JPS636997B2 - - Google Patents
Info
- Publication number
- JPS636997B2 JPS636997B2 JP15129184A JP15129184A JPS636997B2 JP S636997 B2 JPS636997 B2 JP S636997B2 JP 15129184 A JP15129184 A JP 15129184A JP 15129184 A JP15129184 A JP 15129184A JP S636997 B2 JPS636997 B2 JP S636997B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- aluminum
- nickel
- copper
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 43
- 229910052782 aluminium Inorganic materials 0.000 claims description 33
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 33
- 229910052759 nickel Inorganic materials 0.000 claims description 21
- 239000004020 conductor Substances 0.000 claims description 12
- 238000007747 plating Methods 0.000 description 37
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 18
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 18
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 12
- 229910052802 copper Inorganic materials 0.000 description 12
- 239000010949 copper Substances 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 230000007797 corrosion Effects 0.000 description 8
- 238000005260 corrosion Methods 0.000 description 8
- 238000005530 etching Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 235000011121 sodium hydroxide Nutrition 0.000 description 6
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- DITXJPASYXFQAS-UHFFFAOYSA-N nickel;sulfamic acid Chemical compound [Ni].NS(O)(=O)=O DITXJPASYXFQAS-UHFFFAOYSA-N 0.000 description 4
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 3
- 239000004327 boric acid Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229910017604 nitric acid Inorganic materials 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 description 2
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 2
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical group [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910001453 nickel ion Inorganic materials 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000000176 sodium gluconate Substances 0.000 description 2
- 235000012207 sodium gluconate Nutrition 0.000 description 2
- 229940005574 sodium gluconate Drugs 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- DOBRDRYODQBAMW-UHFFFAOYSA-N copper(i) cyanide Chemical compound [Cu+].N#[C-] DOBRDRYODQBAMW-UHFFFAOYSA-N 0.000 description 1
- LEKPFOXEZRZPGW-UHFFFAOYSA-N copper;dicyanide Chemical compound [Cu+2].N#[C-].N#[C-] LEKPFOXEZRZPGW-UHFFFAOYSA-N 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000005554 pickling Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229940071182 stannate Drugs 0.000 description 1
- 125000005402 stannate group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Electroplating Methods And Accessories (AREA)
- Non-Insulated Conductors (AREA)
Description
【発明の詳細な説明】
本発明はアルミニウムブスバーの構造に関す
る。特に本発明は導体の接続部およびプラグとの
接触面の電気的接触を改良されたアルミニウムブ
スバーに関する。なお本明細書で用いる「アルミ
ニウム」という用語はアルミニウムとその合金を
意味する。従来ブスバーには銅導体が使用されて
いるが銅の資源、供給、価格が不安定なことか
ら、アルミニウム導体への移行が進行している。
しかしながら、アルミニウムブスバーを使用する
場合には、銅導体との接続部における腐食や、銅
またはアルミニウム導体との接触面における接触
抵抗の増加等の不安があり、工事の際に接触面の
研磨、コンパウンドの塗付が行われている。ま
た、このような作業を省略し、作業ミスによる事
故を防止するためには、通常、アルミニウムブス
バーの接続部にジンケート処理を施した後、銅メ
ツキを行い、その上に、錫または銀をメツキして
いる。ジンケート法により、錫または銀をメツキ
されたアルミニウムブスバーは、著しい腐食雰囲
気や高温に曝されない場所では、工事前に特別な
処理をしなくても使用できる。しかしながら、従
来の構造のものでは後述の比較例1に示すよう
に、メツキの工程数が非常に多い。また従来の構
造のものでは、銅のストライクおよび下地メツキ
層を有するために、一旦アルミニウム素地およ
び/または亜鉛の置換層が露出すると、銅との接
触腐食により、アルミニウムまたは亜鉛が著しい
腐食を受け、メツキがふくれるという欠点があ
る。また著しい腐食性の環境や高温での使用、ま
たはプラグにゆるみが生じたり他の導体との接続
時のボルトの締付けが不充分である場合には、接
触部の抵抗が増大して、過熱する危険がある。従
来の構造のもう一つの欠点は、その製造時に使用
する銅メツキ液がPH12以上の強アリカリ性である
ために、ジンケート層にわずかでも欠陥がある
と、そこからアルミニウムが溶解して、銅メツキ
をしている時にメツキ層がふくれるという不良が
しばしば発生することである。さらに、従来の構
造のものでは、その製造時に使用するメツキ液が
毒性の強いシアン化物を含んでいるという欠点が
ある。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to the structure of an aluminum busbar. In particular, the present invention relates to an aluminum busbar with improved electrical contact between conductor connections and contact surfaces with plugs. Note that the term "aluminum" used in this specification means aluminum and its alloys. Copper conductors have traditionally been used in busbars, but due to the instability of copper resources, supply, and prices, a shift to aluminum conductors is underway.
