JPS6359279B2 - - Google Patents

Info

Publication number
JPS6359279B2
JPS6359279B2 JP1954683A JP1954683A JPS6359279B2 JP S6359279 B2 JPS6359279 B2 JP S6359279B2 JP 1954683 A JP1954683 A JP 1954683A JP 1954683 A JP1954683 A JP 1954683A JP S6359279 B2 JPS6359279 B2 JP S6359279B2
Authority
JP
Japan
Prior art keywords
laser
monitor
groove
photodetector
semiconductor laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1954683A
Other languages
Japanese (ja)
Other versions
JPS59119784A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1954683A priority Critical patent/JPS59119784A/en
Publication of JPS59119784A publication Critical patent/JPS59119784A/en
Publication of JPS6359279B2 publication Critical patent/JPS6359279B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/026Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
    • H01S5/0262Photo-diodes, e.g. transceiver devices, bidirectional devices
    • H01S5/0264Photo-diodes, e.g. transceiver devices, bidirectional devices for monitoring the laser-output

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)
  • Weting (AREA)

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は光検出部(モニタ)とレーザとが同一
基板(チツプ)上に形成してあるモニタ付半導体
レーザに係り、特に両者の十分な光学的結合を達
成し得るモニタ付半導体レーザ素子に関する。
[Detailed Description of the Invention] [Field of Application of the Invention] The present invention relates to a semiconductor laser with a monitor in which a photodetector (monitor) and a laser are formed on the same substrate (chip), and particularly relates to a semiconductor laser with a monitor in which a photodetector (monitor) and a laser are formed on the same substrate (chip). The present invention relates to a semiconductor laser device with a monitor that can achieve optical coupling.

〔従来技術〕[Prior art]

従来のこの種のモニタ付半導体レーザの一例
は、InP/InGaAsPを用いたダブルヘテロ構造の
化合物半導体の結晶にストライプ状の金属電極が
付けてあり、かつ当該結晶の中央部で該電極に直
交する方向に化学的あるいは物理的な蝕刻によつ
て蝕刻溝部が形成してあり、該溝部に対して片側
をレーザとして、また他方の側を光検出部として
用いるものである。なお、該光検出部とレーザと
は同一断面構造を持つているが、電気的には逆向
きにバイアス電圧を掛けて用いられる(ビー・ア
イ・ミラとケイ・イガによる、アプライド・フイ
ジツクス・レターズ(B.I.Miller and K.Iga,
Appl,Phys.Lett.)の37巻4号339頁(1980年))。
An example of a conventional semiconductor laser with a monitor of this type has a striped metal electrode attached to a double heterostructure compound semiconductor crystal using InP/InGaAsP, and is perpendicular to the electrode in the center of the crystal. An etched groove is formed in the direction by chemical or physical etching, and one side of the groove is used as a laser and the other side is used as a photodetector. Although the photodetector and the laser have the same cross-sectional structure, they are electrically applied with bias voltages in opposite directions (Applied Physics Letters by B.I. Mira and K. Iga). (BI Miller and K.Iga,
Appl, Phys. Lett., Vol. 37, No. 4, p. 339 (1980)).

ここで、レーザと光検出部とを分離する溝の部
分に面する両者の蝕刻端面の深さ方向の傾きが適
当でないと、両者の光学的結合が不適切となつて
所期の機能を望むことができない。即ち、その傾
きが大き過ぎると、十分な量のレーザの出力光が
光検出部の活性部分に到達しないし、一方小さ過
ぎると、両者がダブルキヤビテイを形成する結
果、不要な相互作用(クロストーク)が起る。し
かしながら、上記の公知例では、溝部に面する両
者の端面の深さ方向のそれぞれの傾きには何も限
定がなされていない。ところが、実際には上述の
ように、この傾きが重要な意味を持つている。
Here, if the inclination in the depth direction of the etched end faces of both laser and photodetector facing the groove separating them is not appropriate, the optical coupling between the two will be inappropriate, and the desired function will not be achieved. I can't. That is, if the slope is too large, a sufficient amount of laser output light will not reach the active part of the photodetector, while if it is too small, the two will form a double cavity, resulting in unnecessary interaction (crosstalk). happens. However, in the above-mentioned known example, there is no limitation on the respective inclinations in the depth direction of both end faces facing the groove. However, in reality, as mentioned above, this slope has an important meaning.

〔発明の目的〕[Purpose of the invention]

本発明はこのような実情に鑑みてなされたもの
で、その目的はレーザと光検出部との十分な光学
的結合を達成すると同時に、両者の間の不要な相
互作用を阻止し得る、蝕刻溝部に面する両者の端
面の深さ方向の適正な傾きを有するモニタ付半導
体レーザを提供するにある。
The present invention has been made in view of the above circumstances, and its purpose is to provide an etched groove portion that can achieve sufficient optical coupling between the laser and the photodetector and at the same time prevent unnecessary interaction between the two. It is an object of the present invention to provide a semiconductor laser with a monitor, in which both end faces facing the surface have an appropriate inclination in the depth direction.

