JPS6364613A - Manufacture of thin film magnetic head - Google Patents
Manufacture of thin film magnetic headInfo
- Publication number
- JPS6364613A JPS6364613A JP20903386A JP20903386A JPS6364613A JP S6364613 A JPS6364613 A JP S6364613A JP 20903386 A JP20903386 A JP 20903386A JP 20903386 A JP20903386 A JP 20903386A JP S6364613 A JPS6364613 A JP S6364613A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic pole
- magnetic
- layer
- film
- gap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 23
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 239000010408 film Substances 0.000 claims abstract description 19
- 238000005530 etching Methods 0.000 claims abstract description 13
- 239000000758 substrate Substances 0.000 claims abstract description 11
- 239000010410 layer Substances 0.000 claims description 34
- 238000000034 method Methods 0.000 claims description 15
- 239000000696 magnetic material Substances 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 3
- 239000011229 interlayer Substances 0.000 claims description 2
- 230000001681 protective effect Effects 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract description 2
- 230000002093 peripheral effect Effects 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 229910000889 permalloy Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- LDDQLRUQCUTJBB-UHFFFAOYSA-N ammonium fluoride Chemical compound [NH4+].[F-] LDDQLRUQCUTJBB-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/3116—Shaping of layers, poles or gaps for improving the form of the electrical signal transduced, e.g. for shielding, contour effect, equalizing, side flux fringing, cross talk reduction between heads or between heads and information tracks
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/312—Details for reducing flux leakage between the electrical coil layers and the magnetic cores or poles or between the magnetic cores or poles
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
〔概 要〕
本発明は磁気ディスク装量に用いられるサイドクロスト
ークを低減した薄膜磁気ヘッドの製造方法において、基
板（スライダ）上にギャップ層と対向する両側縁部を傾
斜状にエツチングして断面が台形形状とする第一磁極を
形成し、その第一磁極の周囲に該第一磁極の表面と同一
平面となる段差補正膜を形成した後、第一磁極上にギャ
ップ層を介して断面が矩形形状とする第二磁極を形成す
ることにより、第一磁極先端部とギャップ層を介して対
向する第二磁極先端部との間のギャップ長を当該両側部
で広く形成したものである。[Detailed Description of the Invention] [Summary] The present invention provides a method for manufacturing a thin-film magnetic head that reduces side crosstalk and is used for mounting magnetic disks. After forming a first magnetic pole having a trapezoidal cross section by etching it in an inclined manner, and forming a step correction film that is flush with the surface of the first magnetic pole around the first magnetic pole, a step correction film is formed on the first magnetic pole. By forming the second magnetic pole with a rectangular cross section through the gap layer, the gap length between the first magnetic pole tip and the second magnetic pole tip facing each other through the gap layer can be widened on both sides. It was formed.
本発明は磁気ディスク装置等に用いられる薄膜磁気ヘッ
ドの製造方法に係り、特に高トラツク密度化された磁気
ディスク媒体に対して再生時のサイドクロストークを低
減し得る磁極先端部構造を有する薄膜磁気ヘッドの製造
方法に関するものである。The present invention relates to a method for manufacturing a thin-film magnetic head used in magnetic disk drives, etc., and in particular to a thin-film magnetic head having a magnetic pole tip structure capable of reducing side crosstalk during reproduction of magnetic disk media with high track densities. The present invention relates to a method for manufacturing a head.
近来、磁気ディスク装置においては、高速、大容量化が
急速に進められており、これに伴って磁気ディスク媒体
のクランク密度は益々高められる傾向にある。このため
、トラックの狭幅化に対応して隣接トラックの記録信号
を雑音として再生する、所謂サイドクロストークのない
薄膜磁気ヘッドが必要とされている。In recent years, magnetic disk drives have rapidly become faster and larger in capacity, and as a result, the crank density of magnetic disk media has tended to increase. For this reason, there is a need for a thin film magnetic head free from so-called side crosstalk, which reproduces recorded signals from adjacent tracks as noise in response to narrower tracks.