However, when using aluminum busbars, there are concerns such as corrosion at the connection with the copper conductor and an increase in contact resistance at the contact surface with the copper or aluminum conductor. is being painted. In addition, in order to omit such work and prevent accidents due to work errors, it is common practice to apply zincate treatment to the connections of aluminum busbars, then copper plating, and then tin or silver plating on top of that. are doing. Aluminum busbars plated with tin or silver using the zincate method can be used without special treatment prior to construction in locations where they are not exposed to extremely corrosive atmospheres or high temperatures. However, the conventional structure requires a very large number of plating steps, as shown in Comparative Example 1, which will be described later. In addition, in the conventional structure, since it has a copper strike and an underplating layer, once the aluminum substrate and/or the zinc substitution layer are exposed, the aluminum or zinc undergoes significant corrosion due to contact corrosion with the copper. The drawback is that the velvet swells. In addition, if the plug is used in a highly corrosive environment or at high temperatures, or if the plug becomes loose or the bolts are insufficiently tightened when connecting to other conductors, the resistance of the contact area will increase and cause overheating. There is danger. Another drawback of the conventional structure is that the copper plating solution used in its manufacture is strongly alkaline with a pH of 12 or higher, so if there is even a slight defect in the zincate layer, the aluminum will dissolve and the copper plating will fail. During this process, the plating layer often swells, which is a problem that often occurs. Furthermore, the conventional construction has the disadvantage that the plating solution used during its manufacture contains highly toxic cyanide.
本発明の目的は、従来法の上記欠点に鑑み、こ
れらの欠点を一切有さないアルミニウムブスバー
の構造を与えるものである。 In view of the above-mentioned drawbacks of the conventional methods, the object of the present invention is to provide a structure for an aluminum busbar that does not have any of these drawbacks.
本発明のアルミニウムブスバーは、導体との接
続部およびプラグの接触面にニツケルを1〜50
mg/cm2の割合で直接電気メツキを施したものであ
る。すなわち、本発明のアルミニウムブスバー
は、ニツケルメツキの前処理として、塩酸5〜35
%を含む溶液でエツチングを行ない、次にスルフ
アミン酸塩またはホウフツ化物としてニツケルイ
オンを50g/以上含むメツキ液よりニツケルを
1〜50mg/cm2の割合で導体の接続部およびプラグ
の接触面に直接ニツケルメツキを施すことを特徴
とするアルミニウムブスバーの製造方法によつて
得ることができる。 The aluminum busbar of the present invention has 1 to 50% nickel on the connection part with the conductor and the contact surface of the plug.
It was directly electroplated at a rate of mg/cm 2 . That is, the aluminum busbar of the present invention is treated with hydrochloric acid 5 to 35% as a pretreatment for nickel plating.
%, and then directly apply nickel at a rate of 1 to 50 mg/cm 2 to the conductor connections and plug contact surfaces using a plating solution containing 50 g or more of nickel ions as sulfamate or borofluoride. It can be obtained by a method for producing an aluminum busbar characterized by applying nickel plating.