〔発明の概要〕[Summary of the invention]

この目的を達成するために本発明のモニタ付半
導体レーザは、層状結晶の層面に直角な方向に対
して5゜以上15゜以下の角度を有する深さ方向に末
広がりの溝部を有することを特徴としている。
In order to achieve this object, the semiconductor laser with a monitor of the present invention is characterized by having a groove portion that widens in the depth direction and has an angle of 5° or more and 15° or less with respect to the direction perpendicular to the layer plane of the layered crystal. There is.

即ち、溝部に面する光検出部とレーザのそれぞ
れの端面の傾きを5゜以上にすることによつて、光
検出器からの光がレーザに逆浸入しないようにす
ると同時に、15゜以下にすることによつて、レー
ザから出た光が十分な量だけ光検出部の活性層に
投射するように設計した。なお、この角度限界
は、GaAs/GaAlAs,InP/InGaAsPを用いた
波長域0.6〜1.7μmのすべての装置について、−50
℃〜+100℃の温度域において当てはまることが
フレネルの法則から導かれる。
That is, by making the inclination of the end faces of the photodetector and the laser facing the groove part 5 degrees or more, the light from the photodetector is prevented from entering the laser back, and at the same time, the inclination is 15 degrees or less. In particular, the design is such that a sufficient amount of light emitted from the laser is projected onto the active layer of the photodetector. Note that this angle limit is -50 for all devices using GaAs/GaAlAs, InP/InGaAsP in the wavelength range of 0.6 to 1.7 μm.
It is derived from Fresnel's law that this applies in the temperature range from ℃ to +100℃.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明の一実施例を第1図に基づいて説
明する。第1図は本発明の一実施例のモニタ付半
導体レーザの断面模式図である。本実施例のモニ
タ付半導体レーザは、GaAs/GaAlAsによつて
作られたダブルヘテロ構造の結晶に、湿式化学蝕
刻によつて、図示のような溝部を形成することに
よつて、光検出器とレーザを同一基板上に形成し
た。この図において、1はn型GaAs基板、2は
n型GaAlAsクラツド層、3はn型GaAs活性層、
4はP型GaAlAsクラツド層、5はP型GaAsキ
ヤツプ層、6は金属電極、7は光検出部(光検出
器)、8はレーザ部(レーザ)、9は溝部、10,
11は溝部9に面する光検出部7とレーザ部8の
それぞれの蝕刻端面、12,13は蝕刻端面1
0,11の傾き、即ち、層状結晶の各層面に対し
て蝕刻端面10,11が成す角度である。本発明
のモニタ付半導体レーザは、蝕刻端面10,11
の傾き12,13を5゜以上15゜以下にすることに
よつて、所期の目的を達成することができた。即
ち、受光効率を70%以上に保ち、かつ光検出部7
の内部で反射した光がほとんどレーザ部8に逆浸
入しないで、不要な相互作用が起こらない安定し
た動作が達成された。なお、5゜以上15゜以下の傾
きを得るためには、H3PO4:H2O2
HOCH2CH2OH(エチレングリコール)の(1:
1:3)の溶液を用いて、蝕刻面の傾きが活性層
(第1図においてはnGaAs活性層3)の位置でち
ようと5゜以上15゜以下の角度になるように、刻蝕
刻面を観察しつつ蝕刻時間を注意深く管理した。
蝕刻溶液はこの他に、NH4OH/H2O2
H3PO4/H2O2、Br2/CH3OHなどを用いてもよ
い。また、InP/InGaAsPの結晶に溝部9を作る
のに用いる蝕刻溶液としては、HCl:
CH3COOH:H2O2の(1:2:1)の溶液がよ
い。いずれの場合にも、基板結晶の方位によつて
蝕刻面の傾き方が異るので、あらかじめ使用する
面方位について、蝕刻特性を把握しておく必要が
ある。なお特に、第1図に示すように、蝕刻面が
逆メサ方向、即ち、少量蝕刻した場合に、断面が
上に広がつた台形14になるような方向を選んだ
場合に、この角度の制御がうまくいく。
An embodiment of the present invention will be described below with reference to FIG. FIG. 1 is a schematic cross-sectional view of a semiconductor laser with a monitor according to an embodiment of the present invention. The semiconductor laser with a monitor of this embodiment is constructed by forming a groove as shown in the figure in a double heterostructure crystal made of GaAs/GaAlAs by wet chemical etching. A laser was formed on the same substrate. In this figure, 1 is an n-type GaAs substrate, 2 is an n-type GaAlAs clad layer, 3 is an n-type GaAs active layer,
4 is a P-type GaAlAs clad layer, 5 is a P-type GaAs cap layer, 6 is a metal electrode, 7 is a photodetector (photodetector), 8 is a laser unit (laser), 9 is a groove, 10,
Reference numeral 11 indicates the etched end surfaces of the photodetector section 7 and the laser section 8 facing the groove section 9, and 12 and 13 indicate the etched end surfaces 1.
0.11, that is, the angle formed by the etched end faces 10 and 11 with respect to each layer plane of the layered crystal. The monitor-equipped semiconductor laser of the present invention has etched end faces 10 and 11.
By making the slopes 12 and 13 of 5° or more and 15° or less, the desired purpose could be achieved. In other words, the light receiving efficiency is maintained at 70% or more, and the light detecting section 7
Almost no light reflected inside the laser unit 8 enters back into the laser unit 8, and stable operation without unnecessary interaction is achieved. In addition, in order to obtain a slope of 5° or more and 15° or less, H 3 PO 4 :H 2 O 2 :
HOCH 2 CH 2 OH (ethylene glycol) (1:
Using a solution of 1:3), the etched surface was etched so that the inclination of the etched surface was between 5° and 15° at the position of the active layer (nGaAs active layer 3 in Figure 1). The etching time was carefully controlled while observing.
In addition to this, the etching solution includes NH 4 OH/H 2 O 2 ,
H 3 PO 4 /H 2 O 2 , Br 2 /CH 3 OH, etc. may also be used. Furthermore, the etching solution used to create the groove 9 in the InP/InGaAsP crystal is HCl:
A solution of CH 3 COOH:H 2 O 2 (1:2:1) is good. In either case, since the inclination of the etched surface differs depending on the orientation of the substrate crystal, it is necessary to know in advance the etching characteristics of the surface orientation to be used. In particular, as shown in FIG. 1, when the etched surface is selected in the reverse mesa direction, that is, when a small amount of etching is performed, the cross section becomes a trapezoid 14 that spreads upward, and this angle control is effective. works fine.

