JPS6357367B2 - - Google Patents
Info
- Publication number
- JPS6357367B2 JPS6357367B2 JP28570785A JP28570785A JPS6357367B2 JP S6357367 B2 JPS6357367 B2 JP S6357367B2 JP 28570785 A JP28570785 A JP 28570785A JP 28570785 A JP28570785 A JP 28570785A JP S6357367 B2 JPS6357367 B2 JP S6357367B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon carbide
- graphite
- molded container
- quartz glass
- molding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 51
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 47
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 45
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 40
- 229910002804 graphite Inorganic materials 0.000 claims description 39
- 239000010439 graphite Substances 0.000 claims description 39
- 238000000465 moulding Methods 0.000 claims description 24
- 239000002002 slurry Substances 0.000 claims description 18
- 238000010438 heat treatment Methods 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 11
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 6
- 239000004744 fabric Substances 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000004927 fusion Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910021431 alpha silicon carbide Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007496 glass forming Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B40/00—Preventing adhesion between glass and glass or between glass and the means used to shape it, hold it or support it
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
- C03B11/086—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/10—Die base materials
- C03B2215/12—Ceramics or cermets, e.g. cemented WC, Al2O3 or TiC
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
- C03B2215/22—Non-oxide ceramics
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、石英ガラス成形容器の前処理方法に
関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for pretreating a quartz glass molded container.
［従来の技術］
天然もしくは、人工合成石英ガラスを所望の内
面形状を有するグラフアイト製成形容器を使用し
て高温下で加圧成形する石英ガラス成形方法は公
知である。例えば、特開昭57−67031号には、グ
ラフアイト製成形容器を使用して、石英ガラスを
1700℃以上で、加熱加圧する成形方法が示されて
いる。また特開昭57−92528号にも同様にグラフ
アイト製成形容器を使用して、1850℃以上で、加
熱加圧して石英ガラスを成形する方法が示されて
いる。成形容器の材質としては、高温度下で加圧
するため、高温度で強度低下のないことおよび石
英ガラスとの反応融着等の少ないことなどの制約
条件から、高純度のグラフアイトが最も適してい
る。[Prior Art] A quartz glass forming method is known in which natural or artificial synthetic quartz glass is pressure-formed at high temperature using a graphite molded container having a desired inner surface shape. For example, in Japanese Patent Application Laid-Open No. 57-67031, a molded container made of graphite is used to store quartz glass.
A molding method using heat and pressure at 1700°C or higher is indicated. JP-A No. 57-92528 also discloses a method of molding quartz glass by heating and pressurizing the container at 1850° C. or higher using a graphite molding container. As the material for the molded container is pressurized at high temperatures, high-purity graphite is the most suitable material due to constraints such as no loss of strength at high temperatures and minimal reaction and fusion with quartz glass. There is.
［発明の解決しようとする問題点］
前述のように石英ガラスの高純度下での加圧成
形には、グラフアイト製成形容器が使用されてい
るが、実際の使用に於ては、石英ガラスとグラフ
アイトの反応による成形容器の消耗、あるいは石
英ガラスと成形容器が反応融着して、それらの熱
膨張係数が異なる為、冷却時に石英ガラスにクラ
ツクが発生して、成形歩留りが著しく低下してし
まうというような問題があつた。これらの問題を
解決するために、例えば、特開昭57−92528号で
は成形容器内面、即ち石英ガラスとの接触面に、
グラフアイト質繊維布を内張りしている。しかし
この方法では、高価なグラフアイト質繊維布の再
利用が困難であり、また繊維布が多孔性であるた
め、寸法精度良く加圧成形することが困難であ
る。また特開昭57−67031号では、厚さ10〜
1000μmのαもしくはβ炭化珪素を内面被覆した
グラフアイト製成形容器、あるいは、10〜
1000μmの厚さのすす状炭素を設けたグラフアイ
ト製成形容器を使用している。このうち、すす状
炭素の場合には、P.D.ミラーの報告（J.Am.
