JPS6366558A - Production of photosensitive printing plate having excellent plate wear and chemical resistance - Google Patents

Abstract

PURPOSE:To improve plate wear, chemical resistance and shelf life to a greater extent by coating a photosensitive compsn. on a base, then subjecting the coating to a low-temp. heat treatment for a long period. CONSTITUTION:The photosensitive compsn. contg. an o-quinonediazide compd. and nonphotosensitive high-polymer compd. is coated on the base and is then subjected to the heat treatment for 1-120hr at 40-100 deg.C. The deficiency of obviated by the above-mentioned heat treatment, by which the remaining coating solvent in the photosensitive compsn. is eliminated and the non-crystalline region is eliminated. The photosensitive printing plate having the excellent plate wear and chemical resistance is thereby obtd. and the deterioration in the sensitivity during preservation is prevented. The remarkable improvement in the shelf life is thus attained.

Description

Detailed Description of the Invention [Industrial Application Field] The present invention relates to a method for manufacturing a photosensitive printing plate, and more specifically, to a method for producing a photosensitive printing plate, which improves printing durability J3 and chemical resistance, and improves plate-making performance. The present invention relates to a method for producing a photosensitive printing plate with improved and stabilized properties.

BACKGROUND OF THE INVENTION 1 Conventionally, as a method for manufacturing photosensitive lithographic printing plates, a photosensitive liquid dissolved in an appropriate solvent is applied onto a support such as a grained aluminum plate using an appropriate coater, It is applied with a dip coater, extrusion coater, wheal coater, etc. and dried for a short time in a high-temperature drying line to provide a photosensitive lithographic printing plate. However, since the photosensitive lithographic printing plates produced by high-temperature, short-time drying are not sufficiently heated and dried, a relatively large amount of coating solvent may remain in the photosensitive composition, or molecular chains specific to polymer compounds may Due to the random arrangement, many amorphous regions remain, resulting in poor film strength, easy scratching, and poor printing durability, such as film peeling, and storage problems of photosensitive printing plates. There were problems with quality stability, such as performance deterioration at times.

In particular, there are many problems in the case of positive-working photosensitive compositions in which the coated and dried resist area acts directly as a resist area or an image area, and these drawbacks are particularly noticeable when various additives are mixed in and used.

The inventors of the present invention have made intensive studies to improve the drawbacks of the above-mentioned conventional techniques. As a result, the photosensitive printing plate, which has been coated and dried, is further heated at a relatively low temperature of 40°C to 100°C for 1 hour to 120°C. These drawbacks were solved by heat treatment for a long time.

C.Objective of the Invention An object of the present invention is to provide a method for producing a photosensitive printing plate with improved printing durability and chemical resistance.

Another object of the present invention is to provide a method for producing a photosensitive printing plate that does not deteriorate in performance such as sensitivity during storage, that is, has stable quality.

A further object of the present invention is to provide a method for producing a photosensitive printing plate that exhibits good halftone reproducibility even when exposed using a reduced-strength film original.

[Structure of the Invention] An object of the present invention is to provide a photosensitive printing plate having a photosensitive composition containing an O-quinonediazide compound and a non-photosensitive polymer compound on a support. After that, heat for 1 hour to 120 hours at a temperature of 40 to 100 degrees Celsius! 2! This was achieved by the method for manufacturing photosensitive printing plates based on the X theory.

[Specific structure of the invention] The present invention will be explained below.

The o −:1:nondiazide compound used in the present invention has at least one 0-quinonediazide group, preferably 0
- a penzoginonediazide group or an 0-naphthoquinonediazide compound, including various known compounds such as J
, K osari l-l-igl+t-3ens
itive systemJ (Jol+n Wi
lcy & 3oz.

nC, published in 1965) No. 3393. j ~ No. 353
Page contains the compounds listed in f#llll. In particular, various hydroxyl or amino compounds and 0-
Esters or amides with naphthoquinone diazide sulfur compounds are preferred. Preferred hydroxyl compounds include phenols and carbonyl group-containing compounds, such as aldehydes such as formaldehyde and benzaldehyde, and ketones such as acetone.

Especially phenol/formaldehyde resin, cresol/
Formaldehyde resin, pyrogallol acetone resin,
Resorcinol benzaldehyde resin is preferred.