このような実情から本発明者らは上記の要求を満たす新
しい薄膜磁気ヘッドを特願昭６１−６１６５４号により
既に提案している。Under these circumstances, the present inventors have already proposed a new thin film magnetic head that satisfies the above requirements in Japanese Patent Application No. 61,654/1982.
従来の薄膜磁気ヘッドは、第４図の要部断面図に示すよ
うにスライダとなる基板１１上に第一磁極１２、ギャッ
プ層１３及び層間絶縁層１４を介在した薄膜コイル１５
、第二磁極１６、絶縁保護膜１７が順に積層されている
。該ギャップ層１３を挟んで直接対向する一対の前記磁
極１２．１６の先端部の端面ば、スライダ（基板）１１
の浮上面１８に露出され、磁気ディスク媒体１９と対向
するが、該媒体１９側から見たその磁極先端形状は何れ
も第５図に示すように矩形形状となっている。図中、Ｅ
はギャップ長を示している。A conventional thin film magnetic head has a thin film coil 15 with a first magnetic pole 12, a gap layer 13 and an interlayer insulating layer 14 interposed on a substrate 11 serving as a slider, as shown in a sectional view of the main part in FIG.
, the second magnetic pole 16, and the insulating protective film 17 are laminated in this order. The end surfaces of the tip portions of the pair of magnetic poles 12.16 directly facing each other with the gap layer 13 in between are the slider (substrate) 11.
The magnetic pole tip is exposed on the air bearing surface 18 of the magnetic disk and faces the magnetic disk medium 19, and the shape of the tip of the magnetic pole when viewed from the medium 19 side is rectangular as shown in FIG. In the figure, E
indicates the gap length.
ところが、かかる従来の薄膜磁気ヘッドでは、周知の如
く磁気ディスク媒体１９の記録情報を再生する際に、再
生すべきトランクに隣接したトラックの記録情報も雑音
として再生するという所謂、サイドクロストークが発生
する欠点がある。However, in such conventional thin-film magnetic heads, when reproducing recorded information on the magnetic disk medium 19, so-called side crosstalk occurs in which recorded information on tracks adjacent to the trunk to be reproduced is also reproduced as noise. There are drawbacks to doing so.
このサイドクロストークは、各記録クラブク間に５μｍ
程度の幅のガートバンドと称する非記録再生領域を設け
ることで減少することができるが、しかし前述した高ト
ランク密度化された磁気ディスク媒体では、ガートバン
ドの幅も大きく狭められるので、サイドクロストークの
減少は困難となる。This side crosstalk is 5μm between each recording disc.
This can be reduced by providing a non-recording/reproducing area called a guard band with a certain width, but in the magnetic disk media with high trunk density described above, the width of the guard band is also greatly narrowed, so side crosstalk can be reduced. will be difficult to reduce.
そこで本発明者らは、先に述べたようにこの高トランク
密度の磁気ディスク媒体に対してサイドクロストークが
減少できる新規な薄膜磁気ヘッドを提案している。Therefore, as mentioned above, the present inventors have proposed a new thin film magnetic head that can reduce side crosstalk for this high trunk density magnetic disk medium.
第２図及び第３図はこの薄膜磁気ヘッドの磁極先端部を
示す斜視図と磁気ディスク媒体側から見た磁極先端形状
を示す図である。FIGS. 2 and 3 are a perspective view showing the magnetic pole tip of this thin-film magnetic head and a diagram showing the shape of the magnetic pole tip seen from the magnetic disk medium side.