本発明のアルミニウムブスバーを製造するに
は、まず該ブスバーの接続部は塩酸5〜35%を含
む溶液、好ましくは塩酸10〜20%、硝酸および/
または硫酸0.5〜1%を含む溶液で、5秒〜2分
間、好ましくは30秒〜1分間エツチングする。し
かる後、水洗して、ニツケルイオン50g/以上
を含むスルフアミン酸ニツケルメツキ液またはホ
ウフツ化ニツケルメツキ液よりメツキされる。本
発明によるアルミニウムブスバーの構造は、その
接続部において、著しい微視的な凹凸を有するア
ルミニウム上に、ニツケルが1〜50mg/cm2、好ま
しくは5〜20mg/cm2の割合で直接固着したものと
なつている。 In order to produce the aluminum busbar of the present invention, first, the connections of the busbar are prepared using a solution containing 5 to 35% hydrochloric acid, preferably 10 to 20% hydrochloric acid, nitric acid and/or
Alternatively, etching is performed with a solution containing 0.5 to 1% sulfuric acid for 5 seconds to 2 minutes, preferably 30 seconds to 1 minute. Thereafter, it is washed with water and plated with a sulfamic acid nickel plating solution or a borosified nickel plating solution containing 50 g or more of nickel ions. The structure of the aluminum busbar according to the present invention is such that nickel is directly adhered to aluminum having significant microscopic irregularities at a rate of 1 to 50 mg/cm 2 , preferably 5 to 20 mg/cm 2 at the connection part. It is becoming.
塩酸5%以下あるいはエツチング時間5秒以下
では全面がエツチングされず、メツキが不均一に
なり、ブスバーとして使用した時に耐食性が悪
く、接触抵抗も大きい。塩酸35%以上ではガスの
発生が著しく、またエツチング時間2分以上では
生産速度が遅くなり、またニツケルイオン50g/
以下では、電着速度が小さくなりメツキ時間が
長くなり過ぎて、実際の操業では適用できない。
スルフアミン酸ニツケルメツキ浴またはホウフツ
化ニツケル化浴以外のメツキ液ではメツキが密着
せず、ブスバーとして使用できない。ニツケルメ
ツキ量1mg/cm2未満では耐食性の点でブスバーと
して使用するには問題があり、50mg/cm2を超える
とアルミニウムに比べ高価なニツケルを大量に使
用することになり、コストが高くなり過ぎる。 If the hydrochloric acid is less than 5% or the etching time is less than 5 seconds, the entire surface will not be etched and the plating will be uneven, resulting in poor corrosion resistance and high contact resistance when used as a bus bar. If hydrochloric acid exceeds 35%, gas will be generated significantly, and if the etching time exceeds 2 minutes, the production speed will slow down.
Below this, the electrodeposition speed becomes too low and the plating time becomes too long, making it impossible to apply in actual operation.
Plating liquids other than sulfamic acid nickel plating baths or phosphorous nickel plating baths do not adhere well to the plating and cannot be used as busbars. If the amount of nickel plating is less than 1 mg/cm 2 , there is a problem in using it as a bus bar in terms of corrosion resistance, and if it exceeds 50 mg/cm 2 , a large amount of nickel, which is more expensive than aluminum, will be used, resulting in an excessively high cost.