Typical specific examples of 0-quinonediazide compounds include:
Esters of benzoquinone-(1,2)-diazide sulfonic acid or naphthoquinone-(1,2)-diazide sulfonic acid with phenol-formaldehyde resins or cresol-formaldehyde resins, U.S. Pat. No. 3,635.
．． 709@ Naphthoquinone-(1
,2)-diazide sulfonic acid, sulfonic acid ester of togorogallol acetone resin, naphthoquinone-(1,2)-diazide-(2)-5-sulfone described in JP-A-56-1044 Condensation product of acid and resorcinol/benzaldehyde resin, copolymerization of naphthoquinone-(1,2)-diazide-<2)-5-sulfonic acid and resorcinol/pyrogallol/acetone described in JP-A-55-76346 For ester compounds with condensates and other useful 0-quinonediazide compounds, see JP-A-Sho! +
0-117! A polynismildone containing a hydroxyl group at the end, which is described in the i03 publication.・Ester with quinonediazide sulfonic acid, JP-A-1987-1
p-hi) as described in Publication No. 13305:
Homopolymer of roxystyrene or other monomer copolymerized with this O-quinonediazide compound The content of the O-quinonediazide compound is preferably 5 to 60% by weight based on the total solid content of the photosensitive resist I/forming composition. , particularly preferably 10
It is ~50%.

As the non-photosensitive polymer compound used in the present invention, an aruno-soluble resin is preferable.

As the alkali-soluble resin, those obtained by bonding phenols and ketones or aldehydes in the presence of an acidic catalyst are preferred. Examples of the phenols include phenol, cresol, and p-direct phenol. Examples of the aldehydes include acetaldehyde and formaldehyde, with formaldehyde being preferred. Acetone is preferred as the ketone.

Preferred alkali-soluble resins include, for example, phenol/formaldehyde resins, cresol/formaldehyde resins, phenol/cresol/formaldehyde copolycondensate resins as described in JP-A-55-57841, and JP-A-55-127,553. Copolycondensate resins of p-substituted phenol and phenol or cresol and formaldehyde, condensates of benzaldehyde and polyhydric phenols such as resorcinol-benzaldehyde resins, pyrogallol-benzaldehyde resins, and pyrogallol, as described in Examples include copolycondensates of polyhydric phenol and acetone, such as -resorcinol-acetone resin, and xylenol/formaldehyde resin. More preferably, phenol/m-cresol/
p-cresol formaldehyde copolycondensation resin, 1-
It is a cresol/p-cresol/formaldehyde copolycondensation resin.

On the other hand, alkali-soluble vinyl polymerization type polymers are also used. A specific example is JP-A-54-986
Monomers having an aromatic hydroxyl group as described in Japanese Patent No. 13, such as N-(4-hydroxyphenyl)acrylamide, N-(4-hydroxyphenyl)methacrylamide, 0-1m-1 or p- Copolymers of hydroxystyrene, 0-1In-1 or p-hydroxyphenylmethacrylate-1-, etc. and other monomers, methacrylic acid, acrylic acid and the above-mentioned monomers having aromatic hydroxyl groups or other monomers Examples include copolymers with polymers.

The weight average molecular weight of the alkali-soluble resin is 1,000 to 200,000, more preferably 2.
000 to 100.000 is preferably used. In particular, the effects of the present invention are more pronounced in the case of a novolac resin with a relatively high molecular weight, with a weight average molecular weight of 2,000 to 20.000, more preferably 4.00.
0 to 12,000 phenol m-cresol p
-Cresol/formaldehyde copolycondensation resin or I-cresol/p-cresol/formaldehyde copolycondensation resin. The alkali-soluble tooth content 1 is preferably 30 to 90 mff1%, particularly preferably 50 to 85% by weight, based on the total solid content of the photosensitive composition.

In addition to the materials described above, the photosensitive composition includes a compound that generates a Lewis acid when exposed to light and a compound that develops color, emits color, or changes color when exposed to acid, in order to impart visible image performance upon exposure.
It is also effective to mix and use a fat-sensitizing agent to improve ink adhesion.

As a compound that generates an acid upon exposure to light, the following general formula 1 is used.
or trihaloalkyl or diazonium salt compounds represented by (■) are preferably used.

General formula (1) In the general formula, ><a is a trihaloalkyl group having 1 to 3 carbon atoms, and W is C, N, S, Se.

P, Z are ○, N, S, 3a, P, and Y has a chromophore group, and W,! : Indicates a group consisting of a group of nonmetallic atoms necessary to cyclize Z.