Ceram.Soc.，62［３，４］147―149（1979））に
あるように炭素と石英ガラスの反応速度が炭化珪
素と石英ガラスとの反応速度に比べて大きく、し
かもすす状炭素であるため表面積が大きくすす状
炭素の消耗が激しくなり、成形作業毎にすす状炭
素層を新しく設けなければならず、工程が煩雑と
なる。[Problems to be solved by the invention] As mentioned above, graphite molded containers are used for pressure molding of quartz glass under high purity conditions, but in actual use, quartz glass The molding container is consumed due to the reaction between the graphite and the silica glass, or the silica glass and the molding container react and fuse, resulting in different coefficients of thermal expansion, which can cause cracks in the silica glass during cooling, resulting in a significant drop in molding yield. I had a problem where it turned out to be wrong. In order to solve these problems, for example, in Japanese Patent Application Laid-Open No. 57-92528, on the inner surface of the molded container, that is, on the contact surface with the quartz glass,
Lined with graphite fiber cloth. However, with this method, it is difficult to reuse the expensive graphite fiber cloth, and since the fiber cloth is porous, it is difficult to pressure-form it with good dimensional accuracy. In addition, in JP-A No. 57-67031, the thickness is 10~
A molded container made of graphite whose inner surface is coated with 1000μm α or β silicon carbide, or 10~
A graphite molded container with a 1000 μm thick soot-like carbon layer is used. Among these, in the case of soot-like carbon, PD Miller's report (J.Am.
Ceram.Soc., 62 [3, 4] 147-149 (1979)), the reaction rate between carbon and silica glass is higher than that between silicon carbide and silica glass, and moreover, it is sooty carbon. Therefore, the surface area is large and the soot-like carbon is rapidly consumed, and a new soot-like carbon layer must be provided each time the molding operation is performed, making the process complicated.
また、グラフアイト製成形容器表面の10〜
1000μmの厚みを有する炭化珪素層は、同一のグ
ラフアイト製成形容器を使用して、石英ガラスの
加熱加圧成形を繰り返すことによつても形成され
るが、そのためには数回の成形操作を経ることを
必要とし、その間に前述のような問題が生じて、
石英ガラスの成形品歩留りが著しく低下するとい
う問題が生じる。 In addition, the surface of the graphite molded container
A silicon carbide layer with a thickness of 1000 μm can also be formed by repeating heating and pressure molding of quartz glass using the same graphite molding container, but this requires several molding operations. During this period, problems such as those mentioned above arise,
A problem arises in that the yield of quartz glass molded products is significantly reduced.
［問題点を解決するための手段］
本発明は、前述の問題点を解決すべくなされた
ものであり、石英ガラスを高温下で加圧成形する
際に使用するグラフアイト製成形容器表面に強固
な炭化珪素層を形成するために、炭化珪素層を形
成させるような珪素含有化合物をグラフアイト製
成形容器表面に塗布して1700〜1800℃の温度で熱
処理を行なう、石英ガラス成形容器の前処理方法
を提供するものである。[Means for Solving the Problems] The present invention has been made to solve the above-mentioned problems. Pretreatment of a quartz glass molded container, in which a silicon-containing compound that forms a silicon carbide layer is applied to the surface of the graphite molded container and heat treated at a temperature of 1700 to 1800°C. The present invention provides a method.
前述のようにグラフアイト製成形容器表面に炭
化珪素（以下SiCを書くことがある）層の形成さ
れた成形容器を使用することにより、石英ガラス
との反応による成形容器の消耗や、石英ガラスと
グラフアイト製成形容器の反応融着に起因するク
ラツクの発生、特に未使用のグラフアイト製成形
容器を新たに使用する際に発生する上述のよな問
題がなくなり、成形性並びに成形品の歩留りが著
しく向上した。 As mentioned above, by using a molded container made of graphite with a silicon carbide (hereinafter sometimes referred to as SiC) layer formed on the surface of the molded container, the molded container is not worn out due to reaction with quartz glass, and the quartz glass The occurrence of cracks caused by reaction fusion in graphite molded containers, especially the above-mentioned problems that occur when new graphite molded containers are used, is eliminated, and moldability and molded product yield are improved. Significantly improved.
本発明の好ましい態様によれば、有機シリコ
ン、例えば、テトラエトキシシランSi（OEt4）の
ように加水分解してシリカゾルを形成するような
珪素化合物にイオン交換水を反応当量加えて、シ
リカゾルスラリーを形成させる。このシリカゾル
スラリーに、高純度のβ炭化珪素微粉末をモル比
がSi（OH）4／SiC＝1.0〜0.10の範囲で加え、シリ
カゾル―炭化珪素スラリーとする。添加すべき炭
化珪素はα炭化珪素でももちろん良く、その添加
量は、Si（OH）4／SiC比が0.54を超えると過剰な
Si（OH）4や熱処理時に球状のSiO2となつて均一
なSiC層を形成させることが困難となる。 According to a preferred embodiment of the present invention, a reaction equivalent of ion-exchanged water is added to an organosilicon, for example, a silicon compound that can be hydrolyzed to form a silica sol, such as tetraethoxysilane Si (OEt 4 ), to form a silica sol slurry. Let it form. High-purity β silicon carbide fine powder is added to this silica sol slurry at a molar ratio of Si(OH) 4 /SiC=1.0 to 0.10 to obtain a silica sol-silicon carbide slurry. Of course, the silicon carbide to be added may be α-silicon carbide, and the amount to be added may be excessive if the Si(OH) 4 /SiC ratio exceeds 0.54.
