below, and a stripe-shaped current injection part for forming a stripe-shaped light emitting region. In an edge light emitting diode that has a laminated structure and emits output light from an end face of the double-hetero laminated structure, the end face that emits the output light is formed as a slope having a predetermined angle with respect to the light emitting axis.
従来の端面発光ダイオードにおいては、ストライブ状の
発光領域と、この発光領域と直交し平坦面の端面を有す
るため、誘導放出光成分が大きく、高い光出力が得られ
る。A conventional edge-emitting diode has a striped light-emitting region and a flat end face perpendicular to the light-emitting region, so that a stimulated emission light component is large and a high light output can be obtained.
これは、出力光を放射する主光放射部のある端面と反対
側の端面とが共に発光領域、従って発光軸に対し垂直な
面をもっているため、例えばこの反対側の端面へ進む光
は、発光領域内で増幅されながら端面まで進み、この端
面で反射されて再び発光領域内を主光放射部側の端面へ
と進み、さらに増幅される。This is because both the end face with the main light emitting part that emits the output light and the opposite end face have a light emitting region, that is, a plane perpendicular to the light emitting axis. The light travels to the end face while being amplified within the region, is reflected from this end face, and travels within the light emitting region again to the end face on the main light emitting portion side, where it is further amplified.
その結果主光放射部側の端面において、高い光強度が得
られる。As a result, high light intensity can be obtained at the end face on the main light emitting part side.
ところが主光放射部側の端面も基板に対し垂直であり、
無反射膜を設けであるものの、反射率をレーザ発振が抑
えられる0、1%より小さくすることは困難であるため
、この端面で光が反射されてフィードバックされ、レー
ザ発振を起し易くなる。However, the end face on the main light emitting part side is also perpendicular to the substrate,
Although a non-reflective film is provided, it is difficult to reduce the reflectance to less than 0.1%, which suppresses laser oscillation, so light is reflected at this end face and fed back, making it easy to cause laser oscillation.
そこで本発明においては、主光放射部側の端面を斜面に
し、発光軸に対し斜めの面をもつ端面及び無反射膜とし
、光が発光領域内へ戻る量を低減してレーザ発振を防止
し、高い光出力でも安定な動作が容易に得られるように
した。Therefore, in the present invention, the end face on the side of the main light emitting part is sloped, and the end face has a surface oblique to the light emitting axis and a non-reflection film to reduce the amount of light returning into the light emitting area and prevent laser oscillation. This makes it easy to obtain stable operation even at high optical output.
次に、本発明の実施例について図面を参照して説明する
。Next, embodiments of the present invention will be described with reference to the drawings.
第1図は本発明の一実施例を示す斜視図である。FIG. 1 is a perspective view showing an embodiment of the present invention.
n型TnPの半導体基板11上に、n型InPのクラッ
ド層12、n型InGaAsPの活性層13、p型1n
Pのクラッド層14.n型1nGaAsPのコンタクI
・層15を順次、例えば、液相エピタキシャル法により
積層し形成する。On an n-type TnP semiconductor substrate 11, an n-type InP cladding layer 12, an n-type InGaAsP active layer 13, and a p-type 1n
P cladding layer 14. Contact I of n-type 1nGaAsP
- The layers 15 are sequentially stacked and formed by, for example, a liquid phase epitaxial method.
次に、コンタクト層15の表面から、ストライブ状にZ
nを選択的に拡散して電流注入部16を設け、ス)・ラ
イブ状の発光領域を形成する。Next, from the surface of the contact layer 15, Z
A current injection portion 16 is provided by selectively diffusing n, and a strip-like light emitting region is formed.
続いて、コンタクト層15の表面にAuZn膜によるp
型電極17.半導体基板11の底部表面にAuGeNi
膜によるn型電8i!18を形成する。Subsequently, the surface of the contact layer 15 is coated with an AuZn film.
Type electrode 17. AuGeNi is deposited on the bottom surface of the semiconductor substrate 11.
N-type electricity 8i by membrane! form 18.
次に、イオンビームエツチング法や化学エツチング法等
により工・ソチングし、発光軸21に対し所定の角度な
もつ斜面にし、出力光を放射する側の端面、即ち主光放
射部側の端面19を形成する。Next, etching and sowing are performed using an ion beam etching method, a chemical etching method, etc. to form a slope with a predetermined angle with respect to the light emitting axis 21, and the end surface 19 on the side that emits the output light, that is, the end surface 19 on the side of the main light emitting part, is Form.
そして、この主光放射部側の端面19上に窒化シリコン
膜による無反射膜20を形成し、本実施例の端面発光ダ
イオードが構成される。Then, a non-reflective film 20 made of a silicon nitride film is formed on the end face 19 on the side of the main light emitting part, thereby constructing the end face light emitting diode of this embodiment.