General formula (1), e Ar-N2X In the general formula (2), Ar represents an aryl compound, and X represents a counter ion of an inorganic compound.

As the trihaloalkyl compound represented by the general formula (2), compounds represented by the following general formulas (1), (2), and (2) are preferred.

General 2■ General formula■ General formula V (wherein, Xa is a trihaloalkyl group having 1 to 3 carbon atoms, B is a hydrogen atom or a methyl group, and A is an aryl group including those having an exchange group or Represents one double rope, n
is 0, 1 or 2. ) Specific compounds include oxadiazole compounds having a benzofuran ring as shown in the general formula (■),
2-trichloromethyl-5-((1-methoxystyryl 11,
Examples include 3.4-oxadiazole compounds.

In addition, as compounds of general formulas ① and ②, JP-A-53-3
4-(2,4-dimethoxy-4styryl)-6-dolychloromethyl-2-pyrone compound, 2,4-bis-(trichloromethyl)-6- described in Publication No. 6223
p-methoxystyryl-S-triazine compound, 2.4
-bis-(trichloromethyl)6-p-dimethylaminostyryl=S-triazine compounds and the like.

On the other hand, the diazonium salt compound is preferably a diazonium salt that generates a strong Lewis acid upon exposure to light, and the counter ion of an eyeless compound is recommended as the counter ion moiety. As a specific example, the anion part of a diazonium salt is a fluoride ion, fluoride! ："Element ion, antimony fluoride ion, antimony chloride ion, tin chloride ion, salt (at least one of hibismuth ion and zinc chloride ion)
Aromatic diazonium salt, preferably a diazophenylamine salt.

The concavity contained in the total photosensitive layer composition of the exposed visible image imparting agent is 0.01 to 20% by weight, preferably 0.1 to 20% by weight, more preferably 0.2 to 10% by weight R. .

It is interesting that when these compounds containing trihaloalkyl and the like are added to the photosensitive layer, the heat treatment effect of the present invention, especially the halftone dot reproducibility in a reduced strength film, is remarkable compared to a layer without the addition. However, the causal relationship is not clear.

On the other hand, any compound that forms a salt with an acid can be used as a compound that develops, embellishes, or changes color with an acid, and examples thereof include triphenylmethane dyes, cyanine dyes, diazo dyes, styryl dyes, and the like. Specifically, Victoria Pure Blue BO1 Ethyl Violet, Crystal Violet, Brilliant Green, Paysic Futacin, Eosin, Funinolphthalein, Xylenol Blue, Congo Red, Malachite Green, Oil Blue #603, Oil (Nku#)
312, cresol red, auramine, 4-p-diethylaminophenylimino naphthoquinone, leucomalachite green, leuco crystal violet, and the like. The amount of this dye added is approximately 0 in the total composition of the photosensitive layer.
．． 0.01 to 10% by weight is preferable, more preferably 0.01 to 10% by weight.
05-8 fold ff1%.

In order to improve ink adhesion, the sensitizing agent is preferably a compound having a hydrophobic substituent, especially a polymer compound, such as rose octylphenol formalin novolac resin, rose octylphenol formalin novolac resin, rose 1-butylphenol formalin novolac resin, rose 1- Modified novolak resins such as butylphenolbenzaldehyde resin and rosin-modified novolak resin, and orthonaphthoquinonediazide sulfonic acid esters of these modified novolac resins (esterification rate of OHI of 20 to 70 mol %) are preferably used.

Although the content of these additives varies depending on their type and purpose, it is generally appropriate to range from 0.01 to 20% in the total composition.

Various other additives can be added to the photosensitive layer composition of the photosensitive printing plate of the present invention depending on various purposes.

For example, surfactants such as cellulose alkyl ethers, fluorine surfactants, and silicone compounds are used to improve the coating properties, and acid anhydrides are used as sensitizers, such as geltal anhydride, itaconic anhydride, and tetrahydrophthal anhydride. Examples include acids, phthalic anhydride, etc., and plasticizers such as phosphoric acid ester, phthalic acid ester, polyvinyl butyl ether, etc. as agents for improving the physical properties of the coating film.

The photosensitive layer composition is a coating material dissolved in various solvents, such as cellosolves such as methyl (ethyl) cellosolve and methyl (ethyl) cellosolve acetate, coating solvents such as dimethyl formamide, dimethyl sulfoxide, dioxane, acetone, cyclohexanone, and trichloroethylene. It is formed by applying and drying the grained, anodized aluminum plate support described below.