Si(OH) 4 becomes spherical SiO 2 during heat treatment, making it difficult to form a uniform SiC layer.
またSi（OH）4／SiC比が0.10以下になると成形
されたSiC層が焼結不足のため剥れやすいという
欠点を有する。従つてスラリーの組成は、Si
（OH）4／SiCモル比が0.3〜0.2となることが望ま
しい。こうして得られたシリカゾル―炭化珪素ス
ラリーをグラフアイト製成形容器に均一に塗布し
て熱処理を行なう。シリカゾル―炭化珪素スラリ
ーの塗布量は、少ないと効果がなく、また余り多
いと成形作業途中に炭化珪素の剥離が生じるの
で、前記グラフアイト製成形容器表面の１cm2当
り、SiCが0.05ｇ程度になるようにするのが適当
である。 In addition, when the Si(OH) 4 /SiC ratio is less than 0.10, the formed SiC layer has the disadvantage that it easily peels off due to insufficient sintering. Therefore, the composition of the slurry is Si
It is desirable that the (OH) 4 /SiC molar ratio is 0.3 to 0.2. The silica sol-silicon carbide slurry thus obtained is uniformly applied to a graphite molded container and subjected to heat treatment. If the amount of silica sol-silicon carbide slurry applied is too small, it will not be effective, and if it is too large , silicon carbide will peel off during the molding process. It is appropriate to do so.
こうして得られたシリカゾル−炭化珪素スラリ
ー塗布済みのグラフアイト製成形容器を熱処理用
加熱炉内で熱処理を行なう。熱処理は、1000℃ま
でを10-1torr以下の減圧雰囲気で昇温し、グラフ
アイト製成形容器に吸着される酸素および水分を
充分に除去した後、760torr以上のAr雰囲気と
し、1700℃以上の温度にまで昇温する。熱処理温
度は、1700〜1800℃の範囲の温度で充分である。 The graphite molded container coated with the silica sol-silicon carbide slurry thus obtained is heat treated in a heat treatment furnace. Heat treatment is performed by raising the temperature to 1000℃ in a reduced pressure atmosphere of 10 -1 torr or less, sufficiently removing oxygen and moisture adsorbed by the graphite molded container, and then increasing the temperature to 1000℃ or higher in an Ar atmosphere of 760torr or higher. Raise the temperature to A heat treatment temperature in the range of 1700 to 1800°C is sufficient.
上記の前処理は、グラフアイト製成形容器の石
英ガラスとの接触面だけでも良いが、グラフアイ
ト製成形容器の全表面にわたつて行なうこともも
ちろん良い。特にグラフアイト製成形容器の肉厚
が、７〜５mm程度あるいはそれ以下の薄いグラフ
アイト板を使用する場合には、石英ガラスと接触
する面だけでは、グラフアイトのSiC化にともな
い、成形容器の変形が顕著になるため、全表面に
上記の前処理を施すことが好ましい。 The above pretreatment may be carried out only on the surface of the graphite molded container that comes into contact with the quartz glass, but it is also of course possible to perform the pretreatment over the entire surface of the graphite molded container. In particular, when using a thin graphite plate with a wall thickness of about 7 to 5 mm or less for a graphite molded container, it is difficult to use only the surface that contacts the quartz glass. Since the deformation becomes noticeable, it is preferable to perform the above pretreatment on the entire surface.
上述のように前処理によつて表面に炭化珪素層
の形成されたグラフアイト製成形容器を実際に使
用するにあたつては、炭化珪素が0.01ｇ／cm2以
上、好ましくは0.013ｇ／cm2程度になるように、
炭化珪素スラリーをグラフアイト製成形容器表面
の炭化珪素層上に新たに塗布することが望まし
い。塗布すべきこの炭化珪素の量が0.05ｇ／cm2を
超えると、成形作業途中に炭化珪素の剥離、落下
が生じ、成形性が著しく低下する。 When actually using a graphite molded container on which a silicon carbide layer is formed on the surface by pretreatment as described above, the silicon carbide content is 0.01 g/cm 2 or more, preferably 0.013 g/cm 2 or more. So that it is about 2 ,
It is desirable to newly apply the silicon carbide slurry onto the silicon carbide layer on the surface of the graphite molded container. If the amount of silicon carbide to be coated exceeds 0.05 g/cm 2 , silicon carbide will peel off or fall during the molding operation, resulting in a significant decrease in moldability.