本発明の具体的な実施においては、圧延または
押出によつて製造したアルミニウム板材を望まれ
る大きさに切断した後、必要に応じて研磨、脱脂
などを行ない、しかる後、接続部をアルカリでエ
ツチングする。アルカリエツチング液としては、
例えばカセイソーダ、炭酸ソーダ等の溶液が使用
され、場合によつては、グルコン酸ソーダ等の界
面活性剤を含む溶液が使用される。次に水洗し、
接続部を前述の塩酸5〜35%を含む溶液でエツチ
ングし、しかる後水洗して、ニツケルメツキを施
す。通常、接続面のみを処理するために、接続面
のみを液中に浸漬してエツチング、メツキが行な
われるが、同じ目的のために接続部以外の部分を
塗装、ビニルテープ、ゴム等によつて予め被覆し
ておいてもよい。スルフアミン酸ニツケルメツキ
液は、スルフアミン酸ニツケル以外に、塩化ニツ
ケル、ホウ酸を加えるのが好ましく、またホウフ
ツ化ニツケルメツキ液は、ホウフツ化ニツケル以
外にホウ酸を含むものが好ましい。また、本発明
のアルミニウムブスバーの製造は、手動、半自動
または自動のいずれにおいても操業できる。 In the specific implementation of the present invention, an aluminum plate manufactured by rolling or extrusion is cut into a desired size, and then polished, degreased, etc. are performed as necessary, and then the joints are etched with alkali. do. As an alkaline etching solution,
For example, a solution of caustic soda, soda carbonate, etc. is used, and in some cases, a solution containing a surfactant such as sodium gluconate is used. Next, wash with water,
The joints are etched with the aforementioned solution containing 5 to 35% hydrochloric acid, then washed with water and nickel plated. Normally, in order to treat only the connecting surface, etching and plating are performed by immersing only the connecting surface in liquid, but for the same purpose, parts other than the connecting portion are coated with paint, vinyl tape, rubber, etc. It may be coated in advance. The nickel sulfamic acid plating solution preferably contains nickel chloride and boric acid in addition to the nickel sulfamic acid, and the nickel borosulfate plating solution preferably contains boric acid in addition to the nickel borosulfate. Further, the production of the aluminum busbar of the present invention can be operated manually, semi-automatically or automatically.
本発明のアルミニウムブスバーは後述の実施例
1に示すように、従来の構造のものに比べ製造工
程数が著しく短縮している上に、シアン化物を一
切使用せず、またニツケルが直接アルミニウム表
面にメツキされているために、アルミニウム素地
が露出しても、接触腐食は従来のものに比べはる
かに小さい。また、ニツケルは銅に比べ耐酸化性
に優れておりアルミとの相互拡散が小さいため
に、従来のもののように高温での使用中に触触抵
抗が著しく増大するという現象は起らない。ま
た、本発明のアルミニウムブスバーは、通電サイ
クルテストの結果、接触抵抗が非常に安定してい
ることが分つた。これは、製造方法において、ア
ルミニウムをエツチングする際に著しい凹凸を生
じ、その上にメツキを施しても、メツキの表面に
著しい凹凸が生じていることと、何らかの関係が
あるものと思われるが、詳細は明らかではない。 As shown in Example 1 below, the aluminum busbar of the present invention has a significantly shorter manufacturing process than those with a conventional structure, does not use any cyanide, and nickel is directly applied to the aluminum surface. Because it is plated, even if the aluminum base is exposed, contact corrosion is much smaller than with conventional products. Furthermore, since nickel has better oxidation resistance than copper and has less interdiffusion with aluminum, the phenomenon of a significant increase in contact resistance during use at high temperatures, unlike conventional products, does not occur. Further, as a result of a current cycle test, it was found that the aluminum busbar of the present invention has very stable contact resistance. This seems to have something to do with the fact that in the manufacturing method, when etching the aluminum, significant unevenness is created, and even when plating is applied on top of it, the surface of the plating is left with significant unevenness. Details are not clear.
次に、本発明の実施例について述べる。 Next, examples of the present invention will be described.