Specific examples of coating and drying are shown below. Coating methods include generally known coating methods, such as a wire bar coater, a whaler coater, a double roll coater-1 extrusion type coater. As the primary drying conditions after coating, rapid drying conditions at a high temperature for a short time are preferably used in view of productivity, as opposed to conditions for a long time at a low temperature. Specifically, the temperature is about 60° C. to 150° C. for about 10 seconds to 30 minutes, and the air outlet is 2i1/win to 5011/mi.

Next, the heat treatment step, which is a feature of the present invention, will be specifically explained.

In contrast to the primary drying conditions, relatively low temperature and long time conditions are preferably used. Specifically, from 40°C to 100°C for 1 hour to 120 hours, more preferably from 45°C to 65°C.
℃ for 6 to 30 hours.

The lower the humidity, the more preferably the relative humidity is 50% or less, preferably 20% or less.

In addition, when processing photosensitive printing plates by stacking them, it is also effective to insert a mount or the like for each photosensitive printing plate.

Specific examples of the mount include commonly known mounts, such as plastic-coated abrasives, paper mixed with plastic, or general high-quality paper. Preferably it is paper mixed with polyethylene.

Supports used in the present invention include aluminum plates,
Examples include zinc plates, iron plates, plastic plates, and composite materials thereof, such as aluminized iron plates, chrome-plated iron plates, and aluminum-laminated plastic sheets, with aluminum plates being preferred. Further, it is generally preferable that the surface of the support has a grained shape.

Examples of methods for forming the grain shape include mechanical methods and electrolytic etching methods. Examples of mechanical methods include ball polishing, brush polishing, liquid honing, and puff polishing.

Abrasives used in the mechanical polishing method include alumina, silicone carbide, boron carbide, diamond, sand 1-sized stone, granite V4, limestone, artificial emery, steel balls, iron pieces, alundum, and pumice 1-1. , magnesium oxide, etc., and those with desired particle sizes are used. In the electrolytic etching method, phosphoric acid,
Examples include etching methods using solutions containing sulfuric acid, perchloric acid, nitric acid, birophosphoric acid, fluorine S1, etc. When roughening the aluminum material y43i4, the above-mentioned various methods can be selected and used as appropriate depending on the composition of the aluminum material. The various methods described above can be used alone or in combination.

Electrolytic etching is carried out in a bath containing the above-mentioned inorganic acid alone or in a mixture of 2FD or more. Among these, preferred are sulfuric acid, phosphoric acid, hydrochloric acid, nitric acid, or a mixture of two or more of these, and particularly preferred is a bath containing nitric acid or hydrochloric acid as a main component.

More preferably (irI acid).

In addition, there are free materials such as alcohol, acetic anhydride, unsaturated carboxylic acids, etc., and free materials such as potassium chloride and hydrogen peroxide.

Further, colloids such as gelatin and starch, as well as phosphorus, viscous substances, and surfactants can be added to the bath as additives. These additives may be used alone or in combination of two or more. The electrolytic etching bath is prepared by adding the above-mentioned acids and, if necessary, the above-mentioned additives to water.

Bath during electrolytic etching; pear degree is preferably in the range of 10°C to 50°C, current density is 10 to 200Δ, / dI
A range of t is preferred.

A preferred combination is a graining method in which the material is subjected to brush till polishing or honing treatment, followed by electric WH polishing, particularly electrolysis with nitric acid.

Next, the aluminum material can be subjected to anodic treatment to oxidation treatment. When electrolysis is carried out using sulfuric acid, chromic acid, oxalic acid, phosphoric acid, Maron I'll i, and Kitagoso which is a combination of two or more of these as electrolytes, and aluminum is used as an anode, an anodic oxide film is formed on the aluminum surface. It is formed. Suitable electrolytic conditions are an acid concentration of 5 to 85% by weight, a current density of 1 to 60 A/df, and a bath electric potential of 0 to 80°C.

The amount of anodic oxide film formed in this way is 5 to 701I
1 g/dt' is appropriate, preferably 15 to 701 g
/dr, more preferably 20 to 401 g/df
is within the range of

Next, the grained and anodized aluminum plate is sealed by a generally known method. A preferred example thereof is a sealing treatment using hot water.

The photosensitive liquid described above is coated on the support thus produced, which is further heat-treated to provide a photosensitive printing plate with stable quality.

