JPS6363897B2 - - Google Patents

Info

Publication number
JPS6363897B2
JPS6363897B2 JP8251881A JP8251881A JPS6363897B2 JP S6363897 B2 JPS6363897 B2 JP S6363897B2 JP 8251881 A JP8251881 A JP 8251881A JP 8251881 A JP8251881 A JP 8251881A JP S6363897 B2 JPS6363897 B2 JP S6363897B2
Authority
JP
Japan
Prior art keywords
sheet
photosensitive resin
photosensitive
resin plate
biaxially stretched
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8251881A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57198464A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP8251881A priority Critical patent/JPS57198464A/ja
Publication of JPS57198464A publication Critical patent/JPS57198464A/ja
Publication of JPS6363897B2 publication Critical patent/JPS6363897B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68Preparation processes not covered by groups G03F1/20 - G03F1/50

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP8251881A 1981-06-01 1981-06-01 Manufacture of printing plate surface Granted JPS57198464A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8251881A JPS57198464A (en) 1981-06-01 1981-06-01 Manufacture of printing plate surface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8251881A JPS57198464A (en) 1981-06-01 1981-06-01 Manufacture of printing plate surface

Publications (2)

Publication Number Publication Date
JPS57198464A JPS57198464A (en) 1982-12-06
JPS6363897B2 true JPS6363897B2 (enrdf_load_stackoverflow) 1988-12-08

Family

ID=13776751

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8251881A Granted JPS57198464A (en) 1981-06-01 1981-06-01 Manufacture of printing plate surface

Country Status (1)

Country Link
JP (1) JPS57198464A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0677370U (ja) * 1992-03-10 1994-10-28 豊治 宮本 簡易映像送受信装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108535953B (zh) * 2018-03-29 2021-08-10 上海华力集成电路制造有限公司 光刻掩模版

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0677370U (ja) * 1992-03-10 1994-10-28 豊治 宮本 簡易映像送受信装置

Also Published As

Publication number Publication date
JPS57198464A (en) 1982-12-06

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