本実施例では、主光放射部側の端面19が斜面になって
いるため、この端面19から発光領域に反射されフィー
ドバックされる光量は、垂直の端面に比べ10分の1、
又はそれを下まわる程度まで低下する、
そのため、無反射膜20の反射率が、実用的に再現性よ
く得られる1%程度であっても、光放射部側端面19の
実効的な反射率は0.1%より低く抑えることができる
。In this embodiment, since the end surface 19 on the side of the main light emitting section is sloped, the amount of light reflected and fed back from this end surface 19 to the light emitting region is one-tenth that of the vertical end surface.
Therefore, even if the reflectance of the non-reflective film 20 is about 1%, which can be obtained with good practical reproducibility, the effective reflectance of the light emitting part side end surface 19 is It can be suppressed to less than 0.1%.
その結果、従来に比ベレーザ発振が著しく発生しにくく
なり、高出力でかつ、低温でもレーザ発振を抑制した安
定な動作の端面発光ダイオードを得ることができる。As a result, laser oscillation is significantly less likely to occur than in the past, and it is possible to obtain an edge-emitting diode with high output and stable operation that suppresses laser oscillation even at low temperatures.
なお、反対側の端面22の表面には高反射コートを設け
ることによりさらに高出力を得ることができる。この場
合でもレーザ発振は抑えられ、−30℃でも発振しない
端面発光ダイオードが容易に得られる。Note that even higher output can be obtained by providing a highly reflective coating on the surface of the opposite end face 22. Even in this case, laser oscillation is suppressed, and an edge-emitting diode that does not oscillate even at -30° C. can be easily obtained.
以上説明したように本発明は、出力光を放射する側の端
面を斜面にすることにより、レーザ発振を抑え、広い温
度範囲で高い光出力を安定かつ容易に得ることができる
効果がある。As described above, the present invention has the effect of suppressing laser oscillation and stably and easily obtaining high optical output over a wide temperature range by making the end face on the side that emits the output light oblique.
第1図は本発明の一実施例を示す斜視図である。 FIG. 1 is a perspective view showing an embodiment of the present invention.
Claims (1)
ラッド層と、ストライプ状の発光領域を形成するための
ストライプ状の電流注入部とを有するダブルヘテロ積層
構造を備え、このダブルヘテロ積層構造の端面から出力
光を放射する端面発光ダイオードにおいて、前記出力光
を放射する端面を、発光軸に対して所定の角度をもつ斜
面にしたことを特徴とする端面発光ダイオード。This double-hetero laminated structure includes an active layer on a semiconductor substrate, a cladding layer that sandwiches the active layer from above and below, and a striped current injection part for forming a striped light-emitting region. 1. An edge light emitting diode that emits output light from an end face thereof, wherein the end face that emits the output light is an inclined surface having a predetermined angle with respect to a light emitting axis.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61218404A JPS6373572A (en) | 1986-09-16 | 1986-09-16 | Edge-emitting light-emitting diode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61218404A JPS6373572A (en) | 1986-09-16 | 1986-09-16 | Edge-emitting light-emitting diode |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6373572A true JPS6373572A (en) | 1988-04-04 |
Family
ID=16719381
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61218404A Pending JPS6373572A (en) | 1986-09-16 | 1986-09-16 | Edge-emitting light-emitting diode |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6373572A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01312871A (en) * | 1988-06-10 | 1989-12-18 | Omron Tateisi Electron Co | Semiconductor light emitting diode for slit-light |
US5192985A (en) * | 1991-01-16 | 1993-03-09 | Kabushiki Kaisha Toshiba | Semiconductor light-emitting element with light-shielding film |
US5498883A (en) * | 1992-08-05 | 1996-03-12 | Motorola, Inc. | Superluminescent edge emitting device with apparent vertical light emission and method of making |
JP2009238843A (en) * | 2008-03-26 | 2009-10-15 | Seiko Epson Corp | Light-emitting device |
JP2009238848A (en) * | 2008-03-26 | 2009-10-15 | Seiko Epson Corp | Light-emitting device |
JP2010192603A (en) * | 2009-02-17 | 2010-09-02 | Seiko Epson Corp | Light-emitting device |
JP2012195622A (en) * | 2012-07-19 | 2012-10-11 | Seiko Epson Corp | Light emitting device |
-
1986
- 1986-09-16 JP JP61218404A patent/JPS6373572A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01312871A (en) * | 1988-06-10 | 1989-12-18 | Omron Tateisi Electron Co | Semiconductor light emitting diode for slit-light |
US5192985A (en) * | 1991-01-16 | 1993-03-09 | Kabushiki Kaisha Toshiba | Semiconductor light-emitting element with light-shielding film |
US5498883A (en) * | 1992-08-05 | 1996-03-12 | Motorola, Inc. | Superluminescent edge emitting device with apparent vertical light emission and method of making |
JP2009238843A (en) * | 2008-03-26 | 2009-10-15 | Seiko Epson Corp | Light-emitting device |
JP2009238848A (en) * | 2008-03-26 | 2009-10-15 | Seiko Epson Corp | Light-emitting device |
JP2010192603A (en) * | 2009-02-17 | 2010-09-02 | Seiko Epson Corp | Light-emitting device |
JP2012195622A (en) * | 2012-07-19 | 2012-10-11 | Seiko Epson Corp | Light emitting device |
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