When using the lithographic printing plate material obtained in this way, a known method is applied, in which a positive film is adhered and exposed with an ultra-high pressure mercury lamp, a metal halide lamp, etc., and sodium metasilicate, potassium metasilicate, sodium phosphate, It is developed with an alkaline aqueous solution such as casein soda and supplied as a printing plate.

[Effects of the Invention] The present invention provides extremely excellent printing durability and chemical resistance by performing rapid heat treatment for a longer period of time after drying, and there is no deterioration in performance such as sensitivity during storage. This is an epoch-making product that allows good halftone dot reproducibility even when exposed using a film original.

[Example] The present invention will be described in detail below, but the present invention is not limited thereto.

Example 1 An aluminum plate (material 1050, tempered H16) with a thickness of 0.3 mm was subjected to alkali etching in a 5% aqueous solution of caustic soda at 65°C for 1 minute, then washed with water, and etched in a 1% aqueous nitric acid solution at 25°C. After being immersed for 1 minute to neutralize, it was washed with water. This aluminum plate was placed in a 0.3 mol/litre nitric acid aqueous solution at 30%
After performing electrolytic surface treatment at 60° C. for 30 seconds at a current density of 50 A/df, desmutting was performed at 60° C. for 10 seconds in a 5% caustic soda aqueous solution. After that, it was neutralized and washed with water. Next, anodic oxidation treatment was performed in a 30% sulfuric acid aqueous solution at a temperature of 30''C1 and a current density of 10 A/df for 40 seconds.

The anodized skin 1 was 26+no/dzu. Next 90
A grained aluminum plate was produced by performing a sealing treatment for 20 seconds in warm water at .degree. The average roughness Ra of the grains of the produced aluminum plate was 0.60μ.

Next, extrude the following photosensitive liquid onto this aluminum plate, apply it with a coater, set the temperature to 100°C, and apply the air to rf'1.
Primary drying was performed under the conditions of 10 m3/win, fl; 7 days and 120 seconds. m after application II! m is 2411
(It was 1/di'. Next, use paper blended with polyethylene as a mount, stack 50 sheets, and heat to 50
℃, humidity 3%, time 24 hours! The first principle was developed into a photosensitive lithographic printing plate.

1-5 naphthoquinone (1,2)-diazide (2)-5-sulfonyl chloride and pyrogallol acetone resin <E11A average molecular rR (MW') -1,800° number average molecular group (Mll) -1, Condensation compound of 100) <Molar condensation rate of OH14 -33 mo/L/%> 2 mm parts phenol/m-cresol/p-cresol [composition ratio = 4: 3.6: 2.4 (wt) l
-Formalin novolac resin (MW- 11,000XMn -6,800) 7-fold'J part 2-trichloromethyl-[β(2'-benzofuryl)vinyl]-1,3゜4-oxadiazole 0.06-fold Naphthoquinone (1,2)-diazide (2)-5-sulfonyl chloride and p-octylphenol formalin novolac resin (MW -2,000, Mn -1
, 400) <Molar condensation rate of OH group - 50 mol%> 0.11 parts by weight Victoria Blue Blue BOH (manufactured by Hodogaya Chemical ■) ' 0.08 parts by weight Methyl cellosolve/Ethyl cellosolve = (4/6) 53 parts by weight Using the photosensitive lithographic printing plate thus obtained and the following film original, the operation was evaluated under the following exposure conditions, plate making conditions, and printing conditions.

Film original: 25% halftone dot original has been subjected to power reduction processing, and the average i1 degree of each halftone dot is 2.0.
and Step Tablet No. 2 (manufactured by Kodak ■) 8
Image exposure conditions: Development conditions: 1 Self-development method: Zakura PS version automatic development machine "PS Pl-1"
6 times diluted solution (Konishi Roku Photo Industry 11 Industry 1) 1 present 5! Temperature: 25℃ Development time: 45 seconds Printing conditions: Determination of halftone dot area: ゛'Zakura Area Duck 1000'' (
Roku Konishi Photo Industry (+Wooden) Chemical resistant 2" Ultra Brate Cleaner (U) on printing press
PC)” (A B C-1: Manufactured by Kajtz Co., Ltd.)
L: Clean every 500 sheets of T printing and continue printing (evaluated by number of times of wiping) Next, the photosensitive lithographic printing plate! After being left at room temperature for 6 months, a similar experiment was conducted. The results are shown in Table 2.

Example 2 The same experiment was carried out except that the photosensitive liquid B of Example 1 was used instead.