こうして表面に炭化珪素層を有するグラフアイ
ト製成形容器に炭化珪素スラリーを塗布した成形
容器中に石英ガラスを設置し、前記成形容器ごと
に全体を成形炉内に仕込み、前述のグラフアイト
製成形容器の前処理と同様の昇温条件で1700℃以
上に昇温して、加圧成形を行なう。加圧方法は、
グラフアイト製の重しあるいは錘でも良く、また
油圧プレス機による加圧でも良い。加圧圧力とし
ては、10ｇ／cm2から1200ｇ／cm2の範囲で、目的に
応じた圧力を選択することが可能である。 In this way, quartz glass is placed in a molded container made of graphite having a silicon carbide layer on its surface and coated with silicon carbide slurry, and the entire molded container is placed in a molding furnace, and the molded container made of graphite described above is placed in a molding furnace. Pressure molding is carried out by raising the temperature to 1700°C or higher under the same heating conditions as in the pretreatment. The pressurization method is
A weight or weight made of graphite may be used, or pressure may be applied using a hydraulic press machine. The pressurizing pressure can be selected from a range of 10 g/cm 2 to 1200 g/cm 2 depending on the purpose.
［作用］
石英ガラスと炭化珪素との反応速度は、石英ガ
ラスとグラフアイトの反応速度に比べて、1/3程
度の速さであることが知られている。従つて、石
英ガラスと炭化珪素間の反応融着は、石英ガラス
とグラフアイトに比べて、抑えられるものと期待
される。また成形作業毎に塗布する炭化珪素スラ
リーによつて未焼結のSiC粒子がグラフアイト製
成形容器表面のSiC層と石英ガラスの間に存在す
ることとなるため、この未焼結のSiC粒子が石英
ガラスと成形容器間の潤滑剤として作用すると考
えられ、冷却時に熱膨張係数差によつて生じる応
力を低減させ、クラツクの発生を抑えるものを考
えられる。[Function] It is known that the reaction rate between silica glass and silicon carbide is about 1/3 of the reaction rate between quartz glass and graphite. Therefore, it is expected that the reaction and adhesion between quartz glass and silicon carbide will be suppressed compared to quartz glass and graphite. Furthermore, due to the silicon carbide slurry applied during each molding operation, unsintered SiC particles exist between the SiC layer on the surface of the graphite molded container and the silica glass. It is thought to act as a lubricant between the quartz glass and the molded container, reducing the stress caused by the difference in thermal expansion coefficient during cooling, and suppressing the occurrence of cracks.
［実施例］
モル比が、Si（OH）4／SiC＝0.2となるようなシ
リカゾル―炭化珪素スラリーを珪酸エチル（Si
（OEt）4）とイオン交換水およびβ炭化珪素微粉
末より作成した。このシリカゾル―炭化珪素スラ
リーを炭化珪素が0.05ｇ／cm2となるように塗布し
たグラフアイト製成形容器を1750℃のAr雰囲気
中で４時間処理して、成形容器表面に炭化珪素層
を形成させた。この炭化珪素層を表面に有するグ
ラフアイト製成形容器に、更に炭化珪素が0.013
ｇ／cm2となるように炭化珪素スラリーを塗布した
後、直径120mm、長さ320mmで重量が7923ｇの円柱
状石英ガラスと成形容器中に仕込んで成形容器ご
と加熱し、加圧成形を行なつた。本実施例に使用
したグラフアイト製成形容器は、一辺が160mmの
正方形を水平断面とする成形体が成形によつて得
られる如き成形容器であつた。加熱温度は、1760
℃であり、成形圧力は25ｇ／cm2であつた。[Example] Silica sol-silicon carbide slurry with a molar ratio of Si(OH) 4 /SiC=0.2 was mixed with ethyl silicate (Si
(OEt) 4 ), ion-exchanged water and β-silicon carbide fine powder. A graphite molded container coated with this silica sol-silicon carbide slurry at a silicon carbide content of 0.05 g/cm 2 was treated in an Ar atmosphere at 1750°C for 4 hours to form a silicon carbide layer on the surface of the molded container. Ta. This graphite molded container having a silicon carbide layer on its surface is further coated with 0.013 silicon carbide.