この両図で明らかな如く、スライダの空気流入端側に位
置する第一磁極２１の先端部の両側縁部は、対向する第
二磁極１６の先端部に対し２１ａと２１ｂで示すように
斜めに切り欠かれ、その部分の磁極２１゜１６間ギャッ
プ長７！ｓは規格のギャップ長！より扇形状に広（形成
されている。As is clear from these figures, both side edges of the tip of the first magnetic pole 21 located on the air inflow end side of the slider are diagonal as shown by 21a and 21b with respect to the tip of the opposing second magnetic pole 16. The gap length between the notch and the magnetic poles 21°16 at that part is 7! s is the standard gap length! It is shaped more like a fan.
このように磁極先端部分の両側縁部のギャップ長を広く
することにより、磁気ディスク媒体２２の記録トラック
２２ａ上の記録信号を再生する場合、ガートバンド２３
を介して隣接する記録トランク２２ｂがらの雑音信号、
即ちサイドクロストーク信号はギャップ損失として低減
される。By widening the gap length on both side edges of the magnetic pole tip in this way, when reproducing the recorded signal on the recording track 22a of the magnetic disk medium 22, the guard band 23
a noise signal from the adjacent recording trunk 22b via the
That is, the side crosstalk signal is reduced as gap loss.
しかし、従来の薄膜磁気ヘッドの製造方法では、第一磁
極１２を形成後、ギャップ層１３を介してそのまま第二
磁極１６を形成するようにしているため、該ギャップ層
１３を形成するに先立って第一＠極１２の先端部の両側
縁部に前記傾斜状の切り火きを形成しても、その後、そ
の部分に被着したギャップ層１３は単に斜めに設けられ
るだけで、ギャップ長は何等かわらない。つまり磁極先
端部の両側縁部のギャップ長のみを部分的に広く形成す
ることは容易でなく、前述した新規提案の薄膜磁気ヘッ
ドの製造を困難にしている。However, in the conventional method for manufacturing a thin film magnetic head, after forming the first magnetic pole 12, the second magnetic pole 16 is directly formed with the gap layer 13 interposed therebetween. Even if the above-mentioned inclined opening is formed on both side edges of the tip of the first @ pole 12, the gap layer 13 deposited on that part is simply provided diagonally, and the gap length is not determined. Unchanged. In other words, it is not easy to partially widen only the gap length at both side edges of the magnetic pole tip, making it difficult to manufacture the newly proposed thin film magnetic head mentioned above.
本発明は上記のような状況に鑑み、磁極先端部のギャッ
プ対向面側の両側縁部を傾斜状の切り欠いた第一磁極を
有する磁気ヘッドにおける第一磁極先端部の切り欠き部
分と対向する第一磁極先端部間のギャップ長を広くした
磁極先端部構造の形成に好適な新規な製造方法を提供す
ることを目的とするものである。In view of the above-mentioned circumstances, the present invention provides a magnetic head having a first magnetic pole in which both side edges of the gap-opposing surface side of the magnetic pole tip are cut out in an inclined shape, so as to face the notched portion of the first magnetic pole tip. It is an object of the present invention to provide a novel manufacturing method suitable for forming a magnetic pole tip structure in which the gap length between the first magnetic pole tips is widened.
本発明は上記目的を達成するため、スライダとなる基板
上に設ける第一磁極を、そのギャップ層に対向する両側
縁部を傾斜状にエツチングして断面形状が台形となるよ
うに形成する工程と、その第一磁極上からその周囲に非
磁性材料層を被着した後、該第一磁極の台形上面の非磁
性材料層部分のみを選択エツチング方法により除去して
前記第一磁極の周囲に該第一磁極の表面と同一平面とな
る段差補正膜を形成する工程を行って、その第一磁極の
先端部とギャップ層を介して対向する第二磁極の先端部
との間のギャップ長を当該両側縁部で広（した構造にす
る。In order to achieve the above object, the present invention includes a step of etching a first magnetic pole provided on a substrate serving as a slider in a slanted manner on both side edges facing the gap layer to form a trapezoidal cross-sectional shape. , after depositing a non-magnetic material layer on and around the first magnetic pole, only a portion of the non-magnetic material layer on the trapezoidal upper surface of the first magnetic pole is removed by a selective etching method so as to cover the first magnetic pole. A step of forming a step correction film that is flush with the surface of the first magnetic pole is performed, and the gap length between the tip of the first magnetic pole and the tip of the second magnetic pole facing each other via the gap layer is determined. Create a wide structure on both sides.