実施例 1
厚さ10mm、幅200mm、長さ5mのA1060−Fア
ルミニウム押出板で、裸導体3極フイーダバスダ
クトを製造した。その際、導体は押出後、接続部
をカセイソーダ30g/、炭酸ソーダ30g/か
らなる60℃の溶液で1分間エツチングし水洗し、
次いで塩酸16%、硝酸1%からなる溶液で1分間
エツチングし、水洗し、Ni(SO3NH2)2・
4H2O320g/、NiCl2・6H2O15g/、
H3BO330g/からなる50℃のメツキ液に浸漬
し、5A/dm2の電流密度で5分間メツキして、
ニツケル約4.6mg/cm2のメツキを得た。厚さ10mm、
幅200mm、長さ150mmの同一材質の当て板にも、同
じ方法で約4.6mg/cm2のニツケルメツキを施した。
2組のバスダクトの各導体間にこの当て板を挿入
し、亜鉛メツキ銅製ボルト、ナツト、座金を用い
て接続した。接続部の温度を熱電対を用いて測定
しながら、600Vで3000Aの電流を45分間流し、
45分間通電を停止した。これを1000サイクル繰返
したところ、最大温度上昇は30℃で、非常に小さ
かつた。Example 1 A bare conductor three-pole feeder bus duct was manufactured from an extruded A1060-F aluminum plate with a thickness of 10 mm, a width of 200 mm, and a length of 5 m. At that time, after extruding the conductor, the connection part was etched for 1 minute in a 60°C solution consisting of 30 g of caustic soda and 30 g of soda carbonate, and then washed with water.
Next, it was etched for 1 minute with a solution consisting of 16% hydrochloric acid and 1% nitric acid, washed with water, and then etched with Ni(SO 3 NH 2 ) 2 .
4H 2 O 320g/, NiCl 2・6H 2 O 15g/,
It was immersed in a 50°C plating solution containing 30 g of H 3 BO 3 and plated for 5 minutes at a current density of 5 A/dm 2 .
Approximately 4.6 mg/cm 2 of nickel was obtained. Thickness 10mm,
Approximately 4.6 mg/cm 2 of nickel plating was applied to a patch plate made of the same material with a width of 200 mm and a length of 150 mm using the same method.
This patch plate was inserted between each conductor of the two sets of bus ducts, and the connections were made using galvanized copper bolts, nuts, and washers. While measuring the temperature of the connection using a thermocouple, a current of 3000A at 600V was applied for 45 minutes.
The power supply was stopped for 45 minutes. When this was repeated 1000 cycles, the maximum temperature increase was 30°C, which was very small.
実施例 2
厚さ4mm、幅25mm、長さ2mのA1060−H14ア
ルミニウム圧延板で、タツプ付バスダクトを製造
した。圧延、伸直、切断後、トリクロルエチレン
で洗滌し、タツプ部を、カセイソーダ50g/、
グルコン酸ソーダ3g/の50℃の溶液で2分間
エツチングし、水洗し、塩酸15%、硫酸0.5%を
含む溶液でエツチングした後、水洗して、実施例
1と同一のメツキ液より、50℃の浴温、8A/d
m2の電流密度で10分間メツキし、約14.6mg/cm2の
ニツケルメツキを施した。タツプ部に、黄銅製端
子ねじを用いて、2.6mmφのビニル覆銅線を接続
し、50Aの電流を流した。最大上昇温度は27℃
で、小さかつた。Example 2 A bus duct with a tap was manufactured from an A1060-H14 aluminum rolled plate having a thickness of 4 mm, a width of 25 mm, and a length of 2 m. After rolling, straightening, and cutting, wash with trichlorethylene, and add 50 g of caustic soda to the tap area.
Etched for 2 minutes with a solution of 3 g of sodium gluconate at 50°C, washed with water, etched with a solution containing 15% hydrochloric acid and 0.5% sulfuric acid, washed with water, and etched with the same plating solution as in Example 1 at 50°C. bath temperature, 8A/d
Plating was performed for 10 minutes at a current density of m 2 to give a nickel plating of about 14.6 mg/cm 2 . A 2.6 mmφ vinyl copper-covered wire was connected to the tap using a brass terminal screw, and a current of 50 A was applied. Maximum temperature rise is 27℃
So, it was small.