Photosensitive liquid B Condensation compound of naphthoquinone (1,2)-diazide (2)-5-sulfonyl chloride and pyrogallol acetone resin (Mv = 4,000. Mn = 1,800) <Molar condensation rate of OHM = 33 mol% 〉 Double part cresol (m-cresol/p-cresol = 6/4 (Wt)/Formalin novolac resin (Mw = 9.5001Mn = 4,800) Seven part part 2-trichloromethyl-5-(1) -hydroxystyryl)-1,3゜4-oxadiazole 0.06 parts by weight p-butylphenol formalin novolac resin (Mw = 2,000, : 1Vln
= 1,300) 011 weight All oil blue #603 0.08 parts by weight Methyl cellosolve 53 weight 1 part The results are shown in Table 2.

Example 3.4 The heat treatment conditions of Example 1 (50°C, 24 hours) were changed to 70°C,
The experiment was conducted in the same manner except that the temperature was changed to 6 hours (Example 3) and 50°C for 72 hours (Example 4).

The results are shown in Table 2.

Example 5 In the photosensitive solution A of Example 1, m-cresol/formalin novolac resin (Mw
-1,800, fyjn = 1,300) was used, but the experiment was conducted in the same manner as in Example 1.

The results are shown in Table 2.

Example 6 In the photosensitive solution A of Example 1, p-hydroxyphenyl methacrylamide: acrylonitrile: ethyl acrylate: methacrylic acid (charged molar ratio 15: 28:52:5) (Mw=2
8,000. The experiment was conducted in the same manner as in Actual FF Example 1, except that Mn = 27,200> was used. The results are shown in Table 2.

Examples 7 and 8 Naphthoquinone (1°2)-
In the photosensitive solution (Example 7) excluding only the condensation compound of diazide (2>-5-sulfonyl chloride and p-octylphenol formalin novolac resin), and in photosensitive solution A, 2-trichloromethyl-[β(2' -benzofuryl)vinyl]-1°3.4-Oxadiazole was removed (Example 8), and the operation was evaluated in the same manner. The results are shown in Table 1.

Comparative Examples 1, 2, 3, 4, 5.6 Examples 1.2', 5.6.7. A photosensitive lithographic printing plate was produced in steps 8 and 8 without heat treatment, and an experiment was conducted in the same manner as in Example 1. The results are shown in Table 2.

The correspondence is shown in Table 1.

Table 1 Comparative Example 1: Example 1 without heat treatment Comparative Example 2: Example 2 without heat treatment Comparative Example 3: Example 5 with -C heat treatment Comparative Example 4 of b without heat treatment...Comparative Example 5 of Example 6 without heat treatment...Example 9.10 of Example 7 with no heat treatment The heat treatment conditions (50°C, 24 hours) were changed to 50°C.
8 hours (Example 9), 15 hours at 50°C (Example 10)
) and conducted the same experiment.

The results are shown in Table 2.

As is clear from Table 2, all of Comparative Examples 1 to 6, which were not subjected to long-term heat treatment at low temperatures, had insufficient printing durability and chemical resistance. After storage, τ does not decrease by 1 step, but the sensitivity decreases, the number of solid steps decreases, and the halftone reproducibility with the reduction film is not sufficient before storage. It can be seen that the performance stability of the printing plate is not sufficient.

In contrast, the present invention uses heat treatment at a low temperature for a long period of time, which is a characteristic feature of photosensitive printing plates, so that performance deterioration does not occur even when stored for a long period of time, and chemical resistance is maintained even immediately after production. The company succeeded in developing a photosensitive lithographic printing plate with excellent printing durability and stable quality.

Next, the photosensitive printing plates of Example 1 and Comparative Example 1 were further
The operation was evaluated in the same manner after each heat treatment at 0''C for 24 hours, and the results were almost the same in both cases as in Example 1.Zunawa 15, which had already become a stable photoresist film. was subjected to further heat treatment, but no improvement effect was observed.On the other hand, it is clear that the improvement effect of the photoresist film in an unstable state is also exhibited by additional heat treatment later.Therefore, additional heat treatment It is also possible to determine whether heat treatment has already been performed by observing the effect.

Claims (1)

[Claims] In a photosensitive printing plate having a photosensitive composition containing an o-quinonediazide compound and a non-photosensitive polymer compound on a support, after coating the photosensitive composition,
A method for producing a photosensitive printing plate, characterized by heat treatment at a temperature of 100° C. for 1 hour to 120 hours.