本発明の製造方法では、両側縁部を傾斜状にした断面形
状が台形の第一磁極の周囲に、該第一磁極の表面と同一
平面となる段差補正膜が形成されているため、その第一
磁極先端部上にギャップ層を介して第二磁極先端部を対
向するように形成することにより、該ギャップ層が第一
磁極先端部の断面形成に沿って傾斜して配設されること
がな（、対向する磁極先端部間のギャップ長が両側縁部
において部分的に広くすることが可能となる。In the manufacturing method of the present invention, the step correction film that is flush with the surface of the first magnetic pole is formed around the first magnetic pole having a trapezoidal cross-sectional shape with inclined side edges. By forming the second magnetic pole tip on the tip of one magnetic pole so as to face each other with a gap layer interposed therebetween, the gap layer can be arranged obliquely along the cross-sectional formation of the first magnetic pole tip. (The gap length between the opposing magnetic pole tips can be partially widened at both side edges.
以下図面を用いて本発明の実施例について詳細に説明す
る。Embodiments of the present invention will be described in detail below with reference to the drawings.
第１図は本発明に係る薄膜磁気ヘッドの製造方法の一実
施例を工程順に示した媒体対向面側からみた平面図であ
る。FIG. 1 is a plan view, viewed from the medium facing surface side, showing the process order of an embodiment of the method for manufacturing a thin film magnetic head according to the present invention.
先ず第１図（ａ）に示すようにスライダとなる基板１１
上に、例えばパーマロイからなる磁性層３１を形成し、
該磁性層３１をフォトリソグラフィ工程により第１図（
ｂ）に示すように媒体対向面側を除く周囲の側縁部を傾
斜状にした断面形状が台形となる第一磁極２１を形成す
る。First, as shown in FIG. 1(a), a substrate 11 that will become a slider is prepared.
A magnetic layer 31 made of permalloy, for example, is formed thereon,
The magnetic layer 31 is formed by a photolithography process as shown in FIG.
As shown in b), the first magnetic pole 21 is formed to have a trapezoidal cross-sectional shape with the surrounding side edges, excluding the side facing the medium, inclined.
この断面台形形状の第一磁極２１を形成する方法として
は、前記基板１１上にパーマロイからなる磁性層３１を
スパッタリング法、或いは弯着法等により、例えば１５
０℃程度の基板温度で成膜した第一磁性膜上に３０℃程
度の基板温度で第二Ｗ性膜を成膜した二層構成に形成し
、この磁性層３１上に磁極形成用のレジストパターンを
設けると共に、そのパターンを遮光マスクにして、例え
ばＨ２ＳＯ４＋ Ｈ２Ｏ２１Ｈ２０＋ ＮＨ４Ｆ 、
ＣＲＨ２ｎ＋１０Ｈからなるエツチング液を用いてエツ
チングを行うことにより、成膜温度によりエツチング速
度が異なることを利用して断面台形形状の第一磁極２１
を容易に形成することができる。As a method for forming the first magnetic pole 21 having a trapezoidal cross section, for example, a magnetic layer 31 made of permalloy is formed on the substrate 11 by a sputtering method or a curved deposition method.
A two-layer structure is formed in which a second W film is formed at a substrate temperature of about 30°C on a first magnetic film formed at a substrate temperature of about 0°C, and a resist for forming a magnetic pole is formed on this magnetic layer 31. A pattern is provided and the pattern is used as a light-shielding mask, for example, H2SO4+ H2O21H20+ NH4F,
By performing etching using an etching solution consisting of CRH2n+10H, the first magnetic pole 21 having a trapezoidal cross section is formed by taking advantage of the fact that the etching rate varies depending on the film forming temperature.
can be easily formed.