実施例 3
厚さ0.8mm、幅10cm、長さ0.5mのA1060−H14
アルミニウム圧延板のバスダクトアダプターを製
造した。両端より7cmをトリクロルエチレンで洗
滌し、50g/のカセイソーダを含む60℃の溶液
で1分間エツチングし、水洗し、塩酸18%の溶液
でエツチングし、
ホウフツ化ニツケル 650g/
ホウ酸 30g/
からなるメツキ液で10A/dm2の電流密度で2分
間メツキして、約3.7mg/cm2のニツケルメツキを
施た。NaCl5%、35℃で72時間の塩水噴霧試験を
行つたが全く腐食は生じなかつた。Example 3 A1060-H14 with thickness 0.8 mm, width 10 cm, and length 0.5 m
Manufactured a bus duct adapter made of rolled aluminum plate. Wash 7cm from both ends with trichlorethylene, etch for 1 minute with a solution at 60°C containing 50g of caustic soda, wash with water, and etch with a solution of 18% hydrochloric acid to form a plating made of 650g of borosilicate nickel/30g of boric acid. It was plated with a liquid for 2 minutes at a current density of 10 A/dm 2 to give a nickel plating of about 3.7 mg/cm 2 . A salt spray test was conducted at 35°C with 5% NaCl for 72 hours, but no corrosion occurred.
比較例 1
従来の方法で、実施例1と同型のバスダクトを
製造した。ただし、接続部の表面処理は従来のジ
ンケート法により、押出後カセイソーダ30g/
、炭酸ソーダ30g/からなる60℃の溶液でエ
ツチングし、水洗し、硝酸50%の溶液に10秒間浸
漬し、
NaOH 525g/
ZnO 100g/
の溶液に1分間浸漬してジンケート処理を施し、
水洗し、シアン化銅ストライクメツキ浴より40℃
で2.6A/dm2の電流密度で1分間メツキし、水
洗し、次いでシアン化銅メツキ液(89℃)より
4A/dm2で5分間メツキし、その上に錫酸塩浴
より、5μ錫メツキを施した。実施例1と同一材
質、同一形状の当て板にも、ジンケート法で錫メ
ツキを施した。これらのバスダクトおよび付属品
に、実施例1と同一の方法で試験したところ、最
大上昇温度は120℃に達した。Comparative Example 1 A bus duct of the same type as Example 1 was manufactured using a conventional method. However, the surface treatment of the connection part is done by the conventional zincate method, and after extrusion, 30 g of caustic soda/
, etched with a solution at 60°C consisting of 30 g of soda carbonate, washed with water, immersed in a 50% nitric acid solution for 10 seconds, and zincated by immersed in a solution of 525 g of NaOH and 100 g of ZnO for 1 minute.
Rinse with water and remove from copper cyanide strike plating bath at 40°C.
Plated for 1 minute at a current density of 2.6A/ dm2 , washed with water, and then plated with a cyanide copper plating solution (89℃).
Plating was carried out at 4 A/dm 2 for 5 minutes, and then 5 μm tin plating was applied from a stannate bath. A backing plate made of the same material and having the same shape as in Example 1 was also tin-plated using the zincate method. When these bath ducts and accessories were tested in the same manner as in Example 1, the maximum temperature increase reached 120°C.
比較例 2
実施例3と同型のアダプターを製造した。トリ
クロルエチレンで洗滌後、両端より7cmに比較例
1と同一のエツチング、酸洗、ジンケート処理、
銅ストライクメツキを施し、その上に実施例3と
同一の方法で同一時間ニツケルメツキを施した。
実施例3と同一の塩水噴霧試験を施したところ、
14ケ/dm2の割合でふくれを生じた。Comparative Example 2 An adapter of the same type as in Example 3 was manufactured. After washing with trichlorethylene, the same etching, pickling, and zincate treatments as in Comparative Example 1 were applied to 7 cm from both ends.
Copper strike plating was applied, and nickel plating was applied thereon in the same manner and for the same time as in Example 3.