After applying silicon carbide slurry so that the slurry is 120mm in diameter, 320mm in length, and weighing 7923g in a molding container, the molding container is heated and pressure molded. Ta. The graphite molded container used in this example was such a molded container that a molded body having a horizontal cross section of a square with sides of 160 mm was obtained by molding. Heating temperature is 1760
℃, and the molding pressure was 25 g/cm 2 .
得られた石英ガラス成形体は、一辺が160mmの
正方形を底面とし、高さが140mmであつた。その
重量は7911ｇであり、重量損失は12ｇであつた。
石英ガラス成形体には、クラツクの発生はなく、
表面に凹凸もなく、全体も透明であつた。 The obtained quartz glass molded body had a square bottom with sides of 160 mm and a height of 140 mm. Its weight was 7911 g, and the weight loss was 12 g.
There are no cracks in the quartz glass molded body,
There were no irregularities on the surface, and the entire surface was transparent.
［発明の効果］
以上説明したように、本発明によつてシリカゾ
ル―炭化珪素スラリーを塗布して前処理を行な
い、グラフアイト製成形容器表面に炭化珪素層を
形成させた後、更に炭化珪素スラリーを塗布した
成形容器を使用することによつて、石英ガラスの
成形に於て、クラツクの発生、また成形容器の消
耗等を完全に防止することができる。[Effects of the Invention] As explained above, according to the present invention, a silica sol-silicon carbide slurry is applied and pretreated to form a silicon carbide layer on the surface of a graphite molded container, and then a silicon carbide slurry is applied. By using a molded container coated with silica glass, it is possible to completely prevent the occurrence of cracks and wear and tear of the molded container during molding of quartz glass.
また、成形容器表面の炭化珪素層は、同一のグ
ラフアイト製成形容器を使用して石英ガラスの加
熱加圧成形を数回繰り返すことによつても形成さ
れるが、本方法のように液状のシリカゾル―炭化
珪素スラリーを使用することによつて、一回の処
理で、グラフアイト製成形容器内部まで、充分に
強固な炭化珪素層を形成させることが可能であ
る。 The silicon carbide layer on the surface of the molded container can also be formed by repeating heating and pressure molding of quartz glass several times using the same graphite molded container; By using the silica sol-silicon carbide slurry, it is possible to form a sufficiently strong silicon carbide layer up to the inside of the graphite molded container in a single treatment.
Claims (1)
状の成形体を得るために使用するグラフアイト製
成形容器の表面にシリカゾール炭化珪素スラリー
を塗布した後、熱処理することにより、該グラフ
アイト製成形容器の表面に炭化珪素層を形成させ
ることを特徴とする石英ガラス成形容器の前処理
方法。1. After applying a silicasol silicon carbide slurry to the surface of a graphite molding container used to pressurize quartz glass at high temperature to obtain a molded body of a desired shape, heat treatment is performed to form a molded body made of graphite. A method for pretreating a quartz glass molded container, the method comprising forming a silicon carbide layer on the surface of the molded container.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28570785A JPS62148331A (en) | 1985-12-20 | 1985-12-20 | Pretreatment of quartz glass molding vessel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28570785A JPS62148331A (en) | 1985-12-20 | 1985-12-20 | Pretreatment of quartz glass molding vessel |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62148331A JPS62148331A (en) | 1987-07-02 |
| JPS6357367B2 true JPS6357367B2 (en) | 1988-11-11 |
Family
ID=17694983
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28570785A Granted JPS62148331A (en) | 1985-12-20 | 1985-12-20 | Pretreatment of quartz glass molding vessel |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62148331A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002220240A (en) * | 2001-01-22 | 2002-08-09 | Sumitomo Metal Ind Ltd | Method of producing quartz glass by hot forming |
| TW200502183A (en) | 2003-04-07 | 2005-01-16 | Nikon Corp | Molding apparatus and method of quartz glass |
| JP2010024084A (en) * | 2008-07-18 | 2010-02-04 | Tosoh Quartz Corp | Method of molding quartz glass material using mold material |
| JP5053206B2 (en) * | 2008-08-22 | 2012-10-17 | 東ソー・クォーツ株式会社 | Method of forming quartz glass material using mold material |
| CN111348821A (en) * | 2018-12-21 | 2020-06-30 | 财团法人工业技术研究院 | Graphite mold for glass shaping and manufacturing method thereof |
-
1985
- 1985-12-20 JP JP28570785A patent/JPS62148331A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62148331A (en) | 1987-07-02 |
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