次に第１図ｆｃ）に示すように第一磁極２１を含む基板
１１上に該第一磁極２１と同様な厚さの５ｉ０２．また
はＭ２Ｏ３からなる非磁性材料層３２を被着し、その表
面に、前記第一磁極２１と対応する領域が露出するレジ
ストパターン３３を形成する。Next, as shown in FIG. 1 fc), a 5i02. Alternatively, a nonmagnetic material layer 32 made of M2O3 is deposited, and a resist pattern 33 is formed on the surface thereof, exposing a region corresponding to the first magnetic pole 21.
次に第１図（ｄ）に示すように該レジストパターン３３
を遮光マスクにして、該非磁性材料層３２が５ｉ０２で
ある場合にはＨＦ、Ｎ１−１４Ｆ及びエチレングリコー
ルからなるエツチング液を用いて前記第一磁極２１０表
面が露出するようにエツチングを行う。このエツチング
工程としては上記工程のかわりに、例えばＭマスクパタ
ーンを用い、ＣＦａと０２のエツチングガスによるプラ
ズマエツチング工程を通用しても良い。Next, as shown in FIG. 1(d), the resist pattern 33
When the non-magnetic material layer 32 is made of 5i02, etching is performed using an etching solution consisting of HF, N1-14F and ethylene glycol so that the surface of the first magnetic pole 210 is exposed using a light-shielding mask. For this etching process, instead of the above process, for example, an M mask pattern may be used and a plasma etching process using etching gases of CFa and 02 may be used.
その後、前記レジストパターン３３を除去することによ
り第１図（ｅ）に示すように前記第−Ｍ１極２１の周囲
に該磁極２１の表面と同一レベルの平面となる段差補正
膜３４が形成される。Thereafter, by removing the resist pattern 33, a step correction film 34 is formed around the -M1 pole 21 to have a plane on the same level as the surface of the magnetic pole 21, as shown in FIG. 1(e). .
従って、第１図（ｆｌに示すように引続き前記同一平面
である第一磁極２１及び段差補正膜３４上に５ｉ０２、
またはＡｌ２Ｏ３からなるギャップ層１３を被着し、そ
の表面に更に図示しない眉間絶縁層を介在した薄膜コイ
ルと、断面矩形形状の第二磁極１６及び５ｉＯ７、また
はＡｊ２０．からなる保護膜３５を順に形成する。Therefore, as shown in FIG. 1 (fl), 5i02,
Alternatively, a thin film coil on which a gap layer 13 made of Al2O3 is deposited and a glabella insulating layer (not shown) interposed on the surface thereof, and second magnetic poles 16 and 5iO7 having a rectangular cross section, or Aj20. A protective film 35 consisting of the following is sequentially formed.
そして上記第一、第二磁極２１．１６先婦が露出した面
を所望の浮上形状面に切削研磨仕上げ加工することによ
り、前記第一磁極２１の先端部とギャップ層１３を介し
て対向する第二磁極１６の先端部との間のギャップ長を
当該両側縁部で広（構成することが可能となった。Then, the exposed surfaces of the first and second magnetic poles 21 and 16 are cut and polished into a desired floating shape surface, thereby forming the first and second magnetic poles 21 and 16 facing each other with the gap layer 13 interposed therebetween. It is now possible to widen the gap length between the tips of the two magnetic poles 16 at both side edges.