When the same salt spray test as in Example 3 was conducted,
Blisters occurred at a rate of 14 blisters/dm 2 .
上述のごとく、本発明のアルミニウムブスバー
は電気的接触抵抗が安定でかつ耐食性にも優れた
安価なものでその工業的応用価値は多大なものが
ある。 As mentioned above, the aluminum busbar of the present invention has stable electrical contact resistance, excellent corrosion resistance, and is inexpensive, and has great industrial application value.
Claims (1)
ルを1〜50mg/cm2の割合で直接電気メツキしたア
ルミニウムブスバー。1. Aluminum busbar with nickel directly electroplated on the conductor connections and plug contact surfaces at a rate of 1 to 50 mg/cm 2 .
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15129184A JPS6035477A (en) | 1984-07-23 | 1984-07-23 | Improved aluminum bus bar |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15129184A JPS6035477A (en) | 1984-07-23 | 1984-07-23 | Improved aluminum bus bar |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6035477A JPS6035477A (en) | 1985-02-23 |
JPS636997B2 true JPS636997B2 (en) | 1988-02-15 |
Family
ID=15515468
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15129184A Granted JPS6035477A (en) | 1984-07-23 | 1984-07-23 | Improved aluminum bus bar |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6035477A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10697643B2 (en) * | 2015-08-26 | 2020-06-30 | Panasonic Intellectual Property Management Co., Ltd. | Cooker |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5146841B2 (en) * | 2009-06-11 | 2013-02-20 | 横浜プレシジョン株式会社 | Plating equipment |
JP7162413B2 (en) * | 2017-03-29 | 2022-10-28 | 日本軽金属株式会社 | Aluminum alloy vehicle bus bar and manufacturing method thereof |
JP6738849B2 (en) * | 2018-03-26 | 2020-08-12 | 昭和電線ケーブルシステム株式会社 | Bushing |
-
1984
- 1984-07-23 JP JP15129184A patent/JPS6035477A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10697643B2 (en) * | 2015-08-26 | 2020-06-30 | Panasonic Intellectual Property Management Co., Ltd. | Cooker |
Also Published As
Publication number | Publication date |
---|---|
JPS6035477A (en) | 1985-02-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US3895851A (en) | Brittle-surfaced connector | |
US4169770A (en) | Electroplating aluminum articles | |
US3654099A (en) | Cathodic activation of stainless steel | |
US4789437A (en) | Pulse electroplating process | |
US5464524A (en) | Plating method for a nickel-titanium alloy member | |
JPH01268896A (en) | Electroplating apparatus | |
WO1998033959A1 (en) | Method for electroplating nonconductive material | |
US3455014A (en) | Method of joining by plating aluminum and alloys thereof | |
US4670312A (en) | Method for preparing aluminum for plating | |
GB2079321A (en) | Electrolytic stripping bath and process | |
JPS636997B2 (en) | ||
US4360411A (en) | Aluminum electrical contacts and method of making same | |
JPS58500765A (en) | A method for chemically stripping a plating layer containing palladium and at least one of copper and nickel, and a bath used in the method | |
JP2009149965A (en) | Silver-plating method | |
US4400248A (en) | Electrolytic stripping process | |
US3867265A (en) | Process for electroplating an aluminum wire | |
JPS583348B2 (en) | Aluminum terminal and its manufacturing method | |
US3468765A (en) | Method of plating copper on aluminum | |
JPS6013272B2 (en) | Improved aluminum busbar manufacturing method | |
CN112680757B (en) | Electroplating nickel plating process of electrode | |
US2662054A (en) | Method of electrodepositing chromium directly on aluminum | |
US2966448A (en) | Methods of electroplating aluminum and alloys thereof | |
US2195231A (en) | Art of coating metals | |
CN107170527A (en) | A kind of compressor electric motor copper-clad aluminum conductor processing technology | |
US2563229A (en) | Method of producing bright electroplate on electropolished surfaces |