上記のように、本発明のモニタ付半導体レーザ
は、層状結晶の層面に直角な方向に対して5゜以上
15゜以下の角度を有する深さ方向に末広がりの溝
部を有していることにより、光検出部の感度を安
定させると同時に、レーザ出力も安定させ、両者
の十分な光学的結合を達成して両者間の不要な相
互作用を防止することができ、単体レーザと同等
の出力及びモード特性を得ることができる効果が
ある。
As mentioned above, the semiconductor laser with a monitor according to the present invention has an angle of 5° or more with respect to the direction perpendicular to the layer plane of the layered crystal.
By having a groove that widens in the depth direction with an angle of 15 degrees or less, it stabilizes the sensitivity of the photodetector and at the same time stabilizes the laser output, achieving sufficient optical coupling between the two. Unnecessary interaction between the two can be prevented, and output and mode characteristics equivalent to those of a single laser can be obtained.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例のモニタ付半導体レ
ーザの断面模式図である。 1……n型GaAs基板、2……n型GaAlAsク
ラツド層、3……n型GaAs活性層、4……P型
GaAlAsクラツド層、5……P型GaAsキヤツプ
層、6……金属電極、7……光検出部、8……レ
ーザ部、9……溝部、10,11……蝕刻端面、
12,13……傾き。
FIG. 1 is a schematic cross-sectional view of a semiconductor laser with a monitor according to an embodiment of the present invention. 1...n-type GaAs substrate, 2...n-type GaAlAs cladding layer, 3...n-type GaAs active layer, 4...P-type
GaAlAs cladding layer, 5... P-type GaAs cap layer, 6... Metal electrode, 7... Photodetection section, 8... Laser section, 9... Groove section, 10, 11... Etched end surface,
12, 13...Inclination.

Claims (1)

【特許請求の範囲】[Claims] 1 化合物半導体の層状結晶の一部分に形成され
た溝部によつて分離される光検出部とレーザ部と
を同一基板上に有するモニタ付半導体レーザにお
いて、上記溝部が、上記層状結晶の層面に直角な
方向に対して5゜以上15゜以下の角度を有する深さ
方向に末広がりの溝部であることを特徴とするモ
ニタ付半導体レーザ素子。
1. In a semiconductor laser with a monitor, which has a photodetecting section and a laser section on the same substrate, which are separated by a groove formed in a part of a layered crystal of a compound semiconductor, the groove is perpendicular to the layer plane of the layered crystal. 1. A semiconductor laser device with a monitor, characterized in that the groove portion widens in the depth direction and has an angle of 5° or more and 15° or less with respect to the direction.
JP1954683A 1982-12-24 1982-12-24 Monitor built-in semiconductor laser element Granted JPS59119784A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1954683A JPS59119784A (en) 1982-12-24 1982-12-24 Monitor built-in semiconductor laser element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1954683A JPS59119784A (en) 1982-12-24 1982-12-24 Monitor built-in semiconductor laser element

Publications (2)

Publication Number Publication Date
JPS59119784A JPS59119784A (en) 1984-07-11
JPS6359279B2 true JPS6359279B2 (en) 1988-11-18

Family

ID=12002310

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1954683A Granted JPS59119784A (en) 1982-12-24 1982-12-24 Monitor built-in semiconductor laser element

Country Status (1)

Country Link
JP (1) JPS59119784A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6272179A (en) * 1985-09-25 1987-04-02 Sharp Corp Manufacture of thin compound semiconductor device
JPH0654823B2 (en) * 1986-02-21 1994-07-20 日本電信電話株式会社 Light emitting / receiving element
KR101009652B1 (en) 2008-10-24 2011-01-19 주식회사 에피밸리 Iii-nitride semiconductor light emitting device

Also Published As

Publication number Publication date
JPS59119784A (en) 1984-07-11

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