以上の説明から明らかなように、本発明に係る薄膜磁気
ヘッドの製造方法によれば、両側縁部を傾斜状にした断
面形状が台形の第一磁極の周囲に、該第一磁極の表面と
同一平面となる段差補正膜を形成し、その第一磁極及び
差補正膜上にギャップ層を介して第二磁極を対向配置す
ることで、対向する第一、第二磁極先端部間のギャップ
長が両側縁部において部分的に広くした薄膜磁気ヘッド
を容易に製造することができる。As is clear from the above description, according to the method for manufacturing a thin film magnetic head according to the present invention, the surface of the first magnetic pole and the surface of the first magnetic pole are By forming step correction films that are on the same plane and arranging the second magnetic pole facing each other on the first magnetic pole and the difference correction film with a gap layer interposed therebetween, the gap length between the opposing first and second magnetic pole tips can be reduced. It is possible to easily manufacture a thin film magnetic head in which the width is partially widened at both side edges.
従って、高トラツク密度の磁気ディスク媒体の記録・再
生に通用して極めて有利である。Therefore, it is extremely advantageous for use in recording and reproducing magnetic disk media with high track density.
第１図は本発明に係る薄膜磁気ヘッドの製造方法の一実
施例を工程順に示した媒体対
向面側からみた平面図、
第２図は本発明を適用した薄膜磁気ヘッドの磁極先端部
を示す斜視図、
第３図は本発明を適用した薄膜磁気ヘッドの磁極先端形
状を示す図、
築４図は従来の薄膜磁気ヘッドを説明するための要部断
面図、
第５図は従来の薄膜磁気ヘッドの磁極先端形状を説明す
るための図である。
第１図乃至第３図において、
１１は基板（スライダ）、１３はギャップ層、１６は第
二磁極、２１は第一磁極、３１は磁性層、３２は非磁性
材料層、３３はレジストパターン、３４は段差補正膜、
３５は保護膜をそれぞれ示す。
一木 ■
Ｎ−八FIG. 1 is a plan view of an embodiment of a method for manufacturing a thin film magnetic head according to the present invention, viewed from the medium facing surface side, showing the process order, and FIG. 2 is a diagram showing the tip of a magnetic pole of a thin film magnetic head to which the present invention is applied. A perspective view, FIG. 3 is a diagram showing the shape of the magnetic pole tip of a thin film magnetic head to which the present invention is applied, FIG. FIG. 3 is a diagram for explaining the shape of the magnetic pole tip of the head. 1 to 3, 11 is a substrate (slider), 13 is a gap layer, 16 is a second magnetic pole, 21 is a first magnetic pole, 31 is a magnetic layer, 32 is a non-magnetic material layer, 33 is a resist pattern, 34 is a step correction film;
35 indicates a protective film. Ichiki ■ N-8
Claims (1)
ャップ層（１３）を順に形成し、その表面にそれぞれ層
間絶縁層を介して薄膜コイル及び第二磁極（１６）を積
層形成して磁気ヘッドを製造する方法において、 上記第一磁極（２１）上にギャップ層（１３）を形成す
るに先立って、その第一磁極（２１）のギャップ層（１
３）に対向する両側縁部を傾斜状にエッチングして断面
形状が台形となるように形成する工程と、その第一磁極
（２１）上からその周囲に非磁性材料層（３２）を被着
した後、該第一磁極（２１）の台形上面の非磁性材料層
（３２）部分のみをエッチング除去して前記第一磁極（
２１）の周囲に該第一磁極（２１）の表面と同一平面と
なる段差補正膜（３４）を形成する工程を行って、第一
磁極（２１）の先端部にギャップ層（１３）を介して対
向する第二磁極（１６）の先端部との間のギャップ長を
当該両側部で広く形成することを特徴とする薄膜磁気ヘ
ッドの製造方法。[Claims] A first magnetic pole (21) and a gap layer (13) are formed in this order on a substrate (11) that becomes a slider, and a thin film coil and a second magnetic pole (16) are formed on the surface of the substrate through an interlayer insulating layer, respectively. ) of the first magnetic pole (21), prior to forming the gap layer (13) on the first magnetic pole (21), the gap layer (13) of the first magnetic pole (21) is laminated.
3) A step of etching the opposite side edges in an inclined manner to form a trapezoidal cross-sectional shape, and depositing a non-magnetic material layer (32) on and around the first magnetic pole (21). After that, only the non-magnetic material layer (32) portion on the trapezoidal upper surface of the first magnetic pole (21) is etched away to remove the first magnetic pole (21).
21) to form a step correction film (34) that is flush with the surface of the first magnetic pole (21), and a gap layer (13) is formed on the tip of the first magnetic pole (21). A method for manufacturing a thin-film magnetic head, characterized in that the gap length between the opposite end of the second magnetic pole (16) is made wider on both sides.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20903386A JPS6364613A (en) | 1986-09-04 | 1986-09-04 | Manufacture of thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20903386A JPS6364613A (en) | 1986-09-04 | 1986-09-04 | Manufacture of thin film magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6364613A true JPS6364613A (en) | 1988-03-23 |
Family
ID=16566141
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20903386A Pending JPS6364613A (en) | 1986-09-04 | 1986-09-04 | Manufacture of thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6364613A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0390347A2 (en) * | 1989-03-28 | 1990-10-03 | Quantum Corporation | Recording head to optimize high density recording |
| EP0399800A2 (en) * | 1989-05-26 | 1990-11-28 | Seagate Technology International | Thin film magnetic head manufacturing method |
| EP0536032A2 (en) * | 1991-09-30 | 1993-04-07 | Quantum Corporation | Thin film read/write head for minimizing erase fringing and method of making the same |
-
1986
- 1986-09-04 JP JP20903386A patent/JPS6364613A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0390347A2 (en) * | 1989-03-28 | 1990-10-03 | Quantum Corporation | Recording head to optimize high density recording |
| EP0399800A2 (en) * | 1989-05-26 | 1990-11-28 | Seagate Technology International | Thin film magnetic head manufacturing method |
| EP0536032A2 (en) * | 1991-09-30 | 1993-04-07 | Quantum Corporation | Thin film read/write head for minimizing erase fringing and method of making the same |
| EP0536032A3 (en) * | 1991-09-30 | 1994-03-02 | Digital Equipment Corp |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6801379B2 (en) | Multi-magnetic recording head, and magnetic recording method and magnetic recording apparatus using the same | |
| JPS60163214A (en) | Magnetic head and its manufacturing method | |
| JPH0695367B2 (en) | Magnetic head | |
| JPH04310621A (en) | Magnetic recording medium | |
| JPH0785289B2 (en) | Method of manufacturing magnetic head | |
| JPS6364613A (en) | Manufacture of thin film magnetic head | |
| JPH09153204A (en) | Production of thin film magnetic head | |
| JPS6142716A (en) | Thin-film magnetic head | |
| US7800862B1 (en) | Magnetic recording head having secondary sub-gaps | |
| JPH0765322A (en) | Floating type thin film head and its production | |
| JP3639529B2 (en) | Thin film magnetic head and method of manufacturing thin film magnetic head | |
| JPS62217416A (en) | Manufacture of thin film magnetic head | |
| JPH11283347A (en) | Manufacture of slider and slider | |
| JPS62219218A (en) | Manufacture of thin film magnetic head | |
| JPH04205705A (en) | Thin film magnetic head and magnetic disk device | |
| JPH01158617A (en) | Perpendicular magnetic recording medium | |
| JPH0877520A (en) | Thin-film magnetic head | |
| JPS62234214A (en) | Production of magnetic head | |
| JPH0636221A (en) | Magnetic head and its manufacture | |
| JPH08138211A (en) | Thin-film magnetic head | |
| JPS61210510A (en) | Manufacture of thin-film magnetic head | |
| JPH06150246A (en) | Production of thin film magnetic head | |
| JPH09305919A (en) | Composite type thin film magnetic head and its manufacture | |
| JPH087212A (en) | Production of magnetic head | |
| JPH11273024A (en) | Thin film magnetic head and its manufacture |